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101 条记录 (耗时 0.049 秒)

    X-ray projection exposure apparatus and a device manufacturing method
    21.
    发明授权
    X-ray projection exposure apparatus and a device manufacturing method 失效

    公开(公告)号：US06668037B2

    公开(公告)日：2003-12-23

    申请号：US09948041

    申请日：2001-09-07

    申请人： Shinichi Hara ,  Masami Tsukamoto

    发明人： Shinichi Hara ,  Masami Tsukamoto

    IPC分类号： G21K500

    CPC分类号： G03F7/70708 ,  G03F7/70875 ,  G21K5/10

    摘要： An X-ray projection exposure apparatus includes a mask chuck, a wafer chuck, an X-ray illuminating system, and an X-ray projection system. The masks chuck holds a reflection X-ray mask having a mask pattern thereon. The wafer chuck holds a wafer onto which the mask pattern is transferred. The X-ray illuminating system illuminates the reflection X-ray mask, held by the mask chuck, with X-rays. The X-ray projection optical system projects the mask pattern of the reflection X-ray mask onto the wafer held by the wafer chuck with a predetermined magnification. The mask chuck includes a mechanism for generating static electricity for attracting and holding the reflection X-ray mask by an electrostatic force. The invention also includes a device manufacturing method using such an X-ray projection exposure apparatus to transfer a mask pattern onto the wafer using the X-ray projection exposure apparatus.

    Semiconductor memory production system and semiconductor memory production method
    22.
    发明授权
    Semiconductor memory production system and semiconductor memory production method 失效
    半导体存储器生产系统和半导体存储器生产方法

    公开(公告)号：US06532182B2

    公开(公告)日：2003-03-11

    申请号：US09811529

    申请日：2001-03-20

    申请人： Sumio Ogawa ,  Shinichi Hara

    发明人： Sumio Ogawa ,  Shinichi Hara

    IPC分类号： G11C700

    CPC分类号： H01L22/22 ,  H01L22/20 ,  H01L2924/0002 ,  Y02P90/10 ,  Y02P90/14 ,  H01L2924/00

    摘要： A semiconductor memory production system is provided, capable of holding the data necessary for process analysis for each lot in chronological order using a small amount of information, and which enables production management based on data that has been stored previously without performing new measurements. The semiconductor memory production system comprises: an LSI tester 1 that tests semiconductor memory and outputs the addresses of memory cells for each chip and a pass/fail bitmap corresponding to these addresses, and a process defect estimating device 34 that extracts the bit addresses of fail bits from the bitmap, and determines replacement addresses of word lines and bit lines to be replaced by redundant word lines and redundant bit lines in the redundant memory section, and estimates process defects from statistical analysis of the distribution condition of each chip on each wafer. Through this estimated result, feedback to the manufacturing line/process step prevents from producing defects frequently.

    摘要翻译： 提供一种半导体存储器制造系统，其能够使用少量的信息按照时间顺序保存每个批次的处理分析所必需的数据，并且其能够基于先前已经存储的数据进行生产管理而不执行新的测量。 半导体存储器制造系统包括：LSI测试器1，其测试半导体存储器并输出每个芯片的存储单元的地址以及对应于这些地址的通过/失败位图;以及处理缺陷估计器34，其提取失败的位地址 并且确定要由冗余存储器部分中的冗余字线和冗余位线替换的字线和位线的替换地址，并且从每个晶片上每个芯片的分布条件的统计分析来估计处理缺陷。 通过这个估计结果，反馈到生产线/加工步骤防止频繁地产生缺陷。

    Intermediate communication controller that sends transmission data in a predetermined order to a corresponding slave unit upon request from a master controller
    24.
    发明授权
    Intermediate communication controller that sends transmission data in a predetermined order to a corresponding slave unit upon request from a master controller 失效
    中间通信控制器，其根据主控制器的请求，以预定的顺序向相应的从单元发送传输数据

    公开(公告)号：US6011921A

    公开(公告)日：2000-01-04

    申请号：US782310

    申请日：1997-01-15

    申请人： Akihiro Takahashi ,  Takumi Iwai ,  Kenji Fukunaga ,  Shinichi Hara ,  Shuichi Nakagawa

    发明人： Akihiro Takahashi ,  Takumi Iwai ,  Kenji Fukunaga ,  Shinichi Hara ,  Shuichi Nakagawa

    IPC分类号： G06F13/00 ,  G06F13/24 ,  H04B10/077 ,  H04B10/27 ,  H04B10/272 ,  H04B10/29 ,  H04L13/08 ,  H04L29/10 ,  G06F13/20

    CPC分类号： G06F13/24

    摘要： A communication control apparatus includes a master communication control unit for performing communication control for a plurality of slave units, and an intermediate communication control unit which performs the communication control for each slave unit instead of the master communication control unit. The intermediate communication control unit includes a memory section for holding transmission data necessary for slave unit communication processing and response data, which is a response to the transmission data, a transmission/reception section for sending the transmission data and for receiving the response data, and a communication processing control section. The communication processing control sections sends the transmission data in a predetermined order to the slave unit, which writes the response data received in a predetermined order into the memory section, and notifies the master communication control unit of the completion of the communication processing by using an interruption signal when the communication processing is completed.

    摘要翻译： 通信控制装置包括用于对多个从单元执行通信控制的主通信控制单元，以及对于每个从单元而不是主通信控制单元进行通信控制的中间通信控制单元。 中间通信控制单元包括：存储部，用于保持作为对发送数据的响应的从单元通信处理所需的发送数据和响应数据;发送/接收部，用于发送发送数据和接收响应数据;以及 通信处理控制部。 通信处理控制部以预定的顺序将发送数据发送到从单元，从单元将按照预定顺序接收到的响应数据写入到存储器部分，并通过使用通信处理通知主通信控制单元完成通信处理 通信处理完成时的中断信号。

    Mask and mask supporting mechanism
    27.
    发明授权
    Mask and mask supporting mechanism 失效
    面罩和面罩支撑机构

    公开(公告)号：US5825463A

    公开(公告)日：1998-10-20

    申请号：US791545

    申请日：1997-01-31

    申请人： Shinichi Hara ,  Nobutoshi Mizusawa ,  Yuji Chiba

    发明人： Shinichi Hara ,  Nobutoshi Mizusawa ,  Yuji Chiba

    IPC分类号： G03F1/22 ,  G03F7/20 ,  G03B27/62

    CPC分类号： G03F1/22 ,  G03F7/707

    摘要： A mask and a mask supporting mechanism wherein the outside periphery of a mask frame, having a rectangular shape, which supports the mask, is supported at three supporting points which are substantially the same distance from the center line of a mask membrane, whereby the mask frame is positioned with respect to X, Y and .theta. directions. Two pressing mechanisms press the mask frame at two points substantially opposed to two of the supporting points. The mask is supported at three points on the bottom surface thereof for positioning in the Z direction.

    摘要翻译： 一种掩模和掩模支撑机构，其中具有矩形形状的支撑掩模的掩模框架的外周被支撑在与掩模膜的中心线基本相同的距离处的三个支撑点处，由此掩模 框架相对于X，Y和θ方向定位。 两个按压机构在基本上与两个支撑点相对的两点处按压面罩框架。 掩模在其底表面上的三个点处被支撑以在Z方向上定位。

    Mask holding device, and an exposure apparatus and a device manufacturing method using the device
    28.
    发明授权
    Mask holding device, and an exposure apparatus and a device manufacturing method using the device 失效
    掩模保持装置，以及使用该装置的曝光装置和装置制造方法

    公开(公告)号：US5608773A

    公开(公告)日：1997-03-04

    申请号：US348837

    申请日：1994-11-29

    申请人： Nobusige Korenaga ,  Kouichi Hara ,  Shinichi Hara

    发明人： Nobusige Korenaga ,  Kouichi Hara ,  Shinichi Hara

    IPC分类号： G03F7/20 ,  G03B11/00

    CPC分类号： G03F7/707

    摘要： A mask for exposure is supported at three positions on a holding surface of a mask chuck of an X-ray exposure apparatus by means of kinematic mounting. Magnetic units, each comprising an electromagnet, and magnetic rings are provided around supporting points at the three,positions on the mask chuck and on the mask frame, respectively. It is thereby possible to generate a tensile force to magnetically attract the mask frame in the direction of the normal of the holding surface of the mask chuck, and to attract and hold the mask on the mask chuck. Thus, the mask can be chucked on the X-ray exposure apparatus in substantially the same state as that of a mechanical clamp on an electron beam (EB) scanning apparatus while the mask is manufactured, without using a mechanical clamping mechanism.

    摘要翻译： 用于曝光的掩模通过运动学安装在X射线曝光设备的掩模卡盘的保持表面上的三个位置处被支撑。 分别在掩模卡盘和掩模框架上的三个位置处的支撑点周围设置各自包括电磁体和磁环的磁性单元。 由此，可以产生拉伸力，以沿着掩模卡盘的保持面的法线方向磁吸引掩模框架，并且将掩模吸引并保持在掩模卡盘上。 因此，在不使用机械夹持机构的情况下，可以在制造掩模的同时，以与电子束（EB）扫描装置上的机械夹具基本相同的状态将掩模夹持在X射线曝光装置上。

    Method of manufacturing a thin-film magnetic head
    30.
    发明授权
    Method of manufacturing a thin-film magnetic head 失效
    制造薄膜磁头的方法

    公开(公告)号：US4791719A

    公开(公告)日：1988-12-20

    申请号：US1440

    申请日：1987-01-08

    申请人： Tetsuo Kobayashi ,  Yukihisa Tsukada ,  Shinji Narishige ,  Shinichi Hara

    发明人： Tetsuo Kobayashi ,  Yukihisa Tsukada ,  Shinji Narishige ,  Shinichi Hara

    IPC分类号： G11B5/31 ,  G11B5/127

    CPC分类号： G11B5/3163 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49062

    摘要： A first magnetic layer is formed upon a non-magnetic substrate, a gap layer is formed upon the first magnetic layer, a conductor coil covered with an insulation layer is formed upon the gap layer, a second magnetic layer is formed upon the gap layer and the insulation layer, a magnetic gap being formed between the first and second magnetic layers at a front portion facing a recording medium, and the second magnetic layer being connected to the first magnetic layer at a back portion. After forming a mask made of metal oxide upon the second magnetic layer, the second magnetic layer, the gap layer, and the first magnetic layer are formed into a predetermined shape respectively at the tip portion by dry etching. Thus, a high performance thin-film magnetic head having the same widths for the first and second magnetic layers is obtained.

    摘要翻译： 在非磁性基板上形成第一磁性层，在第一磁性层上形成间隙层，在间隙层上形成被绝缘层覆盖的导体线圈，在间隙层上形成第二磁性层， 所述绝缘层在形成在所述第一和第二磁性层之间的面向记录介质的前部处形成磁隙，所述第二磁性层在后部连接到所述第一磁性层。 在第二磁性层上形成由金属氧化物制成的掩模之后，通过干蚀刻将第二磁性层，间隙层和第一磁性层分别形成为尖端部分的预定形状。 因此，获得了对于第一和第二磁性层具有相同宽度的高性能薄膜磁头。