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    COATING PROCESS USING GAS SCREEN
    21.
    发明申请
    COATING PROCESS USING GAS SCREEN 审中-公开
    使用气体筛选的涂料工艺

    公开(公告)号：US20160326628A1

    公开(公告)日：2016-11-10

    申请号：US15109884

    申请日：2015-01-07

    Applicant: UNITED TECHNOLOGIES CORPORATION

    Inventor： Joseph A. DePalma ,  Mladen F. Trubelja ,  David A. Litton ,  Dmitri L. Novikov ,  Sergei F. Burlatsky

    IPC: C23C14/22 ,  C23C14/02 ,  C23C14/24 ,  C23C14/30

    CPC classification number: C23C14/228 ,  C23C14/02 ,  C23C14/083 ,  C23C14/243 ,  C23C14/30

    Abstract: A method for use in a coating process includes pre-heating a substrate in the presence of a coating material and shielding the substrate during the pre-heating from premature deposition of the coating material by establishing a gas screen between the substrate and the coating material. An apparatus for use in a coating process includes a chamber, a crucible that is configured to hold a coating material in the chamber, an energy source operable to heat the interior of the chamber, a coating envelope situated with respect to the crucible, and at least one gas manifold located near the coating envelope. The at least one gas manifold is configured to provide a gas screen between the coating envelope and the crucible. A second manifold provides gas during a later coating deposition to compress a vapor plume of the coating material and focus the plume on the substrate to increase deposition rate.

    Abstract translation: 用于涂布方法的方法包括在涂料存在下预热基材，并且在预加热期间屏蔽基材以防止涂料过早沉积，从而在基材和涂料之间建立气体筛网。 一种用于涂覆工艺的设备包括：腔室，构造成将涂层材料保持在腔室中的坩埚，可操作以加热腔室内部的能量源，相对于坩埚定位的涂层壳体，​​以及位于 位于涂层外壳附近的至少一个气体歧管。 至少一个气体歧管被配置成在涂层包封和坩埚之间提供气体筛网。 第二歧管在稍后的涂层沉积期间提供气体以压缩涂层材料的蒸气羽流并将羽流聚焦在基底上以增加沉积速率。

    PRESSURE MODULATED COATING
    23.
    发明申请
    PRESSURE MODULATED COATING 有权
    压力调节涂料

    公开(公告)号：US20160040284A1

    公开(公告)日：2016-02-11

    申请号：US14810767

    申请日：2015-07-28

    Applicant: United Technologies Corporation

    Inventor： Dmitri Novikov ,  Sergei F. Burlatsky ,  David Ulrich Fuller ,  David A. Litton

    IPC: C23C14/54 ,  F01D25/00 ,  C23C14/24

    CPC classification number: C23C14/54 ,  C23C14/228 ,  C23C14/243 ,  F01D25/005

    Abstract: A method or control strategy in a coating apparatus for use in a coating process can include controlling differential gas pressures among multiple selected localized zones in a coating chamber with respect to each other. The controlled differential gas pressure of the multiple selected localized zones is used to influence how a coating deposits on at least one component. The localized zones can be selected from a first localized zone around the component, a second localized zone adjacent the source of coating material, a third localized zone that diverges from the second localized zone toward the first localized zone, and a fourth localized zone that circumscribes at least the third localized zone

    Abstract translation: 在涂覆工艺中使用的涂覆装置中的方法或控制策略可以包括控制涂覆室中相对于彼此的多个选定局部区域中的差分气体压力。 多个选定的局部区域的受控差压气体压力用于影响涂层如何沉积在至少一个部件上。 局部区域可以从组件周围的第一局部区域，与涂层材料源相邻的第二局部区域，从第二局部区域向第一局部区域分叉的第三局部区域以及第四局部区域选择， 至少第三个本地化区域

    THERMAL BARRIER COATING WITH REDUCED STABILIZER CONTENT
    25.
    发明申请
    THERMAL BARRIER COATING WITH REDUCED STABILIZER CONTENT 审中-公开

    公开(公告)号：US20200340100A1

    公开(公告)日：2020-10-29

    申请号：US16392003

    申请日：2019-04-23

    Applicant: United Technologies Corporation

    Inventor： Kaylan M. Wessels ,  Brian T. Hazel ,  Michael J. Maloney ,  David A. Litton ,  Elisa M. Zaleski

    IPC: C23C14/30 ,  C23C14/08

    Abstract: In accordance with the present disclosure, there is provided a process for limiting a critical stabilizer content in coatings comprising placing a source coating material in a crucible of a vapor deposition apparatus having a coating chamber, the source coating material having compositional range of LnO1.5 comprising a single cation mol % of 30-50% relative to zirconia (ZrO2), where Ln=La, Pr, Nd, Sm, Eu, Gd, and Tb and combinations thereof; energizing the source coating material with an electron beam that delivers a power density to the material in the crucible forming a vapor cloud from the source coating material; and depositing the source coating material as a coating system onto a surface of a work piece.

    FIXTURE FOR VAPOR DEPOSITION SYSTEM
    26.
    发明申请
    FIXTURE FOR VAPOR DEPOSITION SYSTEM 审中-公开

    公开(公告)号：US20200227234A1

    公开(公告)日：2020-07-16

    申请号：US16836337

    申请日：2020-03-31

    Applicant: United Technologies Corporation

    Inventor： James W. Neal ,  Michael J. Maloney ,  Kevin W. Schlichting ,  David A. Litton

    IPC: H01J37/30 ,  G01K1/14 ,  G01K7/02 ,  G01K13/08 ,  C23C14/50 ,  C23C14/24 ,  C23C14/54 ,  G01N25/00 ,  H01J37/317

    Abstract: A vapor deposition system fixture comprises an arm, a rake, a crown gear bearing assembly, a workpiece holder, a thermocouple, and a contact ring assembly. The crown gear bearing assembly is attached to and rotatably engaged with the rake and includes stationary portion and rotating portions. The workpiece holder is configured to rotate with the rotating portion. The thermocouple is configured to rotate with the workpiece holder. The contact ring assembly comprises a housing, a cover, first and second rotating contact rings, and first and second stationary contact rings. The housing is attached to at least one of the arm and the rake. The first and second rotating contact rings are electrically connected to the thermocouple. The first and second stationary contact rings surround the rotating ring. The first and second stationary contact rings are configured to receive an electrical signal from the first and second rotating contact rings.

    Deposition apparatus and methods
    27.
    发明授权
    Deposition apparatus and methods 有权

    公开(公告)号：US10385444B2

    公开(公告)日：2019-08-20

    申请号：US14774489

    申请日：2014-03-14

    Applicant: United Technologies Corporation

    Inventor： Brian T. Hazel ,  Michael J. Maloney ,  James W. Neal ,  David A. Litton

    IPC: C23C14/30 ,  C23C14/22 ,  C23C14/24 ,  C23C14/50

    Abstract: A deposition apparatus (20) comprising: a chamber (22); a process gas source (62) coupled to the chamber; a vacuum pump (52) coupled to the chamber; at least two electron guns (26); one or more power supplies (30) coupled to the electron guns; a plurality of crucibles (32,33,34) positioned or positionable in an operative position within a field of view of at least one said electron gun; and a part holder (170) having at least one operative position for holding parts spaced above the crucibles by a standoff height H. The standoff height H is adjustable in a range including at least 22 inches.

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