公开(公告)号：US07706044B2

公开(公告)日：2010-04-27

申请号：US11413603

申请日：2006-04-28

Applicant: Wen-Jian Lin ,  Hsiung-Kuang Tsai

Inventor： Wen-Jian Lin ,  Hsiung-Kuang Tsai

IPC: G02F1/03 ,  G02B26/00

CPC classification number: G02B26/001

Abstract: An optical interference display cell is described. A first electrode and a sacrificial layer are sequentially formed on a transparent substrate and at least two openings are formed in the first electrode and the sacrificial layer to define a position of the optical interference display cell. An insulated heat-resistant inorganic supporter is formed in each of the openings. A second electrode is formed on the sacrificial layer and the supporters. Finally, a remote plasma etching process is used for removing the sacrificial layer.

Abstract translation: 描述光学干涉显示单元。 第一电极和牺牲层依次形成在透明基板上，并且在第一电极和牺牲层中形成至少两个开口以限定光学干涉显示单元的位置。 在每个开口中形成绝缘的耐热无机支撑体。 在牺牲层和支撑体上形成第二电极。 最后，使用远程等离子体蚀刻工艺来去除牺牲层。

公开(公告)号：US20090219605A1

公开(公告)日：2009-09-03

申请号：US12463312

申请日：2009-05-08

Applicant: Wen-Jian Lin ,  Brian Arbuckle ,  Brian Gally ,  Philip Floyd ,  Lauren Palmateer

Inventor： Wen-Jian Lin ,  Brian Arbuckle ,  Brian Gally ,  Philip Floyd ,  Lauren Palmateer

IPC: G02B26/00

CPC classification number: G02B26/001 ,  B81B7/0012 ,  B81B2201/045

Abstract: A first electrode and a sacrificial layer are sequentially formed on a substrate, and then first openings for forming supports inside are formed in the first electrode and the sacrificial layer. The supports are formed in the first openings, and then a second electrode is formed on the sacrificial layer and the supports, thus forming a micro electro mechanical system structure. Afterward, an adhesive is used to adhere and fix a protection structure to the substrate for forming a chamber to enclose the micro electro mechanical system structure, and at least one second opening is preserved on sidewalls of the chamber. A release etch process is subsequently employed to remove the sacrificial layer through the second opening in order to form cavities in an optical interference reflection structure. Finally, the second opening is closed to seal the optical interference reflection structure between the substrate and the protection structure.

Abstract translation: 第一电极和牺牲层依次形成在基板上，然后在第一电极和牺牲层中形成用于形成支撑件的第一开口。 支撑件形成在第一开口中，然后在牺牲层和支撑件上形成第二电极，从而形成微机电系统结构。 之后，使用粘合剂将保护结构粘附并固定到基底上以形成腔室以包围微机电系统结构，并且至少一个第二开口保留在腔室的侧壁上。 随后采用释放蚀刻工艺以通过第二开口去除牺牲层，以便在光学干涉反射结构中形成空腔。 最后，关闭第二个开口以密封衬底和保护结构之间的光学干涉反射结构。

公开(公告)号：US20080157413A1

公开(公告)日：2008-07-03

申请号：US12050891

申请日：2008-03-18

Applicant: Wen-Jian Lin

Inventor： Wen-Jian Lin

IPC: B29D11/00

CPC classification number: G02B5/285 ,  H01L27/14625

Abstract: The method of manufacturing an optical interference color display is described. A first electrode structure is formed over a substrate first. At least one first area, second area and third area are defined on the first electrode structure. A first sacrificial layer is formed over the first electrode structure of the first area, the second area and the third area. Moreover, a second sacrificial layer is formed over the first sacrificial layer inside the second area and the third area. In addition, a third sacrificial layer is formed over the second sacrificial layer inside the third area. The etching rates of all sacrificial layers are different. Then, a patterned support layer is formed over the first electrode structure. Next, a second electrode layer is formed and the sacrificial layers are removed to form air gaps. Therefore, the air gaps are effectively controlled by using the material having different etching rates.

Abstract translation: 描述制造光学干涉色彩显示器的方法。 首先在衬底上形成第一电极结构。 在第一电极结构上限定至少一个第一区域，第二区域和第三区域。 在第一区域，第二区域和第三区域的第一电极结构上形成第一牺牲层。 此外，在第二区域和第三区域内的第一牺牲层上形成第二牺牲层。 另外，在第三区域内的第二牺牲层上形成第三牺牲层。 所有牺牲层的蚀刻速率是不同的。 然后，在第一电极结构上形成图案化的支撑层。 接下来，形成第二电极层，去除牺牲层以形成气隙。 因此，通过使用具有不同蚀刻速率的材料来有效地控制气隙。

公开(公告)号：US20080137175A1

公开(公告)日：2008-06-12

申请号：US12024815

申请日：2008-02-01

Applicant: Wen-Jian Lin

Inventor： Wen-Jian Lin

IPC: G02B26/00

CPC classification number: G02F1/29 ,  G02B26/001

Abstract: An optical interference color display comprising a transparent substrate, an inner-front optical diffusion layer, a plurality of first electrodes, a patterned support layer, a plurality of optical films and a plurality of second electrodes is provided. The inner-front optical diffusion layer is on the transparent substrate and the first electrodes are on the inner-front optical diffusion layer. The patterned support layer is on the inner-front optical diffusion layer between the first electrodes. The optical film is on the first electrodes and the second electrodes are positioned over the respective first electrodes. The second electrodes are supported through the patterned support layer. Furthermore, there is an air gap between the second electrodes and their respective first electrodes.

Abstract translation: 提供了包括透明基板，内前光学扩散层，多个第一电极，图案化支撑层，多个光学膜和多个第二电极的光学干涉色彩显示器。 内侧光学扩散层位于透明基板上，第一电极位于内侧光学扩散层上。 图案化支撑层位于第一电极之间的内前光学扩散层上。 光学膜位于第一电极上，第二电极位于相应的第一电极上。 第二电极通过图案化支撑层被支撑。 此外，在第二电极和它们各自的第一电极之间存在气隙。

公开(公告)号：US07092054B2

公开(公告)日：2006-08-15

申请号：US11296949

申请日：2005-12-07

Applicant: Wen-Chung Tang ,  Yao Peng ,  Hung-Huei Hsu ,  Wen-Jian Lin

Inventor： Wen-Chung Tang ,  Yao Peng ,  Hung-Huei Hsu ,  Wen-Jian Lin

IPC: G02F1/1335 ,  G02F1/1333 ,  G02F1/13

CPC classification number: G02F1/133553 ,  G02F1/133555

Abstract: The method for fabricating reflector plate for a reflective liquid crystal display and the device is disclosed. The present invention includes the formation of a protection layer over the glass substrate having thin film transistors and a layer of transparent electrodes on top, followed by the formation of a layer of undulating resin over the protection layer. If the reflector plate to be produced is a semi-transmissive type, a light-transmitting region is created over the protection layer. Since the protection layer is created in advance of the undulating resin outgrowth, the present method can effectively prevent reflection from the exposure stage during the lithography process, thus the problem of abnormal pattern marks occurring on the reflective surface can be avoided, and the exposure time and the production yield are enhanced.

Abstract translation: 公开了用于制造反射型液晶显示器的反射板的方法及其装置。 本发明包括在具有薄膜晶体管的玻璃基板上形成保护层，在顶部形成一层透明电极，然后在保护层上形成起伏的树脂层。 如果要制造的反射板是半透射型的，则在保护层上形成透光区域。 由于保护层是在起伏的树脂生长之前产生的，所以本发明的方法可以有效地防止在光刻工艺期间从曝光阶段的反射，从而可以避免在反射表面上出现异常图案标记的问题，并且曝光时间 提高了产量。

公开(公告)号：US07016095B2

公开(公告)日：2006-03-21

申请号：US11069938

申请日：2005-03-03

Applicant: Wen-Jian Lin

Inventor： Wen-Jian Lin

IPC: G02F1/03 ,  G02F1/07

CPC classification number: G02B26/001 ,  B81B2201/047 ,  B81C1/00182 ,  G02B5/201 ,  G02B5/284

Abstract: An interference display unit with a first electrode, a second electrode and posts located between the two electrodes is provided. The characteristic of the interference display unit is that the second electrode's stress is released through a thermal process. The position of the second electrode is shifted and the distance between the first electrode and the second electrode is therefore defined. A method for fabricating the structure described as follow. A first electrode and a sacrificial layer are sequentially formed on a substrate and at least two openings are formed in the first electrode and the sacrificial layer. A supporter is formed in the opening and the supporter may have at least one arm on the top portion of the supporter. A second electrode is formed on the sacrificial layer and the supporter and a thermal process is performed. Finally, The sacrificial layer is removed.

Abstract translation: 提供具有位于两个电极之间的第一电极，第二电极和支柱的干涉显示单元。 干涉显示单元的特征是通过热处理释放第二电极的应力。 第二电极的位置偏移，因此限定第一电极和第二电极之间的距离。 一种制造如下结构的方法。 第一电极和牺牲层依次形成在基板上，并且在第一电极和牺牲层中形成至少两个开口。 支撑件形成在开口中，并且支撑件可以在支撑件的顶部上具有至少一个臂。 在牺牲层和支撑体上形成第二电极，并进行热处理。 最后，牺牲层被去除。

公开(公告)号：US06912022B2

公开(公告)日：2005-06-28

申请号：US10249244

申请日：2003-03-26

Applicant: Wen-Jian Lin ,  Hsiung-Kuang Tsai

Inventor： Wen-Jian Lin ,  Hsiung-Kuang Tsai

IPC: G02B26/02 ,  G02B5/20 ,  G02B26/00 ,  G02F1/13 ,  G02F1/1335

CPC classification number: G02B26/001 ,  G02B5/201

Abstract: An optical interference color display is provided. The optical interference color display comprises a color filtering substrate, a patterned support layer, a plurality of first electrodes, a plurality of optical films and a plurality of second electrodes. The patterned support layer and the first electrodes are positioned on the color filtering substrate with the patterned support layer between the first electrodes. The optical films are positioned on the first electrodes. The second electrodes is positioned over the first electrodes and supported through the patterned support layer such that an air gap with identical thickness is produce between every pair of second electrode and first electrode. Using the color filtering substrate to show color images, air gap between the first electrodes and the second electrodes are identical and hence simplifies the manufacturing process.

Abstract translation: 提供光学干涉色彩显示。 光学干涉色彩显示器包括滤色基板，图案化支撑层，多个第一电极，多个光学膜和多个第二电极。 图案化支撑层和第一电极位于滤色基板上，图案化支撑层位于第一电极之间。 光学膜位于第一电极上。 第二电极定位在第一电极上并通过图案化的支撑层支撑，使得在每对第二电极和第一电极之间产生具有相同厚度的气隙。 使用滤色基板来显示彩色图像，第一电极和第二电极之间的空气间隙是相同的，因此简化了制造过程。

公开(公告)号：US20050046922A1

公开(公告)日：2005-03-03

申请号：US10815905

申请日：2004-03-31

Applicant: Wen-Jian Lin ,  Hsiung-Kuang Tsai

Inventor： Wen-Jian Lin ,  Hsiung-Kuang Tsai

IPC: G02B26/00 ,  G02F1/133 ,  G02F1/1335

CPC classification number: G02B26/001

Abstract: A hydrophobic layer covers the cavity-side surface of the bottom electrode of the interferometric modulation pixel. Consequently, the hydrophobic layer prohibits the hydrophilic surface of the bottom electrode from the adsorption of water molecules, thereby preventing the top electrode from being pulled toward the bottom electrode when the interferometric modulation pixel is active.

Abstract translation: 疏水层覆盖干涉式调制像素的底部电极的空腔侧表面。 因此，疏水层防止底部电极的亲水性表面吸附水分子，从而防止当干涉式调制像素有效时顶部电极被拉向底部电极。

公开(公告)号：US20050036192A1

公开(公告)日：2005-02-17

申请号：US10807142

申请日：2004-03-24

Applicant: Wen-Jian Lin ,  Hsiung-Kuang Tsai

Inventor： Wen-Jian Lin ,  Hsiung-Kuang Tsai

IPC: G02B7/00 ,  G02B26/00 ,  G02B26/08 ,  G02F1/03 ,  G02B5/22 ,  G02F1/07

CPC classification number: G02B7/00 ,  G02B26/001

Abstract: An optical interference display panel is disclosed that has a substrate, an optical interference reflection structure, and a protection structure. The optical interference reflection structure has many color-changeable pixels and is formed on the substrate. The protection structure is adhered to the substrate with an adhesive and encloses the optical interference reflection structure between the substrate and the protection structure. The adhesive is used to hermetically isolate the optical interference reflection structure from water, dust and oxygen in the air. Moreover, the protection structure prevents the interference reflection structure from being damaged by an external force.

Abstract translation: 公开了具有基板，光学干涉反射结构和保护结构的光学干涉显示面板。 光学干涉反射结构具有许多可变色像素并形成在基板上。 保护结构用粘合剂粘附到基底上，并包围基片和保护结构之间的光学干涉反射结构。 粘合剂用于将光学干涉反射结构与空气中的水，灰尘和氧气密封隔离。 此外，保护结构防止干涉反射结构被外力损坏。

公开(公告)号：US20050036095A1

公开(公告)日：2005-02-17

申请号：US10815884

申请日：2004-03-31

Applicant: Jia-Jiun Yeh ,  Wen-Jian Lin ,  Hsiung-Kuang Tsai

Inventor： Jia-Jiun Yeh ,  Wen-Jian Lin ,  Hsiung-Kuang Tsai

IPC: G02B26/00 ,  G02B26/08 ,  G02F1/1343 ,  G02F1/1339

CPC classification number: G02B26/001

Abstract: A distribution density of supports and the spacing therebetween are adjusted to improve a restorability of a light-reflection electrode of a color-changeable pixel. When the spacing between the supports is decreased or the distribution density thereof is increased, a tension per unit area of the light-reflection electrode is raised. If an external force is applied to the light-reflection electrode, the tension caused by the supports will counteract the force and allow the light-reflection electrode to successfully return to the original state after the external force is removed.

Abstract translation: 调整支撑体的分布密度及其间的间隔，以提高可变色像素的光反射电极的恢复性。 当支撑体之间的间隔减小或其分布密度增加时，光反射电极的每单位面积的张力升高。 如果对光反射电极施加外力，则由支撑件引起的张力将抵消力并且允许光反射电极在外力被去除之后成功地返回到原始状态。