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公开(公告)号：US4458302A
公开(公告)日：1984-07-03
申请号：US384679
申请日：1982-06-02
申请人： Masataka Shiba , Yoshitada Oshida
发明人： Masataka Shiba , Yoshitada Oshida
CPC分类号： G03F7/70358 , G02B19/0023 , G02B19/0047 , G02B19/0095
摘要： A reflection-type optical focusing apparatus comprising an optical focusing system including at least two 4th-degree surface reflectors with their revolving symmetric axis formed by a line connecting the position of a point source and the point source focusing position, said reflectors being used in combination so that the light emitted from a point source placed at the point source position is focused to form a virtual point source at the point source focusing position, and a 4th-degree surface reflector with its cross-section, on a plane including the revolving symmetric axis, forming a part of an ellipse with its major axis having a certain inclination with respect to the revolving symmetric axis, said virtual point source being located at one focal point of the ellipse so that a light image in the shape of an arc band is obtained.
摘要翻译： 一种反射型光学聚焦装置，包括光学聚焦系统，该光学聚焦系统包括至少两个4度的表面反射器，其旋转对称轴由连接点源的位置和点源聚焦位置的线形成，所述反射器被组合使用 使得从放置在点源位置的点源发射的光被聚焦以在点源聚焦位置处形成虚拟点源，并且在包括旋转对称的平面的平面上具有其横截面的4度表面反射器 轴，形成椭圆的一部分，其长轴相对于旋转对称轴具有一定倾角，所述虚拟点源位于椭圆的一个焦点处，使得弧形形状的光图像为 获得。
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公开(公告)号：US07598020B2
公开(公告)日：2009-10-06
申请号：US11117492
申请日：2005-04-29
申请人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
发明人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
IPC分类号： H01L21/00
CPC分类号： G03F7/705 , G03F7/2002 , G03F7/701 , G03F7/70125 , G03F7/70308 , G03F7/70591 , Y10S430/146
摘要： A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a light pattern on the substrate of the semiconductor device through an object lens, developing the resist exposed by the light pattern to form a wafer pattern with the resist, and etching the substrate on which the wafer pattern with the resist is formed. In the step of exposing, the light pattern projected on the substrate is formed by excimer laser light which is emitted from an annular shaped light source and which is passed through a mask having a phase shifter.
摘要翻译： 一种半导体器件的制造方法，包括以下步骤：通过物镜将半导体器件的基板上的光图案投射到半导体器件的基板上，使其抗蚀剂曝光，使由光图形曝光的抗蚀剂显影形成 具有抗蚀剂的晶片图案，并且蚀刻其上形成有抗蚀剂的晶片图案的基板。 在曝光的步骤中，投射在基板上的光图案由从环形光源发射并通过具有移相器的掩模的准分子激光形成。
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公开(公告)号：US07277155B2
公开(公告)日：2007-10-02
申请号：US11117447
申请日：2005-04-29
申请人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
发明人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
CPC分类号： G03F7/705 , G03F7/2002 , G03F7/701 , G03F7/70125 , G03F7/70308 , G03F7/70591 , Y10S430/146
摘要： A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a first light pattern on the substrate of the semiconductor device the first light pattern being formed by passing light through a first mask, and exposing the resist by projecting a second light pattern on the substrate, the second light pattern being formed by passing light through a second mask. In the step of exposing the resist by projecting the second light pattern, the second light pattern is formed by excimer laser light having an annular shape and passed through the second mask.
摘要翻译： 一种半导体器件的制造方法，包括以下步骤：通过将半导体器件的衬底上的第一光图案投射到通过第一掩模通过光而形成的第一光图案，使涂覆在半导体器件的衬底上的抗蚀剂曝光， 并通过在基板上投射第二光图案来曝光抗蚀剂，第二光图案是通过使光通过第二掩模而形成的。 在通过投影第二光图案使抗蚀剂曝光的步骤中，第二光图案由具有环形的准分子激光形成并通过第二掩模。
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公开(公告)号：US20050196713A1
公开(公告)日：2005-09-08
申请号：US11117447
申请日：2005-04-29
申请人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
发明人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
IPC分类号： G03F1/84 , G03F7/20 , H01L21/027 , H01L21/30 , G03F7/00
CPC分类号： G03F7/705 , G03F7/2002 , G03F7/701 , G03F7/70125 , G03F7/70308 , G03F7/70591 , Y10S430/146
摘要： A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a first light pattern on the substrate of the semiconductor device the first light pattern being formed by passing light through a first mask, and exposing the resist by projecting a second light pattern on the substrate, the second light pattern being formed by passing light through a second mask. In the step of exposing the resist by projecting the second light pattern, the second light pattern is formed by excimer laser light having an annular shape and passed through the second mask.
摘要翻译： 一种半导体器件的制造方法，包括以下步骤：通过将半导体器件的衬底上的第一光图案投射到通过第一掩模通过光而形成的第一光图案，使涂覆在半导体器件的衬底上的抗蚀剂曝光， 并通过在基板上投射第二光图案来曝光抗蚀剂，第二光图案是通过使光通过第二掩模而形成的。 在通过投影第二光图案使抗蚀剂曝光的步骤中，第二光图案由具有环形的准分子激光形成并通过第二掩模。
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公开(公告)号：US5526094A
公开(公告)日：1996-06-11
申请号：US235654
申请日：1994-04-29
申请人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
发明人： Minori Noguchi , Yukio Kenbo , Yoshitada Oshida , Masataka Shiba , Yasuhiro Yoshitaka , Makoto Murayama
CPC分类号： G03F7/705 , G03F7/2002 , G03F7/701 , G03F7/70125 , G03F7/70308 , G03F7/70591 , Y10S430/146
摘要： An exposure apparatus and method wherein a mask is illuminated with light and light one of transmitted through and reflected from the illuminated mask is imaged onto a substrate. At least during imaging, transmission of light one of transmitted and reflected from the illuminated mask is partially inhibited. More particularly, a spatial filter is utilized for inhibiting at least a portion of O-order diffraction light.
摘要翻译： 一种曝光装置和方法，其中用光和光照射掩模，将透射通过和从照射的掩模反射的透镜装置成像到基板上。 至少在成像期间，部分地抑制从被照射的掩模发射和反射的光的透射。 更具体地，利用空间滤波器来抑制O级衍射光的至少一部分。
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公开(公告)号：US07217573B1
公开(公告)日：2007-05-15
申请号：US09678652
申请日：2000-10-04
CPC分类号： G01N21/6428 , G01N21/6452 , G01N21/6456 , Y10S436/80 , Y10T436/143333
摘要： A method of inspecting a DNA chip and an apparatus therefor that allow a picture to be reconstructed in the following steps: A plurality of irradiation spots are formed on a DNA probe array mounted on a stage. Then, the stage is displaced in X, Y directions so as to execute a scanning, thereby irradiating substantially all the entire surface of the DNA probe array. Next, a plurality of emitted fluorescent lights, which are generated from the plurality of irradiation spot portions on the DNA probe array, are converged and are then detected simultaneously by multi detectors. Finally, a data processing apparatus processes the detected signals, thereby reconstructing the picture.
摘要翻译： 一种用于检查DNA芯片的方法及其装置，其允许以下列步骤重建图像：在安装在平台上的DNA探针阵列上形成多个照射点。 然后，在X，Y方向上移位台，以进行扫描，从而基本上照射DNA探针阵列的整个表面。 接下来，从DNA探针阵列上的多个照射点部分产生的多个发射荧光灯被会聚，然后由多个检测器同时检测。 最后，数据处理装置处理检测到的信号，从而重建图像。
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公开(公告)号：US4779986A
公开(公告)日：1988-10-25
申请号：US851723
申请日：1986-04-14
申请人： Naoto Nakashima , Yoshitada Oshida
发明人： Naoto Nakashima , Yoshitada Oshida
摘要： A reduction projection system alignment method for detecting the positions of an alignment pattern on a reticle and an alignment pattern on a wafer projected onto a reticle by a reduction projection lens so as to relatively align the reticle and wafer. This method comprises providing spatial images emanating from patterns on the reticle and wafer surfaces as alginment patterns of at least one of the reticle and wafer, and detecting the alignment patterns of the reticle and wafer by the same detection optical system using lights which are different in the wavelength from that of an exposure light and different from each other between the reticle and wafer. An apparatus for performing this method is also disclosed.
摘要翻译： 一种缩小投影系统对准方法，用于通过缩小投影透镜检测投影到掩模版上的晶片上的掩模版上的对准图案的位置和对准图案的位置，以使掩模版和晶片相对对准。 该方法包括提供从掩模版和晶片表面上的图案发出的空间图像，作为掩模版和晶片中的至少一个的突出图案，并且通过相同的检测光学系统使用不同的光，检测标线片和晶片的对准图案 来自曝光光的波长和在光罩和晶片之间彼此不同的波长。 还公开了一种用于执行该方法的装置。
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28.发明授权Method and apparatus for optical alignment of semiconductor by using a hologram 失效通过使用全息图进行半导体的光学取向的方法和装置
公开(公告)号：US4862008A
公开(公告)日：1989-08-29
申请号：US213141
申请日：1988-06-29
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/68
CPC分类号： G03F9/70
摘要： A wafer is aligned by using an alignment light having a longer wavelength than an exposure light. Exposure and alignment are effected through a common reduction lens. A wavefront aberration caused by the use of the long wavelength alignment light is compensated by a hologram. Thus, an alignment precision is improved without exposing a resist layer to a light.
摘要翻译： 通过使用具有比曝光光更长的波长的对准光来对准晶片。 曝光和对准通过公共的减速透镜实现。 由使用长波长对准光引起的波前像差由全息图补偿。 因此，不会使抗蚀剂层暴露于光而提高对准精度。
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公开(公告)号：US08361784B2
公开(公告)日：2013-01-29
申请号：US11709120
申请日：2007-02-22
CPC分类号： G01N21/6428 , G01N21/6452 , G01N21/6456 , Y10S436/80 , Y10T436/143333
摘要： A DNA inspecting apparatus including driving means for relatively changing positions of the multi-spot lights and a position of the DNA chip so as to detect the fluorescent lights in such a manner that a desired area on the DNA chip is irradiated with the multi-spot lights, and a control system for determining and inspecting DNA information about the to-be-inspected DNA chip from fluorescent light intensities and fluorescent light positions of the desired area on the DNA chip, the fluorescent light intensities and the fluorescent light positions being detected by the driving means and the fluorescent light detecting means.
摘要翻译： 一种DNA检查装置，包括用于相对改变多点灯位置的驱动装置和DNA芯片的位置，以便以这样的方式检测荧光，使得DNA芯片上的期望区域被多点照射 灯和用于从DNA芯片上的期望区域的荧光强度和荧光灯位置确定和检查关于待检查DNA芯片的DNA信息的控制系统，荧光强度和荧光灯位置由 驱动装置和荧光检测装置。
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公开(公告)号：US20070154938A1
公开(公告)日：2007-07-05
申请号：US11709120
申请日：2007-02-22
CPC分类号： G01N21/6428 , G01N21/6452 , G01N21/6456 , Y10S436/80 , Y10T436/143333
摘要： A DNA inspecting apparatus including driving means for relatively changing positions of the multi-spot lights and a position of the DNA chip so as to detect the fluorescent lights in such a manner that a desired area on the DNA chip is irradiated with the multi-spot lights, and a control system for determining and inspecting DNA information about the to-be-inspected DNA chip from fluorescent light intensities and fluorescent light positions of the desired area on the DNA chip, the fluorescent light intensities and the fluorescent light positions being detected by the driving means and the fluorescent light detecting means.
摘要翻译： 一种DNA检查装置，包括用于相对改变多点灯位置的驱动装置和DNA芯片的位置，以便以这样的方式检测荧光，使得DNA芯片上的期望区域被多点照射 灯和用于从DNA芯片上的期望区域的荧光强度和荧光灯位置确定和检查关于待检查DNA芯片的DNA信息的控制系统，荧光强度和荧光灯位置由 驱动装置和荧光检测装置。
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