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21.发明申请EUV High Throughput Inspection System For Defect Detection On Patterned EUV Masks, Mask Blanks, And Wafers 有权EUV高通量检测系统，用于在图案化的EUV面罩，面罩空白和晶圆上进行缺陷检测公开(公告)号：US20110116077A1
公开(公告)日：2011-05-19
申请号：US12812950
申请日：2010-06-18
申请人： Yung-Ho Chuang , Richard W. Solarz , David R. Shafer , Bing-Ming Benjamin Tsai , David L. Brown
发明人： Yung-Ho Chuang , Richard W. Solarz , David R. Shafer , Bing-Ming Benjamin Tsai , David L. Brown
IPC分类号： G01N21/956
CPC分类号： G01N21/95 , G01N21/8806 , G01N21/9501 , G01N21/956 , G01N2021/95676 , G01N2201/068 , G03F1/84 , G03F7/70616 , H05G2/008
摘要： Inspection of EUV patterned masks, blank masks, and patterned wafers generated by EUV patterned masks requires high magnification and a large field of view at the image plane. An EUV inspection system can include a light source directed to an inspected surface, a detector for detecting light deflected from the inspected surface, and an optic configuration for directing the light from the inspected surface to the detector. In particular, the detector can include a plurality of sensor modules. Additionally, the optic configuration can include a plurality of mirrors that provide magnification of at least 100× within an optical path less than 5 meters long. In one embodiment, the optical path is approximately 2-3 meters long.
摘要翻译： 对EUV图案化掩模，空白掩模和由EUV图案化掩模生成的图案化晶片的检查需要高倍率和在图像平面上的大视场。 EUV检查系统可以包括指向检查表面的光源，用于检测从被检查表面偏转的光的检测器和用于将来自被检查表面的光引导到检测器的光学配置。 特别地，检测器可以包括多个传感器模块。 另外，光学配置可以包括在小于5米长的光路内提供至少100倍的放大倍数的多个反射镜。 在一个实施例中，光路大约2-3米长。
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22.发明授权Ultra-broadband UV microscope imaging system with wide range zoom capability 有权超宽带紫外显微镜成像系统具有广泛的变焦能力公开(公告)号：US07423805B2
公开(公告)日：2008-09-09
申请号：US10958242
申请日：2004-10-04
IPC分类号： G02B15/14
CPC分类号： G02B17/0896 , G02B17/023 , G02B17/0808 , G02B17/0812 , G02B17/0856 , G02B17/086 , G02B17/0892 , G02B21/16 , G03F1/84 , G03F7/70225 , G03F7/70275 , G03F7/70616 , G03F7/7065
摘要： An ultra-broadband ultraviolet (UV) catadioptric imaging microscope system with wide-range zoom capability. The microscope system, which comprises a catadioptric lens group and a zooming tube lens group, has high optical resolution in the deep UV wavelengths, continuously adjustable magnification, and a high numerical aperture. The system integrates microscope modules such as objectives, tube lenses and zoom optics to reduce the number of components, and to simplify the system manufacturing process. The preferred embodiment offers excellent image quality across a very broad deep ultraviolet spectral range, combined with an all-refractive zooming tube lens. The zooming tube lens is modified to compensate for higher-order chromatic aberrations that would normally limit performance.
摘要翻译： 超宽带紫外（UV）反折射成像显微镜系统，具有广泛的变焦能力。 包括反射折射透镜组和变焦管透镜组的显微镜系统在深UV波长，连续可调放大倍数和高数值孔径中具有高的光学分辨率。 该系统集成了诸如目标，管镜和变焦光学的显微镜模块，以减少部件数量，并简化系统制造过程。 优选实施例在非常广泛的深紫外光谱范围内提供优异的图像质量，与全折射变焦管透镜组合。 变焦管镜头被修改以补偿通常会限制性能的高阶色差。
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公开(公告)号：US07136234B2
公开(公告)日：2006-11-14
申请号：US11033218
申请日：2005-01-10
申请人： David R. Shafer , Yung-Ho Chuang
发明人： David R. Shafer , Yung-Ho Chuang
CPC分类号： G02B17/0892 , G02B13/143 , G02B13/22 , G02B17/0808 , G02B17/086
摘要： A high performance objective having very small central obscuration, an external pupil for apertureing and Fourier filtering, loose manufacturing tolerances, large numerical aperture, long working distance, and a large field of view is presented. The objective is preferably telecentric. The design is ideally suited for both broad-band bright-field and laser dark field imaging and inspection at wavelengths in the UV to VUV spectral range.
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24.发明授权Ultra-broadband UV microscope imaging system with wide range zoom capability 失效超宽带紫外显微镜成像系统具有广泛的变焦能力公开(公告)号：US06801357B2
公开(公告)日：2004-10-05
申请号：US10282592
申请日：2002-10-29
IPC分类号： G02B1514
CPC分类号： G02B17/0896 , G02B17/023 , G02B17/0808 , G02B17/0812 , G02B17/0856 , G02B17/086 , G02B17/0892 , G02B21/16 , G03F1/84 , G03F7/70225 , G03F7/70275 , G03F7/70616 , G03F7/7065
摘要： An ultra-broadband ultraviolet (UV) catadioptric imaging microscope system with wide-range zoom capability. The microscope system, which comprises a catadioptric lens group and a zooming tube lens group, has high optical resolution in the deep UV wavelengths, continuously adjustable magnification, and a high numerical aperture. The system integrates microscope modules such as objectives, tube lenses and zoom optics to reduce the number of components, and to simplify the system manufacturing process. The preferred embodiment offers excellent image quality across a very broad deep ultraviolet spectral range, combined with an all-refractive zooming tube lens. The zooming tube lens is modified to compensate for higher-order chromatic aberrations that would normally limit performance.
摘要翻译： 超宽带紫外（UV）反折射成像显微镜系统，具有广泛的变焦能力。 包括反射折射透镜组和变焦管透镜组的显微镜系统在深UV波长，连续可调放大倍数和高数值孔径中具有高的光学分辨率。 该系统集成了诸如目标，管镜和变焦光学的显微镜模块，以减少部件数量，并简化系统制造过程。 优选实施例在非常广泛的深紫外光谱范围内提供优异的图像质量，与全折射变焦管透镜组合。 变焦管镜头被修改以补偿通常会限制性能的高阶色差。
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25.发明授权
公开(公告)号：US6133576A
公开(公告)日：2000-10-17
申请号：US950283
申请日：1997-10-14
IPC分类号： G01N21/33 , G02B13/14 , G02B17/08 , G02B21/16 , G03C5/16 , G03F1/84 , G03F3/00 , G03F7/20 , H04N5/225 , G01N21/64
CPC分类号： G03F7/70225 , G02B13/143 , G02B17/0808 , G02B17/0856 , G02B17/0892 , G02B21/16 , G03F1/84 , G03F7/70216 , G03F7/70275 , G03F7/70616 , G03F7/7065
摘要： Broad spectrum ultraviolet inspection methods employ an achromatic catadioptric system to image the surface of an object, such as a semiconductor wafer or photomask, at multiple ultraviolet (UV) wavelengths over a large flat field (with a size on the order of 0.5 mm) in order to detect and identify defects. The imaging system provides broad band correction of primary and residual, longitudinal and lateral, chromatic aberrations for wavelengths extending into the deep UV. UV imaging applications include a method that illuminates an object with fluorescence-excitation radiation to stimulate fluorescent emission at a plurality of UV wavelengths, then images the fluorescent emissions and detects the images so formed in UV wavelength bands distributed over at least 50 nm (preferably 100-200 nm) wavelength. Photoresist patterns can be analyzed in this way. Another method uses multi-wavelength UV illumination and imaging to inspect photoresists, patterned wafers, phase-shift photomasks and the like based on the varying response to different UV wavelengths (such as wavelength-dependent reflectivities) of different materials. Yet another method takes advantage of the small depth of focus of imaging systems at UV wavelengths to generate image slices at various depths, such as on patterned wafers with nonplanar surface profiles, and at different wavelengths. The slices can be integrated to produce a composite 3-D UV-color image.
摘要翻译： 广谱紫外检测方法采用消色差反射折射系统，在多个紫外（UV）波长下的大平坦场（尺寸约0.5毫米）上成像物体表面，例如半导体晶片或光掩模 以检测和识别缺陷。 成像系统为延伸到深紫外线的波长提供主要和残留，纵向和横向色差的宽带校正。 UV成像应用包括用荧光激发辐射照射物体以刺激多个UV波长的荧光发射的方法，然后对荧光发射进行成像，并检测如此形成的图像，其形式分布在至少50nm（优选为100nm） -200nm）波长。 可以以这种方式分析光刻胶图案。 基于对不同材料的不同UV波长（例如波长依赖的反射率）的变化响应，另一种方法使用多波长UV照明和成像来检查光致抗蚀剂，图案化晶片，相移光掩模等。 另一种方法利用UV波长下的成像系统的小的深度焦点来产生各种深度的图像切片，例如具有非平面表面轮廓的图案化晶片和不同波长的图像切片。 这些切片可以被集成以产生复合3-D UV彩色图像。
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26.发明授权EUV high throughput inspection system for defect detection on patterned EUV masks, mask blanks, and wafers 有权EUV高通量检测系统，用于在图案化的EUV掩模，掩模毛坯和晶片上进行缺陷检测公开(公告)号：US08553217B2
公开(公告)日：2013-10-08
申请号：US12812950
申请日：2010-06-18
IPC分类号： G01N21/00
CPC分类号： G01N21/95 , G01N21/8806 , G01N21/9501 , G01N21/956 , G01N2021/95676 , G01N2201/068 , G03F1/84 , G03F7/70616 , H05G2/008
摘要： Inspection of EUV patterned masks, blank masks, and patterned wafers generated by EUV patterned masks requires high magnification and a large field of view at the image plane. An EUV inspection system can include a light source directed to an inspected surface, a detector for detecting light deflected from the inspected surface, and an optic configuration for directing the light from the inspected surface to the detector. In particular, the detector can include a plurality of sensor modules. Additionally, the optic configuration can include a plurality of mirrors that provide magnification of at least 100× within an optical path less than 5 meters long. In one embodiment, the optical path is approximately 2-3 meters long.
摘要翻译： 对EUV图案化掩模，空白掩模和由EUV图案化掩模生成的图案化晶片的检查需要高倍率和在图像平面上的大视场。 EUV检查系统可以包括指向检查表面的光源，用于检测从被检查表面偏转的光的检测器和用于将来自被检查表面的光引导到检测器的光学配置。 特别地，检测器可以包括多个传感器模块。 另外，光学配置可以包括在小于5米长的光路内提供至少100倍的放大倍数的多个反射镜。 在一个实施例中，光路大约2-3米长。
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公开(公告)号：US20090080065A1
公开(公告)日：2009-03-26
申请号：US12231693
申请日：2008-09-05
CPC分类号： G02B17/0896 , G02B17/023 , G02B17/0808 , G02B17/0812 , G02B17/0856 , G02B17/086 , G02B17/0892 , G02B21/16 , G03F1/84 , G03F7/70225 , G03F7/70275 , G03F7/70616 , G03F7/7065
摘要： An ultra-broadband ultraviolet (UV) catadioptric imaging microscope system with wide-range zoom capability. The microscope system, which comprises a catadioptric lens group and a zooming tube lens group, has high optical resolution in the deep UV wavelengths, continuously adjustable magnification, and a high numerical aperture. The system integrates microscope modules such as objectives, tube lenses and zoom optics to reduce the number of components, and to simplify the system manufacturing process. The preferred embodiment offers excellent image quality across a very broad deep ultraviolet spectral range, combined with an all-refractive zooming tube lens. The zooming tube lens is modified to compensate for higher-order chromatic aberrations that would normally limit performance.
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28.发明授权Ultra-broadband UV microscope imaging system with wide range zoom capability 有权超宽带紫外显微镜成像系统具有广泛的变焦能力公开(公告)号：US06483638B1
公开(公告)日：2002-11-19
申请号：US09571109
申请日：2000-05-15
IPC分类号： G02B1708
CPC分类号： G02B17/0896 , G02B17/023 , G02B17/0808 , G02B17/0812 , G02B17/0856 , G02B17/086 , G02B17/0892 , G02B21/16 , G03F1/84 , G03F7/70225 , G03F7/70275 , G03F7/70616 , G03F7/7065
摘要： An ultra-broadband ultraviolet (UV) catadioptric imaging microscope system with wide-range zoom capability. The microscope system, which comprises a catadioptric lens group and a zooming tube lens group, has high optical resolution in the deep UV wavelengths, continuously adjustable magnification, and a high numerical aperture. The system integrates microscope modules such as objectives, tube lenses and zoom optics to reduce the number of components, and to simplify the system manufacturing process. The preferred embodiment offers excellent image quality across a very broad deep ultraviolet spectral range, combined with an all-refractive zooming tube lens. The zooming tube lens is modified to compensate for higher-order chromatic aberrations that would normally limit performance.
摘要翻译： 超宽带紫外（UV）反折射成像显微镜系统，具有广泛的变焦能力。 包括反射折射透镜组和变焦管透镜组的显微镜系统在深UV波长，连续可调放大倍数和高数值孔径中具有高的光学分辨率。 该系统集成了诸如目标，管镜和变焦光学的显微镜模块，以减少部件数量，并简化系统制造过程。 优选实施例在非常广泛的深紫外光谱范围内提供优异的图像质量，与全折射变焦管透镜组合。 变焦管镜头被修改以补偿通常会限制性能的高阶色差。
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29.发明授权Ultra-broadband UV microscope imaging system with wide range zoom capability 有权超宽带紫外显微镜成像系统具有广泛的变焦能力公开(公告)号：US07773296B2
公开(公告)日：2010-08-10
申请号：US12231693
申请日：2008-09-05
IPC分类号： G02B15/14
CPC分类号： G02B17/0896 , G02B17/023 , G02B17/0808 , G02B17/0812 , G02B17/0856 , G02B17/086 , G02B17/0892 , G02B21/16 , G03F1/84 , G03F7/70225 , G03F7/70275 , G03F7/70616 , G03F7/7065
摘要： An ultra-broadband ultraviolet (UV) catadioptric imaging microscope system with wide-range zoom capability. The microscope system, which includes a catadioptric lens group and a zooming tube lens group, has high optical resolution in the deep UV wavelengths, continuously adjustable magnification, and a high numerical aperture. The system integrates microscope modules such as objectives, tube lenses and zoom optics to reduce the number of components, and to simplify the system manufacturing process. The preferred embodiment offers excellent image quality across a very broad deep ultraviolet spectral range, combined with an all-refractive zooming tube lens. The zooming tube lens is modified to compensate for higher-order chromatic aberrations that would normally limit performance.
摘要翻译： 超宽带紫外（UV）反折射成像显微镜系统，具有广泛的变焦能力。 包括反折射透镜组和变焦管透镜组的显微镜系统在深紫外波长，连续可调放大倍率和高数值孔径中具有高的光学分辨率。 该系统集成了诸如目标，管镜和变焦光学的显微镜模块，以减少部件数量，并简化系统制造过程。 优选实施例在非常广泛的深紫外光谱范围内提供优异的图像质量，与全折射变焦管透镜组合。 变焦管镜头被修改以补偿通常会限制性能的高阶色差。
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公开(公告)号：US5956174A
公开(公告)日：1999-09-21
申请号：US7561
申请日：1998-01-15
IPC分类号： G01N21/33 , G02B13/14 , G02B17/08 , G02B21/16 , G03C5/16 , G03F1/84 , G03F3/00 , G03F7/20 , H04N5/225 , G02B1/00 , G02B17/00
CPC分类号： G03F7/70225 , G02B13/143 , G02B17/0808 , G02B17/0856 , G02B17/0892 , G02B21/16 , G03F1/84 , G03F7/70216 , G03F7/70275 , G03F7/70616 , G03F7/7065
摘要： An ultraviolet (UV) catadioptric imaging system, with broad spectrum correction of primary and residual, longitudinal and lateral, chromatic aberrations for wavelengths extending into the deep UV (as short as about 0.16 .mu.m), comprises a focusing lens group with multiple lens elements that provide high levels of correction of both image aberrations and chromatic variation of aberrations over a selected wavelength band, a field lens group formed from lens elements with at least two different refractive materials, such as silica and a fluoride glass, and a catadioptric group including a concave reflective surface providing most of the focusing power of the system and a thick lens providing primary color correction in combination with the focusing lens group. The field lens group is located near the intermediate image provided by the focusing lens group and functions to correct the residual chromatic aberrations. The system is characterized by a high numerical aperture (type. greater than 0.7) and a large flat field (with a size on the order of 0.5 mm). The broad band color correction allows a wide range of possible UV imaging applications at multiple wavelengths.
摘要翻译： 紫外线（UV）反折射成像系统，对于延伸到深紫外线（短至约0.16μm）的波长的主要和残留的纵向和横向色差的广谱校正包括具有多个透镜元件的聚焦透镜组 其提供了在所选波长带上的像差的两个像差和色度变化的高水平校正，由具有至少两种不同折射材料的透镜元件形成的场透镜组，例如二氧化硅和氟化物玻璃，以及包括 提供系统的大部分聚焦功能的凹面反射表面以及与聚焦透镜组组合地提供原色校正的厚透镜。 场透镜组位于由聚焦透镜组提供的中间图像附近，并且用于校正残余色差。 该系统的特征在于具有高数值孔径（大于0.7）和大的平坦场（尺寸约为0.5mm）。 宽带色彩校正允许在多个波长下的广泛范围的可能的UV成像应用。
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