公开(公告)号：US09291581B2

公开(公告)日：2016-03-22

申请号：US14071149

申请日：2013-11-04

Applicant: SUMITOMO RUBBER INDUSTRIES, LTD.

Inventor： Ryo Mashita ,  Hiroyuki Kishimoto ,  Tomomi Masui

IPC: G01N23/201 ,  G01N23/202

CPC classification number: G01N23/202 ,  G01N23/201 ,  G01N2223/1006 ,  G01N2223/1016 ,  G01N2223/106 ,  G01N2223/623

Abstract: The present invention provides a method for evaluating energy loss in a polymeric material, wherein the method provides sufficient evaluation of the difference in performance between samples with excellent measurement accuracy; a method for evaluating chipping resistance of a polymeric material, wherein the method provides evaluation in a short period of time and at low cost with excellent measurement accuracy; and a method for evaluating abrasion resistance of a polymeric material, wherein the method provides sufficient evaluation of the difference in performance between samples with excellent measurement accuracy. The present invention relates to methods for evaluating energy loss, chipping resistance, and abrasion resistance of a polymeric material, and the methods include irradiating the polymeric material with X-rays or neutrons to perform X-ray scattering measurement or neutron scattering measurement.

Abstract translation: 本发明提供了一种用于评估聚合物材料中的能量损失的方法，其中该方法提供了具有优异测量精度的样品之间的性能差异的充分评估; 评价聚合物材料的耐崩裂性的方法，其中，所述方法在短时间内以低成本提供以优异的测量精度进行评估; 以及用于评价聚合物材料的耐磨性的方法，其中该方法提供了具有优异测量精度的样品之间的性能差异的充分评估。 本发明涉及用于评估聚合材料的能量损失，耐崩裂性和耐磨性的方法，并且所述方法包括用X射线或中子照射聚合物材料以进行X射线散射测量或中子散射测量。

公开(公告)号：US20160077025A1

公开(公告)日：2016-03-17

申请号：US14521345

申请日：2014-10-22

Applicant: Applied Materials, Inc.

Inventor： Lin ZHANG ,  Shuran SHENG ,  Andrew V. LE

IPC: G01N23/201 ,  G01N23/18 ,  G01T7/08 ,  G01N23/083

CPC classification number: G01N23/201 ,  G01N23/207 ,  G01N2223/071 ,  G01N2223/602 ,  G01T7/08 ,  G03F7/70625 ,  H01L22/12

Abstract: An apparatus for integrating metrology and method for using the same are disclosed. The apparatus includes a multi-chamber system having a transfer chamber, a deposition chamber, an etch chamber and a metrology chamber, and a robot configured to transfer a substrate between the deposition chamber or etch chamber and the metrology chamber.

Abstract translation: 公开了一种用于集成度量的装置及其使用方法。 该装置包括具有传送室，沉积室，蚀刻室和计量室的多室系统，以及被配置为在沉积室或蚀刻室与计量室之间传送衬底的机器人。

公开(公告)号：US20150330920A1

公开(公告)日：2015-11-19

申请号：US14713081

申请日：2015-05-15

Applicant: Brookhaven Science Associates, LLC

Inventor： Charles T. Black ,  Kevin G. Yager

IPC: G01N23/20 ,  G01N23/201

CPC classification number: G01N23/20025 ,  G01N23/201 ,  G01N2223/054 ,  G01N2223/309

Abstract: A nano-confinement platform that may allow improved quantification of the structural order of nanometer-scale systems. Sample-holder ‘chips’ are designed for the GTSAXS experimental geometry. The platform involves fabricated nanostructured sample holders on and in one or more corners of a substrate support where the sample material of interest is positioned at the corner of the substrate support. In an embodiment, the substrate material making up the substrate support beneath the sample-holding area is removed. A scattering x-ray sample platform includes a substrate support arranged in a parallelepiped form, having a substantially flat base and a substantially flat top surface, the top surface being substantially parallel with the base, the parallelepiped having a plurality of corners. At least one corner of the substrate support has a sample holding area formed in the top surface of the substrate support and within a predetermined distance from the corner. The sample holding area includes a regular array of nano-wells formed in the top surface of the substrate support.

Abstract translation: 纳米限制平台可以改进纳米尺度系统的结构顺序的量化。 样品架“芯片”是为GTSAXS实验几何设计的。 该平台涉及在衬底支撑件的一个或多个角部上和之上的制造的纳米结构样品架，其中感兴趣的样品材料位于衬底支架的拐角处。 在一个实施例中，去除在样品保持区域下方构成基底支撑物的基底材料。 散射X射线样品平台包括布置成平行六面体形式的基底支撑件，具有基本上平坦的基部和基本平坦的顶表面，该顶表面基本上平行于基部，该平行六面体具有多个拐角。 衬底支撑件的至少一个角部具有形成在衬底支撑件的顶表面中并且距离拐角预定距离内的样品保持区域。 样品保持区域包括在衬底支撑体的顶表面中形成的纳米孔的规则阵列。

公开(公告)号：US09188551B2

公开(公告)日：2015-11-17

申请号：US14033025

申请日：2013-09-20

Applicant: MORPHO DETECTION, INC.

Inventor： Geoffrey Harding ,  Helmut Rudolf Otto Strecker

IPC: G01N23/201 ,  G01N23/20 ,  G01V5/00

CPC classification number: G01N23/201 ,  G01N23/20 ,  G01N2223/3307 ,  G01N2223/643 ,  G01V5/0025

Abstract: An x-ray diffraction imaging (XDI) system having a system axis includes at least one x-ray source configured to generate x-rays directed toward an object that includes at least one substance. The at least one x-ray source is further configured to irradiate at least one voxel defined within the object with x-rays arriving from a plurality of directions, each direction defined by an angle of incidence with respect to the system axis. The system also includes at least one detector configured to detect scattered x-rays after the x-rays have passed through the object. The system further includes at least one processor coupled to the at least one detector. The processor is programmed to generate a plurality of XDI profiles of the object voxel. Each XDI profile is a function of an associated angle of incidence.

Abstract translation: 具有系统轴的x射线衍射成像（XDI）系统包括被配置为产生朝向包括至少一种物质的物体的x射线的至少一个x射线源。 所述至少一个X射线源还被配置成用从多个方向到达的x射线照射在物体内限定的至少一个体素，每个方向由相对于系统轴线的入射角限定。 该系统还包括至少一个检测器，其构造成在X射线已经通过物体之后检测散射的X射线。 系统还包括耦合到至少一个检测器的至少一个处理器。 处理器被编程为生成对象体素的多个XDI轮廓。 每个XDI轮廓是相关联的入射角的函数。

公开(公告)号：US20150311513A1

公开(公告)日：2015-10-29

申请号：US14651590

申请日：2013-11-21

Applicant: NEC CORPORATION

Inventor： Ryota YUGE ,  Akio TODA ,  Takashi MIYAZAKI

IPC: H01M4/36 ,  G01N23/201 ,  H01M4/38 ,  H01M4/48 ,  H01M10/0525 ,  H01M4/62

CPC classification number: H01M4/366 ,  G01N23/201 ,  H01M4/134 ,  H01M4/364 ,  H01M4/382 ,  H01M4/386 ,  H01M4/48 ,  H01M4/483 ,  H01M4/485 ,  H01M4/625 ,  H01M10/0525 ,  H01M2220/20 ,  H01M2220/30 ,  Y02T10/7011

Abstract: There is provided a negative electrode material for lithium ion secondary batteries having a structure in which in charged and discharged states, a LixSi compound (2) exists in the inside of a Li oxide (1) and the LixSi compound is dispersed in the inside of the Li oxide. The negative electrode material, in which volume change resulting from charge/discharge is suppressed, has excellent performance as a negative electrode material for lithium ion secondary batteries.

Abstract translation: 提供了一种用于锂离子二次电池的负极材料，其具有这样的结构，其中在充电和放电状态下，Li xSi化合物（2）存在于Li氧化物（1）的内部，并且LixSi化合物分散在 氧化锂。 由于充放电导致的体积变化被抑制的负极材料作为锂离子二次电池的负极材料具有优异的性能。

公开(公告)号：US09031203B2

公开(公告)日：2015-05-12

申请号：US13912364

申请日：2013-06-07

Applicant: Rigaku Innovative Technologies, Inc.

Inventor： Licai Jiang ,  Boris Verman

IPC: G21K1/06 ,  G01N23/201

CPC classification number: G21K1/067 ,  G01N23/201 ,  G21K2201/064

Abstract: A system for analyzing a sample is provided. The system includes an optical system capable of providing a one-dimensional beam and a two-dimensional beam. The system may include a beam selection device to select between providing a one-dimensional x-ray beam to the sample in a one-dimensional operation mode and a two-dimensional x-ray beam to the sample in a two-dimensional operation mode.

Abstract translation: 提供了一种用于分析样品的系统。 该系统包括能够提供一维光束和二维光束的光学系统。 所述系统可以包括波束选择装置，用于在以一维操作模式向所述样本提供一维X射线束和以二维操作模式向所述样本提供二维X射线束之间进行选择。

公开(公告)号：US20150085983A1

公开(公告)日：2015-03-26

申请号：US14033025

申请日：2013-09-20

Applicant: Morpho Detection, Inc.

Inventor： Geoffrey Harding ,  Helmut Rudolf Otto Strecker

IPC: G01N23/201 ,  G01V5/00

CPC classification number: G01N23/201 ,  G01N23/20 ,  G01N2223/3307 ,  G01N2223/643 ,  G01V5/0025

Abstract: An x-ray diffraction imaging (XDI) system having a system axis includes at least one x-ray source configured to generate x-rays directed toward an object that includes at least one substance. The at least one x-ray source is further configured to irradiate at least one voxel defined within the object with x-rays arriving from a plurality of directions, each direction defined by an angle of incidence with respect to the system axis. The system also includes at least one detector configured to detect scattered x-rays after the x-rays have passed through the object. The system further includes at least one processor coupled to the at least one detector. The processor is programmed to generate a plurality of XDI profiles of the object voxel. Each XDI profile is a function of an associated angle of incidence.

Abstract translation: 具有系统轴的x射线衍射成像（XDI）系统包括被配置为产生朝向包括至少一种物质的物体的x射线的至少一个x射线源。 所述至少一个X射线源还被配置成用从多个方向到达的x射线照射在物体内限定的至少一个体素，每个方向由相对于系统轴线的入射角限定。 该系统还包括至少一个检测器，其构造成在X射线已经通过物体之后检测散射的X射线。 系统还包括耦合到至少一个检测器的至少一个处理器。 处理器被编程为生成对象体素的多个XDI轮廓。 每个XDI轮廓是相关联的入射角的函数。

公开(公告)号：US20140324401A1

公开(公告)日：2014-10-30

申请号：US14356331

申请日：2012-10-29

Applicant: Sumitomo Rubber Industries Ltd.

Inventor： Hiroyuki Kishimoto ,  Masato Naito

IPC: G06F17/50

CPC classification number: G06F17/5009 ,  C08L21/00 ,  G01N23/201 ,  G01N33/445 ,  G06F17/5018

Abstract: Provided is a method that is useful for accurately setting a rubber material model for a simulation from an actual rubber material and obtaining a high-accuracy calculation result. A method for simulating a rubber material containing a filler comprises a measurement step (S1) for measuring scattering data relating to x-rays and/or neutron in the rubber material, a visualization step (S2) for specifying the three-dimensional structure of the filler in the rubber material through a reverse Monte Carlo method from the scattering data, model setting steps (S3 to S6) for setting a rubber material model on the basis of the three-dimensional structure of the filler, and a step for performing a deformation simulation on the basis of the rubber material model, wherein in the measurement step, obtaining the scattering data with a scattering vector (q) within the range of 10−4 nm−1 to 10 nm−1.

Abstract translation: 提供一种用于从实际橡胶材料精确地设定用于模拟的橡胶材料模型并获得高精度计算结果的方法。 用于模拟含有填料的橡胶材料的方法包括：用于测量与橡胶材料中的X射线和/或中子有关的散射数据的测量步骤（S1），用于指定橡胶材料的三维结构的可视化步骤（S2） 通过反射蒙特卡洛方法从橡胶材料的散射数据中填充橡胶材料，用于根据填料的三维结构设定橡胶材料模型的模型设定步骤（S3至S6）以及进行变形的步骤 基于橡胶材料模型进行模拟，其中在测量步骤中，以10-4nm-1至10nm-1范围内的散射矢量（q）获得散射数据。

公开(公告)号：US20140151569A1

公开(公告)日：2014-06-05

申请号：US14093873

申请日：2013-12-02

Applicant: ANTON PAAR GMBH

Inventor： HEIMO SCHNABLEGGER ,  JOSEF GAUTSCH ,  WOLFGANG GIGERL

IPC: G01N23/20

CPC classification number: G01N23/20 ,  G01N23/201 ,  G01N23/202

Abstract: A method and a device examine a sample with radiation emitted from a radiation source, which is directed to the sample carried by a sample holder via a beam-forming unit and detected by a detector and evaluated in an evaluating unit. Prior to the examination of the sample, at least one of the following components, including the radiation source, beam-forming unit, sample holder, detector, and a primary beam stop, are oriented and/or positioned in terms of spatial location in relation to at least one of the other components and/or in relation to a predefined fixed point and/or in relation to the optical path with a control unit via actuating drives. The radiation intensity measured by the detector, in a predefined detector range, and/or a value derived therefrom is used for establishing a control variable conferred from the control unit to the actuating drives assigned to the components.

Abstract translation: 一种方法和装置利用从辐射源发射的辐射来检查样品，该辐射源通过光束形成单元被引导到由样品保持器携带的样品，并由检测器检测并在评估单元中进行评估。 在检查样品之前，包括辐射源，束形成单元，样品保持器，检测器和主光束挡块的以下部件中的至少一个在空间位置方面被定位和/或定位 至少一个其它部件和/或关于预定义的固定点和/或通过致动驱动器具有与控制单元相关的光学路径。 由检测器测量的在预定义的检测器范围内的辐射强度和/或由其导出的值用于建立从控制单元赋予分配给部件的致动驱动器的控制变量。

公开(公告)号：US20140140483A1

公开(公告)日：2014-05-22

申请号：US14071149

申请日：2013-11-04

Applicant: SUMITOMO RUBBER INDUSTRIES, LTD.

Inventor： Ryo MASHITA ,  Hiroyuki KISHIMOTO ,  Tomomi MASUI

IPC: G01N23/202 ,  G01N23/201

CPC classification number: G01N23/202 ,  G01N23/201 ,  G01N2223/1006 ,  G01N2223/1016 ,  G01N2223/106 ,  G01N2223/623

Abstract: The present invention provides a method for evaluating energy loss in a polymeric material, wherein the method provides sufficient evaluation of the difference in performance between samples with excellent measurement accuracy; a method for evaluating chipping resistance of a polymeric material, wherein the method provides evaluation in a short period of time and at low cost with excellent measurement accuracy; and a method for evaluating abrasion resistance of a polymeric material, wherein the method provides sufficient evaluation of the difference in performance between samples with excellent measurement accuracy. The present invention relates to methods for evaluating energy loss, chipping resistance, and abrasion resistance of a polymeric material, and the methods include irradiating the polymeric material with X-rays or neutrons to perform X-ray scattering measurement or neutron scattering measurement.

Abstract translation: 本发明提供了一种用于评估聚合物材料中的能量损失的方法，其中该方法提供了具有优异测量精度的样品之间的性能差异的充分评估; 评价聚合物材料的耐崩裂性的方法，其中，所述方法在短时间内以低成本提供以优异的测量精度进行评估; 以及用于评价聚合物材料的耐磨性的方法，其中该方法提供了具有优异测量精度的样品之间的性能差异的充分评估。 本发明涉及用于评估聚合材料的能量损失，耐崩裂性和耐磨性的方法，并且所述方法包括用X射线或中子照射聚合物材料以进行X射线散射测量或中子散射测量。