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    Electron source
    21.
    发明申请
    Electron source 失效
    电子源

    公开(公告)号：US20050062387A1

    公开(公告)日：2005-03-24

    申请号：US10497894

    申请日：2002-12-06

    Applicant: Ana Lacoste ,  Jacques Pelletier ,  Yves Arnal

    Inventor： Ana Lacoste ,  Jacques Pelletier ,  Yves Arnal

    IPC: H05H1/46 ,  H01J3/02 ,  H01J37/077 ,  H01J17/26 ,  H01J27/16

    CPC classification number: H01J37/077 ,  H01J3/025 ,  H01J2237/0041

    Abstract: The invention concerns a source supplying an adjustable energy electron beam, comprising a plasma chamber (P) consisting of an enclosure (1) having an inner surface of a first value (S1) and an extraction gate (2) having a surface of a second value (S2), the gate potential being different from that of the enclosure and adjustable. The invention is characterized in that the plasma is excited and confined in multipolar or multidipolar magnetic structures, the ratio of the second value (S2) over the first value (S1) being close to: D=1/β {square root}2πcme/mi exp (−½), wherein: β is the proportion of electrons of the plasma P, me the electron mass, and mi is the mass of positively charged ions.

    Abstract translation: 本发明涉及提供可调节能量电子束的源，包括由具有第一值（S1）的内表面的外壳（1）和具有第二值的表面的抽出栅极（2）组成的等离子体室（P） 值（S2），门电位与外壳不同，可调。 本发明的特征在于，等离子体被激发并限制在多极或多极磁结构中，第二值（S2）超过第一值（S1）的比接近于：D = 1 /β（平方根）2picme / mi exp（-½），其中：β是等离子体P的电子比例，me是电子质量，mi是带正电荷的离子的质量。

    Inductively coupled high-frequency electron source with a reduced power requirement as a result of an electrostatic inclusion of electrons
    22.
    发明授权
    Inductively coupled high-frequency electron source with a reduced power requirement as a result of an electrostatic inclusion of electrons 有权
    由于电子的静电夹杂，电感耦合高频电子源具有降低的功率需求

    公开(公告)号：US06661165B2

    公开(公告)日：2003-12-09

    申请号：US09988818

    申请日：2001-11-20

    Applicant: Martin Closs ,  Johann Müller

    Inventor： Martin Closs ,  Johann Müller

    IPC: H01J3934

    CPC classification number: H01J37/077 ,  H01J3/025 ,  H01J2237/0041

    Abstract: An inductively coupled high-frequency electron source is disclosed having a plasma chamber, which is open at least at a first end, the total surface of the open regions of the plasma chamber defined by A0, and having a gas inlet for a gas to be ionized, as well as a high-frequency coil. The interior wall of the plasma chamber is formed at least partially by conductive regions which are connected with a current source, the total surface of the conductive regions defined by Ac, and the ratio of the surface amounts A0 to Ac not exceeding a defined maximal value.

    Abstract translation: 公开了一种电感耦合高频电子源，其具有至少在第一端开放的等离子体室，其由A0限定的等离子体室的开口区域的总表面，并且具有用于气体的气体入口 电离，以及高频线圈。 等离子体室的内壁至少部分地由与电流源连接的导电区域，由Ac限定的导电区域的总表面以及表面量A0至Ac的比例不超过限定的最大值 。

    Source for the generation of large area pulsed ion and electron beams
    23.
    发明授权
    Source for the generation of large area pulsed ion and electron beams 失效
    用于生成大面积脉冲离子和电子束的源

    公开(公告)号：US5841235A

    公开(公告)日：1998-11-24

    申请号：US866551

    申请日：1997-05-30

    Applicant: Vladimir Engelko ,  Harald Giese ,  Georg Muller ,  Sven Schalk ,  Christoph Schultheiss ,  Hermann Wurz

    Inventor： Vladimir Engelko ,  Harald Giese ,  Georg Muller ,  Sven Schalk ,  Christoph Schultheiss ,  Hermann Wurz

    IPC: H01J3/02 ,  H01J27/08 ,  H01J37/077 ,  H01J37/08 ,  H01J37/00

    CPC classification number: H01J37/08 ,  H01J27/08 ,  H01J3/025 ,  H01J37/077

    Abstract: In a source for the generation of large-area pulsed ion or electron beams from an anode discharge electrode which has openings receiving discharge electrodes forming a vacuum arc plasma source, the discharge is safely triggered by a load which determines the total current and which consists of a parallel circuit including an ohmic resistor and a capacitor wherein the load output is adapted to the internal resistance of the pulse voltage generator. With a dimensioning of the electrical components taking into consideration given limits, a homogeneous beam of charged particles is obtained wherein the particle composition can be all the same or a homogeneous mixture of different particles depending on the choice of electrode materials.

    Abstract translation: 在用于从具有接收形成真空电弧等离子体源的放电电极的开口的阳极放电电极产生大面积脉冲离子或电子束的源中，该放电由确定总电流的负载安全地触发，并且由负载 包括欧姆电阻和电容器的并联电路，其中负载输出适合于脉冲电压发生器的内部电阻。 考虑到给定极限的电气元件的尺寸，得到均匀的带电粒子束，其中根据电极材料的选择，颗粒组成可以是全部相同的或不同颗粒的均匀混合物。

    Dynamic electron emitter
    24.
    发明授权
    Dynamic electron emitter 失效
    动态电子发射器

    公开(公告)号：US4739214A

    公开(公告)日：1988-04-19

    申请号：US930245

    申请日：1986-11-13

    Applicant: Robert W. Barr

    Inventor： Robert W. Barr

    IPC: H01J27/02 ,  H01J27/08 ,  H01J37/077 ,  H01J37/08 ,  H05H1/34

    CPC classification number: H01J37/077

    Abstract: A dynamic electron emitter includes a cold cathode in a cathode chamber emitting electrons in a focussed beam at and through a small orifice into a receiving chamber containing an anode and which may be the chamber of an ion gun. The orifice size is critical in that it must be small enough to ensure a higher pressure in the cathode than in the receiving chamber yet large enough to pass therethrough a sufficiently large flux of electrons to accomplish the intended purpose of the electron stream.

    Abstract translation: 动态电子发射器包括在阴极室中的冷阴极，其中的聚焦光束中的电子在小孔处并通过小孔，进入容纳阳极并且可以是离子枪室的接收室。 孔口尺寸是关键的，因为它必须足够小以确保阴极中比在接收室中更高的压力，但足够大以通过其中足够大的电子流以实现电子流的预期目的。

    Melting furnace including wire-discharge ion plasma electron emitter
    30.
    发明授权
    Melting furnace including wire-discharge ion plasma electron emitter 有权
    熔炼炉包括放电离子等离子体电子发射体

    公开(公告)号：US09453681B2

    公开(公告)日：2016-09-27

    申请号：US13919233

    申请日：2013-06-17

    Applicant: ATI Properties, Inc.

    Inventor： Robin M. Forbes Jones ,  Richard L. Kennedy

    IPC: H01J37/077 ,  C22B9/04 ,  F27D11/00 ,  B22D11/11 ,  F27B3/08 ,  F27B3/20 ,  F27B5/04 ,  F27D99/00 ,  H01J37/305 ,  C22B9/22

    CPC classification number: F27D11/00 ,  B22D11/11 ,  C22B9/04 ,  C22B9/226 ,  C22B9/228 ,  F27B3/08 ,  F27B3/20 ,  F27B5/04 ,  F27D99/0006 ,  H01J37/077 ,  H01J37/305 ,  H01J2237/3128

    Abstract: An apparatus for melting an electrically conductive metallic material includes a vacuum chamber and a hearth disposed in the vacuum chamber. At least one wire-discharge ion plasma electron emitter is disposed in or adjacent the vacuum chamber and is positioned to direct a wide-area field of electrons into the vacuum chamber, wherein the wide-area electron field has sufficient energy to heat the electrically conductive metallic material to its melting temperature. The apparatus may further include at least one of a mold and an atomizing apparatus which is in communication with the vacuum chamber and is positioned to receive molten material from the hearth.

    Abstract translation: 用于熔化导电金属材料的设备包括设置在真空室中的真空室和炉床。 至少一个线放电离子等离子体电子发射器设置在真空室中或其附近，并且被定位成将电场的大面积区域引导到真空室中，其中广域电子场具有足够的能量以加热导电 金属材料达到其熔融温度。 该装置还可以包括模具和雾化装置中的至少一个，该模具和雾化装置与真空室连通并定位成从炉床接收熔融材料。

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