Ion pumping of a flat microtip screen
    22.
    发明授权
    Ion pumping of a flat microtip screen 失效
    离子泵送平面微型荧光屏

    公开(公告)号:US6107745A

    公开(公告)日:2000-08-22

    申请号:US104683

    申请日:1998-06-25

    CPC classification number: H01J41/18 H01J29/94 H01J7/16 H01J9/39

    Abstract: A flat microtip display screen including a cathode provided with active areas of electron emission microtips; a cathodoluminescent anode provided, at least in front of the active microtip areas, with active areas of phosphor elements; a main grid of extraction of electrons emitted by the active microtips towards the phosphor elements; and on the cathode side, at least one sacrificial area of microtips adapted to being addressed, outside screen operation periods and independently from the active areas.

    Abstract translation: 平面微型显示屏幕,包括具有电子发射微尖头的有源区域的阴极; 阴极发光阳极,至少在活性微尖区域的前面设置有磷光体元件的活性区域; 将主动微尖端发射的电子提取到磷光体元件的主栅格; 并且在阴极侧具有适于被寻址的屏幕操作周期的至少一个微尖端的牺牲区域,并且独立于有源区域。

    Ion pump with direct molecule flow channel through anode

    公开(公告)号:US09960026B1

    公开(公告)日:2018-05-01

    申请号:US14466711

    申请日:2014-08-22

    CPC classification number: H01J41/14 F04B37/14 H01J41/18

    Abstract: An ultra-high vacuum (UHV) system includes a UHV cell and an ion pump to maintain the UHV in the UHV cell. The ion pump has a GCC (glass, ceramic, or crystalline) housing. An interior wall of the ion-pump housing serves as an anode or bears a coating that serves as an anode. At least one cathode is disposed with respect to the housing so that it can cooperate with the anode to form an electric field for establishing a Penning trap. The GCC housing defines a flow channel that extends radially through the anode so that a molecule can flow directly into the most ionizing region of a Penning trap.

    Sputter ion pump and manufacturing method therefor and image display device with sputter ion pump
    28.
    发明申请
    Sputter ion pump and manufacturing method therefor and image display device with sputter ion pump 审中-公开
    溅射离子泵及其制造方法和溅射离子泵的图像显示装置

    公开(公告)号:US20060078433A1

    公开(公告)日:2006-04-13

    申请号:US11281374

    申请日:2005-11-18

    CPC classification number: H01J41/18 H01J7/16 H01J29/94

    Abstract: A sputter ion pump comprises a metal pump container. In the pump container are arranged a cathode and an anode opposed to each other in the pump container and a permanent magnet situated between the cathode and the inner surface of the pump container. After locating the anode, cathode, and magnetic material in the pump container, the magnetic material is magnetized from outside the pump container, thereby forming the permanent magnet.

    Abstract translation: 溅射离子泵包括金属泵容器。 在泵容器中设置有在泵容器中彼此相对的阴极和阳极以及位于泵容器的阴极和内表面之间的永磁体。 将阳极,阴极和磁性材料定位在泵容器中后,磁性材料从泵容器的外部被磁化,从而形成永磁体。

    Ion drag vacuum pump
    30.
    发明授权
    Ion drag vacuum pump 失效
    离子吸力真空泵

    公开(公告)号:US5899666A

    公开(公告)日:1999-05-04

    申请号:US918279

    申请日:1997-08-25

    CPC classification number: H01J41/18

    Abstract: An ion drag vacuum pump is installed in a body, one side of which is connected to and in communication with a sealed chamber. An ion generating device and a positive ion dragging device for dragging positive ions generated by the ion generating device to exhaust gases located near the ions by speeding up the ions is disposed in the body. The positive ions are neutralized by a positive ion neutralizing device. The ion generating device includes a corona electrode as a corona discharger to which a positive voltage is applied, a metal plate as a DC glow discharger to which a positive DC voltage is applied, or a first RF electrode and a second RF electrode to which RF power is applied. The ion dragging device includes a target electrode or a first and a second grids to which a positive and a negative voltage are respectively applied. The ion neutralizing device includes a grounded baffle plate.

    Abstract translation: 离子阻力真空泵安装在主体中,其一侧连接到密封室并与密封室连通。 离子产生装置和用于通过加速离子将由离子产生装置产生的正离子拖到位于离子附近的废气的离子产生装置和正离子拖曳装置设置在体内。 正离子被正离子中和装置中和。 离子产生装置包括作为施加正电压的电晕放电器的电晕电极,作为直流辉光放电器的金属板,施加正的直流电压,或第一RF电极和第二RF电极,RF 电源被施加。 离子牵引装置包括目标电极或分别施加有正电压和负电压的第一栅极和第二栅极。 离子中和装置包括接地挡板。

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