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    Lithographic process using reaction of O-quinodimethane
    21.
    发明申请
    Lithographic process using reaction of O-quinodimethane 失效
    使用O-醌二甲烷的反应进行平版印刷

    公开(公告)号：US20030165778A1

    公开(公告)日：2003-09-04

    申请号：US10189551

    申请日：2002-07-08

    发明人： Naonori Makino ,  Hidekazu Oohashi

    IPC分类号： G03F007/038

    CPC分类号： B41C1/1025 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/22 ,  B41C2210/24 ,  Y10S430/145 ,  Y10S430/146

    摘要： A lithographic process comprises the steps of image-wise heating a presensitized lithographic printing plate and removing an unheated area of an image-forming layer to form a lithographic printing plate. The presensitized lithographic printing plate comprises a hydrophilic support and the image-forming layer. The image-forming layer contains a compound or a polymer having o-quinodimethane structures or precursor structures thereof. The lithographic printing plate is prepared by a reaction of the o-quinodimethane structures.

    摘要翻译： 平版印刷方法包括以下步骤：以图像方式加热未敏化的平版印刷版并除去图像形成层的未加热区域以形成平版印刷版。 预敏化的平版印刷版包括亲水性载体和图像形成层。 图像形成层含有具有邻醌二甲烷结构或其前体结构的化合物或聚合物。 平版印刷版通过邻二醌二甲烷结构的反应制备。

    Functionalized polymer
    22.
    发明申请
    Functionalized polymer 审中-公开
    官能化聚合物

    公开(公告)号：US20030162123A1

    公开(公告)日：2003-08-28

    申请号：US10368985

    申请日：2003-02-15

    申请人： Shipley Company, L.L.C.

    发明人： Robert K. Barr ,  Charles R. Keil ,  Steven M. Luboviski

    IPC分类号： G03F007/038

    CPC分类号： G03F7/038 ,  C08G18/6254 ,  C08G18/672 ,  C08G18/7831 ,  C08G18/792 ,  C08L33/00 ,  C08L75/16 ,  C09D175/16 ,  G03F7/027 ,  C08G18/62 ,  C08G18/48 ,  C08L2666/04

    摘要： A functionalized polymer containing a main chain derived from polyerizable monomers and pendent functional groups derived from isocyanates terminated with null or null ethylenically or acetyenically unsaturated groups. The functionalized polymer forms a good film and may be employed in industries where film forming polymers are used. Such industries include lithography, adhesives, electrophotoimaging, and the like. The functionalized polymers are self cross-linking and are suitable for use as polymer binders in both primary and secondary photoimaging compositions.

    摘要翻译： 包含衍生自可聚合单体的主链的官能化聚合物和衍生自用α或β-烯键式或乙烯基不饱和基团封端的异氰酸酯的侧链官能团。 官能化聚合物形成良好的膜并且可以用于使用成膜聚合物的工业中。 这些行业包括光刻，粘合剂，电子照相等。 官能化聚合物是自交联的并且适用于初级和次级光成像组合物中的聚合物粘合剂。

    Resins for resists and chemically amplifiable resist compositions
    23.
    发明申请
    Resins for resists and chemically amplifiable resist compositions 有权
    用于抗蚀剂和化学放大抗蚀剂组合物的树脂

    公开(公告)号：US20030148214A1

    公开(公告)日：2003-08-07

    申请号：US10332770

    申请日：2003-01-13

    发明人： Tadayuki Fujiwara ,  Yukiya Wakisaka ,  Toru Tokimitsu ,  Naoshi Murata ,  Yoshihiro Kamon ,  Hikaru Momose

    IPC分类号： C08F020/28 ,  C08F024/00 ,  G03F007/038

    CPC分类号： G03F7/0392 ,  C08F20/28 ,  Y10S430/106 ,  Y10S430/111

    摘要： A resist resin containing a monomer unit selected from the group consisting of the following Formulas (I) and (II): 1 wherein each of R1 and R2 represents a hydrogen atom, alkyl group or acid-deprotectable protecting group respectively, and 2 wherein a substituent R3 represents an alkyl group, or a functional group comprising an acid-deprotectable protecting group, m representing the number of R3 is 0 (non-substitution), 1, 2 or more, R3 may be different from each other, provided that m is 2 or more, and n represents an integer of 0 to 4, has no rough spots on the surface after etching and so has good dry etching resistance, and therefore the resist resin is preferably used as a photo resist for DUV.

    摘要翻译： 含有选自下述式（I）和（II）中的单体单元的抗蚀剂树脂：其中R 1和R 2各自分别表示氢原子，烷基或酸可脱保护基，其中取代基R 3 代表烷基或包含酸可去保护基团的官能团，表示R3的数目的m为0（非取代），1,2或更多，R 3可以彼此不同，条件是m为2 以上，n表示0〜4的整数，蚀刻后的表面没有粗糙斑点，因此具有良好的耐干蚀刻性，因此抗蚀树脂优选用作DUV的光致抗蚀剂。

    Lithographic printing plate precursor
    25.
    发明申请
    Lithographic printing plate precursor 有权
    平版印刷版前体

    公开(公告)号：US20030138721A1

    公开(公告)日：2003-07-24

    申请号：US10225168

    申请日：2002-08-22

    发明人： Satoshi Hoshi ,  Gaku Kumada

    IPC分类号： G03F007/028 ,  G03F007/038

    CPC分类号： B41C1/1008 ,  B41C1/1016 ,  B41C1/1025 ,  B41C2201/02 ,  B41C2201/12 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/22 ,  B41C2210/24

    摘要： There is provided a lithographic printing plate precursor having good on-machine development quality, and moreover high sensitivity and high printing durability, which comprises a support having provided thereon an image forming layer containing (1) at least one ingredient selected from the group consisting of fine particles containing a compound having two or more vinyloxy groups and microcapsules encapsulating a compound having two or more vinyloxy groups, (2) a light-to-heat conversion agent, (3) a hydrophilic resin and (4) an acid precursor.

    摘要翻译： 提供了具有良好的机上显影质量，以及高灵敏度和高印刷耐久性的平版印刷版原版，其包括在其上设置有图像形成层的载体，所述图像形成层含有（1）至少一种选自以下的成分： 含有具有两个以上乙烯基氧基的化合物的微粒和包封具有两个以上乙烯基氧基的化合物的微胶囊，（2）光热转换剂，（3）亲水性树脂和（4）酸前体。

    Negative photosensitive resin composition and display device using the same
    27.
    发明申请
    Negative photosensitive resin composition and display device using the same 审中-公开
    负型感光性树脂组合物及使用其的显示装置

    公开(公告)号：US20030113663A1

    公开(公告)日：2003-06-19

    申请号：US10275847

    申请日：2002-11-12

    发明人： Satoshi Kobayashi

    IPC分类号： G03F007/038

    CPC分类号： G03F7/0007 ,  G03F7/0382

    摘要： A negative working radiation sensitive resin composition comprising; an alkali-soluble novolak resin treated by fractionation and having 1,000 to 10,000 of weight average molecular weight as determined by polystyrene standard, where the portion with molecular weight of 500 or less is 5% or less in the total weight of the composition; a crosslinking agent; and a photo acid generator. This negative working radiation sensitive resin composition can be used preferably as etching resist, ion implantation resist, plating resist, LCD panel structural material such as spacer and electrode insulation material for an organic EL display because of having wide process margin, high heat resistance, high sensitivity, high resolution and good pattern shape.

    摘要翻译： 负性辐射敏感性树脂组合物，其包含： 通过分级处理的碱溶性酚醛清漆树脂，并且通过聚苯乙烯标准测定的重均分子量为1,000至10,000，其中分子量为500以下的部分在组合物的总重量中为5％以下; 交联剂; 和光酸产生剂。 这种负型工作辐射敏感性树脂组合物可以优选用作抗蚀剂，离子注入抗蚀剂，电镀抗蚀剂，用于有机EL显示器的间隔物和电极绝缘材料的LCD面板结构材料，因为其具有宽的工艺余量，高耐热性，高 灵敏度高，分辨率高，图案形状好。

    Thermal switchable composition and imaging member containing complex oxonol IR dye and methods of imaging and printing
    28.
    发明申请
    Thermal switchable composition and imaging member containing complex oxonol IR dye and methods of imaging and printing 失效
    含有复合氧杂红外线染料的热可切换组合物和成像构件以及成像和印刷方法

    公开(公告)号：US20030104314A1

    公开(公告)日：2003-06-05

    申请号：US09947112

    申请日：2001-09-05

    申请人： Eastman Kodak Company

    发明人： Shiying Zheng ,  Kevin W. Williams

    IPC分类号： G03F007/038 ,  G03F007/24 ,  G03F007/26 ,  B41C001/055 ,  B41N001/22 ,  B41N001/12

    CPC分类号： B41M5/465 ,  B41C1/1041 ,  B41M5/368 ,  Y10S430/145 ,  Y10S430/146 ,  Y10S430/165

    摘要： An imaging member, such as a negative-working printing plate or on-press cylinder, can be prepared with a hydrophilic imaging layer comprised of a heat-sensitive hydrophilic charged polymer (ionomer) and an infrared radiation sensitive negatively-charged oxonol dye that has a nullmax of greater than 700 nm. The heat-sensitive polymer and IR dye can be formulated in water or water-miscible solvents to provide highly thermal sensitive imaging compositions. In the imaging member, the polymer reacts to provide increased hydrophobicity in areas exposed to energy that provides or generates heat. For example, heat can be supplied by laser irradiation in the IR region of the electromagnetic spectrum. The heat-sensitive polymer is considered nullswitchablenull in response to heat, and provides a lithographic image without conventional alkaline processing.

    摘要翻译： 可以由亲水性成像层制备成像构件，例如负性印刷板或压印滚筒，所述亲水成像层由热敏亲水带电聚合物（离聚物）和具有​​红外辐射敏感的带负电荷的oxonol染料组成，该染料具有 大于700nm的lambdmax。 热敏聚合物和IR染料可以配制在水或水混溶性溶剂中以提供高度热敏成像组合物。 在成像构件中，聚合物在暴露于提供或产生热量的能量的区域中反应以提供增加的疏水性。 例如，可以通过激光照射在电磁光谱的IR区域中提供热量。 热敏聚合物被认为是响应于热可以切换的，并提供平版印刷图像，而不需要常规的碱处理。

    ONIUM SALTS AND POSITIVE RESIST MATERIALS USING THE SAME
    30.
    发明申请
    ONIUM SALTS AND POSITIVE RESIST MATERIALS USING THE SAME 无效
    ONIUM SALTS和积极的材料使用它

    公开(公告)号：US20030096189A1

    公开(公告)日：2003-05-22

    申请号：US08815410

    申请日：1997-03-11

    发明人： FUJIO YAGIHASHI ,  TOMOYOSHI FURIHATA ,  JUN WATANABE ,  AKINOBU TANAKA ,  YOSHIO KAWAI ,  TADAHITO MATSUA

    IPC分类号： G03F007/038

    CPC分类号： G03F7/039 ,  C07C381/12 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/115

    摘要： Disclosed are novel onium salts represented by general formula (R) 3SnullM, wherein three R's may be the same or different, each being an aryl group, provided that at least one of R's is a t-alkoxy substituted phenyl group, and M is an anion capable of foxing the sulfonium salts; and high energy radiation-responsive positive resist materials using said novel onium salts as acid generator.

    摘要翻译： 公开了由通式（R）3S + M表示的新的鎓盐，其中三个R可以相同或不同，各自为芳基，条件是R的至少一个是叔烷氧基取代的苯基，M 是能够使锍盐氧化的阴离子; 和使用所述新型鎓盐作为酸发生剂的高能辐射响应正抗蚀材料。