公开(公告)号：US20040227082A1

公开(公告)日：2004-11-18

申请号：US10828001

申请日：2004-04-20

Inventor： Tatsuya Adachi ,  Toshiaki Fujii ,  Masashi Iwatsuki ,  Mikio Naruse ,  Mike Hassel Shearer

IPC: H01J037/26 ,  G01N001/28

CPC classification number: H01J37/3056 ,  B01L3/545 ,  B01L2300/021 ,  B01L2300/0822 ,  G01N1/32 ,  G01N2035/00772 ,  H01J37/304 ,  H01J2237/30416

Abstract: The problem of the present invention is to provide a TEM sample equipped with an identifying function for easily specifying a detailed TEM sample and to provide a system for handling the management of information relating to the TEM sample using the TEM when making observations that is constructed with the FIB device manufacturing the sample. The TEM sample of the present invention is written with a mark encoding information specifying the sample at a specified location of a peripheral part. Information relating to the sample filed taking sample specifying information as an index is supplied to a TEM as associated matter. The sample working FIB device and observation TEM device of the present invention are provided with a function enabling writing of information relating to the sample and images to the file during operation which is then read out and utilized on a display.

Abstract translation: 本发明的问题是提供一种具有识别功能的TEM样品，用于容易地指定详细的TEM样品，并提供一个系统，用于当进行观察时使用TEM处理与TEM样品有关的信息的管理， FIB设备制造样品。 本发明的TEM样品用指定样品在周边部分的指定位置处的标记编码信息进行写入。 以采样指定信息为索引的样本提供的信息作为关联事项提供给TEM。 本发明的样品工作FIB装置和观察TEM装置具有能够在操作期间将关于样品和图像的信息写入文件的功能，然后在显示器上读出并利用该功能。

公开(公告)号：US20040144924A1

公开(公告)日：2004-07-29

申请号：US10758651

申请日：2004-01-15

Inventor： Peter Emile Stephan Joseph Asselbergs ,  Hendrik Gezinus Tappel ,  Gerard Nicolaas Anne van Veen

IPC: H01J037/26

CPC classification number: H01J37/20 ,  G01N1/04 ,  G01N1/286 ,  H01J2237/208 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: The invention provides a method for the manufacture and transmissive irradiation of a sample, comprising the steps of: A Providing a particle-optical system having an internal low-pressure chamber and suitable for the generation of an electron beam and an intersecting ion beam in said chamber; B Providing a specimen within the chamber, carried by a manipulator; C Irradiating the specimen with the ion beam so as to cut a sample from the specimen; D Relatively displacing the sample thus cut to a sample holder than can be manipulated; E Attaching the sample to the sample holder; F Using an electron beam to perform transmissive irradiation of the sample thus attached to the sample holder, characterized in that step F is performed in the low-pressure chamber of the particle-optical system according to step A.

Abstract translation: 本发明提供了一种用于制造和透射照射样品的方法，包括以下步骤：A提供具有内部低压室并且适于在所述电子束中产生电子束和相交离子束的粒子光学系统 房间 B在室内提供样品，由机械手承载; C用离子束照射样品，以从样品上切下样品; D将如此切割的样品相对移位到可操纵的样品架上; E将样品安装到样品架上; F使用电子束对附着于样品保持器的样品进行透射照射，其特征在于，在根据步骤A的粒子光学系统的低压室中进行步骤F.

公开(公告)号：US20030201393A1

公开(公告)日：2003-10-30

申请号：US10402977

申请日：2003-04-01

Inventor： Ruriko Tsuneta ,  Masanari Koguchi ,  Isao Nagaoki ,  Hiroyuki Kobayashi

IPC: H01J037/26

CPC classification number: H01J37/26 ,  H01J37/28 ,  H01J2237/216 ,  H01J2237/221 ,  H01J2237/2487 ,  Y10S977/869 ,  Y10S977/881

Abstract: The present invention provides an analysis of displacement by calculating the phase variance image Pnull (k, l) between Fourier transformed images of paired images S1 (n, m) and S2 (n, m) to determine the center of gravity of null peak appearing on the invert Fourier transform image of the images. The present invention provides numerous advantages such as a precision of displacement analysis of a fraction of pixel to thereby allow to improve the precision of focal analysis, or reduced number of pixels required to achieve the same precision, evaluation of reliability of the analysis by using the null peak intensity, influence of varying background reduced by using a phase variance component. The improved performance by the present invention allows any operator skilled or not to achieve a best focusing.

Abstract translation: 本发明通过计算配对图像S1（n，m）和S2（n，m）的傅立叶变换图像之间的相位差图像P'（k，l）来提供位移分析，以确定δ峰的重心 出现在图像的反转傅里叶变换图像上。 本发明提供许多优点，例如像素的一部分的位移分析的精度，从而允许提高焦点分析的精度，或减少实现相同精度所需的像素数量，通过使用 δ峰强度，通过使用相位方差分量减小了变化背景的影响。 通过本发明的改进的性能允许任何操作者熟练或不能实现最佳聚焦。

公开(公告)号：US20030132383A1

公开(公告)日：2003-07-17

申请号：US10339276

申请日：2003-01-09

Inventor： Gerd Benner

IPC: H01J037/26

CPC classification number: H01J37/265 ,  H01J37/26 ,  H01J2237/2614

Abstract: In a transmission electron microscope with phase contrast imaging, the illumination of the object to be imaged takes place with an annular illuminating aperture. An annular phase-shifting element with a central aperture is arranged in a plane Fourier transformed with respect to the object plane. The annular phase-shifting element confers a phase shift of null/2 on a null beam, while the radiation of higher diffraction orders diffracted at the object in the direction of the optical axis passes through the central aperture of the annular phase-shifting element and consequently is not affected, or only slightly affected, by the phase-shifting element. The annular illuminating aperture is preferably produced sequentially in time by a deflecting system, which produces a beam tilt in a plane conjugate to the object plane.

Abstract translation: 在具有相位对比成像的透射电子显微镜中，待成像对象的照明是用环形照明孔进行的。 具有中心孔的环形相移元件布置在相对于物平面进行傅里叶变换的平面中。 环形移相元件在零光束上赋予π/ 2的相移，而在物体处沿光轴方向衍射的较高衍射级的辐射通过环形移相元件的中心孔，并且 因此不受相移元件的影响或仅受轻微的影响。 环形照明孔优选地通过偏转系统在时间上顺序地产生，该偏转系统在与物平面共轭的平面中产生光束倾斜。

公开(公告)号：US20030094572A1

公开(公告)日：2003-05-22

申请号：US10166774

申请日：2002-06-12

Applicant: Hitachi, Ltd.

Inventor： Miyako Matsui ,  Mari Nozoe

IPC: H01J037/26

CPC classification number: H01J37/28 ,  H01J2237/0047 ,  H01J2237/2817

Abstract: In a method for inspecting positions and types of defects on wafers with circuit patterns in the semiconductor manufacturing process, a highly sensitive inspection is made regardless of the types and materials of junctions of circuit patterns of the semiconductor devices, different kinds of defects being distinguished from one another. Further, extraordinary electrification of the circuit pattern is prevented and an area to be exposed to an electron beam is controlled evenly and at a desired voltage. Thus, this method contributes to the early setup of manufacturing processes of integrated circuits and early measures against defects, increasing the reliability and productivity of the semiconductor devices. During an inspection of positions and types of defects on a wafer with a circuit pattern in the semiconductor manufacturing process, with the use of a charged-particle beam from a charged-particle source, an optical beam from an optical source as well as a charged-particle beam are applied to a junction of the circuit pattern of the wafer placed on a wafer holder. Thus, regardless of the types and materials of circuit patterns, a highly sensitive inspection is made according to contrasts of the defects in an image captured.

Abstract translation: 在半导体制造工艺中利用电路图案检查晶片上的缺陷的位置和类型的方法中，无论半导体器件的电路图案的结的类型和材料如何，均进行高灵敏度检查，不同种类的缺陷与 另一个。 此外，防止电路图案的异常带电，并且暴露于电子束的区域被均匀地控制并且处于期望的电压。 因此，该方法有助于早期建立集成电路的制造工艺和早期的缺陷措施，提高半导体器件的可靠性和生产率。 在利用半导体制造工艺中的电路图案的晶圆上的缺陷位置和类型的检查中，使用来自带电粒子源的带电粒子束，来自光源的光束以及带电粒子 - 粒子束被施加到放置在晶片保持器上的晶片的电路图案的结。 因此，无论电路图案的类型和材料如何，根据所拍摄图像中的缺陷的对比度进行高灵敏度检查。

公开(公告)号：US20030066964A1

公开(公告)日：2003-04-10

申请号：US10255163

申请日：2002-09-25

Applicant: JEOL Ltd.

Inventor： Kuniaki Nagayama ,  Radostin S. Danev

IPC: H01J037/26

CPC classification number: H01J37/263 ,  H01J37/26 ,  H01J2237/226 ,  H01J2237/2614

Abstract: Phase manipulation is used to produce a high contrast electron microscope image. A phase plate is placed at the back focal plane of an objective lens and used to form a differential contrast image.

Abstract translation: 相位操作用于产生高对比度电子显微镜图像。 将相位板放置在物镜的后焦平面上，并用于形成差分对比度图像。

公开(公告)号：US20020148962A1

公开(公告)日：2002-10-17

申请号：US10071881

申请日：2002-02-08

Applicant: JEOL Ltd.

Inventor： Fumio Hosokawa ,  Kuniaki Nagayama ,  Radostin S. Danev

IPC: H01J037/26

CPC classification number: H01J37/26 ,  H01J2237/2614

Abstract: A lens system for use with a phase plate in a transmission electron microscope comprises a phase plate placed after the back-focal plane of the objective lens in an imaging system mounted downstream of the objective lens. Phase lenses image the back-focal plane of the objective lens onto the phase plate such that the position and tilt of the electron beam relative to the optical axis are made conjugate. An alignment coil may direct the electron beam going out of the phase lenses toward the phase plate. A second alignment coil may direct the electron beam going out of the phase plate toward the imaging lenses located after the phase plate.

Abstract translation: 在透射电子显微镜中与相位板一起使用的透镜系统包括在安装在物镜下游的成像系统中放置在物镜的后焦平面之后的相位板。 相位透镜将物镜的后焦平面成像到相位板上，使得电子束相对于光轴的位置和倾斜成为共轭。 对准线圈可以将相位透镜的电子束引向相位板。 第二对准线圈可以将电子束引导出位于相位板之后的成像透镜。