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    Scanning probe microscope apparatus for use in a scanning electron microscope
    21.
    发明授权
    Scanning probe microscope apparatus for use in a scanning electron microscope 失效
    用于扫描电子显微镜的扫描探针显微镜装置

    公开(公告)号：US5510615A

    公开(公告)日：1996-04-23

    申请号：US478479

    申请日：1995-06-07

    Applicant: Huddee Ho ,  Paul E. West

    Inventor： Huddee Ho ,  Paul E. West

    IPC: G01Q10/04 ,  G01Q30/02 ,  G01Q30/16 ,  G01Q30/18 ,  G01Q70/02 ,  H01J37/28 ,  H01J37/067

    CPC classification number: G01Q30/02 ,  B82Y35/00 ,  G01Q30/18 ,  G01Q70/02 ,  H01J37/28 ,  H01J2237/2818 ,  Y10S977/86

    Abstract: The scanning probe microscope translation apparatus includes a scanning probe microscope for examining a specimen, with a specimen stage for mounting the specimen for examination by the scanning probe microscope, and a first translator mounted to the scanning probe microscope for translating the specimen stage relative to the scanning probe microscope. A support frame is dimensioned and adapted to be mounted in a specimen chamber of a scanning electron microscope, and a second translator is provided for scanning the scanning probe microscope relative to the support frame. The second translator is mounted on dual mass plates provided for isolating the scanning probe microscope from external vibrations, and suspension device are provided for suspending the mass plates from the support frame. A vacuum load lock system permits moving the scanning probe microscope, specimen stage, first translator, and mounting assembly into and out of the vacuum of the scanning electron microscope vacuum chamber.

    Abstract translation: 扫描探针显微镜转印装置包括用于检查样本的扫描探针显微镜，具有用于通过扫描探针显微镜安装用于检查的样本的样本台和安装到扫描探针显微镜上的第一平移器，用于将样本台相对于 扫描探针显微镜。 支撑框架尺寸适于安装在扫描电子显微镜的样本室中，并且提供第二平移器用于相对于支撑框架扫描扫描探针显微镜。 第二个翻译器安装在双重质量板上，用于将扫描探针显微镜与外部振动隔离，并提供悬挂装置，用于将质量板从支撑架悬挂下来。 真空负载锁定系统允许将扫描探针显微镜，样品台，第一平移器和安装组件移入和移出扫描电子显微镜真空室的真空。

    Charged Particle Beam Source and Charged Particle Beam System
    27.
    发明公开
    Charged Particle Beam Source and Charged Particle Beam System 审中-公开

    公开(公告)号：US20230317400A1

    公开(公告)日：2023-10-05

    申请号：US18121931

    申请日：2023-03-15

    Applicant: JEOL Ltd.

    Inventor： Kyouichi Kamino ,  Tomohisa Fukuda ,  Norikazu Arima ,  Yasuyuki Okano ,  Keiichi Yamamoto

    IPC: H01J37/067 ,  H01J37/18 ,  H01J37/28

    CPC classification number: H01J37/067 ,  H01J37/18 ,  H01J37/28

    Abstract: Provided is a charged particle beam source having an emitter that can be replaced easily. The charged particle beam source includes an electron gun chamber; a first unit including both a supportive insulative member mechanically supporting a cable and a first set of terminals electrically connected to the cable; and a second unit including both the emitter that releases charged particles and a second set of terminals electrically connected to the emitter. The chamber has a side wall provided with a through-hole in which the first unit is secured. The second unit can be detachably mounted to the first unit. Within the chamber, the emitter is placed on an optical axis, so that the first and second sets of terminals are brought into contact with each other.

    MEMS BASED CHARGED PARTICLE DEFLECTOR DESIGN
    28.
    发明申请
    MEMS BASED CHARGED PARTICLE DEFLECTOR DESIGN 失效
    基于MEMS的充电颗粒偏转器设计

    公开(公告)号：US20050199822A1

    公开(公告)日：2005-09-15

    申请号：US10987871

    申请日：2004-11-12

    Applicant: Rahul Saini ,  Zoran Jandric ,  David Tuggle

    Inventor： Rahul Saini ,  Zoran Jandric ,  David Tuggle

    IPC: G01K1/08 ,  H01J3/14 ,  H01J3/26 ,  H01J37/04 ,  H01J37/067 ,  H01L21/44 ,  H05K1/00

    CPC classification number: H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/28 ,  H01J37/3177 ,  H01J2237/03 ,  H01J2237/0492 ,  H01J2237/1205

    Abstract: A microcolumn including a plurality of beam modification components coupled to an assembly substrate, wherein the plurality of beam modification components includes: (1) an extractor component; (2) a first focusing electrode component; (3) a first anode component; (4) a first deflector component; (5) a second focusing electrode component; (6) a second deflector component; (7) a third focusing electrode component; (8) a third deflector component; (9) a second anode component; (10) a fourth focusing electrode component; and (11) a third anode component. The beam modification components may be ordered on the substrate in this sequence or other sequences.

    Abstract translation: 一种微柱，包括耦合到组件衬底的多个光束修改部件，其中所述多个光束修改部件包括：（1）提取器部件; （2）第一聚焦电极组件; （3）第一阳极部件; （4）第一偏转器部件; （5）第二聚焦电极部件; （6）第二偏转器部件; （7）第三聚焦电极部件; （8）第三偏转器部件; （9）第二阳极部件; （10）第四聚焦电极组件; 和（11）第三阳极组件。 束修饰组分可以按照该顺序或其它序列在衬底上排列。

    Electron gun having electrically isolated and adjustable cathode
    29.
    发明授权
    Electron gun having electrically isolated and adjustable cathode 失效
    电子枪具有电气隔离和可调节的阴极

    公开(公告)号：US5686785A

    公开(公告)日：1997-11-11

    申请号：US503991

    申请日：1995-07-19

    Applicant: Boris A. Movchan ,  Viktor A. Timashov ,  Evgenii L. Pijuk

    Inventor： Boris A. Movchan ,  Viktor A. Timashov ,  Evgenii L. Pijuk

    IPC: H01J37/065 ,  H01J37/067 ,  H01J29/46

    CPC classification number: H01J37/067 ,  H01J37/065 ,  H01J2237/06308

    Abstract: An electron gun for producing a beam of electrons has an elongated, linear thermionic cathode and a focusing electrode. The opposite ends of the cathode are engaged by adjustable holders which enable the spatial separation between the cathode and focusing electrode to be easily varied. The focusing electrode is electrically isolated from the cathode whereby fine tuning of the electron beam may be accomplished by varying the potential difference between the focusing electrode and cathode.

    Abstract translation: 用于产生电子束的电子枪具有细长的线性热离子阴极和聚焦电极。 阴极的相对端由可调节的保持器接合，这使得阴极和聚焦电极之间的空间分离容易变化。 聚焦电极与阴极电隔离，由此可以通过改变聚焦电极和阴极之间的电位差来实现电子束的微调。

    Scanning probe microscope apparatus for use in a scanning electron
    30.
    发明授权
    Scanning probe microscope apparatus for use in a scanning electron 失效
    用于扫描电子显微镜的扫描探针显微镜装置

    公开(公告)号：US5455420A

    公开(公告)日：1995-10-03

    申请号：US273740

    申请日：1994-07-12

    Applicant: Huddee Ho ,  Paul E. West

    Inventor： Huddee Ho ,  Paul E. West

    IPC: G01Q10/04 ,  G01Q30/02 ,  G01Q30/16 ,  G01Q30/18 ,  G01Q70/02 ,  H01J37/28 ,  H01J37/067

    CPC classification number: G01Q30/02 ,  B82Y35/00 ,  G01Q30/18 ,  G01Q70/02 ,  H01J37/28 ,  H01J2237/2818 ,  Y10S977/86

    Abstract: The scanning probe microscope translation apparatus includes a scanning probe microscope for examining a specimen, with a specimen stage for mounting the specimen for examination by the scanning probe microscope, and a first translator mounted to the scanning probe microscope for translating the specimen stage relative to the scanning probe microscope. A support frame is dimensioned and adapted to be mounted in a specimen chamber of a scanning electron microscope, and a second translator is provided for scanning the scanning probe microscope relative to the support frame. The second translator is mounted on dual mass plates provided for isolating the scanning probe microscope from external vibrations, and suspension O-rings are provided for suspending the mass plates from the support frame. A vacuum load lock system permits moving the scanning probe microscope, specimen stage, first translator, and mounting assembly into and out of the vacuum of the scanning electron microscope vacuum chamber.

    Abstract translation: 扫描探针显微镜转印装置包括用于检查样本的扫描探针显微镜，具有用于通过扫描探针显微镜安装用于检查的样本的样本台和安装到扫描探针显微镜上的第一平移器，用于将样本台相对于 扫描探针显微镜。 支撑框架尺寸适于安装在扫描电子显微镜的样本室中，并且提供第二平移器用于相对于支撑框架扫描扫描探针显微镜。 第二个翻译器安装在双重质量板上，用于将扫描探针显微镜与外部振动隔离，并提供悬挂O形环用于将质量块悬挂在支撑框架上。 真空负载锁定系统允许将扫描探针显微镜，样品台，第一平移器和安装组件移入和移出扫描电子显微镜真空室的真空。

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