公开(公告)号：US20090226824A1

公开(公告)日：2009-09-10

申请号：US12320874

申请日：2009-02-06

Applicant: Sang Kyun Kim ,  Sang Hak Lim ,  Mi Young Kim ,  Sang Ran Koh ,  Hui Chan Yun ,  Do Hyeon Kim ,  Dong Seon Uh ,  Jong Seob Kim

Inventor： Sang Kyun Kim ,  Sang Hak Lim ,  Mi Young Kim ,  Sang Ran Koh ,  Hui Chan Yun ,  Do Hyeon Kim ,  Dong Seon Uh ,  Jong Seob Kim

IPC: G03F1/00 ,  G03F7/20

CPC classification number: H01L21/31144 ,  C08G77/04 ,  C09D183/04 ,  H01L21/0276

Abstract: A hardmask composition for processing a resist underlayer film includes a solvent and an organosilane polymer, wherein the organosilane polymer is represented by Formula 6: In Formula 6, R is methyl or ethyl, R′ is substituted or unsubstituted cyclic or acyclic alkyl, Ar is an aromatic ring-containing functional group, x, y and z satisfy the relations x+y=4, 0.4≦x≦4, 0≦y≦3.6, and 4×10−4≦z≦1, and n is from about 3 to about 500.

Abstract translation: 用于加工抗蚀剂下层膜的硬掩模组合物包括溶剂和有机硅烷聚合物，其中有机硅烷聚合物由式6表示：在式6中，R是甲基或乙基，R'是取代或未取代的环状或无环烷基，Ar是 含芳环的官能团x，y和z满足x + y = 4,0.4 <= x <= 4,0 <= y <= 3.6和4×10-4 <= z <1的关系，以及 n为约3至约500。

公开(公告)号：US20070148974A1

公开(公告)日：2007-06-28

申请号：US11508074

申请日：2006-08-22

Applicant: Dong Seon Uh ,  Chang Il Oh ,  Do Hyeon Kim ,  Hui Chan Yun ,  Jin Kuk Lee ,  Irina Nam ,  Jong Seob Kim

Inventor： Dong Seon Uh ,  Chang Il Oh ,  Do Hyeon Kim ,  Hui Chan Yun ,  Jin Kuk Lee ,  Irina Nam ,  Jong Seob Kim

IPC: C23F1/00 ,  H01L21/302

CPC classification number: H01L21/0273 ,  G03F7/11

Abstract: Provided herein are hardmask compositions for resist underlayer films, wherein according to some embodiments of the invention, hardmask compositions include a polymer prepared by the reaction of a compound of Formula 1 with a compound of Formula 2 (R)m—Si—(OCH3)4-m   (2) in the presence of a catalyst, wherein R is a monovalent organic group, n is an integer from 3 to 20, and m is 1 or 2; and an organic solvent.Also provided herein are methods for producing a semiconductor integrated circuit device using a hardmask composition according to an embodiment of the invention. Further provided are semiconductor integrated circuit devices produced by a method embodiment of the invention.

Abstract translation: 本文提供了用于抗蚀剂下层膜的硬掩模组合物，其中根据本发明的一些实施方案，硬掩模组合物包括通过式1的化合物与式2化合物的反应制备的聚合物， （2）（2）式（2）所示的化合物，其中R 1，R 2，R 3， 在存在催化剂的情况下，<？in-line-formula description =“In-line Formulas”end =“tail”？>，其中R为一价有机基团，n为3至20的整数，m为1 或2; 和有机溶剂。 本文还提供了使用根据本发明实施例的硬掩模组合物制造半导体集成电路器件的方法。 还提供了通过本发明的方法实施例生产的半导体集成电路器件。

公开(公告)号：US20070148586A1

公开(公告)日：2007-06-28

申请号：US11507701

申请日：2006-08-22

Applicant: Dong Seon Uh ,  Chang Il Oh ,  Do Hyeon Kim ,  Hui Chan Yun ,  Jin Kuk Lee ,  Irina Nam ,  Jong Seob Kim

Inventor： Dong Seon Uh ,  Chang Il Oh ,  Do Hyeon Kim ,  Hui Chan Yun ,  Jin Kuk Lee ,  Irina Nam ,  Jong Seob Kim

IPC: G03C1/00

CPC classification number: G03F7/11 ,  G03F7/0752 ,  Y10S430/106 ,  Y10S430/111

Abstract: Provided herein are hardmask compositions for resist underlayer films, wherein in some embodiments, the hardmask compositions include(a) a first polymer prepared by the reaction of a compound of Formula 1 wherein n is a number of 3 to 20, with a compound of Formula 2 (R)m—Si—(OCH3)4-m   (2) wherein R is a monovalent organic group and m is 0, 1 or 2;(b) a second polymer that includes at least one of the structures represented by Formulae 3-6;(c) an acid or base catalyst; and(d) an organic solvent.Further provided herein are methods for producing a semiconductor integrated circuit device using a hardmask composition according to an embodiment of the present invention.In addition, provided herein are semiconductor integrated circiut devices produced by a method embodiment of the invention.

Abstract translation: 本文提供了用于抗蚀剂下层膜的硬掩模组合物，其中在一些实施方案中，硬掩模组合物包括（a）通过其中n为3至20数的式1化合物与式1化合物的反应制备的第一聚合物 2 <？in-line-formula description =“In-line Formulas”end =“lead”？（R） -Si-（OCH 3 3）_{其中R是一价有机基团，m是0,1或2; （b）第二聚合物，其包含由式3-6表示的至少一种结构; （c）酸或碱催化剂; 和（d）有机溶剂。 本文还提供了使用根据本发明实施例的硬掩模组合物制造半导体集成电路器件的方法。 此外，本发明提供了通过本发明的方法实施例制造的半导体集成循环装置。}

公开(公告)号：US11311016B1

公开(公告)日：2022-04-26

申请号：US17403370

申请日：2021-08-16

Applicant: Do Hyeon Kim

Inventor： Do Hyeon Kim

IPC: A01N59/14 ,  A01N59/26 ,  A01N59/20 ,  A01P15/00

Abstract: Disclosed is a plant disease control composition for soaking virus-infected plant seeds. The plant disease control composition is a composition including nitrogen, phosphate, potassium oxide, manganese, molybdenum, zinc, boron, copper, and a surfactant and characterized by exhibiting an effect on the diseases of cucurbitaceae or solanaceae crops. A plant disease control method for seed soaking involves soaking seeds in a plant disease control composition including nitrogen (N), phosphoric anhydride (P2O5), potassium oxide (K2O), boron (B), manganese (Mn), molybdenum (Mo), zinc (Zn), copper (Cu), and a surfactant to control plant diseases.

公开(公告)号：US09449418B2

公开(公告)日：2016-09-20

申请号：US13012201

申请日：2011-01-24

Applicant: Dong-Hyuk Lee ,  Mu-Sik Kwon ,  Sang-Wook Oh ,  Do-Hyeon Kim ,  Hee-Bum Ahn ,  Seong-Taek Hwang

Inventor： Dong-Hyuk Lee ,  Mu-Sik Kwon ,  Sang-Wook Oh ,  Do-Hyeon Kim ,  Hee-Bum Ahn ,  Seong-Taek Hwang

IPC: G06T13/00 ,  G06T13/80 ,  G06F3/041

CPC classification number: G06T13/80 ,  G06F3/041

Abstract: A method for creating an animation message includes generating input information containing information regarding input time and input coordinates according to input order of drawing information input through a touch screen; dividing an image containing the drawing information and background information into a plurality of blocks; creating an animation message by mapping the input information to the plurality of blocks so that the drawing information can be sequentially reproduced according to the input order; allocating a parity bit per pre-set block range of the animation message in order to detect an error occurring in the animation message; and transmitting the created animation message.

Abstract translation: 一种用于创建动画消息的方法包括根据输入通过触摸屏输入的绘图信息的顺序产生包含关于输入时间和输入坐标的信息的输入信息; 将包含绘图信息和背景信息的图像分割成多个块; 通过将输入信息映射到多个块来创建动画消息，使得可以根据输入的顺序顺序地再现绘图信息; 为每个动画消息的预设块范围分配奇偶校验位，以便检测动画消息中出现的错误; 并发送所创建的动画消息。

公开(公告)号：US08761514B2

公开(公告)日：2014-06-24

申请号：US13036875

申请日：2011-02-28

Applicant: Jeong-Wan Park ,  Sang-Wook Oh ,  Do-Hyeon Kim ,  Hee-Bum Ahn

Inventor： Jeong-Wan Park ,  Sang-Wook Oh ,  Do-Hyeon Kim ,  Hee-Bum Ahn

IPC: G06K9/18

CPC classification number: G06K9/48 ,  G06K2209/01 ,  G06K2209/013

Abstract: A character recognition apparatus and method based on a character orientation are provided, in which an input image is binarized, at least one character area is extracted from the binarized image, a slope value of the extracted at least one character area is calculated, the calculated slope value is set as a character feature value, and a character is recognized by using a neural network for recognizing a plurality of characters by receiving the set character feature value. Accordingly, the probability of wrongly recognizing a similar character decreases, and a recognition ratio of each character increases.

Abstract translation: 提供了一种基于字符取向的字符识别装置和方法，其中输入图像被二值化，从二值化图像中提取至少一个字符区域，计算所提取的至少一个字符区域的斜率值，计算出 斜率值被设置为字符特征值，并且通过使用用于通过接收设置的字符特征值来识别多个字符的神经网络来识别字符。 因此，错误地识别相似字符的概率降低，并且每个字符的识别率增加。

公开(公告)号：US20110111775A1

公开(公告)日：2011-05-12

申请号：US12879283

申请日：2010-09-10

Applicant: Do-Hyeon KIM ,  Mu-Sik Kwon ,  Sang-Wook Oh ,  Seong-Taek Hwang

Inventor： Do-Hyeon KIM ,  Mu-Sik Kwon ,  Sang-Wook Oh ,  Seong-Taek Hwang

IPC: G06K9/00 ,  G06F3/041 ,  H04W4/12

CPC classification number: G06K9/222 ,  G06F3/03545 ,  G06F3/0416 ,  H04L51/02 ,  H04L51/066 ,  H04L51/38 ,  H04M1/72552 ,  H04M2250/22

Abstract: A method for reproducing a handwritten message using handwriting data, the method including receiving an input of the handwritten message and generating handwriting data including position information and time information of the handwritten message and a still image using the position information, encoding a handwriting image including the handwriting data in the still image and transmitting the encoded handwriting image through the still image, receiving and decoding the handwriting image, extracting the handwriting data included in the decoded handwriting image, and sequentially reproducing the handwritten message according to an order of input of the handwritten message using the extracted handwriting data.

Abstract translation: 一种使用手写数据再现手写信息的方法，所述方法包括：接收手写消息的输入，并且生成包括手写消息的位置信息和时间信息的手写数据和使用该位置信息的静止图像，对包括 在静止图像中输入手写数据并通过静止图像发送经编码的手写图像，接收和解码手写图像，提取解码的手写图像中包括的笔迹数据，并根据手写的输入顺序顺序地再现手写信息 消息使用提取的手写数据。

公开(公告)号：US20110086650A1

公开(公告)日：2011-04-14

申请号：US12903556

申请日：2010-10-13

Applicant: Mu-Sik KWON ,  Sang-Wook Oh ,  Jung-Rim Kim ,  Do-Hyeon Kim ,  Seong-Taek Hwang

Inventor： Mu-Sik KWON ,  Sang-Wook Oh ,  Jung-Rim Kim ,  Do-Hyeon Kim ,  Seong-Taek Hwang

IPC: H04W4/00

CPC classification number: G06T9/20 ,  G06F3/04883 ,  G06T9/00 ,  H04L51/08 ,  H04M1/72547 ,  H04M1/72552 ,  H04M1/72555 ,  H04M2250/22 ,  H04N1/00307 ,  H04N1/00312 ,  H04N1/00392 ,  H04N1/00411 ,  H04N2201/0013 ,  H04N2201/0046

Abstract: A method for transmitting and receiving a handwritten message having time information includes generating one or more codes using handwritten message information which is sequentially input by a user, converting the handwritten message information and the one or more codes into one image and transmitting the converted image, confirming whether a received image includes the one or more codes, and if the received image includes the one or more codes, sequentially reproducing the contents of the handwritten message according to an input order of the contents of the handwritten message by analyzing the one or more codes.

Abstract translation: 用于发送和接收具有时间信息的手写消息的方法包括：使用由用户顺序输入的手写消息信息生成一个或多个代码，将手写消息信息和一个或多个代码转换成一个图像并发送转换后的图像， 确认接收到的图像是否包括一个或多个代码，并且如果接收到的图像包括一个或多个代码，则通过分析一个或多个代码根据手写消息的内容的输入顺序顺序地再现手写消息的内容 代码。

公开(公告)号：US20080118875A1

公开(公告)日：2008-05-22

申请号：US11984741

申请日：2007-11-21

Applicant: Mi Young Kim ,  Sang Kyun Kim ,  Sang Hak Lim ,  Sang Ran Koh ,  Hui Chan Yun ,  Do Hyeon Kim ,  Dong Seon Uh ,  Jong Seob Kim

Inventor： Mi Young Kim ,  Sang Kyun Kim ,  Sang Hak Lim ,  Sang Ran Koh ,  Hui Chan Yun ,  Do Hyeon Kim ,  Dong Seon Uh ,  Jong Seob Kim

IPC: C08G77/04 ,  C08K5/16 ,  C08K5/3432 ,  C08K5/42 ,  C08K5/52 ,  G03F7/20

CPC classification number: C08G77/50 ,  C08L83/14 ,  G03F7/11 ,  G03F7/2022 ,  H01L21/02126 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/0271 ,  H01L21/31144 ,  H01L21/3122

Abstract: A hardmask composition includes a solvent and an organosilicon copolymer. The organosilicon copolymer may be represented by Formula A: (SiO1.5—Y—SiO1.5)x(R3SiO1.5)y   (A) wherein x and y may satisfy the following relations: x is about 0.05 to about 0.9, y is about 0.05 to about 0.9, and x+y=1, R3 may be a C1-C12 alkyl group, and Y may be a linking group including a substituted or unsubstituted, linear or branched C1-C20 alkyl group, a C1-C20 group containing a chain that includes an aromatic ring, a heterocyclic ring, a urea group or an isocyanurate group, or a C2-C20 group containing one or more multiple bonds.

Abstract translation: 硬掩模组合物包括溶剂和有机硅共聚物。 有机硅共聚物可以由式A表示：<？in-line-formula description =“In-line Formulas”end =“lead”→（SiO 1.5 -Y-SiO 1.5 （A）＆lt;＆lt; /＆gt;（S）＆lt; 公式描述=“在线公式”end =“tail”？>其中x和y可以满足以下关系：x为约0.05至约0.9，y为约0.05至约0.9，x + y = 1，R 3可以是C 1 -C 12烷基，Y可以是包含取代或未取代的直链或支链C 含有包含芳香环的链的C 1 -C 20 -C 20烷基，C 1 -C 20 -C 20烷基，C 1 -C 20 -C 20烷基， ，杂环，脲基或异氰脲酸酯基，或含有一个或多个多重键的C 2 -C 20 -C 20基团。