公开(公告)号：US20050017192A1

公开(公告)日：2005-01-27

申请号：US10492393

申请日：2002-10-09

Applicant: Dror Shemesh ,  Dubi Shachal

Inventor： Dror Shemesh ,  Dubi Shachal

IPC: G06T17/00 ,  G06T17/20 ,  H01J3/14 ,  H01J3/26 ,  H01J37/153 ,  H01J37/21 ,  H01J37/22 ,  H01J37/26

CPC classification number: H01J37/21 ,  H01J37/153 ,  H01J37/22 ,  H01J37/241 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/1501

Abstract: An apparatus and method for fast changing a focal length of a charged particle beam the method comprising the step of changing a control signal in response to a relationship between the control signal voltage value and the focal length of the charged particle beam.

Abstract translation: 一种用于快速改变带电粒子束的焦距的装置和方法，该方法包括响应于控制信号电压值与带电粒子束的焦距之间的关系改变控制信号的步骤。

公开(公告)号：US07912657B2

公开(公告)日：2011-03-22

申请号：US11877125

申请日：2007-10-23

Applicant: Dror Shemesh ,  Yuri Shirman

Inventor： Dror Shemesh ,  Yuri Shirman

IPC: G01B5/28 ,  G01K1/08

CPC classification number: G01N23/2276

Abstract: A system for providing a compensated Auger spectrum, the system includes: a processor, adapted to generate a compensated Auger spectrum in response to a non-compensated Auger spectrum and in response to an electric potential related parameter, and an interface to an electron detector that is adapted to detect electrons emitted from the first area, wherein the interface is connected to the processor, and wherein the electric potential related parameter reflects a state of a first area of an object that was illuminated by a charged particle beam during the generation of the non-compensated Auger spectrum.

Abstract translation: 一种用于提供经补偿的俄歇频谱的系统，该系统包括：处理器，适于响应于未补偿的俄歇频谱和响应于电位相关参数产生经补偿的俄歇频谱，以及与电子检测器的接口， 适于检测从所述第一区域发射的电子，其中所述界面连接到所述处理器，并且其中所述电位相关参数反映在所述第一区域生成期间被带电粒子束照射的物体的第一区域的状态 非补偿俄歇谱。

公开(公告)号：US07161158B2

公开(公告)日：2007-01-09

申请号：US10492393

申请日：2002-10-09

Applicant: Dror Shemesh ,  Dubi Shachal

Inventor： Dror Shemesh ,  Dubi Shachal

IPC: H01J3/14 ,  H01J37/21 ,  H01J3/28 ,  H01J37/256

CPC classification number: H01J37/21 ,  H01J37/153 ,  H01J37/22 ,  H01J37/241 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/1501

Abstract: An apparatus and method for fast changing a focal length of a charged particle beam the method comprising the step of changing a control signal in response to a relationship between the control signal voltage value and the focal length of the charged particle beam.

Abstract translation: 一种用于快速改变带电粒子束的焦距的装置和方法，该方法包括响应于控制信号电压值与带电粒子束的焦距之间的关系改变控制信号的步骤。

公开(公告)号：US20060216839A1

公开(公告)日：2006-09-28

申请号：US11350516

申请日：2006-02-09

Applicant: Dror Shemesh ,  Michal Eilon ,  Hen Doozli ,  Ekaterina Rechav ,  Eitan Binyamini

Inventor： Dror Shemesh ,  Michal Eilon ,  Hen Doozli ,  Ekaterina Rechav ,  Eitan Binyamini

IPC: H01L21/66 ,  G01R31/26

CPC classification number: H01L22/12

Abstract: A method for evaluating a cleanliness of a tool, the method includes: receiving a wafer; cleaning the wafer; placing the wafer into the tool for a predefined period; removing the wafer from the tool, performing a contact angle measurement and determining the cleanliness of the wafer.

公开(公告)号：US20060049349A1

公开(公告)日：2006-03-09

申请号：US10530159

申请日：2003-10-08

Applicant: Dror Shemesh

Inventor： Dror Shemesh

IPC: G21K7/00 ,  G01N23/00

CPC classification number: G01N23/2252

Abstract: Systems and methods for process monitoring based upon X-ray emission induced by a beam of charged particles such as electrons or ions. Concept as expressed herein.

Abstract translation: 基于由诸如电子或离子的带电粒子束引起的X射线发射的过程监测的系统和方法。 概念如本文所述。