公开(公告)号：US07912657B2

公开(公告)日：2011-03-22

申请号：US11877125

申请日：2007-10-23

Applicant: Dror Shemesh ,  Yuri Shirman

Inventor： Dror Shemesh ,  Yuri Shirman

IPC: G01B5/28 ,  G01K1/08

CPC classification number: G01N23/2276

Abstract: A system for providing a compensated Auger spectrum, the system includes: a processor, adapted to generate a compensated Auger spectrum in response to a non-compensated Auger spectrum and in response to an electric potential related parameter, and an interface to an electron detector that is adapted to detect electrons emitted from the first area, wherein the interface is connected to the processor, and wherein the electric potential related parameter reflects a state of a first area of an object that was illuminated by a charged particle beam during the generation of the non-compensated Auger spectrum.

Abstract translation: 一种用于提供经补偿的俄歇频谱的系统，该系统包括：处理器，适于响应于未补偿的俄歇频谱和响应于电位相关参数产生经补偿的俄歇频谱，以及与电子检测器的接口， 适于检测从所述第一区域发射的电子，其中所述界面连接到所述处理器，并且其中所述电位相关参数反映在所述第一区域生成期间被带电粒子束照射的物体的第一区域的状态 非补偿俄歇谱。

公开(公告)号：US07161158B2

公开(公告)日：2007-01-09

申请号：US10492393

申请日：2002-10-09

Applicant: Dror Shemesh ,  Dubi Shachal

Inventor： Dror Shemesh ,  Dubi Shachal

IPC: H01J3/14 ,  H01J37/21 ,  H01J3/28 ,  H01J37/256

CPC classification number: H01J37/21 ,  H01J37/153 ,  H01J37/22 ,  H01J37/241 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/1501

Abstract: An apparatus and method for fast changing a focal length of a charged particle beam the method comprising the step of changing a control signal in response to a relationship between the control signal voltage value and the focal length of the charged particle beam.

Abstract translation: 一种用于快速改变带电粒子束的焦距的装置和方法，该方法包括响应于控制信号电压值与带电粒子束的焦距之间的关系改变控制信号的步骤。

公开(公告)号：US20060216839A1

公开(公告)日：2006-09-28

申请号：US11350516

申请日：2006-02-09

Applicant: Dror Shemesh ,  Michal Eilon ,  Hen Doozli ,  Ekaterina Rechav ,  Eitan Binyamini

Inventor： Dror Shemesh ,  Michal Eilon ,  Hen Doozli ,  Ekaterina Rechav ,  Eitan Binyamini

IPC: H01L21/66 ,  G01R31/26

CPC classification number: H01L22/12

Abstract: A method for evaluating a cleanliness of a tool, the method includes: receiving a wafer; cleaning the wafer; placing the wafer into the tool for a predefined period; removing the wafer from the tool, performing a contact angle measurement and determining the cleanliness of the wafer.

公开(公告)号：US20060049349A1

公开(公告)日：2006-03-09

申请号：US10530159

申请日：2003-10-08

Applicant: Dror Shemesh

Inventor： Dror Shemesh

IPC: G21K7/00 ,  G01N23/00

CPC classification number: G01N23/2252

Abstract: Systems and methods for process monitoring based upon X-ray emission induced by a beam of charged particles such as electrons or ions. Concept as expressed herein.

Abstract translation: 基于由诸如电子或离子的带电粒子束引起的X射线发射的过程监测的系统和方法。 概念如本文所述。

公开(公告)号：US20120241605A1

公开(公告)日：2012-09-27

申请号：US13460470

申请日：2012-04-30

Applicant: Dror Shemesh

Inventor： Dror Shemesh

IPC: H01J37/26

CPC classification number: H01J37/28 ,  H01J2237/057 ,  H01J2237/2814

Abstract: A method for improving the resolution of a scanning electron microscope, the method including: defining an energy band in response to an expected penetration depth of secondary electrons in an object; illuminating the object with a primary electron beam; and generating images from electrons that arrive at a spectrometer having an energy within the energy band. A scanning electron microscope that includes: a stage for supporting an object; a controller, adapted to receive or define an energy band an energy band in response to an expected penetration depth of secondary electrons in an object; illumination optics adapted to illuminate the object with a primary electron beam; a spectrometer; controlled by the controller so as to selectively reject electrons in response to the defined energy band; and a processor that is adapted to generate images from detection signals provided by the spectrometer.

Abstract translation: 一种用于提高扫描电子显微镜的分辨率的方法，所述方法包括：响应于对象中二次电子的预期穿透深度来定义能带; 用一次电子束照射物体; 以及从能量到达具有能带内的光谱仪的电子产生图像。 一种扫描电子显微镜，包括：用于支撑物体的台; 控制器，适于响应于物体中二次电子的预期穿透深度而接收或限定能带的能带; 适于用一次电子束照射物体的照明光学器件; 光谱仪 由控制器控制，以响应于限定的能带选择性地拒绝电子; 以及适于根据由该光谱仪提供的检测信号产生图像的处理器。

公开(公告)号：US07312446B2

公开(公告)日：2007-12-25

申请号：US10530159

申请日：2003-10-08

Applicant: Dror Shemesh

Inventor： Dror Shemesh

IPC: G01N23/00

CPC classification number: G01N23/2252

Abstract: Systems and methods for process monitoring based upon X-ray emission induced by a beam of charged particles such as electrons or ions. Concept as expressed herein.

Abstract translation: 基于由诸如电子或离子的带电粒子束引起的X射线发射的过程监测的系统和方法。 概念如本文所述。

公开(公告)号：US07233008B1

公开(公告)日：2007-06-19

申请号：US11080036

申请日：2005-03-14

Applicant: Igor Petrov ,  Dror Shemesh

Inventor： Igor Petrov ,  Dror Shemesh

IPC: G03B27/54 ,  G03B27/42

CPC classification number: G03B27/42 ,  G03B27/54

Abstract: A inspection system includes: a lens arrangement adapted to generate a substantially symmetrical electrostatic field about an optical axis and to direct a primary electron beam towards an object that is oriented in relation to the optical axis at a non-normal angle; and at least on additional electrode, positioned outside the lens arrangement such as to increase symmetry of an electromagnetic field in the vicinity of an interaction point between the primary electron beam and the object. A method for inspecting an object includes: passing a primary electron beam, along an optical axis, through a substantially symmetrical electrostatic field defined within an electron lens arrangement; and propagating the primary electron beam from the lens arrangement towards an interaction point with an object that is oriented in relation to the optical axis at a non-normal angle, while maintaining, by at least one additional electrode positioned outside the lens arrangement, a substantially symmetrical electrical field in a vicinity of the interaction point.

Abstract translation: 检查系统包括：透镜装置，其适于产生围绕光轴的基本上对称的静电场，并且将一次电子束引向朝向相对于光轴以非正常角度取向的物体; 并且至少在位于透镜装置外部的另外的电极上，以增加电子束在一次电子束和物体之间的相互作用点附近的对称性。 用于检查物体的方法包括：使沿着光轴的一次电子束通过限定在电子透镜装置内的基本上对称的静电场; 并且将来自透镜装置的一次电子束传播到与以非正常角度相对于光轴定向的物体的相互作用点，同时通过位于透镜装置外部的至少一个附加电极基本上 在相互作用点附近的对称电场。

公开(公告)号：US06900065B2

公开(公告)日：2005-05-31

申请号：US10327398

申请日：2002-12-19

Applicant: Vicky Rashkovan ,  Dror Shemesh

Inventor： Vicky Rashkovan ,  Dror Shemesh

IPC: G01R31/311 ,  H01L23/544 ,  H01L21/66 ,  G01R31/08 ,  G01R31/26

CPC classification number: H01L22/34 ,  G01R31/311

Abstract: An apparatus and a method for electrically testing a semiconductor wafer, the method including: (i) depositing electrical charges at certain points of a test pattern; (ii) scanning at least a portion of the test pattern such as to enhance charge differences resulting from defects; and (iii) collecting charged particles emitted from the at least scanned portion as a result of the scanning, thus providing an indication about an electrical state of the respective test structure.

Abstract translation: 一种用于电测试半导体晶片的装置和方法，所述方法包括：（i）在测试图案的某些点放置电荷; （ii）扫描至少一部分测试图案，以增强由缺陷导致的电荷差异; 和（iii）作为扫描的结果收集从至少扫描的部分发射的带电粒子，从而提供关于各个测试结构的电状态的指示。

公开(公告)号：US06670610B2

公开(公告)日：2003-12-30

申请号：US10005190

申请日：2001-11-26

Applicant: Dror Shemesh ,  Ariel Ben-Porath ,  Dubi Shachal ,  Alexey Stepanov

Inventor： Dror Shemesh ,  Ariel Ben-Porath ,  Dubi Shachal ,  Alexey Stepanov

IPC: H01J3726

CPC classification number: H01J37/3056 ,  H01J37/304 ,  H01J2237/28

Abstract: A system and method for directing the object, such as a semiconductor die. The system includes a first images such as a scanning electron microscope, a stage for moving the object and a second imager and miller such as a focused ion beam generator. The object is images to locate a desired location in which the object is to be milled and a landmark that is utilized for directing the miller. The system can include additional steps of milling, analyzing and movement of the object.

公开(公告)号：US07847267B2

公开(公告)日：2010-12-07

申请号：US10502104

申请日：2003-10-22

Applicant: Dror Shemesh ,  Pavel Adamec

Inventor： Dror Shemesh ,  Pavel Adamec

IPC: H01J37/244

CPC classification number: H01J37/244 ,  G01N23/2251 ,  H01J37/28 ,  H01J2237/24465 ,  H01J2237/24475 ,  H01J2237/2449 ,  H01J2237/24495 ,  H01J2237/281 ,  H01J2237/2815 ,  H01J2237/2817

Abstract: A system and method for multi detector detection of electrons, the method includes the steps of directing a primary electron beam, through a column, to interact with an inspected object, directing, by introducing a substantial electrostatic field, electrons reflected or scattered from the inspected objects towards multiple interior detectors, whereas at least some of the directed electrons are reflected or scattered at small angle in relation to the inspected object; and receiving detection signals from at least one interior detector.

Abstract translation: 一种用于电子的多检测器检测的系统和方法，该方法包括以下步骤：通过列引导一次电子束与检测对象相互作用，通过引入实质的静电场来引导从检查的反射或散射的电子 物体朝向多个内部检测器，而至少一些定向电子相对于被检查物体以小角度反射或散射; 以及从至少一个内部检测器接收检测信号。