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    Release layers and compositions for forming the same
    36.
    发明授权
    Release layers and compositions for forming the same 失效
    用于形成它们的剥离层和组合物

    公开(公告)号：US06342324B1

    公开(公告)日：2002-01-29

    申请号：US09504461

    申请日：2000-02-16

    Applicant: Minyu Li ,  M. Zaki Ali ,  Eric D. Morrison ,  Charles W. Simpson ,  Leonard J. Stulc ,  Ramnath Subramaniam ,  Jiayi Zhu

    Inventor： Minyu Li ,  M. Zaki Ali ,  Eric D. Morrison ,  Charles W. Simpson ,  Leonard J. Stulc ,  Ramnath Subramaniam ,  Jiayi Zhu

    IPC: G03G5147

    CPC classification number: G03G5/14773 ,  C09D183/04 ,  C08L83/00

    Abstract: Release compositions include (a) from zero to about 30 parts by weight of a polymer selected from the group consisting of wherein R1, R2, R3, R6, R7, R10, R11, and R12 are each independently selected from an alkyl group, an alkenyl group, an aryl group, and an aralkyl group, such that at least one of R6 and R7 is an alkenyl group, l, m, and n are each independently an integer so long as the polymer contains greater than 3 mol % vinyl-containing siloxane groups; a (vinyl siloxy)(siloxy)-modified silica having a vinyl content of at least about 0.4 vinyl equivalent/kg; and a combination thereof; (b) more than about 20 parts by weight of a polymer having the formula wherein R13, R14, R15, R18, R19, R22, R23, and R24 are each independently selected from an alkyl group, an alkenyl group, an aryl group, and an aralkyl group, such that at least two of R13, R14, R15, R18, R19, R22, R23, and R24 are alkenyl groups, p, q, and r are each independently integers so long as the polymer has less than 3 mol % vinyl-containing siloxane groups; and (c) up to about 20 parts by weight of a cross-linking agent of the formula wherein R36, R37, R38, R43, R44, and R45 are each independently selected from hydrogen, an alkyl group, an aryl group, and an aralkyl group, X is O, or a divalent organic linking group, and s and t are independently integers so long as there are at least two functional groups capable of cross-linking per molecule.

    Abstract translation: 脱模剂组合物包括（a）从0至约30重量份的选自由以下组成的组的聚合物：R1，R2，R3，R6，R7，R10，R11和R12各自独立地选自烷基，烯基 基团，芳基和芳烷基，使得R 6和R 7中的至少一个为烯基，l，m和n各自独立地为整数，只要该聚合物含有大于3摩尔％的含乙烯基的 硅氧烷基团; 具有至少约0.4乙烯当量/ kg的乙烯基含量的（乙烯基甲硅烷氧基）（甲硅烷氧基） - 改性二氧化硅; 及其组合;（b）大于约20重量份的具有式R 13，R 14，R 15，R 18，R 19，R 22，R 23和R 24的聚合物各自独立地选自烷基，烯基， 芳基和芳烷基，使得R 13，R 14，R 15，R 18，R 19，R 22，R 23和R 24中的至少两个是烯基，p，q和r各自独立地为整数，只要聚合物 具有少于3摩尔％的含乙烯基的硅氧烷基团; 和（c）最多约20重量份的式R 36，R 37，R 38，R 43，R 44和R 45的交联剂各自独立地选自氢，烷基，芳基和芳烷基 基团，X为O或二价有机连接基团，且t和t独立地为整数，只要每分子具有至少两个能够交联的官能团即可。

    Photographic elements comprising antistatic layers
    38.
    发明授权
    Photographic elements comprising antistatic layers 失效
    摄影元件包括抗静电层

    公开(公告)号：US5529893A

    公开(公告)日：1996-06-25

    申请号：US507548

    申请日：1995-07-26

    Applicant: Alberto Valsecchi ,  Elio Martino ,  Paola Puppo ,  Eric D. Morrison

    Inventor： Alberto Valsecchi ,  Elio Martino ,  Paola Puppo ,  Eric D. Morrison

    IPC: C08L67/00 ,  C08L67/02 ,  C09D167/00 ,  C09D167/02 ,  G03C1/30 ,  G03C1/795 ,  G03C1/89

    CPC classification number: G03C1/301 ,  G03C1/89

    Abstract: Light-sensitive photographic element comprising a polymeric film base, a silver halide emulsion layer, and an antistatic layer comprising a low viscosity and highly sulfonated water soluble polyacetal (preferably obtained by reaction of a low viscosity polyvinyl alcohol and a sulfonated aldehyde), a hydrophobic binder selected from the group consisting of a water dispersible sulfopolyester and a latex polymer having hydrophilic functionality, and a polyfunctional aldehyde crosslinking agent. The antistatic layer may be present as a backing layer on the side of the base opposite the silver halide emulsion layer, as a subbing layer between the base and the emulsion layer in a single or double side coated photographic element, and/or as a subbing layer between the base and a different backing layer.

    Abstract translation: 包含聚合物膜基材，卤化银乳剂层和抗静电层的感光照相元件包括低粘度和高度磺化的水溶性聚缩醛（优选通过低粘度聚乙烯醇和磺化醛的反应获得），疏水性 选自水分散性磺基聚酯和具有亲水性官能团的胶乳聚合物的组合物和多官能醛交联剂。 抗静电层可以作为背衬层存在于与卤化银乳剂层相对的一侧上，作为在单面或双面涂布的照相元件中的基底和乳剂层之间的底层，和/或作为底层 基底和不同背衬层之间的层。

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