DEEP TRENCH ISOLATION STRUCTURES WITH A SUBSTRATE CONNECTION

    公开(公告)号:US20230335583A1

    公开(公告)日:2023-10-19

    申请号:US17723665

    申请日:2022-04-19

    CPC classification number: H01L29/0649 H01L21/762

    Abstract: Semiconductor structures including a deep trench isolation structure and methods of forming a semiconductor structure including a deep trench isolation structure. The semiconductor structure includes a semiconductor substrate having a device region, and a deep trench isolation structure in the semiconductor substrate. The deep trench isolation structure further includes a first portion, a second portion adjacent to the first portion, and a conductor layer in the first portion and the second portion. The conductor layer in the first portion of the deep trench isolation structure surrounds the device region. The conductor layer in the second portion of the deep trench isolation structure defines an electrical connection to the semiconductor substrate.

    THREE TERMINAL MEMORY CELLS AND METHOD OF MAKING THE SAME

    公开(公告)号:US20230320104A1

    公开(公告)日:2023-10-05

    申请号:US17657363

    申请日:2022-03-31

    CPC classification number: H01L27/2436 H01L45/1253 H01L45/1608

    Abstract: The disclosed subject matter relates generally to memory devices and a method of forming the same. More particularly, the present disclosure relates to three terminal resistive random-access (ReRAM) memory structures having two bottom electrodes and one top electrode. The present disclosure provides a structure including a first bottom electrode having an upper surface, a second bottom electrode having an upper surface, a switching layer on the upper surface of the first electrode and the upper surface of the second electrode, an oxygen enhancement layer on the switching layer, and a top electrode on the oxygen enhancement layer, the top electrode is positioned above the first bottom electrode and the second bottom electrode.

    CIRCUIT STRUCTURE AND RELATED MULTI-TIME PROGRAMMABLE (MTP) MEMORY CELL

    公开(公告)号:US20230301087A1

    公开(公告)日:2023-09-21

    申请号:US17694846

    申请日:2022-03-15

    CPC classification number: H01L27/11558

    Abstract: Embodiments of the disclosure provide a circuit structure and related multi-time programmable (MTP) memory cell. The circuit structure may include a transistor having a floating gate over a semiconductor channel and a control gate on the dielectric layer. The control gate is electrically coupled to a word line. The control gate is capacitively coupled to the floating gate. A metal-insulator-metal (MIM) capacitor includes a first electrode coupled to the word line and a second electrode coupled to the floating gate of the transistor.

    Magnetic field sensor and methods of fabricating a magnetic field sensor

    公开(公告)号:US11762042B2

    公开(公告)日:2023-09-19

    申请号:US17105675

    申请日:2020-11-27

    CPC classification number: G01R33/077 H10N50/85 H10N52/01 H10N52/101

    Abstract: A magnetic field sensor may include a semiconductor structure having a planar surface, and first, second, and third sensing devices. The semiconductor structure may include a semiconductor member having a two-dimensional electron gas therein, and an insulator member disposed on the semiconductor member. The first sensing device may be configured to sense magnetic field along a first axis parallel to the planar surface. The second sensing device may be configured to sense magnetic field along a second axis parallel to the planar surface, and orthogonal to the first axis. The third sensing device may be configured to sense a magnetic field along a third axis normal to the planar surface. Each of the first, second, and third sensing devices may be formed in the semiconductor structure and may include electrodes that extend from the insulator member to the two-dimensional electron gas.

Patent Agency Ranking