Semiconductor device with passivated magnetic concentrator

    公开(公告)号:US11864471B2

    公开(公告)日:2024-01-02

    申请号:US17514820

    申请日:2021-10-29

    Abstract: A described example includes: a semiconductor die including a Hall sensor arranged in a first plane that is parallel to a device side surface of the semiconductor die; a passivated magnetic concentrator including a magnetic alloy layer formed over the device side surface of the semiconductor die, the upper surface of the magnetic alloy layer covered by a layer of polymer material; a backside surface of the semiconductor die opposite the device side surface mounted to a die side surface of a die pad on a package substrate, the semiconductor die having bond pads on the device side surface spaced from the magnetic concentrator; electrical connections coupling the bond pads of the semiconductor die to leads of the package substrate; and mold compound covering the magnetic concentrator, the semiconductor die, the electrical connections, a portion of the leads, and the die side surface of the die pad.

    HALL SENSOR AND MANUFACTURING METHOD OF HALL SENSOR

    公开(公告)号:US20230296699A1

    公开(公告)日:2023-09-21

    申请号:US18051923

    申请日:2022-11-02

    Applicant: ROHM Co., LTD.

    Inventor: Hirotoshi Kubo

    CPC classification number: G01R33/07 H10N52/101 H10N52/01

    Abstract: Disclosed herein is a Hall sensor including a Hall element having a first principal surface, and a first magnetic body arranged on a side of the first principal surface, in which the first magnetic body has a first surface facing the first principal surface, and an area of a projection surface of the first magnetic body when viewed in plan from an opposite side of the Hall element is larger than an area of the first surface.

    HALL SENSOR WITH PERFORMANCE CONTROL
    8.
    发明公开

    公开(公告)号:US20230165165A1

    公开(公告)日:2023-05-25

    申请号:US18094631

    申请日:2023-01-09

    Inventor: Keith R. Green

    CPC classification number: H10N52/80 H10N52/101 H10B61/00

    Abstract: A Hall sensor includes a Hall well, such as an implanted region in a surface layer of a semiconductor structure, and four doped regions spaced apart from one another in the implanted region. The implanted region and the doped regions include majority carriers of the same conductivity type. The sensor also includes a dielectric layer that extends over the implanted region, and an electrode layer over the dielectric layer to operate as a control gate to set or adjust the sensor performance. A first supply circuit provides a first bias signal to a first pair of the terminals, and a second supply circuit provides a second bias signal to the electrode layer.

    Hall Sensor Using Face Down Structure with Through Substrate Vias

    公开(公告)号:US20240210497A1

    公开(公告)日:2024-06-27

    申请号:US18146447

    申请日:2022-12-26

    CPC classification number: G01R33/077 H10N52/01 H10N52/101

    Abstract: An integrated circuit (IC) package comprises a semiconductor die having a first surface with a Hall-effect sensor circuit and a second surface. A plurality of through substrate vias (TSV) each having a metal layer extend from the first surface of the semiconductor die to the second surface. The IC package includes a portion of a leadframe having a first set of leads and a second set of leads. The first set of leads provide a field generating current path for directing a magnetic field toward the Hall-effect sensor circuit. The second set of leads are attached to bond pads on the semiconductor die. A first side of an insulator is attached to the leadframe using a die attach material, and a second side of the insulator is attached to the first side of the semiconductor die using a bonding material.

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