SPRING ARM LIFT SYSTEMS
    33.
    发明申请
    SPRING ARM LIFT SYSTEMS 失效
    弹簧臂系统

    公开(公告)号:US20110278424A1

    公开(公告)日:2011-11-17

    申请号:US12945068

    申请日:2010-11-12

    IPC分类号: H05K7/00

    摘要: A display positioning apparatus is provided for lifting, supporting, and/or positioning a load, such as a display. The apparatus includes a base and a lift arm adapted to couple to a display, the lift arm pivotally coupled to the base providing a range of travel. A balance mechanism is operatively coupled to the lift arm and the base to counterbalance the lift arm and display. In some cases the balance mechanism includes a torquing spring member to counterbalance the lift arm and an attached display along the range of travel.

    摘要翻译: 提供显示定位装置,用于提升,支撑和/或定位诸如显示器的负载。 该装置包括基座和适于联接到显示器的提升臂,提升臂枢转地联接到基座,提供行程范围。 平衡机构可操作地联接到提升臂和底座以平衡提升臂和显示器。 在一些情况下,平衡机构包括扭力弹簧构件,以抵抗升降臂和沿行程范围的附接显示器。

    INTERVERTEBRAL IMPLANT
    34.
    发明申请

    公开(公告)号:US20100094421A1

    公开(公告)日:2010-04-15

    申请号:US12574222

    申请日:2009-10-06

    IPC分类号: A61F2/44

    摘要: The intervertebral implant is in the form of a three-dimensional structure (10) comprising (a) a top side (1) and an underside (2) which are designed to rest against the end plates of two adjacent vertebras, (b) a left side face (3) and a right side face (4), (c) a front face (5) and a rear face (6), (d) a horizontal center plane situated between the top side (1) and the underside (2), (e) a vertical center plane (8) situated between the left side face (3) and the right side face (8) and (f) a plurality of boreholes (9) passing through the implant structure (10) that are designed to receive longitudinal affixation elements (20), the axes (19) of said elements intersecting the horizontal center plane (7). At least one of the boreholes (9) is designed in a manner that the affixation element (10) received in it can be rigidly connected to the intervertebral implant. Said connection is implemented using a thread or by matching conical surfaces.

    摘要翻译: 椎间植入物为三维结构(10)的形式,包括(a)顶侧(1)和下侧(2),其被设计成抵靠两个相邻椎骨的端板,(b) 左侧面(3)和右侧面(4),(c)前面(5)和后面(6),(d)位于上侧(1)和下侧 (2),(e)位于左侧面(3)和右侧面(8)之间的垂直中心平面(8)和(f)穿过植入结构(10)的多个钻孔(9) 被设计成接收纵向固定元件(20),所述元件的轴线(19)与水平中心平面(7)相交。 钻孔(9)中的至少一个被设计成使得其中容纳的固定元件(10)可以刚性地连接到椎间植入物。 所述连接使用螺纹或通过匹配锥形表面来实现。

    EDUCATIONAL KIT FOR TEACHING CONSTRUCTION FRAMING
    35.
    发明申请
    EDUCATIONAL KIT FOR TEACHING CONSTRUCTION FRAMING 失效
    教学建筑框架教学工具包

    公开(公告)号:US20060019221A1

    公开(公告)日:2006-01-26

    申请号:US10894602

    申请日:2004-07-20

    申请人: John Cain

    发明人: John Cain

    IPC分类号: G09B25/00

    CPC分类号: G09B25/04

    摘要: An instructional kit suited for teaching the necessary materials, methods and techniques for conventional stick built wood structures is provided. In accordance with the present invention, a kit for stick framing a true representation of a scale house model includes all of the framing members required to build a scale model house. Specifically, the kit includes precut framing members representing each of the correct members used in actual residential construction such as studs, rafters, sills, top plates, headers, etc. Also included in the kit are wall layout plans and detailed instructions regarding the proper construction of a residential house. The intent of the kit is to provide a self contained educational tool for teaching the necessary understanding of structural wood framing.

    摘要翻译: 提供了一种适用于教授常规棒木结构的必要材料,方法和技术的教学套件。 根据本发明,一种用于制作比例尺模型的真实表示的棒的套件包括构建比例模型房屋所需的所有框架构件。 具体来说,该套件包括表示在实际住宅建筑中使用的每个正确构件的预制框架构件,例如螺柱,椽子,窗台,顶板,头部等。套件中还包括壁布局图和关于适当构造的详细说明 的住宅。 该套件的目的是提供一个独立的教学工具,用于教授对结构木框架的必要了解。

    Baffle system for tank
    36.
    发明授权
    Baffle system for tank 失效
    挡泥板系统

    公开(公告)号:US5779092A

    公开(公告)日:1998-07-14

    申请号:US787519

    申请日:1997-01-22

    摘要: The tank and baffle system comprises a tank for transporting liquids, having a plurality of baffles for controlling surges and excess liquid movement produced by movement of the tank. The present invention is particularly useful where there is a large ratio of tank width to tank support and lateral bending loads may be in excess of longitudinal bending. The baffles are rigidly secured to a tunnel structure that spans longitudinally from the front to the rear of the tank, and forms a continuous structure in both longitudinal and transverse directions. A further aspect of the invention is the use of chamfered corners on the baffle plates to provide fluid communication between chambers of the tank, as well as to reduce surging of the liquid contents and reduce or eliminate joint fatigue. Access ports in the baffles that are covered by access covers during use are another aspect of the invention.

    摘要翻译: 罐和挡板系统包括用于输送液体的罐,具有用于控制浪涌的多个挡板和由罐的移动产生的过量的液体运动。 如果罐宽与罐支架的比率大,横向弯曲载荷可能超过纵向弯曲,本发明特别有用。 挡板刚性地固定到从罐的前部到后部纵向延伸的隧道结构,并且在纵向和横向方向上形成连续的结构。 本发明的另一方面是在挡板上使用倒棱角来提供罐的腔室之间的流体连通,以及减少液体内容物的浪涌并减少或消除接合疲劳。 在使用过程中被通道盖覆盖的挡板中的进入端口是本发明的另一方面。

    Integrated-circuit processing with progressive intermetal-dielectric
deposition
    37.
    发明授权
    Integrated-circuit processing with progressive intermetal-dielectric deposition 失效
    具有渐进式金属间电介质沉积的集成电路处理

    公开(公告)号:US5286518A

    公开(公告)日:1994-02-15

    申请号:US876276

    申请日:1992-04-30

    CPC分类号: C23C16/505 H01L21/76801

    摘要: A semiconductor processing method provides for plasma-enhanced chemical-vapor deposition (PECVD) for intermetal dielectrics while minimizing risk of gate oxide impairment due to plasma discharge. A protective oxide sublayer is deposited without using high-power PECVD. The protective sublayer can be deposited by using chemical-vapor deposition (CVD) without plasma enhancement or by a lower-power PECVD. In the latter case, the initial rf power of the plasma is selected to be low enough to ensure that the gate oxide is not breached in the event of a plasma discharge. The protective sublayer can be thick enough to maintain its integrity in the event of a plasma discharge even during a higher-power PECVD deposition.

    摘要翻译: 半导体处理方法为等离子体增强化学气相沉积(PECVD)提供了金属间电介质,同时最小化由于等离子体放电引起的栅极氧化物损伤的风险。 在不使用大功率PECVD的情况下沉积保护性氧化物层。 可以通过使用不具有等离子体增强的化学气相沉积(CVD)或通过较低功率的PECVD来沉积保护子层。 在后一种情况下,等离子体的初始rf功率被选择为足够低以确保栅极氧化物在等离子体放电的情况下不被破坏。 即使在较高功率的PECVD沉积期间,即使在等离子体放电的情况下,保护子层可以足够厚以保持其完整性。