公开(公告)号：US06660063B2

公开(公告)日：2003-12-09

申请号：US10147145

申请日：2002-05-16

Applicant: Glenn M. Tom ,  James V. McManus ,  Luping Wang ,  W. Karl Olander

Inventor： Glenn M. Tom ,  James V. McManus ,  Luping Wang ,  W. Karl Olander

IPC: B01D5304

CPC classification number: B01D53/0415 ,  B01D53/0407 ,  B01D53/053 ,  B01D2253/10 ,  B01D2253/102 ,  B01D2253/104 ,  B01D2253/106 ,  B01D2253/1085 ,  B01D2253/202 ,  B01D2258/0216 ,  B01D2259/40003 ,  B01D2259/4009 ,  B01D2259/40094 ,  B01D2259/40098 ,  B01D2259/4525 ,  B01D2259/455 ,  B01J20/20 ,  F17C7/00 ,  F17C11/00 ,  F17C13/04 ,  F17C13/045 ,  F17C2201/0109 ,  F17C2201/0114 ,  F17C2201/058 ,  F17C2205/0329 ,  F17C2205/0338 ,  F17C2205/0341 ,  F17C2205/035 ,  F17C2205/0385 ,  F17C2205/0391 ,  F17C2223/0123 ,  F17C2223/033 ,  F17C2223/035 ,  F17C2227/044 ,  F17C2250/043 ,  F17C2270/0518 ,  F17D1/04

Abstract: A capacity increase and/or pressure decrease of gas in a gas storage and dispensing vessel is achieved by use of a physical adsorbent having sorptive affinity for the gas. Such approach enables conventional high pressure gas cylinders to be redeployed with contained sorbent, to achieve substantial enhancement of safety and capacity.

Abstract translation: 通过使用对气体具有吸附亲和力的物理吸附剂来实现气体储存和分配容器中的气体的容量增加和/或压力降低。 这种方法使传统的高压气瓶能够与所含的吸附剂重新部署，以实现安全性和容量的显着增强。

公开(公告)号：US06453924B1

公开(公告)日：2002-09-24

申请号：US09624478

申请日：2000-07-24

Applicant: Luping Wang ,  Terry A. Tabler ,  James A. Dietz

Inventor： Luping Wang ,  Terry A. Tabler ,  James A. Dietz

IPC: F17C1100

CPC classification number: F17D1/04 ,  F17C11/00 ,  F17C13/04 ,  F17C2205/0146 ,  F17C2205/0323 ,  F17C2205/0338 ,  F17C2221/05 ,  F17C2223/0153 ,  F17C2223/033 ,  F17C2250/032 ,  F17C2250/0626 ,  F17C2250/0636 ,  F17C2265/01 ,  F17C2270/0518 ,  Y10T137/0318 ,  Y10T137/4807 ,  Y10T137/6416 ,  Y10T137/86187

Abstract: A fluid distribution system for supplying a gas to a process facility such as a semiconductor manufacturing plant. The system includes a main fluid supply vessel coupled by flow circuitry to a local sorbent-containing supply vessel from which fluid, e.g., low pressure compressed gas, is dispensed to a fluid-consuming unit, e.g., a semiconductor manufacturing tool. A fluid pressure regulator is disposed in the flow circuitry or the main liquid supply vessel and ensures that the gas flowed to the fluid-consuming unit is at desired pressure. The system and associated method are particularly suited to the supply and utilization of liquefied compressed gases such as trimethylsilane, arsine, phosphine, and dichlorosilane.

Abstract translation: 一种用于向诸如半导体制造工厂之类的处理设备供应气体的流体分配系统。 该系统包括通过流动回路耦合到局部吸附剂的供应容器的主要流体供应容器，从该液体供应容器将诸如低压压缩气体的流体从其分配到诸如半导体制造工具的流体消耗单元。 流体压力调节器设置在流动回路或主液体供应容器中，并且确保流到流体消耗单元的气体处于期望的压力。 该系统和相关方法特别适用于供应和利用液化压缩气体如三甲基硅烷，胂，膦和二氯硅烷。

公开(公告)号：US6101816A

公开(公告)日：2000-08-15

申请号：US67393

申请日：1998-04-28

Applicant: Luping Wang ,  Glenn M. Tom

Inventor： Luping Wang ,  Glenn M. Tom

IPC: C23C14/24 ,  C23C16/448 ,  F17C1/00 ,  F17C7/00 ,  F17C7/02 ,  F17C7/04 ,  F17C9/02 ,  F17C11/00 ,  F17C13/00 ,  F17C13/02 ,  F17C13/04 ,  H01L21/205 ,  H01L21/265 ,  H01L21/306

CPC classification number: F17C7/02 ,  B01D53/0407 ,  B01D53/0415 ,  B01D53/053 ,  B01J20/20 ,  F17C1/00 ,  F17C11/00 ,  F17C11/005 ,  F17C13/02 ,  F17C13/025 ,  F17C13/04 ,  F17C13/045 ,  F17C7/00 ,  F17D1/04 ,  B01D2253/10 ,  B01D2253/102 ,  B01D2253/104 ,  B01D2253/106 ,  B01D2253/1085 ,  B01D2253/202 ,  B01D2258/0216 ,  B01D2259/40003 ,  B01D2259/4009 ,  B01D2259/40094 ,  B01D2259/40098 ,  B01D2259/4525 ,  B01D2259/455 ,  F17C2201/0109 ,  F17C2201/0114 ,  F17C2201/058 ,  F17C2205/0329 ,  F17C2205/0338 ,  F17C2205/0341 ,  F17C2205/035 ,  F17C2205/0385 ,  F17C2205/0391 ,  F17C2223/0123 ,  F17C2223/033 ,  F17C2223/035 ,  F17C2250/043 ,  F17C2270/0518 ,  Y02E60/321

Abstract: A fluid storage and dispensing system comprising a vessel for holding a fluid at a desired pressure. The vessel has a pressure regulator associated with a port of the vessel, and set at a predetermined pressure. A dispensing assembly, e.g, including a flow control means such as a valve, is arranged in gas/vapor flow communication with the regulator, whereby the opening of the valve effects dispensing of gas/vapor from the vessel. The fluid in the vessel may be constituted by a liquid which is confined in the vessel at a pressure in excess of its liquefaction pressure at prevailing temperature conditions, e.g., ambient (room) temperature. A phase separator such as a gas/vapor-permeable liquid-impermeable membrane, may be associated with the regulator, as a barrier to flow of liquid into the regulator, when the contained fluid in the vessel is in a liquid state.

Abstract translation: 一种流体存储和分配系统，包括用于将流体保持在期望压力的容器。 容器具有与容器的端口相关联的压力调节器，并且设定在预定压力。 例如包括诸如阀门的流量控制装置的分配组件布置成与调节器气体/蒸气流连通，由此阀的开口实现从容器分配气体/蒸气。 容器中的流体可以由在主要温度条件例如环境（室内）温度下以超过其液化压力的压力限制在容器中的液体构成。 当容器中的所含流体处于液体状态时，诸如气体/蒸气可透过液体不可渗透膜的相分离器可与调节器相关联，作为液体流入调节器的屏障。

公开(公告)号：US6089027A

公开(公告)日：2000-07-18

申请号：US300994

申请日：1999-04-28

Applicant: Luping Wang ,  Glenn M. Tom

Inventor： Luping Wang ,  Glenn M. Tom

IPC: C23C14/24 ,  C23C16/448 ,  F17C1/00 ,  F17C7/00 ,  F17C7/02 ,  F17C7/04 ,  F17C9/02 ,  F17C11/00 ,  F17C13/00 ,  F17C13/02 ,  F17C13/04 ,  H01L21/205 ,  H01L21/265 ,  H01L21/306

CPC classification number: F17C7/02 ,  B01D53/0407 ,  B01D53/0415 ,  B01D53/053 ,  B01J20/20 ,  F17C1/00 ,  F17C11/00 ,  F17C11/005 ,  F17C13/02 ,  F17C13/025 ,  F17C13/04 ,  F17C13/045 ,  F17C7/00 ,  F17D1/04 ,  B01D2253/10 ,  B01D2253/102 ,  B01D2253/104 ,  B01D2253/106 ,  B01D2253/1085 ,  B01D2253/202 ,  B01D2258/0216 ,  B01D2259/40003 ,  B01D2259/4009 ,  B01D2259/40094 ,  B01D2259/40098 ,  B01D2259/4525 ,  B01D2259/455 ,  F17C2201/0109 ,  F17C2201/0114 ,  F17C2201/058 ,  F17C2205/0329 ,  F17C2205/0338 ,  F17C2205/0341 ,  F17C2205/035 ,  F17C2205/0385 ,  F17C2205/0391 ,  F17C2223/0123 ,  F17C2223/033 ,  F17C2223/035 ,  F17C2250/043 ,  F17C2270/0518 ,  Y02E60/321

Abstract: A fluid storage and dispensing system comprising a vessel for holding a fluid at a desired pressure. The vessel has a pressure regulator, e.g., a single-stage or multi-stage regulator, associated with a port of the vessel, and set at a predetermined pressure. A dispensing assembly, e.g., including a flow control means such as a valve, is arranged in gas/vapor flow communication with the regulator, whereby the opening of the valve effects dispensing of gas/vapor from the vessel. The fluid in the vessel may be constituted by a liquid that is confined in the vessel at a pressure in excess of its liquefaction pressure at prevailing temperature conditions, e.g., ambient (room) temperature. In another aspect, the vessel contains a solid-phase sorbent material having sorbable gas adsorbed thereon, at a pressure in excess of 50 psig. The vessel may have a >1 inch NGT threaded neck opening, to accommodate the installation of an interior regulator.

Abstract translation: 一种流体存储和分配系统，包括用于将流体保持在期望压力的容器。 容器具有压力调节器，例如与容器的端口相关联并设定在预定压力下的单级或多级调节器。 例如，包括诸如阀的流量控制装置的分配组件布置成与调节器气体/蒸汽流连通，由此阀的打开实现了从容器分配气体/蒸气。 容器中的流体可以由在主要温度条件例如环境（室内）温度下在超过其液化压力的压力下限制在容器中的液体构成。 在另一方面，容器含有在其上吸附有可吸收气体的固态吸附剂材料，压力超过50psig。 该容器可具有> 1英寸NGT螺纹颈部开口，以适应内部调节器的安装。

公开(公告)号：US07614421B2

公开(公告)日：2009-11-10

申请号：US11360732

申请日：2006-02-23

Applicant: W. Karl Olander ,  Matthew B. Donatucci ,  Luping Wang ,  Michael J. Wodjenski

Inventor： W. Karl Olander ,  Matthew B. Donatucci ,  Luping Wang ,  Michael J. Wodjenski

IPC: F16K3/36 ,  B08B9/027 ,  G05B11/01

CPC classification number: F17C13/04 ,  F17C5/00 ,  F17C2201/0109 ,  F17C2201/0119 ,  F17C2201/032 ,  F17C2201/056 ,  F17C2201/058 ,  F17C2205/0111 ,  F17C2205/0176 ,  F17C2205/0326 ,  F17C2205/0332 ,  F17C2205/0335 ,  F17C2205/0338 ,  F17C2205/0341 ,  F17C2205/0391 ,  F17C2205/0394 ,  F17C2221/012 ,  F17C2221/014 ,  F17C2221/016 ,  F17C2221/037 ,  F17C2221/05 ,  F17C2223/0123 ,  F17C2223/036 ,  F17C2225/0123 ,  F17C2225/033 ,  F17C2225/035 ,  F17C2225/038 ,  F17C2227/044 ,  F17C2227/045 ,  F17C2250/032 ,  F17C2250/043 ,  F17C2260/036 ,  F17C2260/044 ,  F17C2270/0518 ,  Y02E60/321 ,  Y10T137/0324 ,  Y10T137/0419 ,  Y10T137/2569 ,  Y10T137/4259 ,  Y10T137/7759 ,  Y10T137/7761 ,  Y10T137/7762 ,  Y10T137/7793 ,  Y10T137/8158 ,  Y10T137/87249

Abstract: Apparatus and method for dispensing a gas using a gas source coupled in selective flow relationship with a gas manifold. The gas manifold includes flow circuitry for discharging gas to a gas-using zone, and the gas source includes a pressure-regulated gas source vessel containing the gas at superatmospheric pressure. The pressure-regulated gas source vessel can be arranged with a pressure regulator at or within the vessel and a flow control valve coupled in flow relationship to the vessel, so that gas dispensed from the vessel flows through the regulator prior to flow through the flow control valve, and into the gas manifold. The apparatus and method permit an enhancement of the safety of storage and dispensing of toxic or otherwise hazardous gases used in semiconductor processes.

Abstract translation: 使用与气体歧管以选择性流动关系耦合的气体源分配气体的装置和方法。 气体歧管包括用于将气体排放到气体使用区域的流动回路，并且气体源包括在超大气压下容纳气体的压力调节气体源容器。 压力调节的气体源容器可以布置有在容器内或容器内的压力调节器，以及与容器流动关系的流量控制阀，使得从容器分配的气体在流过流量控制器之前流过调节器 阀，并进入气体歧管。 该装置和方法允许提高半导体工艺中使用的有毒或其他有害气体的储存和分配的安全性。

公开(公告)号：US20090099016A1

公开(公告)日：2009-04-16

申请号：US12158318

申请日：2006-12-19

Applicant: J. Donald Carruthers ,  Xueping Xu ,  Luping Wang

Inventor： J. Donald Carruthers ,  Xueping Xu ,  Luping Wang

IPC: D01F9/12 ,  C23C16/02 ,  C01B31/08 ,  B01J8/00

CPC classification number: B01J20/205 ,  B01J20/20 ,  B01J21/185 ,  B01J23/74 ,  B01J23/881 ,  B01J23/882 ,  B01J23/883 ,  B82Y30/00 ,  B82Y40/00 ,  C01B32/162 ,  C01B2202/02 ,  C01B2202/08 ,  C01B2202/36 ,  Y02P20/582

Abstract: A method and apparatus for manufacture of carbon nanotubes, in which a substrate is contacted with a hydrocarbonaceous feedstock containing a catalytically effective metal to deposit the feedstock on the substrate, followed by oxidation of the deposited feedstock to remove hydrocarbonaceous and carbonaceous components from the substrate, while retaining the catalytically effective metal thereon, and contacting of the substrate having retained catalytically effective metal thereon with a carbon source material to grow carbon nanotubes on the substrate. The manufacture can be carried out with a petroleum feedstock such as an oil refining atmospheric tower residue, to produce carbon nanotubes in high volume at low cost. Also disclosed is a composite including porous material having single-walled carbon nanotubes in pores thereof.

Abstract translation: 一种用于制造碳纳米管的方法和装置，其中将基底与含有催化有效金属的含烃原料接触以将原料沉积在基底上，随后氧化沉积的原料以从基底中除去含碳和碳质的组分， 同时在其上保留催化有效的金属，并且将具有保留的催化有效金属的基材与碳源材料接触以在基材上生长碳纳米管。 可以用石油原料如炼油大气塔渣进行制造，以低成本大量生产碳纳米管。 还公开了一种复合材料，其包括在其孔中具有单壁碳纳米管的多孔材料。

公开(公告)号：US07437060B2

公开(公告)日：2008-10-14

申请号：US11157733

申请日：2005-06-21

Applicant: Luping Wang ,  Thomas H. Baum ,  Chongying Xu

Inventor： Luping Wang ,  Thomas H. Baum ,  Chongying Xu

IPC: B01D7/00

CPC classification number: C23C16/4481 ,  B01D1/0082

Abstract: A delivery system for vaporizing and delivering vaporized solid and liquid precursor materials at a controlled rate having particular utility for semiconductor manufacturing applications. The system includes a vaporization vessel, a processing tool and a connecting vapor line therebetween, where the system further includes an input flow controller and/or an output flow controller to provide a controlled delivery of a vaporizable source material to the vaporization vessel and a controlled flow rate of vaporized source material to the processing tool.

Abstract translation: 一种用于以对于半导体制造应用具有特殊用途的受控速率蒸发并递送蒸发的固体和液体前体材料的输送系统。 该系统包括蒸发容器，处理工具和它们之间的连接蒸汽管线，其中系统还包括输入流量控制器和/或输出流量控制器，以向蒸发容器提供可蒸发的源材料的受控输送， 蒸发的原料流向加工工具的流量。

公开(公告)号：US20050263075A1

公开(公告)日：2005-12-01

申请号：US11157733

申请日：2005-06-21

Applicant: Luping Wang ,  Thomas Baum ,  Chongying Xu

Inventor： Luping Wang ,  Thomas Baum ,  Chongying Xu

IPC: B01D1/00 ,  B01D7/00 ,  C23C14/00 ,  C23C16/00 ,  C23C16/448

CPC classification number: C23C16/4481 ,  B01D1/0082

Abstract: A delivery system for vaporizing and delivering vaporized solid and liquid precursor materials at a controlled rate having particular utility for semiconductor manufacturing applications. The system includes a vaporization vessel, a processing tool and a connecting vapor line therebetween, where the system further includes an input flow controller and/or an output flow controller to provide a controlled delivery of a vaporizable source material to the vaporization vessel and a controlled flow rate of vaporized source material to the processing tool.

Abstract translation: 一种用于以对于半导体制造应用具有特殊用途的受控速率蒸发并递送蒸发的固体和液体前体材料的输送系统。 该系统包括蒸发容器，处理工具和它们之间的连接蒸汽管线，其中系统还包括输入流量控制器和/或输出流量控制器，以向蒸发容器提供可蒸发的源材料的受控输送， 蒸发的原料流向加工工具的流量。

公开(公告)号：US06620225B2

公开(公告)日：2003-09-16

申请号：US10043731

申请日：2002-01-10

Applicant: Luping Wang ,  Doug Neugold

Inventor： Luping Wang ,  Doug Neugold

IPC: B01D5304

CPC classification number: F17C11/007 ,  F17C11/00 ,  F17C2205/0338 ,  F17C2205/0391 ,  F17C2270/0518 ,  Y02E60/321 ,  Y10S95/90 ,  Y10S502/526

Abstract: The invention relates to a fluid storage and delivery system utilizing a porous metal matrix that comprises at least one Group VIII metal or Group IB metal therein. In one aspect of the invention, such porous metal matrix forms a solid-phase metal adsorbent medium, characterized by an average pore diameter of from about 0.5 nm to about 2.0 nm and a porosity of from about 10% to about 30%. Such solid-phase metal adsorbent medium is particularly useful for sorptively storing and desoprotively dispensing a low vapor pressure fluid, e.g., ClF3, HF, GeF4, Br2, etc. In another aspect of the invention, such porous metal matrix forms a solid-phase metal sorbent, characterized by an average pore diameter of from about 0.25 &mgr;m to about 500 &mgr;m and a porosity of from about 15% to about 95%, which can effectively immobilize low vapor pressure liquefied gas.

Abstract translation: 本发明涉及一种利用多孔金属基质的流体储存和输送系统，该多孔金属基质包含至少一种第VIII族金属或IB族金属。 在本发明的一个方面，这种多孔金属基质形成固相金属吸附剂介质，其特征在于平均孔径为约0.5nm至约2.0nm，孔隙率为约10％至约30％。 这样的固相金属吸附剂介质特别适用于吸附储存和反向分配低蒸气压流体，例如ClF 3，HF，GeF 4，Br 2等。在本发明的另一方面，这种多孔金属基质形成固相 金属吸附剂，其特征在于平均孔径为约0.25μm至约500μm，孔隙率为约15％至约95％，其可以有效地固定低蒸气压液化气体。