中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

174 records (took 0.02 seconds)

    Sulfonium salts having acid-labile groups
    31.
    发明授权
    Sulfonium salts having acid-labile groups 失效
    具有酸性组的磺酸盐

    公开(公告)号：US5191124A

    公开(公告)日：1993-03-02

    申请号：US214011

    申请日：1988-06-30

    Applicant: Reinhold Schwalm ,  Andreas Boettcher

    Inventor： Reinhold Schwalm ,  Andreas Boettcher

    IPC: C07D333/46 ,  C07C67/00 ,  C07C69/96 ,  C07C325/00 ,  C07C381/12 ,  C07F7/18 ,  C08F2/50 ,  C08F4/00 ,  C09D7/12 ,  G03F7/004 ,  G03F7/029 ,  G03F7/031

    CPC classification number: C07C381/12 ,  C07F7/1856 ,  G03F7/029

    Abstract: Sulfonium salts of the general formula ##STR1## where R.sup.1, R.sup.2 and R.sup.3 are identical or different and are aliphatic and/or aromatic radicals which may contain heteroatoms, or two of the radicals R.sup.1 and R.sup.3 are bonded to one another to form a ring, with the proviso that one or more of the radicals R.sup.1 to R.sup.3 contain one or more acid-cleavable groups, or one of the radicals R.sup.1 to R.sup.3 is bonded to one or more further sulfonium salt radicals, if desired via acid-cleavable groups, and X.sup..crclbar. is a non-nucleophilic counter-ion, are suitable as photoinitiators for cationic polymerization.

    Abstract translation: 其中R 1，R 2和R 3相同或不同并且可以含有杂原子的脂族和/或芳族基团或基团R 1和R 3中的两个彼此键合形成环，通式为“IMAGE”的锍盐， 条件是一个或多个基团R 1至R 3含有一个或多个可酸可裂解基团，或者如果需要，通过酸可裂解基团，基团R 1至R 3中的一个与一个或多个其它锍盐基团键合，以及 X（ - ）是非亲核反离子，适合用作阳离子聚合的光引发剂。

    Radiation-sensitive mixture containing acid labile groups and production of relief patterns
    32.
    发明授权
    Radiation-sensitive mixture containing acid labile groups and production of relief patterns 失效
    含有酸性可溶性组合物的辐射敏感性混合物和生产消除形式的辐射敏感性混合物

    公开(公告)号：US5073474A

    公开(公告)日：1991-12-17

    申请号：US352415

    申请日：1989-05-16

    Applicant: Reinhold Schwalm ,  Horst Binder ,  Andreas Boettcher

    Inventor： Reinhold Schwalm ,  Horst Binder ,  Andreas Boettcher

    IPC: G03F7/004 ,  G03F7/039

    CPC classification number: G03F7/0045 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/168

    Abstract: A radiation sensitive mixture suitable for producing relief patterns contains(a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and(b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and additionally a group which forms a strong acid on irradiation,wherein the polymeric binder (a) contains from 5 to 35 mol % of monomer units having acid labile groups as copolymerized or cocondensed units or acid labile groups introduced by polymer analaogous reaction.

    Abstract translation: 适用于产生浮雕图案的辐射敏感性混合物包含（a）不溶于水但可溶于碱性水溶液的聚合物粘合剂，和（b）其在碱性显影液中的溶解度通过酸的作用而增加的有机化合物， 含有至少一个酸可裂解基团，另外是在照射时形成强酸的基团，其中聚合物粘合剂（a）含有5至35摩尔％的具有酸不稳定基团的单体单元作为共聚或缩聚单元或酸不稳定基团引入 通过聚合物分析反应。

    Radiation-sensitive mixture
    33.
    发明授权
    Radiation-sensitive mixture 失效
    辐射敏感混合物

    公开(公告)号：US5035979A

    公开(公告)日：1991-07-30

    申请号：US422456

    申请日：1989-10-17

    Applicant: Son Nguyen-Kim ,  Gerhard Hoffmann ,  Reinhold Schwalm

    Inventor： Son Nguyen-Kim ,  Gerhard Hoffmann ,  Reinhold Schwalm

    IPC: G03F7/039 ,  G03F7/004 ,  H01L21/027 ,  H01L21/30

    CPC classification number: G03F7/0045

    Abstract: The invention relates to a radiation-sensitive mixture essentially consisting of(a) a water-insoluble binder or binder mixture which is soluble in aqueous alkaline solutions,(b) a compound which upon irradiation forms a strong acid and(c) one or more organic compounds which inhibit the solubility of (a) in aqueous alkaline solutions,where the organic compound (c) is a malonic acid ester.This radiation-sensitive mixture may be used to prepare photoresists.

    Abstract translation: 本发明涉及一种辐射敏感性混合物，其基本上由（a）可溶于碱性水溶液的水不溶性粘合剂或粘合剂混合物组成，（b）在照射时形成强酸的化合物和（c）一种或多种 抑制（a）在碱性水溶液中的溶解度的有机化合物，其中有机化合物（c）是丙二酸酯。 该辐射敏感性混合物可用于制备光致抗蚀剂。

Patent Agency Ranking