公开(公告)号：US06906847B2

公开(公告)日：2005-06-14

申请号：US10305536

申请日：2002-11-26

Applicant: Andrew G. Huibers ,  Satyadev R. Patel

Inventor： Andrew G. Huibers ,  Satyadev R. Patel

IPC: B81B3/00 ,  B81B7/00 ,  B81C1/00 ,  B81C99/00 ,  G02B26/08 ,  G02B26/00

CPC classification number: G02B26/0833 ,  B81B7/0077 ,  B81B2201/042 ,  B81C1/00896 ,  B81C1/00904 ,  B81C2203/0118 ,  B82Y30/00 ,  H01L24/97 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01018 ,  H01L2924/01019 ,  H01L2924/0102 ,  H01L2924/01023 ,  H01L2924/01024 ,  H01L2924/01027 ,  H01L2924/01033 ,  H01L2924/01039 ,  H01L2924/01041 ,  H01L2924/01049 ,  H01L2924/01054 ,  H01L2924/01058 ,  H01L2924/01072 ,  H01L2924/01074 ,  H01L2924/01077 ,  H01L2924/01079 ,  H01L2924/01322 ,  H01L2924/04953 ,  H01L2924/10329 ,  H01L2924/12042 ,  H01L2924/12044 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/3025 ,  H01L2924/00

Abstract: A projection system, a spatial light modulator, and a method for forming a micromirror array such as for a projection display are disclosed. The spatial light modulator can have two substrates bonded together with one of the substrates comprising a micro-mirror array. The two substrates can be bonded at the wafer level after depositing a getter material and/or solid or liquid lubricant on one or both of the wafers if desired. In one embodiment of the invention, one of the substrates is a light transmissive substrate and a light absorbing layer is provided on the light transmissive substrate to selectively block light from passing through the substrate. The light absorbing layer can form a pattern, such as a frame around an array of micro-mirrors.

公开(公告)号：US06885494B2

公开(公告)日：2005-04-26

申请号：US10366296

申请日：2003-02-12

Applicant: Satyadev R. Patel ,  Andrew G. Huibers ,  Peter J. Heureux

Inventor： Satyadev R. Patel ,  Andrew G. Huibers ,  Peter J. Heureux

IPC: G02B26/08 ,  G02B26/00 ,  G02F1/29

CPC classification number: G02B26/0841

Abstract: A micro-mirror that comprises a substrate, a hinge structure formed on the substrate and a mirror plate attached to the hinge structure is provided for use in display systems. The mirror plate is capable of rotating from a non-deflected resting state to a state that is at least 14°, and preferably from 15° to 27° from the non-deflected resting state. In operation, the micro-mirror switches between an “ON”-state and “OFF”-state, which are defined in accordance with a rotational position of the mirror plate. The OFF state can be a non-deflected position of the micro-mirror (generally parallel to the substrate), the same angle (though opposite direction) as the ON state, or an angle less than the ON state (though in the opposite direction). Reflected light from the “ON” and “OFF” states are thus separated and the contrast ratio is improved.

Abstract translation: 提供了一种微镜，其包括基底，形成在基底上的铰链结构和附接到铰链结构的镜板，用于显示系统。 镜板能够从非偏转静止状态旋转到从非偏转静止状态至少为14°，优选为15°至27°的状态。 在操作中，微反射镜在根据镜板的旋转位置限定的“ON”状态和“OFF”状态之间切换。 关闭状态可以是微反射镜（大体上平行于基板）的非偏转位置，与ON状态相同的角度（尽管相反的方向），或者小于ON状态的角度（尽管在相反方向 ）。 因此，从“ON”和“OFF”状态的反射光被分离，并且对比度提高。

公开(公告)号：US06873450B2

公开(公告)日：2005-03-29

申请号：US10613379

申请日：2003-07-03

Applicant: Satyadev R. Patel ,  Andrew G. Huibers

Inventor： Satyadev R. Patel ,  Andrew G. Huibers

IPC: G02B26/00 ,  G02B26/08 ,  H01L20060101 ,  H01L21/00

CPC classification number: G02B26/0841

Abstract: A micromirror device is disclosed, along with a method of making such a micromirror device that comprises a mirror plate, a hinge and an extension plate. The extension plate is formed on the mirror plate and between the mirror plate and the electrode associated with the mirror plate for rotating the mirror plate. The extension plate can be metallic or dielectric. Also disclosed is a method of making such a micromirror device. In particular, the extension plate is formed after the formation of the mirror plate. Moreover, also disclosed is a projection system that comprises a spatial light modulator having an array of such micromirrors, as well as a light source, condensing optics, wherein light from the light source is focused onto the array of micromirrors, projection optics for projecting light selectively reflected from the array of micromirrors onto a target, and a controller for selectively actuating the micromirrors in the array.

公开(公告)号：US06849471B2

公开(公告)日：2005-02-01

申请号：US10402789

申请日：2003-03-28

Applicant: Satyadev R. Patel ,  Jonathan C. Doan

Inventor： Satyadev R. Patel ,  Jonathan C. Doan

IPC: B81B7/00 ,  B81C20060101 ,  B81C1/00 ,  H01L21/00 ,  H01L21/76

CPC classification number: B81C1/00793 ,  B81B2201/042 ,  B81C2201/053

Abstract: A method for processing microelectromechanical devices is disclosed herein. The method prevents the diffusion and interaction between sacrificial layers and structure layers of the microelectromechanical devices by providing selected barrier layers between consecutive sacrificial and structure layers.

公开(公告)号：US06844959B2

公开(公告)日：2005-01-18

申请号：US10305509

申请日：2002-11-26

Applicant: Andrew G. Huibers ,  Satyadev R. Patel ,  Robert M. Duboc, Jr.

Inventor： Andrew G. Huibers ,  Satyadev R. Patel ,  Robert M. Duboc, Jr.

IPC: B81B3/00 ,  B81B7/04 ,  G02B26/08 ,  G02B26/00 ,  B32B9/00 ,  G09G3/34

CPC classification number: G02B26/0841 ,  B82Y30/00 ,  Y10T428/30

Abstract: A projection system, a spatial light modulator, and a method for forming micromirrors are disclosed. A substrate comprises circuitry and electrodes for electrostatically deflecting micromirror elements that are disposed within an array of such elements forming the spatial light modulator. In one embodiment, the substrate is a silicon substrate having circuitry and electrodes thereon for electrostatically actuating adjacent micromirror elements, and the substrate is fully or selectively covered with a light absorbing material.

Abstract translation: 公开了投影系统，空间光调制器和用于形成微镜的方法。 衬底包括用于静电偏转微镜元件的电路和电极，微镜元件设置在形成空间光调制器的这种元件的阵列内。 在一个实施例中，衬底是具有电路和电极的硅衬底，用于静电地驱动相邻的微镜元件，并且衬底被完全或选择性地覆盖有光吸收材料。

公开(公告)号：US06804039B1

公开(公告)日：2004-10-12

申请号：US10692386

申请日：2003-10-22

Applicant: Jonathan C. Doan ,  Satyadev R. Patel

Inventor： Jonathan C. Doan ,  Satyadev R. Patel

IPC: G02F2600

CPC classification number: B81B3/0035 ,  B81B2201/042 ,  G02B26/0833

Abstract: A method and an improved multilayer hinge structure for use in a micromirror device for a spatial light modulator are provided herein. The micromirror device presents a conductive, composite torsion hinge with improved mechanical reliability, achieved by optimizing the geometry of the hinge, which minimizes the amount of residual twist, fixed torsional stiffness and fixed rate of plastic deformation in the mechanically undesirable hinge element. A method and its alternatives are disclosed herein by the present invention for manufacturing such multilayer hinge structure.

Abstract translation: 本文提供了一种用于空间光调制器的微反射镜装置中的方法和改进的多层铰链结构。 微反射镜装置呈现出具有改善的机械可靠性的导电复合扭转铰链，其通过优化铰链的几何形状而实现，其最大限度地减少机械不需要的铰链元件中的残余扭曲量，固定的扭转刚度和固定的塑性变形速率。 本发明公开了一种制造这种多层铰链结构的方法及其替代方案。

公开(公告)号：US07514012B2

公开(公告)日：2009-04-07

申请号：US10766776

申请日：2004-01-27

Applicant: Jonathan Doan ,  Satyadev R. Patel ,  Dmitri Simonian

Inventor： Jonathan Doan ,  Satyadev R. Patel ,  Dmitri Simonian

IPC: C23F1/00 ,  H01L21/00

CPC classification number: B81C1/00682 ,  B81B2201/042 ,  G02B26/0841

Abstract: The present invention discloses a method for processing a deformable element of a microstructure for reducing the plastic deformation by oxidizing the deformable element. The method of the present invention can be performed at a variety of stages of the fabrication and packaging processes.

Abstract translation: 本发明公开了一种用于通过氧化可变形元件来处理微结构的可变形元件以减少塑性变形的方法。 本发明的方法可以在制造和包装过程的各个阶段进行。

公开(公告)号：US07422920B2

公开(公告)日：2008-09-09

申请号：US11388116

申请日：2006-03-23

Applicant: Satyadev R. Patel ,  Andrew G. Huibers

Inventor： Satyadev R. Patel ,  Andrew G. Huibers

IPC: H01L21/00

CPC classification number: B82Y30/00 ,  G02B26/0841 ,  H04N5/7458

Abstract: A spatial light modulator is disclosed, along with a method for making such a modulator that comprises an array of micromirror devices. The center-to-center distance and the gap between adjacent micromirror devices are determined corresponding to the light source being used so as to optimize optical efficiency and performance quality. The micromirror device comprises a hinge support formed on a substrate and a hinge that is held by the hinge support. A mirror plate is connected to the hinge via a contact, and the distance between the mirror plate and the hinge is determined according to desired maximum rotation angle of the mirror plate, the optimum gap and pitch between the adjacent micromirrors. In a method of fabricating such spatial light modulator, one sacrificial layer is deposited on a substrate followed by forming the mirror plates, and another sacrificial layer is deposited on the mirror plates followed by forming the hinge supports. The two sacrificial layers are removed via the small gap between adjacent mirror devices with spontaneous vapor phase chemical etchant.

Abstract translation: 公开了一种空间光调制器，以及用于制造这样的调制器的方法，该调制器包括微镜器件阵列。 根据所使用的光源确定中心到中心的距离和相邻的微反射镜装置之间的间隙，以优化光学效率和性能质量。 微反射镜装置包括形成在基底上的铰链支撑件和由铰链支撑件保持的铰链。 镜板通过触点连接到铰链，并且根据镜板的期望的最大旋转角度，相邻微镜之间的最佳间隙和间距来确定镜板和铰链之间的距离。 在制造这种空间光调制器的方法中，将一个牺牲层沉积在衬底上，随后形成镜板，并且另一牺牲层沉积在镜板上，随后形成铰链支架。 通过具有自发气相化学蚀刻剂的相邻反射镜装置之间的小间隙去除两个牺牲层。

公开(公告)号：US07405860B2

公开(公告)日：2008-07-29

申请号：US11076640

申请日：2005-03-09

Applicant: Andrew G. Huibers ,  Satyadev R. Patel

Inventor： Andrew G. Huibers ,  Satyadev R. Patel

IPC: G02B26/00 ,  G09G3/34

CPC classification number: B82Y30/00 ,  G02B26/0833 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/0102 ,  H01L2924/01024 ,  H01L2924/01074

Abstract: A projection system, a spatial light modulator, and a method for forming a micromirror array such as for a projection display are disclosed. The spatial light modulator can have two substrates bonded together with one of the substrates comprising a micro-mirror array. The two substrates can be bonded at the wafer level after depositing a getter material and/or solid or liquid lubricant on one or both of the wafers if desired. In one embodiment of the invention, one of the substrates is a light transmissive substrate and a light absorbing layer is provided on the light transmissive substrate to selectively block light from passing through the substrate. The light absorbing layer can form a pattern, such as a frame around an array of micro-mirrors.

Abstract translation: 公开了投影系统，空间光调制器和用于形成诸如投影显示器的微镜阵列的方法。 空间光调制器可以具有与包括微镜阵列的基板之一粘合在一起的两个基板。 如果需要，在沉积吸气剂材料和/或固体或液体润滑剂在一个或两个晶片上之后，两个基底可以在晶片层上结合。 在本发明的一个实施例中，一个基板是透光基板，并且在透光基板上设置光吸收层，以选择性地阻挡光通过基板。 光吸收层可以形成图案，例如围绕微镜阵列的框架。

公开(公告)号：US07189332B2

公开(公告)日：2007-03-13

申请号：US10269149

申请日：2002-10-11

Applicant: Satyadev R. Patel ,  Gregory P. Schaadt ,  Douglas B. MacDonald ,  Niles K. MacDonald ,  Hongqin Shi

Inventor： Satyadev R. Patel ,  Gregory P. Schaadt ,  Douglas B. MacDonald ,  Niles K. MacDonald ,  Hongqin Shi

IPC: C23F3/12

CPC classification number: H01J37/32963 ,  B81C1/00476 ,  B81C1/00587 ,  B81C99/0065 ,  B81C2201/0132 ,  B81C2201/0138 ,  H01J37/32449 ,  H01J37/32935

Abstract: Processes for the removal of a layer or region from a workpiece material by contact with a process gas in the manufacture of a microstructure are enhanced by the ability to accurately determine the endpoint of the removal step. A vapor phase etchant is used to remove a material that has been deposited on a substrate, with or without other deposited structure thereon. By creating an impedance at the exit of an etching chamber (or downstream thereof), as the vapor phase etchant passes from the etching chamber, a gaseous product of the etching reaction is monitored, and the endpoint of the removal process can be determined. The vapor phase etching process can be flow through, a combination of flow through and pulse, or recirculated back to the etching chamber.

Abstract translation: 通过与制造微结构中的工艺气体接触从工件材料去除层或区域的工艺通过精确地确定去除步骤的终点的能力增强。 气相蚀刻剂用于去除已经沉积在基底上的材料，其上具有或不具有其它沉积结构。 通过在蚀刻室（或其下游）的出口处产生阻抗，当气相蚀刻剂从蚀刻室通过时，监测蚀刻反应的气态产物，并且可以确定去除过程的终点。 气相蚀刻工艺可以流过，流过和脉冲的组合，或再循环回蚀刻室。