公开(公告)号：US20050245072A1

公开(公告)日：2005-11-03

申请号：US10833154

申请日：2004-04-28

申请人： Hsien-Ming Lee ,  Jing-Cheng Lin ,  Shing-Chyang Pan ,  Ming-Hsing Tsai ,  Hung-Wen Su ,  Shih-Wei Chou ,  Shau-Lin Shue ,  Kuo-Wei Cheng ,  Ting-Chu Ko

发明人： Hsien-Ming Lee ,  Jing-Cheng Lin ,  Shing-Chyang Pan ,  Ming-Hsing Tsai ,  Hung-Wen Su ,  Shih-Wei Chou ,  Shau-Lin Shue ,  Kuo-Wei Cheng ,  Ting-Chu Ko

IPC分类号： H01L21/288 ,  H01L21/4763 ,  H01L21/76 ,  H01L21/768

CPC分类号： H01L21/2885 ,  H01L21/76843 ,  H01L21/76861 ,  H01L21/76862 ,  H01L21/76873 ,  H01L21/76877

摘要： A method of electrochemical deposition (ECD) provides a barrier and a seed layer on a substrate. The surfaces of the substrate are pre-treated before a metal layer is electrochemically deposited thereon in an electrochemical plating cell with a physical or a chemical surface treatment process. The electrochemical plating cell is covered by a cap to prevent evaporation of the electrolyte solution. The electrochemical plating cell includes a substrate holder assembly with a lift seal, e.g., with a contact angle θ less than 90° between the lift seal and the substrate. The substrate holder assembly includes a substrate chuck at the rear side of the substrate.

摘要翻译： 电化学沉积（ECD）的方法在衬底上提供阻挡层和种子层。 在将金属层电化学沉积在具有物理或化学表面处理工艺的电化学镀覆电池中之前，对基板的表面进行预处理。 电化学镀覆电池被盖覆盖以防止电解质溶液的蒸发。 电化学电镀单元包括具有提升密封件的衬底保持器组件，例如在提升密封件和衬底之间的接触角θ小于90°。 衬底保持器组件包括在衬底的后侧的衬底卡盘。

公开(公告)号：US20050097769A1

公开(公告)日：2005-05-12

申请号：US10668291

申请日：2003-09-24

申请人： Jing-Cheng Lin ,  Shing-Chyang Pan ,  Hsien-Ming Lee ,  Hung-Wen Su ,  Shih-Wei Chou ,  Ming-Hsing Tsai ,  Shau-Lin Shue

发明人： Jing-Cheng Lin ,  Shing-Chyang Pan ,  Hsien-Ming Lee ,  Hung-Wen Su ,  Shih-Wei Chou ,  Ming-Hsing Tsai ,  Shau-Lin Shue

IPC分类号： H01L21/677 ,  F26B13/30

CPC分类号： H01L21/67781

摘要： A loadlock. The loadlock for wafers includes a chamber, a pedestal, a retractable shaft, and a bellows. The chamber has a plurality of walls and a bottom surface. The pedestal supports a cassette and is disposed in the chamber. The retractable shaft has a top end and a bottom end. The top end is connected to the pedestal and the bottom end is connected to the bottom surface as a reference for positioning the pedestal. The bellows has a first end and a second end. The first end is disposed on the pedestal and the second end is sealed at the bottom end of the retractable shaft. Preferably, the retractable shaft is fully enclosed by the bellows.

摘要翻译： 一个加载锁 用于晶片的负荷锁包括一个腔室，一个基座，一个伸缩轴和一个波纹管。 腔室具有多个壁和底面。 基座支撑盒并设置在腔室中。 伸缩轴具有顶端和底端。 顶端连接到基座，底端连接到底面作为基座的基准。 波纹管具有第一端和第二端。 第一端设置在基座上，第二端在可伸缩轴的底端被密封。 优选地，可伸缩轴被波纹管完全包围。