公开(公告)号：US20210096476A1

公开(公告)日：2021-04-01

申请号：US17119485

申请日：2020-12-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Johannes Catharinus Hubertus MULKENS ,  Nicolaas TEN KATE

IPC: G03F7/20

Abstract: A difficulty of contamination interfering with a grid plate positional measurement system is addressed. In one embodiment contamination is prevented from coming into contact with the grating or the sensor. In an embodiment, surface acoustic waves are used to detach contamination from a surface of the grating or sensor.

公开(公告)号：US20190235395A1

公开(公告)日：2019-08-01

申请号：US16376673

申请日：2019-04-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE

IPC: G03F7/20 ,  C23C16/44 ,  H01L21/687

CPC classification number: G03F7/70716 ,  C23C16/44 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70975 ,  H01L21/6875 ,  Y10T29/49

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

公开(公告)号：US20190224755A1

公开(公告)日：2019-07-25

申请号：US16369368

申请日：2019-03-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Sjoerd Nicolaas Lambertus DONDERS ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE ,  Elisabeth Corinne RODENBURG

IPC: B22F7/06 ,  B23K26/354 ,  G03F7/20 ,  B22F3/105 ,  B33Y80/00 ,  B33Y10/00 ,  B23K26/342 ,  B05D5/00 ,  B05D3/06 ,  B23Q3/18

Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burs to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.

公开(公告)号：US20180348650A1

公开(公告)日：2018-12-06

申请号：US15856133

申请日：2017-12-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas TEN KATE ,  Raymond Wilhelmus Louis Lafarre

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341

Abstract: A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.

公开(公告)号：US20180284625A1

公开(公告)日：2018-10-04

申请号：US15994492

申请日：2018-05-31

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE

IPC: G03F7/20 ,  H01L21/687 ,  C23C16/44

CPC classification number: G03F7/70716 ,  C23C16/44 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70975 ,  H01L21/6875 ,  Y10T29/49

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

公开(公告)号：US20180203365A1

公开(公告)日：2018-07-19

申请号：US15920788

申请日：2018-03-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Niek Jacobus Johannes ROSET ,  Nicolaas TEN KATE ,  Sergei SHULEPOV ,  Raymond Wilhelmus Louis LAFARRE

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: A lithographic apparatus having a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of a substrate table and/or a substrate located in a recess of the substrate table, a cover including a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.

公开(公告)号：US20170031250A1

公开(公告)日：2017-02-02

申请号：US15293009

申请日：2016-10-13

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Nicolaas Rudolf KEMPER ,  Henrikus Herman Marie COX ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Nicolaas TEN KATE ,  Jeroen Johannes Sophia Maria MERTENS ,  Frits VAN DER MEULEN ,  Franciscus Johannes Herman Maria TEUNISSEN ,  Jan-Gerard Cornelis VAN DER TOORN ,  Martinus Cornelis Maria VERHAGEN ,  Stefan Philip Christiaan BELFROID ,  Johannes Petrus Maria SMEULERS ,  Herman VOGEL

IPC: G03F7/20

CPC classification number: G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

Abstract translation: 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。

公开(公告)号：US20160179014A1

公开(公告)日：2016-06-23

申请号：US14973421

申请日：2015-12-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Niek Jacobus Johannes ROSET ,  Nicolaas TEN KATE ,  Sergei SHULEPOV ,  Raymond Wilhelmus Louis LAFARRE

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: A lithographic apparatus having a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of a substrate table and/or a substrate located in a recess of the substrate table, a cover including a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.

Abstract translation: 一种具有流体处理结构的光刻设备，其被配置为将浸没流体包含在与衬底台的上表面相邻的空间中和/或位于所述衬底台的凹部中的衬底上，所述盖包括平面主体，所述平面主体在使用中 从衬底的上表面延伸到基板的上主表面的周边部分，以覆盖凹部的边缘和基板的边缘之间的间隙，以及浸没流体膜破坏器，其构造成破坏基板 在衬底台相对于流体处理结构移动期间，在盖的边缘和由流体处理结构容纳的浸没流体之间形成浸没流体膜。

公开(公告)号：US20150220003A1

公开(公告)日：2015-08-06

申请号：US14690032

申请日：2015-04-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas TEN KATE ,  Raymond Wilhelmus Louis LAFARRE

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341

Abstract: A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.

Abstract translation: 一种用于光刻设备的工作台，该工作台具有形成在工作台的上表面中的集水开口，该容器开口通过工作台与桌子的环境流体连通，在桌子的表面的排水开口处，除了 上表面。

公开(公告)号：US20240011150A1

公开(公告)日：2024-01-11

申请号：US18475068

申请日：2023-09-26

Applicant: ASML Netherlands B.V.

Inventor： Sonia CASTELLANOS ORTEGA ,  Jan VERHOEVEN ,  Joost Wilhelmus Maria FRENKEN ,  Pavlo ANTONOV ,  Nicolaas TEN KATE ,  Olivier Christian Maurice LUGIER

IPC: C23C16/04 ,  C23C16/26 ,  C23C16/48

CPC classification number: C23C16/047 ,  C23C16/26 ,  C23C16/482 ,  C23C16/483 ,  H01L21/02527

Abstract: Methods and apparatus for forming a patterned layer of carbon are disclosed. In one arrangement, a selected portion of a surface of a solid structure is irradiated with extreme ultraviolet radiation in the presence of a carbon-containing precursor. The radiation interacts with the solid structure in the selected portion to cause formation of a layer of carbon in the selected portion from the carbon-containing precursor. The layer of carbon is formed in a pattern defined by the selected portion.