公开(公告)号：US20220113636A1

公开(公告)日：2022-04-14

申请号：US17428223

申请日：2020-01-03

Applicant: ASML Netherlands B.V.

Inventor： Hans BUTLER ,  Bas JANSEN ,  Cornelius Adrianus Lambertus DE HOON

IPC: G03F7/20 ,  G01D3/032 ,  G01P15/09

Abstract: The invention relates to an electronic system for an accelerometer having a piezoelectric element and a first mechanical resonance frequency, comprising: a) a damping circuit configured to: —receive an acceleration signal from the piezoelectric element; —electronically dampen an amplitude of the first mechanical resonance frequency; and—generate a damped acceleration signal, b) an extender configured to: —receive the damped acceleration signal; —extend the frequency response; and—output an extended damped acceleration signal, wherein the extender is configured to have a first electronic anti-resonance frequency matching the damped first mechanical resonance frequency, and to have a frequency response between the first electronic anti-resonance frequency and a higher second frequency that is substantially opposite to a corresponding frequency response of the combination of the accelerometer and the damping circuit.

公开(公告)号：US20210132505A1

公开(公告)日：2021-05-06

申请号：US16959702

申请日：2018-11-29

Applicant: ASML Netherlands B.V.

Inventor： Hans BUTLER

IPC: G03F7/20

Abstract: A lithographic apparatus comprises a projection system comprising position sensors to measure a position of optical elements of the projection system. The positions sensors are referenced to a sensor frame. Damping actuators damp vibrations of the sensor frame. A control device drives the actuators and is configured to derive sensor frame damping force signals from at least one of the acceleration signals and the sensor frame position signals, derive an estimated line of sight error from the position signals, determine actuator drive signals from the sensor frame damping force signals and the estimated line of sight error, drive the actuators using the actuator drive signals to dampen the sensor frame and to at least partly compensate the estimated line of sight error.

公开(公告)号：US20200209757A1

公开(公告)日：2020-07-02

申请号：US16319587

申请日：2017-06-16

Applicant: ASML Netherlands B.V. ,  Carl Zeiss SMT GmbH

Inventor： Hans BUTLER ,  Bernhard Mathias GEUPPERT ,  Erik Roelof LOOPSTRA ,  Maurice Willem Jozef Etiënn WIJCKMANS

IPC: G03F7/20

Abstract: The present invention relates to a lithographic apparatus, comprising: —a base frame (10), adapted for mounting the lithographic apparatus (1) on a support surface (9), —a projection system (20) comprising: —a force frame (30), —an optical element (21) which is moveable relative to the force frame, —a sensor frame (40), which is separate from the force frame, —at least one sensor which is adapted to monitor the optical element, comprising at least one sensor (25) element which is mounted to the sensor frame, —a force frame support (31), which is adapted to support the force frame on the base frame, —an intermediate frame (45), which is separate from the force frame, —a sensor frame coupler (41), which is adapted to couple the sensor frame to the intermediate frame, —an intermediate frame support (46), which is separate from the force fame support and adapted to support the intermediate frame on the base frame.

公开(公告)号：US20190354021A1

公开(公告)日：2019-11-21

申请号：US16483660

申请日：2018-01-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans BUTLER ,  Michael Johannes VERVOORDELDONK ,  Maurice Willem Jozef Etiënne WIJCKMANS

IPC: G03F7/20

Abstract: A lithographic apparatus is described, the apparatus comprising: a projection system configured to project a patterned beam of radiation onto a substrate; the projection system comprising a plurality of optical elements; a sensor frame; a first position measurement system configured to measure a position of the plurality of optical elements relative to the sensor frame; wherein the sensor frame comprises: N sub-frames, N being an integer >1, a coupling system coupling the N sub-frames and a second position measurement system configured to determine a relative position of the N sub-frames.

公开(公告)号：US20190250518A1

公开(公告)日：2019-08-15

申请号：US16245400

申请日：2019-01-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Joeri LOF ,  Hans BUTLER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Aleksey Yurievich KOLESNYCHENKO ,  Erik Roelof LOOPSTRA ,  Hendricus Johannes Maria MEIJER ,  Johannes Catherinus Hubertus MULKENS ,  Roelof Aeilko Siebrand RITSEMA ,  Frank VAN SCHAIK ,  Timotheus Franciscus SENGERS ,  Klaus SIMON ,  Joannes Theodoor DE SMIT ,  Alexander STRAAIJER ,  Bob STREEFKERK ,  Erik Theodorus Maria BIJLAART ,  Christiaan Alexander HOOGENDAM ,  Helmar VAN SANTEN ,  Marcus Adrianus VAN DE KERKHOF ,  Mark KROON ,  Arie Jeffrey DEN BOEF ,  Joost Jeroen OTTENS ,  Jeroen Johannes Sophia Maria MERTENS

IPC: G03F7/20

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

公开(公告)号：US20190079416A1

公开(公告)日：2019-03-14

申请号：US16070848

申请日：2017-01-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Robbert Edgar VAN LEEUWEN ,  Hans BUTLER

IPC: G03F7/20 ,  G01B9/02

CPC classification number: G03F7/70758 ,  G01B9/02015 ,  G01B9/02049 ,  G03F7/70733 ,  G03F7/70775 ,  G03F7/7085 ,  H01L41/00 ,  H01L41/02 ,  H01L41/04

Abstract: An actuator system configured to position an object, the actuator system includes a piezo actuator having an actuator contact surface. The piezo actuator is configured to exert a force via the actuator contact surface onto the object. The piezo actuator includes a transparent piezo material. The actuator system further has an optical position sensor configured to measure a position of the actuator contact surface. The optical position sensor is configured to transmit an optical beam through the transparent piezo material to the actuator contact surface. The optical position sensor may form an interferometer.

公开(公告)号：US20180373156A1

公开(公告)日：2018-12-27

申请号：US16062735

申请日：2016-11-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans BUTLER ,  Björn Hubertus Maria BUKKEMS ,  Cornelius Adrianus Lambertus DE HOON ,  Maurice Willem Jozef Etiënne WIJCKMANS

IPC: G03F7/20

CPC classification number: G03F7/709 ,  G03F7/70758 ,  G03F7/70775 ,  G03F7/70825 ,  G03F7/70833

Abstract: A lithographic apparatus comprises a base frame constructed to form a supporting structure of the lithographic apparatus, an active base frame support arranged between the base frame and a ground floor. The active base frame support is configured to support the base frame on the ground floor. The active base frame support comprises an actuator configured to exert a force in a horizontal direction between the base frame and the ground plane. The lithographic apparatus further comprises a control device configured to drive the actuator, a signal representative of a disturbance force on the base frame being provided to the control device, the control device being configured to drive the actuator using the force sensor signal.

公开(公告)号：US20160299442A1

公开(公告)日：2016-10-13

申请号：US15100920

申请日：2014-11-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans BUTLER ,  Marcus Joseph Elisabeth Godfried BREUKERS ,  Marcel François HEERTJES

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70725

Abstract: A control device configured to determine a primary first drive signal, based on a first error signal representing a difference between desired and measured positions of a first body, for driving a positioner driving the first body; determine a primary second drive signal, based on a second error signal representing a difference between desired and measured positions of a second body, for driving a positioner driving the second body; determine, based on the second error signal, a secondary first drive signal for driving the first body positioner; determine, based on the first error signal, a secondary second drive signal for driving the second body positioner; combine the primary and secondary first drive signals and combine the primary and secondary second drive signals; and output the combined first and second drive signals to the respective positioning devices.

Abstract translation: 一种控制装置，被配置为基于表示第一身体的期望位置和测量位置之间的差异的第一误差信号来确定主要第一驱动信号，用于驱动驱动第一身体的定位器; 基于表示第二机体的期望位置和测量位置之间的差异的第二误差信号来确定主要第二驱动信号，用于驱动驱动第二机体的定位器; 基于所述第二误差信号确定用于驱动所述第一主体定位器的辅助第一驱动信号; 基于所述第一误差信号确定用于驱动所述第二机身定位器的次级第二驱动信号; 组合主和次级第一驱动信号并组合主和次级第二驱动信号; 并将组合的第一和第二驱动信号输出到相应的定位装置。

公开(公告)号：US20160238953A1

公开(公告)日：2016-08-18

申请号：US15027986

申请日：2014-10-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans BUTLER ,  Cornelius Adrianus Lambertus DE HOON ,  Marc Wilhelmus Maria VAN DER WIJST ,  Thijs VERHEES ,  Sander KERSSEMAKERS

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70766 ,  G03F7/70833 ,  G03F7/709

Abstract: A lithographic apparatus includes a base frame, an illumination system configured to condition a radiation beam and supported by the base frame, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a positioning device configured to position the substrate table, the positioning device being supported by the base frame, a sensor configured to sense a vibration caused by a torque exerted on the base frame, and an actuator configured to exert a force on the illumination system or the base frame, in response to the sensed vibration, in order to at least partly dampen the vibration.

Abstract translation: 光刻设备包括基架，照明系统，其配置为调节辐射束并由基架支撑，支撑结构以支撑图案形成装置，所述图案形成装置能够将辐射束赋予其横截面图案， 形成图案化的辐射束，构造成保持衬底的衬底台，配置成将图案化的辐射束投影到衬底的目标部分上的投影系统，配置成定位衬底台的定位装置，定位装置被支撑 通过基架，传感器被配置为感测由施加在基架上的扭矩引起的振动;以及致动器，其被配置为响应于感测到的振动而对照明系统或基架施加力，以致于 至少部分抑制振动。

公开(公告)号：US20160077450A1

公开(公告)日：2016-03-17

申请号：US14956110

申请日：2015-12-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans BUTLER ,  Henrikus Herman Marie COX

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03B27/53 ,  G03B27/58 ,  G03F7/70725

Abstract: A positioning system for controlling a relative position between a first component and a second component of a lithographic apparatus, wherein a position of each component is defined by a set of orthogonal coordinates, the positioning system including: a measuring device configured to determine an error in the momentary position of one of the components with respect to a setpoint position in a measurement coordinate; and a controller configured to control movement of the other component in a control coordinate based on the determined error; wherein the measurement coordinate is different from the control coordinate.

Abstract translation: 一种用于控制光刻设备的第一部件和第二部件之间的相对位置的定位系统，其中每个部件的位置由一组正交坐标定义，所述定位系统包括：测量装置，其被配置为确定 相对于测量坐标中的设定点位置的部件之一的瞬时位置; 以及控制器，被配置为基于所确定的误差来控制所述另一部件在控制坐标中的移动; 其中测量坐标与控制坐标不同。