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公开(公告)号：US20080149862A1
公开(公告)日：2008-06-26
申请号：US11644153
申请日：2006-12-22
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： An EUV light source is disclosed which may comprise a plurality of targets, e.g., tin droplets, and a system generating pre-pulses and main-pulses with the pre-pulses for irradiating targets to produce expanded targets. The system may further comprise a continuously pumped laser device generating the main pulses with the main pulses for irradiating expanded targets to produce a burst of EUV light pulses. The system may also have a controller varying at least one pre-pulse parameter during the burst of EUV light pulses. In addition, the EUV light source may also include an instrument measuring an intensity of at least one EUV light pulse within a burst of EUV light pulses and providing a feedback signal to the controller to vary at least one pre-pulse parameter during the burst of EUV light pulses to produce a burst of EUV pulses having a pre-selected dose.
摘要翻译： 公开了一种EUV光源，其可以包括多个目标，例如锡滴，以及产生预脉冲和主脉冲的系统，其中具有用于照射目标的预脉冲以产生扩展的目标。 该系统还可以包括连续泵浦的激光器装置，其产生具有用于照射扩展目标的主脉冲以产生EUV光脉冲的脉冲的主脉冲。 该系统还可以具有在EUV光脉冲的突发期间改变至少一个预脉冲参数的控制器。 另外，EUV光源还可以包括测量EUV光脉冲脉冲串内的至少一个EUV光脉冲的强度的仪器，并且向控制器提供反馈信号以在脉冲串的爆发期间改变至少一个预脉冲参数 EUV光脉冲以产生具有预选剂量的EUV脉冲的突发。
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公开(公告)号：US20170097572A1
公开(公告)日：2017-04-06
申请号：US15374533
申请日：2016-12-09
CPC分类号： G03F7/7015 , G02B5/0891 , G02B5/09 , G02B19/0019 , G02B19/0095 , G03F7/70033 , G03F7/70175 , G03F7/70916 , G03F7/70933 , G21K1/062 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A reflective EUV optic such as a collector mirror configured as an array of facets that are spaced apart to form respective gaps between adjacent facets. The gaps are used as inlets for gas flow across one of the facets such that flow is introduced parallel to the optic surface. The facets can be made with offsets such that loss of reflective area of the EUV optic can be minimized. The gas facilitates removal of target material from the surface of the facets.
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公开(公告)号：US07518787B2
公开(公告)日：2009-04-14
申请号：US11452558
申请日：2006-06-14
CPC分类号： H01S3/2316 , H01S3/0057 , H01S3/11 , H01S3/2232 , H01S3/225 , H05G1/54 , H05G2/008
摘要： A laser light source is disclosed having a laser oscillator producing an output beam; a first amplifier amplifying the output beam to produce a first amplified beam, and a second amplifier amplifying the first amplified beam to produce a second amplified beam. For the source, the first amplifier may have a gain medium characterized by a saturation energy (Es, 1) and a small signal gain (go, 1); and the second amplifier may have a gain medium characterized by a saturation energy (Es, 2) and a small signal gain (go, 2), with (go, 1)>(go, 2) and (Es, 2)>(Es, 1). In another aspect, a laser oscillator of a laser light source may be a cavity dumped laser oscillator, e.g. a mode-locked laser oscillator, q-switched laser oscillator and may further comprising a temporal pulse stretcher.
摘要翻译： 公开了具有产生输出光束的激光振荡器的激光源; 放大所述输出光束以产生第一放大光束的第一放大器，以及放大所述第一放大光束以产生第二放大光束的第二放大器。 对于源，第一放大器可以具有以饱和能量（Es，1）和小信号增益（go，1）为特征的增益介质; 并且第二放大器可以具有特征在于饱和能量（Es，2）和小信号增益（go，2）的增益介质，其中（go，1）>（go，2）和（Es，2）>（ Es，1）。 在另一方面，激光光源的激光振荡器可以是空腔倾覆的激光振荡器，例如。 模式锁定激光振荡器，q切换激光振荡器，并且还可以包括时间脉冲展开器。
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34.发明授权EUV light source components and methods for producing, using and refurbishing same 有权EUV光源组件及其制造，使用和翻新方法公开(公告)号：US08314398B2
公开(公告)日：2012-11-20
申请号：US13091923
申请日：2011-04-21
IPC分类号： G01J3/10
CPC分类号： G02B5/0891 , B82Y10/00 , G01J1/429 , G03F7/70941 , G03F7/70958 , G03F7/70975 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material.
摘要翻译： 公开了一种用于EUV反射镜的原位监测以确定光学降解程度的方法。 该方法可以包括用具有波长在EUV谱以外的波长的光照射反射镜的至少一部分的步骤/动作，在光已经从反射镜反射之后测量光的至少一部分，并且使用该测量和 镜面退化和光反射率之间的预定关系，以估计多层镜面退化的程度。 还公开了一种用于制备近似法线入射的EUV反射镜的方法，该反射镜可以包括提供金属基底的步骤/动作，转动基底的表面的金刚石，使用物理气相沉积沉积覆盖表面的至少一种中间材料 技术，并沉积覆盖中间材料的多层镜面涂层。
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公开(公告)号：US20100066989A1
公开(公告)日：2010-03-18
申请号：US12210012
申请日：2008-09-12
CPC分类号： G03B27/42 , G03F7/70575
摘要： A spectral purity filter arrangement is disclosed. The spectral purity filter arrangement includes a film configured for filtering out at least a portion of input light and a support structure coupled to the film along at least one edge of the film. The spectral purity filter arrangement further includes a gas control subsystem configured to direct a gas at the film to support the film at least when the film is disposed in an operational position to perform the filtering.
摘要翻译： 公开了一种光谱纯度滤光器装置。 光谱纯度滤光器装置包括被配置为滤除输入光的至少一部分的膜和沿膜的至少一个边缘耦合到膜的支撑结构。 光谱纯度滤光器装置还包括气体控制子系统，该气体控制子系统被配置成引导薄膜上的气体至少当薄膜设置在操作位置以执行滤光时支撑薄膜。
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公开(公告)号：US07741626B2
公开(公告)日：2010-06-22
申请号：US12210012
申请日：2008-09-12
CPC分类号： G03B27/42 , G03F7/70575
摘要： A spectral purity filter arrangement is disclosed. The spectral purity filter arrangement includes a film configured for filtering out at least a portion of input light and a support structure coupled to the film along at least one edge of the film. The spectral purity filter arrangement further includes a gas control subsystem configured to direct a gas at the film to support the film at least when the film is disposed in an operational position to perform the filtering.
摘要翻译： 公开了一种光谱纯度滤光器装置。 光谱纯度滤光器装置包括被配置为滤除输入光的至少一部分的膜和沿膜的至少一个边缘耦合到膜的支撑结构。 光谱纯度滤光器装置还包括气体控制子系统，该气体控制子系统被配置成引导薄膜上的气体至少当薄膜设置在操作位置以执行滤光时支撑薄膜。
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37.发明申请EUV light source components and methods for producing, using and refurbishing same 有权EUV光源组件及其制造，使用和翻新方法公开(公告)号：US20090159808A1
公开(公告)日：2009-06-25
申请号：US12004871
申请日：2007-12-20
CPC分类号： G02B5/0891 , B82Y10/00 , G01J1/429 , G03F7/70941 , G03F7/70958 , G03F7/70975 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material.
摘要翻译： 公开了一种用于EUV反射镜的原位监测以确定光学降解程度的方法。 该方法可以包括用具有波长在EUV谱以外的波长的光照射反射镜的至少一部分的步骤/动作，在光已经从反射镜反射之后测量光的至少一部分，并且使用该测量和 镜面退化和光反射率之间的预定关系，以估计多层镜面退化的程度。 还公开了一种用于制备近似法线入射的EUV反射镜的方法，该反射镜可以包括提供金属基底的步骤/动作，转动基底的表面的金刚石，使用物理气相沉积沉积覆盖表面的至少一种中间材料 技术，并沉积覆盖中间材料的多层镜面涂层。
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公开(公告)号：US08704200B2
公开(公告)日：2014-04-22
申请号：US13441639
申请日：2012-04-06
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： An EUV light source is disclosed which may comprise a plurality of targets, e.g., tin droplets, and a system generating pre-pulses and main-pulses with the pre-pulses for irradiating targets to produce expanded targets. The system may further comprise a continuously pumped laser device generating the main pulses with the main pulses for irradiating expanded targets to produce a burst of EUV light pulses. The system may also have a controller varying at least one pre-pulse parameter during the burst of EUV light pulses. In addition, the EUV light source may also include an instrument measuring an intensity of at least one EUV light pulse within a burst of EUV light pulses and providing a feedback signal to the controller to vary at least one pre-pulse parameter during the burst of EUV light pulses to produce a burst of EUV pulses having a pre-selected dose.
摘要翻译： 公开了一种EUV光源，其可以包括多个目标，例如锡滴，以及产生预脉冲和主脉冲的系统，其中具有用于照射目标的预脉冲以产生扩展的目标。 该系统还可以包括连续泵浦的激光器装置，其产生具有用于照射扩展目标的主脉冲以产生EUV光脉冲的脉冲的主脉冲。 该系统还可以具有在EUV光脉冲的突发期间改变至少一个预脉冲参数的控制器。 另外，EUV光源还可以包括测量EUV光脉冲脉冲串内的至少一个EUV光脉冲的强度的仪器，并且向控制器提供反馈信号以在脉冲串的爆发期间改变至少一个预脉冲参数 EUV光脉冲以产生具有预选剂量的EUV脉冲的突发。
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公开(公告)号：US07465946B2
公开(公告)日：2008-12-16
申请号：US11406216
申请日：2006-04-17
摘要： An EUV light source is disclosed which may comprise at least one optical element having a surface, such as a multi-layer collector mirror; a laser source generating a laser beam; and a source material irradiated by the laser beam to form a plasma and emit EUV light. In one aspect, the source material may consist essentially of a tin compound and may generate tin debris by plasma formation which deposits on the optical element and, in addition, the tin compound may include an element that is effective in etching deposited tin from the optical element surface. Tin compounds may include SnBr4, SnBr2 and SnH4. In another aspect, an EUV light source may comprise a molten source material irradiated by a laser beam to form a plasma and emit EUV light, the source material comprising tin and at least one other metal, for example tin with Gallium and/or Indium.
摘要翻译： 公开了一种EUV光源，其可以包括具有表面的至少一个光学元件，例如多层收集镜; 产生激光束的激光源; 以及由激光束照射以形成等离子体并发射EUV光的源材料。 在一个方面，源材料可以基本上由锡化合物组成，并且可以通过沉积在光学元件上的等离子体形成而产生锡屑，此外，锡化合物可以包括有效地从光学蚀刻沉积的锡的元素 元素表面。 锡化合物可以包括SnBr4，SnBr2和SnH4。 另一方面，EUV光源可以包括由激光束照射以形成等离子体并发射EUV光的熔融源材料，源材料包含锡和至少一种其它金属，例如锡与镓和/或铟。
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40.发明授权Systems and methods for buffer gas flow stabilization in a laser produced plasma light source 有权激光产生等离子体光源中缓冲气体流动稳定的系统和方法公开(公告)号：US09516730B2
公开(公告)日：2016-12-06
申请号：US13156188
申请日：2011-06-08
摘要： An extreme-ultraviolet (EUV) light source comprising an optic, a target material, and a laser beam passing through said optic along a beam path to irradiate said target material. The EUV light source further includes a system generating a gas flow directed toward said target material along said beam path, said system having a tapering member surrounding a volume and a plurality of gas lines, each gas line outputting a gas stream into said volume.
摘要翻译： 一种极紫外（EUV）光源，包括光学元件，目标材料和沿着光束路径通过所述光学元件以照射所述目标材料的激光束。 EUV光源还包括沿着所述光束路径产生朝向所述目标材料的气流的系统，所述系统具有包围体积和多条气体管线的锥形构件，每条气体管线将气流输送到所述体积中。
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