Method of multiple gate oxide forming with hard mask

    公开(公告)号:US10916438B2

    公开(公告)日:2021-02-09

    申请号:US16407500

    申请日:2019-05-09

    Abstract: Methods for fabricating an integrated circuit having a plurality of gate dielectrics. The methods are provided to include: forming one or more isolation trenches and a first active region and a second active region in a substrate; depositing hard mask material on the substrate; removing a first portion of the hard mask material over the first active region; forming a first oxide layer having a first thickness over the first active region; removing a second portion of the hard mask material over the second active region; and forming a second oxide layer having a second thickness over the first and second active regions such that a thickness of oxide formed over the first active region comprises a sum of the thickness of the first oxide layer and the second oxide layer, and a thickness of oxide formed over the second active region comprises the second thickness.

    METHODS AND APPARATUS FOR ELECTRICAL OVERSTRESS PROTECTION

    公开(公告)号:US20200076189A1

    公开(公告)日:2020-03-05

    申请号:US16115901

    申请日:2018-08-29

    Abstract: An electronic device having first and second terminals includes an electrical overstress (EOS) protection circuitry configured to detect an EOS event at one or both of the first and second terminals. The electronic device includes a power clamp coupled to the EOS protection circuitry and configured to clamp a voltage between the first terminal and the second terminal to a clamp voltage. The EOS protection circuitry can adjust the clamp voltage when an EOS event is detected.

    Dual circuit digital isolator
    40.
    发明授权

    公开(公告)号:US12068237B2

    公开(公告)日:2024-08-20

    申请号:US18051151

    申请日:2022-10-31

    CPC classification number: H01L23/5222 H01L21/823493

    Abstract: An apparatus including; a substrate; an isolator that is formed over the substrate, the isolator including a silicon shield layer that is formed between a first buried oxide (BOX) layer and a second BOX layer; a silicon layer having an oxide trench structure formed therein, the oxide trench structure being arranged to define a first silicon island and a second silicon island; a first electronic circuit that is formed over the first silicon island; and a second electronic circuit that is formed over the second silicon island, the first electronic circuit being electrically coupled to the first electronic circuit.

Patent Agency Ranking