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    Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template
    32.
    发明申请
    Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template 审中-公开
    具有不同厚度的模板以便于排出位于基板和模板之间的气体

    公开(公告)号：US20100291257A1

    公开(公告)日：2010-11-18

    申请号：US12838852

    申请日：2010-07-19

    申请人： Douglas J. Resnick ,  Mario J. Meissl ,  Byung-Jin Choi ,  Sidlgata V. Sreenivasan

    发明人： Douglas J. Resnick ,  Mario J. Meissl ,  Byung-Jin Choi ,  Sidlgata V. Sreenivasan

    IPC分类号： B28B11/08

    CPC分类号： H01L21/67126 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/6715

    摘要： A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region.

    摘要翻译： 一种纳米压印光刻模板，其特别包括具有第一和第二相对侧的主体，第一表面设置在第一侧上，第二侧具有设置在其中的凹部，该主体具有第一和第二区域，第二区域围绕第一 所述凹部与所述第一区域叠加，所述第一表面的与所述第一区域重叠的部分与所述第二侧面间隔开第一距离，并且所述第一表面的与所述第二区域重叠的部分间隔开 从第二侧排出第二距离，第二距离大于第一距离; 以及模具，其设置在所述主体的第一侧上，以叠加所述第一区域的一部分。

    Formation of Conductive Templates Employing Indium Tin Oxide
    36.
    发明申请
    Formation of Conductive Templates Employing Indium Tin Oxide 审中-公开
    形成使用氧化铟锡的导电模板

    公开(公告)号：US20090214686A1

    公开(公告)日：2009-08-27

    申请号：US12434921

    申请日：2009-05-04

    申请人： Sidlgata V. Sreenivasan ,  Ian Matthew McMackin ,  Byung-Jin Choi ,  Ronald D. Voisin

    发明人： Sidlgata V. Sreenivasan ,  Ian Matthew McMackin ,  Byung-Jin Choi ,  Ronald D. Voisin

    IPC分类号： B28B17/00 ,  B29C35/08

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  C03C17/3417 ,  C03C2217/77 ,  C03C2218/31 ,  C03C2218/328

    摘要： The present invention is directed to a method forming conductive templates that includes providing a substrate; forming a mesa on the substrate; and forming a plurality of recessions and projections on the mesa with a nadir of the recessions comprising electrically conductive material and the projections comprising electrically insulative material. It is desired that the mesa be substantially transparent to a predetermined wavelength of radiation, for example ultraviolet radiation. As a result, it is desired to form the electrically conductive material from a material that allows ultraviolet radiation to propagate therethrough. In the present invention indium tin oxide is a suitable material from which to form the electrical conductive material.

    摘要翻译： 本发明涉及一种形成导电模板的方法，其包括提供衬底; 在基板上形成台面; 以及在所述台面上形成多个凹陷和突出部，其中所述凹陷的最低点包括导电材料，并且所述突起包括电绝缘材料。 希望台面对于预定波长的辐射例如紫外线辐射基本上是透明的。 结果，期望由允许紫外线辐射传播的材料形成导电材料。 在本发明中，氧化铟锡是形成导电材料的合适材料。

    Pattern reversal employing thick residual layers
    38.
    发明授权
    Pattern reversal employing thick residual layers 有权
    采用厚残余层的图案反转

    公开(公告)号：US07547504B2

    公开(公告)日：2009-06-16

    申请号：US10946566

    申请日：2004-09-21

    申请人： Sidlgata V. Sreenivasan

    发明人： Sidlgata V. Sreenivasan

    IPC分类号： G03F1/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： The present invention features a method of patterning a substrate that includes forming, on the substrate, a first layer having a first pattern and selectively shifting in tone, as well as along a first direction, a subsequent pattern formed into the same layer that corresponds to the first pattern. To that end, one method of the present invention includes generating into the first layer, a second pattern having a shape inverse to the first pattern. A third pattern is then transferred into the first layer that has a shape inverse to the second pattern.

    摘要翻译： 本发明的特征在于一种图案化衬底的方法，该方法包括在衬底上形成具有第一图案的第一层，并且沿着第一方向选择性地移位色调，并形成与之对应的相同层的后续图案 第一种模式。 为此，本发明的一种方法包括向第一层生成具有与第一图案相反的形状的第二图案。 然后将第三图案转移到具有与第二图案相反的形状的第一层。

    Self-Aligned Cross-Point Memory Fabrication
    39.
    发明申请
    Self-Aligned Cross-Point Memory Fabrication 有权
    自对准交叉点内存制作

    公开(公告)号：US20090035934A1

    公开(公告)日：2009-02-05

    申请号：US12182905

    申请日：2008-07-30

    申请人： Sidlgata V. Sreenivasan ,  Christopher Mark Melliar-Smith ,  Dwayne L. LaBrake

    发明人： Sidlgata V. Sreenivasan ,  Christopher Mark Melliar-Smith ,  Dwayne L. LaBrake

    IPC分类号： H01L21/4763

    CPC分类号： H01L27/101 ,  H01L27/24

    摘要： Fabricating a cross-point memory structure using two lithography steps with a top conductor and connector or memory element and a bottom conductor orthogonal to the top connector. A first lithography step followed by a series of depositions and etching steps patterns a first channel having a bottom conductor. A second lithography step followed by a series of depositions and etching steps patterns a second channel orthogonal to the first channel and having a memory element connecting the an upper conductor and the lower conductor at their overlaid intersections.

    摘要翻译： 使用具有顶部导体和连接器或存储元件的两个光刻步骤和与顶部连接器正交的底部导体来制造交叉点存储器结构。 第一光刻步骤之后是一系列沉积和蚀刻步骤，图案化具有底部导体的第一通道。 随后是一系列沉积和蚀刻步骤的第二光刻步骤模拟与第一通道正交的第二通道，并且具有在其重叠的相交处连接上导体和下导体的存储元件。

    Capillary imprinting technique
    40.
    发明授权
    Capillary imprinting technique 有权
    毛细管压印技术

    公开(公告)号：US07442336B2

    公开(公告)日：2008-10-28

    申请号：US10645306

    申请日：2003-08-21

    申请人： Byung-Jin Choi ,  Sidlgata V. Sreenivasan ,  Michael P. C. Watts

    发明人： Byung-Jin Choi ,  Sidlgata V. Sreenivasan ,  Michael P. C. Watts

    IPC分类号： B29C35/08 ,  B29C41/12 ,  B81C1/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  C23F1/08

    摘要： The present invention provides a method for patterning a substrate with a template having a mold that features positioning conformable material between the substrate and the mold and filling a volume defined between the mold and the substrate with the conformable material through capillary action between the conformable material and one of the mold and the substrate. Thereafter, the conformable material is solidified. Specifically, the distance between the mold and the substrate is controlled to a sufficient degree to attenuate, if not avoid, compressive forces between the mold and the substrate. As a result, upon initial contact of the mold with the conformable material, spontaneous capillary filling of the volume between the mold and the substrate occurs.

    摘要翻译： 本发明提供了一种用模板图案化模板的方法，该模板具有在基板和模具之间具有定位适形材料的模具，并且通过适形材料之间的毛细管作用在适形材料之间填充限定在模具和基板之间的体积， 模具和基材之一。 此后，使适形材料固化。 具体地说，模具和基板之间的距离被控制到足够的程度以减小模具和基板之间的压缩力（如果不是避免的话）。 结果，在模具与适形材料初次接触时，发生模具和基板之间的体积的自发毛细管填充。