公开(公告)号：US20100119961A1

公开(公告)日：2010-05-13

申请号：US12613221

申请日：2009-11-05

申请人： Jun YE ,  Yu Cao ,  Hanying Feng

发明人： Jun YE ,  Yu Cao ,  Hanying Feng

IPC分类号： G03F7/20 ,  G03B27/32

CPC分类号： G06F17/50 ,  G03F1/144 ,  G03F1/36 ,  G03F1/68 ,  G03F7/70433 ,  G03F7/705 ,  G03F7/70516

摘要： A method of efficient optical and resist parameters calibration based on simulating imaging performance of a lithographic process utilized to image a target design having a plurality of features. The method includes the steps of determining a function for generating a simulated image, where the function accounts for process variations associated with the lithographic process; and generating the simulated image utilizing the function, where the simulated image represents the imaging result of the target design for the lithographic process. Systems and methods for calibration of lithographic processes whereby a polynomial fit is calculated for a nominal configuration of the optical system and which can be used to estimate critical dimensions for other configurations.

摘要翻译： 一种基于模拟用于对具有多个特征进行成像的目标设计的光刻工艺的成像性能的有效的光学和抗蚀剂参数校准的方法。 该方法包括以下步骤：确定用于产生模拟图像的功能，其中该功能考虑到与光刻工艺相关联的工艺变化; 并利用该功能产生模拟图像，其中模拟图像表示用于光刻工艺的目标设计的成像结果。 用于校准光刻过程的系统和方法，由此针对光学系统的标称配置计算多项式拟合，并且其可以用于估计其他配置的关键尺寸。

公开(公告)号：US20100003321A1

公开(公告)日：2010-01-07

申请号：US11915096

申请日：2007-06-26

申请人： Yu Cao ,  Yatindra Joshi ,  Ping Li ,  Madhusudhan Pudipeddi ,  Alan E. Royce ,  Robert F. Wagner ,  Jiahao Zhu

发明人： Yu Cao ,  Yatindra Joshi ,  Ping Li ,  Madhusudhan Pudipeddi ,  Alan E. Royce ,  Robert F. Wagner ,  Jiahao Zhu

IPC分类号： A61K31/549 ,  A61K9/20 ,  A61P9/00 ,  A61P25/00

CPC分类号： A61K9/2054 ,  A61K9/209 ,  A61K31/41 ,  A61K31/4422 ,  A61K31/549 ,  A61K2300/00

摘要： Monolayer, bilayer and trilayer solid dosage forms of a combination of valsartan, amlodipine and hydrochlorothiazide are made.

摘要翻译： 制备缬沙坦，氨氯地平和氢氯噻嗪组合的单层，双层和三层固体剂型。

公开(公告)号：US20090300573A1

公开(公告)日：2009-12-03

申请号：US12475095

申请日：2009-05-29

申请人： Yu Cao ,  Wenjin Shao ,  Ronaldus Johannes Gijsbertus Goossens ,  Jun Ye ,  James Patrick Koonmen

发明人： Yu Cao ,  Wenjin Shao ,  Ronaldus Johannes Gijsbertus Goossens ,  Jun Ye ,  James Patrick Koonmen

IPC分类号： G06F17/50

CPC分类号： B29C67/0088 ,  B29C64/386 ,  G03F7/70091 ,  G03F7/70458 ,  G03F7/705 ,  G03F7/70516 ,  G03F7/70525 ,  G06F17/50 ,  G06F17/5009 ,  G06F17/5081

摘要： Systems and methods for process simulation are described. The methods may use a reference model identifying sensitivity of a reference scanner to a set of tunable parameters. Chip fabrication from a chip design may be simulated using the reference model, wherein the chip design is expressed as one or more masks. An iterative retuning and simulation process may be used to optimize critical dimension in the simulated chip and to obtain convergence of the simulated chip with an expected chip. Additionally, a designer may be provided with a set of results from which an updated chip design is created.

摘要翻译： 描述了过程仿真的系统和方法。 这些方法可以使用标识参考扫描仪对一组可调谐参数的灵敏度的参考模型。 可以使用参考模型来模拟来自芯片设计的芯片制造，其中芯片设计被表示为一个或多个掩模。 可以使用迭代重调和仿真过程来优化模拟芯片中的关键尺寸，并获得模拟芯片与预期芯片的收敛。 此外，可以向设计者提供一组结果，从中创建更新的芯片设计。

公开(公告)号：US07523108B2

公开(公告)日：2009-04-21

申请号：US11752205

申请日：2007-05-22

申请人： Yu Cao

发明人： Yu Cao

IPC分类号： G06F17/30 ,  G06F7/00

CPC分类号： G06F17/30241 ,  Y10S707/99935

摘要： A system that automatically discerning the best combinations of a user query's geographical origin and language, retrieving and displaying search results accordingly. A record on the system are associated with a geographic location and a language. A record could be composed of two or more records, each of which associates with a location and a language. A record could be in rich media format.

摘要翻译： 自动识别用户查询的地理来源和语言的最佳组合的系统，相应地检索和显示搜索结果。 系统上的记录与地理位置和语言相关联。 记录可以由两个或多个记录组成，每个记录与位置和语言相关联。 记录可以是富媒体格式。

公开(公告)号：US07488933B2

公开(公告)日：2009-02-10

申请号：US11461929

申请日：2006-08-02

申请人： Jun Ye ,  Yu Cao ,  Guangqing Chen ,  Stefan Hunsche

发明人： Jun Ye ,  Yu Cao ,  Guangqing Chen ,  Stefan Hunsche

IPC分类号： G12B13/00

CPC分类号： G03F7/70516 ,  G03F7/705

摘要： A method for separately calibrating an optical model and a resist model of lithography process using information derived from in-situ aerial image measurements to improve the calibration of both the optical model and the resist model components of the lithography simulation model. Aerial images produced by an exposure tool are measured using an image sensor array loaded into the exposure tool. Multiple embodiments of measuring aerial image information and using the measured aerial image information to calibrate the optical model and the resist model are disclosed. The method of the invention creates more accurate and separable optical and resist models, leading to better predictability of the pattern transfer process from mask to wafer, more accurate verification of circuit patterns and how they will actually print in production, and more accurate model-based process control in the wafer fabrication facility.

摘要翻译： 使用从原位空间图像测量得到的信息分别校准光学模型和光刻工艺的抗蚀剂模型的方法，以改进光刻模拟和光刻模拟模型的抗蚀剂模型组件的校准。 使用装载到曝光工具中的图像传感器阵列来测量由曝光工具产生的空中影像。 公开了测量空间图像信息和使用所测量的空间图像信息来校准光学模型和抗蚀剂模型的多个实施例。 本发明的方法创建更精确和可分离的光学和抗蚀剂模型，导致从掩模到晶片的图案转移过程更好的可预测性，电路图案的更准确的验证以及它们将如何在生产中实际打印，以及更准确的基于模型 晶圆制造设备中的过程控制。

公开(公告)号：US20080301620A1

公开(公告)日：2008-12-04

申请号：US11757805

申请日：2007-06-04

申请人： Jun Ye ,  Yu Cao ,  Hanying Feng

发明人： Jun Ye ,  Yu Cao ,  Hanying Feng

IPC分类号： G06F17/50 ,  G03F1/00

CPC分类号： G03F1/36

摘要： Methods are disclosed to create efficient model-based Sub-Resolution Assist Features (MB-SRAF). An SRAF guidance map is created, where each design target edge location votes for a given field point on whether a single-pixel SRAF placed on this field point would improve or degrade the aerial image over the process window. In one embodiment, the SRAF guidance map is used to determine SRAF placement rules and/or to fine tune already-placed SRAFs. In another embodiment the SRAF guidance map is used directly to place SRAFs in a mask layout.

摘要翻译： 公开了创建有效的基于模型的子分辨率辅助特征（MB-SRAF）的方法。 创建SRAF指南图，其中每个设计目标边缘位置对于给定的场点投票，放置在该场点上的单像素SRAF是否将改善或降级过程窗口上的空中图像。 在一个实施例中，SRAF引导图用于确定SRAF放置规则和/或微调已经放置的SRAF。 在另一个实施例中，SRAF引导图被直接用于将SRAF放置在掩模布局中。

公开(公告)号：US20070282813A1

公开(公告)日：2007-12-06

申请号：US11694930

申请日：2007-03-30

申请人： Yu Cao ,  Feng Lu ,  Kai Lu ,  Woodrow Cannon

发明人： Yu Cao ,  Feng Lu ,  Kai Lu ,  Woodrow Cannon

IPC分类号： G06F17/30

CPC分类号： G06Q30/0273 ,  G06F16/951 ,  G06Q30/0275 ,  G06Q30/0277

摘要： A system that enables the search for providers of services or products, for a given user query that's in free text, and typically the services or products are focused on a particular area, such as an industry, a sector, etc. The system thus enables a searcher to submit queries that are substantially similar to those asked to an expert in the area, and get back results that are helpful in their decision making in obtaining services or products. Thus the searcher's experience is substantially similar to that of consulting a human expert. The system employs methods in matching and placing advertisements in relation to user queries and the concepts contained in these queries. Still further, it employs other various methods to enhance the searcher's effectiveness in their decision making. Finally, the system searches for queries that are composes of at least two languages. The system further comprises a method to (a) turn a large number of records, typically web pages crawled from the entire Web, into hundreds or even thousands of logical partitions, where each partition is associated with an identifier; and (b) take a user query that typically contains an identifier or several identifiers, and match records in those partitions with the identifier(s), or alternatively, take a user query, return multiple results, and then take the user's selection of identifier(s) and re-process the results so that only those associated with the selected identifier(s) are returned to the user.

摘要翻译： 一种能够搜索服务或产品提供商的系统，针对给定的用户查询是免费文本，通常是服务或产品集中在一个特定的领域，如行业，部门等。因此，系统启用 搜索者提交与该地区的专家所提出的查询大致相似的查询，并返回有助于他们在获取服务或产品方面的决策。 因此，搜索者的经验与咨询人类专家的经验基本相似。 该系统采用与用户查询和这些查询中包含的概念相匹配和放置广告的方法。 此外，它采用其他各种方法来提高搜索者在决策中的有效性。 最后，系统搜索至少包含两种语言的查询。 该系统还包括以下方法：（a）将大量记录（通常是从整个Web爬行的网页）转换成数百或甚至数千个逻辑分区，其中每个分区与标识符相关联; （b）采取通常包含标识符或多个标识符的用户查询，并在具有标识符的那些分区中匹配记录，或者替代地，进行用户查询，返回多个结果，然后取得用户对标识符的选择 并重新处理结果，使得只有与所选择的标识符相关联的那些被返回给用户。

公开(公告)号：US20070032896A1

公开(公告)日：2007-02-08

申请号：US11461929

申请日：2006-08-02

申请人： Jun Ye ,  Yu Cao ,  Guangqing Chen ,  Stefan Hunsche

发明人： Jun Ye ,  Yu Cao ,  Guangqing Chen ,  Stefan Hunsche

IPC分类号： G06F19/00

CPC分类号： G03F7/70516 ,  G03F7/705

摘要： A method for separately calibrating an optical model and a resist model of lithography process using information derived from in-situ aerial image measurements to improve the calibration of both the optical model and the resist model components of the lithography simulation model. Aerial images produced by an exposure tool are measured using an image sensor array loaded into the exposure tool. Multiple embodiments of measuring aerial image information and using the measured aerial image information to calibrate the optical model and the resist model are disclosed. The method of the invention creates more accurate and separable optical and resist models, leading to better predictability of the pattern transfer process from mask to wafer, more accurate verification of circuit patterns and how they will actually print in production, and more accurate model-based process control in the wafer fabrication facility.

摘要翻译： 使用从原位空间图像测量得到的信息分别校准光学模型和光刻工艺的抗蚀剂模型的方法，以改进光刻模拟和光刻模拟模型的抗蚀剂模型组件的校准。 使用装载到曝光工具中的图像传感器阵列来测量由曝光工具产生的空中影像。 公开了测量空间图像信息和使用所测量的空间图像信息来校准光学模型和抗蚀剂模型的多个实施例。 本发明的方法创建更精确和可分离的光学和抗蚀剂模型，导致从掩模到晶片的图案转移过程更好的可预测性，电路图案的更准确的验证以及它们将如何在生产中实际打印，以及更准确的基于模型 晶圆制造设备中的过程控制。

公开(公告)号：US07126681B1

公开(公告)日：2006-10-24

申请号：US10421626

申请日：2003-04-23

申请人： George Q. Chen ,  Lih-Huah Yiin ,  Yu Cao

发明人： George Q. Chen ,  Lih-Huah Yiin ,  Yu Cao

IPC分类号： G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/956

摘要： A method and apparatus for inspecting specimens or patterned transmissive substrates, such as photomasks, for unwanted particles and features, particularly those associated with contacts, including irregularly shaped contacts. A specimen is illuminated by a laser through an optical system comprised of a laser scanning system, individual transmitted and/or reflected light collection optics and detectors collect and generate signals representative of the light transmitted by the substrate. The defect identification of the substrate is performed using those transmitted light signals. Defect identification is performed using an inspection algorithm by comparing image feature representations of a test specimen with a reference specimen, and using a boundary computer and flux comparison device to establish tight boundaries around contacts and compute flux differences between the test and reference specimen contacts. Defect sizes are reported as ratio of flux difference, and entire contacts are highlighted for review.

公开(公告)号：US20050120327A1

公开(公告)日：2005-06-02

申请号：US11024121

申请日：2004-12-28

申请人： Jun Ye ,  Yen-Wen Lu ,  Yu Cao ,  Luoqi Chen ,  Xun Chen

发明人： Jun Ye ,  Yen-Wen Lu ,  Yu Cao ,  Luoqi Chen ,  Xun Chen

IPC分类号： G03B27/54 ,  G03F20060101 ,  G03F7/20 ,  G06F17/50 ,  G06K9/00 ,  G06T7/00

CPC分类号： G06F17/5009 ,  G03F1/00 ,  G03F7/004 ,  G03F7/705 ,  G03F7/70666 ,  G06F17/5081 ,  G06F19/00 ,  G06F2217/12 ,  G06F2217/14 ,  G06T7/0004 ,  G06T2207/30148 ,  G21K5/00

摘要： There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques. In this regard, in one embodiment, the present invention employs a lithography simulation system architecture, including application-specific hardware accelerators, and a processing technique to accelerate and facilitate verification, characterization and/or inspection of a mask design, for example, RET design, including detailed simulation and characterization of the entire lithography process to verify that the design achieves and/or provides the desired results on final wafer pattern. The system includes: (1) general purpose-type computing device(s) to perform the case-based logic having branches and inter-dependency in the data handling and (2) accelerator subsystems to perform a majority of the computation intensive tasks.