公开(公告)号：US07271396B2

公开(公告)日：2007-09-18

申请号：US10492574

申请日：2002-10-04

Applicant: Dror Shemesh

Inventor： Dror Shemesh

IPC: H01J37/26

CPC classification number: H01J37/1471 ,  H01J37/153 ,  H01J37/22 ,  H01J37/263 ,  H01J37/265 ,  H01J37/304 ,  H01J2237/045 ,  H01J2237/1501 ,  H01J2237/1532 ,  H01J2237/216 ,  H01J2237/221

Abstract: The invention provides a method for automatically aligning a beam of charged particles with an aperture. Thereby, the beam is defelcted to two edges of the aperture. From the signals required to obtain an extinction, a correction deflection field is calculated. Furter, a method for automatically aligning a beam of charged particles with an optical axis is provided. Thereby a defocusing is introduced and a signal calculated based on an introduced image shift is applied to a deflection unit. Further, a method for correction of the astigmatism is provided. Thereby the sharpness is evaluated for a sequence of frames measured whilst varying the signals to a stigmator.

Abstract translation: 本发明提供一种用于将带电粒子束自动对准孔的方法。 由此，光束被消除到光圈的两个边缘。 根据获得消光所需的信号，计算校正偏转场。 Furter提供了一种用于将带电粒子束自动对准光轴的方法。 从而引入散焦，并将基于引入的图像偏移计算的信号应用于偏转单元。 此外，提供了用于校正像散的方法。 因此，对于在将信号改变为瞄准器的同时测量的帧序列来评估锐度。

公开(公告)号：US20070114404A1

公开(公告)日：2007-05-24

申请号：US11532465

申请日：2006-09-15

Applicant: Dror Shemesh

Inventor： Dror Shemesh

IPC: G21K7/00

CPC classification number: H01J37/28 ,  H01J2237/057

Abstract: A method for detecting hidden defects and patterns, the method includes: receiving an object that comprises an opaque layer positioned above an intermediate layer; defining an energy band in response to at least one characteristic of the opaque layer and at least one characteristic of a scanning electron microscope; illuminating the object with a primary electron beam; and generating images from electrons that arrive to a spectrometer having an energy within the energy band. A scanning electron microscope that includes a stage for supporting an object that comprises an opaque layer positioned above an intermediate layer; a controller, adapted to receive or define an energy band in response to at least one characteristic of the opaque layer and at least one characteristic of a scanning electron microscope; illumination optics adapted to illuminate the object with a primary electron beam; an electron spectrometer, controlled by the controller such as to selectively reject electrons in response to the defined energy band; and a processor, coupled to the spectrometer, adapted to generate images from detection signals provided by the spectrometer.

Abstract translation: 一种用于检测隐藏的缺陷和图案的方法，所述方法包括：接收包含位于中间层上方的不透明层的对象; 响应于不透明层的至少一个特性和扫描电子显微镜的至少一个特征限定能带; 用一次电子束照射物体; 以及从到达具有能带内的能量的光谱仪的电子产生图像。 一种扫描电子显微镜，其包括用于支撑物体的台，所述台包括位于中间层上方的不透明层; 控制器，适于响应于所述不透明层的至少一个特性和扫描电子显微镜的至少一个特性接收或限定能带; 适于用一次电子束照射物体的照明光学器件; 由控制器控制的电子光谱仪，以便响应于限定的能带选择性地拒绝电子; 以及耦合到所述光谱仪的处理器，适于从由所述光谱仪提供的检测信号产生图像。

公开(公告)号：US20070090288A1

公开(公告)日：2007-04-26

申请号：US11533306

申请日：2006-09-19

Applicant: Dror Shemesh

Inventor： Dror Shemesh

IPC: H01J37/28

CPC classification number: H01J37/28 ,  H01J2237/057 ,  H01J2237/2814

Abstract: A method for improving the resolution of a scanning electron microscope, the method includes: defining an energy band in response to an expected penetration depth of secondary electrons in an object; illuminating the object with a primary electron beam; and generating images from electrons that arrive to a spectrometer having an energy within the energy band. A scanning electron microscope that includes: a stage for supporting an object; a controller, adapted to receive or define an energy band an energy band in response to an expected penetration depth of secondary electrons in an object; illumination optics adapted to illuminate the object with a primary electron beam; a spectrometer, controlled by the controller such as to selectively reject electrons in response to the defined energy band; and a processor that is adapted to generate images from detection signals provided by the spectrometer.

Abstract translation: 一种用于提高扫描电子显微镜的分辨率的方法，所述方法包括：响应于物体中二次电子的预期穿透深度来定义能带; 用一次电子束照射物体; 以及从到达具有能带内的能量的光谱仪的电子产生图像。 一种扫描电子显微镜，包括：用于支撑物体的台; 控制器，适于响应于物体中二次电子的预期穿透深度而接收或限定能带的能带; 适于用一次电子束照射物体的照明光学器件; 由控制器控制的光谱仪，以便响应于限定的能带选择性地拒绝电子; 以及适于根据由该光谱仪提供的检测信号产生图像的处理器。

公开(公告)号：US06894294B2

公开(公告)日：2005-05-17

申请号：US10600886

申请日：2003-06-19

Applicant: Dror Shemesh

Inventor： Dror Shemesh

IPC: B08B7/00 ,  H01L21/306 ,  G21G5/00

CPC classification number: H01L21/02046 ,  B08B7/00 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31747

Abstract: A system and method for reducing ion contamination in an object, the ion contamination introduced by a contaminating ion beam milling step. The system includes means for defining a suspected ion contaminated area; and means for removing the suspected ion contaminated area by a non-contaminating process, which usually involves directing an electron beam towards the removed area while allowing the beam to interact with additional material. The method includes the steps of defining a suspected ion contaminated area; and removing the suspected ion contaminated area by non-contaminating process.

Abstract translation: 用于减少物体中的离子污染的系统和方法，通过污染离子束研磨步骤引入的离子污染物。 该系统包括用于定义可疑离子污染区域的装置; 以及用于通过非污染过程去除可疑离子污染区域的装置，其通常涉及将电子束引向去除区域，同时允许光束与附加材料相互作用。 该方法包括确定可疑离子污染区域的步骤; 并通过非污染过程去除可疑的离子污染区域。

公开(公告)号：US20050017192A1

公开(公告)日：2005-01-27

申请号：US10492393

申请日：2002-10-09

Applicant: Dror Shemesh ,  Dubi Shachal

Inventor： Dror Shemesh ,  Dubi Shachal

IPC: G06T17/00 ,  G06T17/20 ,  H01J3/14 ,  H01J3/26 ,  H01J37/153 ,  H01J37/21 ,  H01J37/22 ,  H01J37/26

CPC classification number: H01J37/21 ,  H01J37/153 ,  H01J37/22 ,  H01J37/241 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/1501

Abstract: An apparatus and method for fast changing a focal length of a charged particle beam the method comprising the step of changing a control signal in response to a relationship between the control signal voltage value and the focal length of the charged particle beam.

Abstract translation: 一种用于快速改变带电粒子束的焦距的装置和方法，该方法包括响应于控制信号电压值与带电粒子束的焦距之间的关系改变控制信号的步骤。