公开(公告)号：US07045471B2

公开(公告)日：2006-05-16

申请号：US10220394

申请日：2001-03-06

申请人： Satoshi Kobayashi

发明人： Satoshi Kobayashi

IPC分类号： H01L21/31 ,  G03C1/492

CPC分类号： G03F7/0007 ,  G03F7/038 ,  G03F7/0382

摘要： A negative-working radiation sensitive resin composition with good heat resistance and low water absorption, which is useful for formation of a resist pattern in the lift-off method or as an insulating member in a organic EL panel and is able to form a reverse tapered resist pattern with a good shape. The negative-working radiation sensitive resin composition comprises (A) an alkali-soluble resin obtained by polycondensation of methylol bisphenol compounds represented by general formula (I) below, phenol compounds used as necessary and aldehydes, (B) a crosslinking agent and (C) a photo-acid generator. The negative-working radiation sensitive resin composition is applied onto a substrate, exposed to light and developed to form a reverse tapered pattern. A metal pattern is formed by vapor-depositing a metal film over the reverse tapered pattern and then removing the resist pattern by developer. Wherein R1 to R4 each represent a hydrogen atom, a C1 to C3 alkyl group or —CH2OH whereupon at least one of R1 to R4 represents —CH2OH, and R5 and R6 each represent a hydrogen atom or a C1 to C3 alkyl group.

摘要翻译： 一种具有良好耐热性和低吸水性的负性辐射敏感性树脂组合物，其可用于在剥离方法中形成抗蚀剂图案或作为有机EL面板中的绝缘构件，并且能够形成倒锥形 抗皱图案形状好。 负性辐射敏感性树脂组合物包含（A）通过以下通式（I）表示的羟甲基双酚化合物缩聚得到的碱溶性树脂，必要时使用的酚化合物和醛，（B）交联剂和（C ）光酸发生器。 将负性辐射敏感树脂组合物施加到基材上，曝光并显影以形成反向锥形图案。 通过在反向锥形图案上气相沉积金属膜然后通过显影剂去除抗蚀剂图案形成金属图案。 其中R 1至R 4各自表示氢原子，C 1至C 3烷基或-C 3 - CH 2 OH，其中R 1至R 4中的至少一个表示-CH 2 OH，R' R 5和R 6各自表示氢原子或C 1至C 3烷基。

公开(公告)号：US20060009008A1

公开(公告)日：2006-01-12

申请号：US11175155

申请日：2005-07-07

申请人： Yasuomi Kaneuchi ,  Yukio Morishige ,  Satoshi Genda ,  Satoshi Kobayashi ,  Toshio Tsuchiya ,  Ryugo Oba

发明人： Yasuomi Kaneuchi ,  Yukio Morishige ,  Satoshi Genda ,  Satoshi Kobayashi ,  Toshio Tsuchiya ,  Ryugo Oba

IPC分类号： H01L21/301 ,  B23K26/38

CPC分类号： H01L21/6836 ,  B23K26/03 ,  B23K26/032 ,  B23K26/0622 ,  B23K26/0853 ,  B23K26/364 ,  B23K26/40 ,  B23K2101/40 ,  B23K2103/50 ,  H01L21/67092 ,  H01L21/78 ,  H01L2221/68327

摘要： A method for the laser processing of a wafer having a plurality of devices which are composed of a laminate consisting of an insulating film and a functional film on the front surface of a substrate, the method comprising applying a pulse laser beam along streets for sectioning the plurality of devices to form grooves along the streets, wherein a pulse width of the pulse laser beam is set to 100 to 1,000 ns.

摘要翻译： 一种用于激光加工晶片的方法，所述晶片具有由基板前表面上的绝缘膜和功能膜构成的层叠体构成的多个器件，所述方法包括：沿着街道施加脉冲激光束， 多个装置沿着街道形成凹槽，其中脉冲激光束的脉冲宽度设定为100至1,000ns。

公开(公告)号：US20050098548A1

公开(公告)日：2005-05-12

申请号：US10981524

申请日：2004-11-05

申请人： Satoshi Kobayashi ,  Yukio Morishige

发明人： Satoshi Kobayashi ,  Yukio Morishige

IPC分类号： B23K26/067 ,  B28D5/00 ,  B23K26/06

CPC分类号： B23K26/0892 ,  B23K26/0613 ,  B23K26/0622 ,  B23K26/067 ,  B23K26/53 ,  B28D5/0011

摘要： A processing apparatus using a laser beam, which comprises holding means for holding a workpiece, and laser beam application means for irradiating the workpiece, held by the holding means, with a pulsed laser beam capable of passing through the workpiece, thereby deteriorating the workpiece. The laser beam application means includes pulsed laser beam oscillation means and transmitting/focusing means for transmitting and focusing the pulsed laser beam oscillated by the pulsed laser beam oscillation means. The transmitting/focusing means focuses the pulsed laser beam, with a time difference provided, to at least two focus points displaced in the optical axis direction.

摘要翻译： 使用激光束的处理装置，其包括用于保持工件的保持装置，以及用于通过保持装置保持的工件照射能够穿过工件的脉冲激光束的激光束施加装置，从而使工件恶化。 激光束施加装置包括脉冲激光束振荡装置和用于发射和聚焦由脉冲激光束振荡装置振荡的脉冲激光束的发射/聚焦装置。 发射/聚焦装置将提供的时间差的脉冲激光束聚焦到在光轴方向上移位的至少两个聚焦点。

公开(公告)号：US20050082267A1

公开(公告)日：2005-04-21

申请号：US10950813

申请日：2004-09-28

申请人： Yusuke Nagai ,  Satoshi Kobayashi ,  Yukio Morishige ,  Masaru Nakamura ,  Masahiro Murata

发明人： Yusuke Nagai ,  Satoshi Kobayashi ,  Yukio Morishige ,  Masaru Nakamura ,  Masahiro Murata

IPC分类号： B23K26/00 ,  B23K26/03

CPC分类号： B23K26/03 ,  B23K2101/40

摘要： A laser beam machine comprising a chuck table for holding a workpiece and a laser beam application means for applying a laser to the workpiece held on the chuck table, wherein the machine further comprises a processing sound wave detection means for detecting processing sound waves generated when a laser beam is applied to the workpiece from the laser beam application means and a control means for judging whether a detection signal from the processing sound wave detection means falls within a predetermined permissible range.

摘要翻译： 一种激光束机，包括用于保持工件的卡盘台和用于将激光施加到保持在卡盘台上的工件的激光束施加装置，其中，该机器还包括处理声波检测装置，用于检测当 激光束从激光束施加装置施加到工件，以及用于判断来自处理声波检测装置的检测信号是否落在预定允许范围内的控制装置。

公开(公告)号：US20050061789A1

公开(公告)日：2005-03-24

申请号：US10938728

申请日：2004-09-13

申请人： Yusuke Nagai ,  Satoshi Kobayashi ,  Yukio Morishige ,  Koichi Shigematsu

发明人： Yusuke Nagai ,  Satoshi Kobayashi ,  Yukio Morishige ,  Koichi Shigematsu

IPC分类号： B23K26/04 ,  B23K26/06

CPC分类号： B23K26/04

摘要： A laser beam machine comprising a workpiece holding means for holding a workpiece, a laser beam application means comprising a condenser for applying a laser beam to the workpiece held on the workpiece holding means, and a focusing point position adjusting means for adjusting the position of the focusing point of the laser beam applied by the condenser, wherein the machine further comprises a temperature detection means for detecting a temperature of the condenser and a control means for controlling the focusing point position adjusting means based on the temperature of the condenser detected by the temperature detection means.

摘要翻译： 一种激光束机器，包括用于保持工件的工件保持装置，激光束施加装置，包括用于将激光束施加到保持在工件保持装置上的工件的聚光器，以及聚焦点位置调整装置， 通过冷凝器施加的激光束的聚焦点，其中，该机器还包括用于检测冷凝器的温度的温度检测装置，以及用于根据温度检测到的冷凝器的温度来控制聚焦点位置调整装置的控制装置 检测手段。

公开(公告)号：US20050009301A1

公开(公告)日：2005-01-13

申请号：US10870053

申请日：2004-06-18

申请人： Yusuke Nagai ,  Satoshi Kobayashi

发明人： Yusuke Nagai ,  Satoshi Kobayashi

IPC分类号： B23K26/40 ,  H01L21/301

CPC分类号： B23K26/40 ,  B23K26/53 ,  B23K26/57 ,  B23K2101/40 ,  B23K2103/50

摘要： A method which can divide a semiconductor wafer sufficiently precisely along a street by use of a laser beam, while fully avoiding or suppressing contamination of circuits formed in rectangular regions on the face of the semiconductor water, and without causing chipping to the rectangular regions on the face. A laser beam is applied from beside one of the back and the face of a semiconductor substrate and focused onto the other of the back and the face of the semiconductor substrate, or the vicinity thereof, to partially deteriorate at least a zone ranging from the other of the back and the face of the semiconductor substrate to a predetermined depth.

摘要翻译： 可以通过使用激光束沿着街道充分精确地分割半导体晶片的方法，同时完全避免或抑制在半导体水的表面上形成的矩形区域中形成的电路的污染，并且不会导致半导体晶片上的矩形区域的碎片 面对。 激光束从半导体衬底的背面和表面之一施加，并且聚焦到半导体衬底的背面和表面的另一个或其附近，以至少部分地劣化从另一个区域 的半导体衬底的背面和表面到预定深度。

公开(公告)号：US20050003300A1

公开(公告)日：2005-01-06

申请号：US10909718

申请日：2004-08-02

申请人： Satoshi Kobayashi

发明人： Satoshi Kobayashi

IPC分类号： G03F7/00 ,  G03F7/038 ,  G03C1/76

CPC分类号： G03F7/0007 ,  G03F7/0382

摘要： A negative working radiation sensitive resin composition comprising; an alkali-soluble novolak resin treated by fractionation and having 1,000 to 10,000 of weight average molecular weight as determined by polystyrene standard, where the portion with molecular weight of 500 or less is 5% or less in the total resin; a crosslinking agent; and a photo acid generator. This negative working radiation sensitive resin composition can be used preferably as etching resist, ion implantation resist, plating resist, LCD panel structural material such as spacer and electrode insulation material for an organic EL display because of having wide process margin, high heat resistance, high sensitivity, high resolution and good pattern shape.

摘要翻译： 负性辐射敏感性树脂组合物，其包含： 通过分级处理的碱溶性酚醛清漆树脂，并且通过聚苯乙烯标准测定的重均分子量为1,000至10,000，其中分子量为500以下的部分在总树脂中为5％以下; 交联剂; 和光酸产生剂。 这种负型工作辐射敏感性树脂组合物可以优选用作抗蚀剂，离子注入抗蚀剂，电镀抗蚀剂，用于有机EL显示器的间隔物和电极绝缘材料的LCD面板结构材料，因为其具有宽的工艺余量，高耐热性，高 灵敏度高，分辨率高，图案形状好。

公开(公告)号：US06795631B2

公开(公告)日：2004-09-21

申请号：US10157065

申请日：2002-05-30

申请人： Yoshihiko Noro ,  Shiro Takahashi ,  Hisanori Suzuki ,  Satoshi Kobayashi

发明人： Yoshihiko Noro ,  Shiro Takahashi ,  Hisanori Suzuki ,  Satoshi Kobayashi

IPC分类号： G02B610

CPC分类号： G02B6/12011 ,  G02B6/1203 ,  G02B2006/12038 ,  G02B2006/121 ,  G02B2006/12135 ,  G02B2006/12178

摘要： An optical waveguide apparatus comprises a substrate (1), a patterned waveguide as a core (4), and an upper cladding layer (10) formed on the substrate. The core is surrounded by a cladding comprising the substrate as a lower cladding layer and the upper cladding layer and smaller in refractive index than the core. The core and the cladding are integrally coupled to each other in a manner such that temperature-dependent expansion or contraction is performed substantially in accordance the characteristic of the cladding. The core and the cladding are made of materials selected so that the variation in optical path length according to the temperature-dependent expansion or contraction of the cladding is canceled by the variation in optical path length according to temperature-dependent variation in refractive index of the core.

摘要翻译： 一种光波导装置，包括基板（1），作为芯（4）的图案化波导和形成在基板上的上包层（10）。 该芯被包层包围，该包层包括作为下包层的衬底和上包层，并且折射率小于芯。 芯和包层以这样的方式彼此一体地耦合，使得基本上根据包层的特性进行依赖于温度的膨胀或收缩。 芯和包层由选择的材料制成，使得根据温度依赖的包层的膨胀或收缩，光路长度的变化由于光程长度的变化而被消除，其中根据温度依赖的折射率的变化 核心。

公开(公告)号：US5939280A

公开(公告)日：1999-08-17

申请号：US570943

申请日：1995-12-12

申请人： Nobuo Hanai ,  Akiko Furuya ,  Motoo Yamasaki ,  Satoshi Kobayashi ,  Takashi Kuwabara

发明人： Nobuo Hanai ,  Akiko Furuya ,  Motoo Yamasaki ,  Satoshi Kobayashi ,  Takashi Kuwabara

IPC分类号： G01N33/53 ,  C07K14/52 ,  C07K14/53 ,  C07K14/535 ,  C07K16/00 ,  C07K16/24 ,  C12N5/10 ,  C12N15/02 ,  C12P21/08 ,  G01N33/535 ,  G01N33/577 ,  G01N33/537 ,  G01N33/543

CPC分类号： C07K16/243

摘要： An immunological assay for quantifying PEG-modified human granulocyte colony stimulating factor or derivatives thereof in a sample comprising bringing into contact with said sample an antibody which reacts with the human granulocyte colony stimulating factor or its derivative and with PEG-modified human granulocyte colony stimulating factor or its derivative and a monoclonal antibody which reacts specifically with the human granulocyte colony stimulating factor or its derivative but not with the PEG-modified human granulocyte-colony stimulating factor or its derivative.

摘要翻译： 用于定量样品中PEG修饰的人粒细胞集落刺激因子或其衍生物的免疫学测定法，其包括与所述样品接触与人粒细胞集落刺激因子或其衍生物反应的抗体和与PEG修饰的人粒细胞集落刺激因子 或其衍生物和单克隆抗体，其与人粒细胞集落刺激因子或其衍生物特异性反应，但不与PEG修饰的人粒细胞集落刺激因子或其衍生物反应。

公开(公告)号：US5583987A

公开(公告)日：1996-12-10

申请号：US361041

申请日：1994-12-21

申请人： Satoshi Kobayashi ,  Toshikazu Yokoi ,  Kunio Takahari ,  Yoichi Nakamura ,  Junichi Ishikawa ,  Nigel Bruce ,  David Wright ,  Colin Hough

发明人： Satoshi Kobayashi ,  Toshikazu Yokoi ,  Kunio Takahari ,  Yoichi Nakamura ,  Junichi Ishikawa ,  Nigel Bruce ,  David Wright ,  Colin Hough

IPC分类号： G06F11/14 ,  G06F11/00 ,  G06F11/20 ,  G06F15/177

CPC分类号： G06F11/1658 ,  G06F11/006 ,  G06F11/2028 ,  G06F11/1417 ,  G06F11/2043

摘要： A symmetric multiprocessor system connecting a plurality of CPUs by a common bus initializes itself while defective CPUs are set aside to use only the remaining CPUs when the power is turned on, thereby maintaining the predetermined CPU numbers and giving a minimum influence with the existing software thereof. The multiprocessor system includes an identifier setting register to designate in a predetermined order the CPU numbers only to normal CPUs, and a reset controller to cut off the defective CPUs from the common bus. The multiprocessor system can automatically start re-setting up where the defective CPUs are detected during the processing of setting-up based on the time-out detection, can release an abnormal state of the hardware, and can control the setting-up processing in use of any CPU based on the level of a reset status input port and contents of a reset information register.

摘要翻译： 通过公共总线连接多个CPU的对称多处理器系统将自身初始化，同时将有缺陷的CPU设置为仅在电源接通时仅使用剩余的CPU，从而保持预定的CPU数量并且对其现有软件产生最小的影响 。 多处理器系统包括标识符设置寄存器，用于以预定顺序指定CPU号码到正常CPU，以及复位控制器，以从公共总线切断有缺陷的CPU。 多处理器系统可以根据超时检测在设置处理期间自动开始重新设置检测到故障的CPU，可以释放硬件的异常状态，并可以控制使用中的设置处理 基于复位状态输入端口的电平和复位信息寄存器的内容。