Method and apparatus for non-contact measurement of a gauge of a high
temperature material
    31.
    发明授权
    Method and apparatus for non-contact measurement of a gauge of a high temperature material 失效
    用于非接触式测量高温材料量规的方法和装置

    公开(公告)号:US4027978A

    公开(公告)日:1977-06-07

    申请号:US431735

    申请日:1974-01-08

    IPC分类号: G01B11/02 G01B11/04

    CPC分类号: G01B11/022 G01B11/046

    摘要: There are provided a method and apparatus for noncontact measurement of a gauge of a high temperature material such as a red-hot steel slab, wherein the entire optical system including a light source, a filter and a detector is employed at wavelengths in the near-ultraviolet zone, preferably in the range 4,300 - 4,400 A, and a sampling mark corresponding to a reference projection point for an optical mark of wavelengths in the near-ultraviolet zone is established on the screen of a television receiver on which the optical mark is displayed in accordance with the output of a camera tube which receives the optical mark through a band-pass filter which transmits the wavelengths in the near-ultraviolet zone, whereby the light source and the camera tube are translated from the reference positions until the optical mark formed on a high temperature material to be measured coincides with the sampling mark so that the gauge of the high temperature material is measured in accordance with the distance covered by the parallel motion of the light source and the camera tube.

    摘要翻译: 提供了用于非接触式测量诸如红热钢板的高温材料的量规的方法和装置,其中包括光源,滤光器和检测器的整个光学系统采用近红外线的波长, 紫外线区域,优选在3,300-4,400A范围内,并且在其上显示光标记的电视接收机的屏幕上建立对应于近紫外区域中的波长光学标记的参考投影点的取样标记 根据通过透射近紫外区域中的波长的带通滤波器接收光学标记的相机管的输出,由此光源和照相机管从基准位置平移直到形成光标 在要测量的高温材料上与采样标记一致,使得高温材料的规格根据二 由光源和相机管的平行运动所覆盖的姿态。

    Chemical-mechanical polishing pad and chemical-mechanical polishing method
    32.
    发明授权
    Chemical-mechanical polishing pad and chemical-mechanical polishing method 有权
    化学机械抛光垫和化学机械抛光方法

    公开(公告)号:US08944888B2

    公开(公告)日:2015-02-03

    申请号:US13809694

    申请日:2011-06-13

    摘要: A chemical mechanical polishing pad includes a polishing layer, a recess being formed in a polishing surface of the polishing layer, the polishing layer including a surface layer that forms at least an inner side of the recess, and a ratio (D1/D2) of an average opening ratio D1(%) to an average opening ratio D2(%) being 0.01 to 0.5, the average opening ratio D1 being an average opening ratio of the inner side of the recess when the polishing layer has been immersed in water at 23° C. for 1 hour, and the average opening ratio D2 being an average opening ratio of a cross section of the polishing layer that does not intersect the surface layer when the cross section has been immersed in water at 23° C. for 1 hour.

    摘要翻译: 化学机械抛光垫包括抛光层,在抛光层的抛光表面上形成的凹槽,所述抛光层包括至少形成凹部内侧的表面层,以及所述抛光层的比例(D1 / D2) 平均开口率D1(%)相对于平均开口率D2(%)为0.01〜0.5,平均开口率D1是当抛光层浸入水中时凹部的内侧的平均开口率为23 ℃,1小时,平均开口率D2是当横截面已经在23℃的水中浸渍1小时时,与表面层不相交的抛光层的横截面的平均开口率 。

    CHEMICAL-MECHANICAL POLISHING PAD AND CHEMICAL-MECHANICAL POLISHING METHOD
    33.
    发明申请
    CHEMICAL-MECHANICAL POLISHING PAD AND CHEMICAL-MECHANICAL POLISHING METHOD 有权
    化学机械抛光垫和化学机械抛光方法

    公开(公告)号:US20130189907A1

    公开(公告)日:2013-07-25

    申请号:US13809694

    申请日:2011-06-13

    IPC分类号: B24B37/26 B24B37/24

    摘要: A chemical mechanical polishing pad includes a polishing layer, a recess being formed in a polishing surface of the polishing layer, the polishing layer including a surface layer that forms at least an inner side of the recess, and a ratio (D1/D2) of an average opening ratio D1(%) to an average opening ratio D2(%) being 0.01 to 0.5, the average opening ratio D1 being an average opening ratio of the inner side of the recess when the polishing layer has been immersed in water at 23° C. for 1 hour, and the average opening ratio D2 being an average opening ratio of a cross section of the polishing layer that does not intersect the surface layer when the cross section has been immersed in water at 23° C. for 1 hour.

    摘要翻译: 化学机械抛光垫包括抛光层,在抛光层的抛光表面上形成的凹槽,所述抛光层包括至少形成凹部内侧的表面层,以及所述抛光层的比例(D1 / D2) 平均开口率D1(%)相对于平均开口率D2(%)为0.01〜0.5,平均开口率D1是当抛光层浸入水中时凹部的内侧的平均开口率为23 ℃,1小时,平均开口率D2是当横截面已经在23℃的水中浸渍1小时时,与表面层不相交的抛光层的横截面的平均开口率 。

    Method for producing chemical mechanical polishing pad
    34.
    发明授权
    Method for producing chemical mechanical polishing pad 有权
    化学机械抛光垫的生产方法

    公开(公告)号:US07790788B2

    公开(公告)日:2010-09-07

    申请号:US12253349

    申请日:2008-10-17

    IPC分类号: D21H19/58 C08B37/02 B24D11/00

    摘要: There is provided a method for producing a chemical mechanical polishing pad, the method comprising the steps of (1) producing a sheet-shaped polymer molded article and (2) irradiating the sheet-shaped polymer molded article with an electron beam within an irradiation dose of 10 to 400 kGy.A chemical mechanical polishing pad produced by the above method has advantages that it is excellent in removal rate and scratches and in-plane uniformity on a polished surface and that it shows a stable removal rate even when polishing a number of objects to be polished successively.

    摘要翻译: 提供了一种生产化学机械抛光垫的方法,该方法包括以下步骤:(1)制备片状聚合物模塑制品,和(2)在辐射剂量内用电子束照射片状聚合物模塑制品 10到400 kGy。 通过上述方法制造的化学机械抛光垫具有在抛光表面上的去除率和划痕和面内均匀性优异的优点,即使在连续研磨多个待抛光物体时也能显示出稳定的去除率。

    Three-phase brushless self-excited synchronous generator with no rotor
excitation windings
    35.
    发明授权
    Three-phase brushless self-excited synchronous generator with no rotor excitation windings 失效
    无转子励磁绕组的三相无刷自励同步发电机

    公开(公告)号:US5694027A

    公开(公告)日:1997-12-02

    申请号:US569478

    申请日:1995-12-08

    IPC分类号: H02P9/14 H02K19/28

    CPC分类号: H02K19/28

    摘要: On a stator core, there are wound T-connection primary generating windings such that the second and third single-phase windings are respectively arranged at positions electrically orthogonal to the first single-phase winding. The winding number of the first single-phase winding is 31/2 times that of the second single-phase winding or the third single-phase winding. The stator excitation windings are also wound on the stator core, which are connected to the center taps of the primary generating windings through a control rectifier. A plurality of field windings are wound on a rotor core. The field windings are arranged at positions where they are magnetically coupled with both the odd-order spatial higher harmonic components of armature reaction magnetic fields produced by currents flowing in the primary generating windings and the static magnetic fields produced by current flowing in the stator excitation windings. Due to the T-connection primary generating windings, the generator is capable of simultaneously generating not only the three-phase outputs but also the single-phase three-line outputs.

    摘要翻译: 在定子铁芯上,缠绕有T形连接的初级绕组,使得第二和第三单相绕组分别布置在与第一单相绕组电正交的位置处。 第一单相绕组的绕组数为3 + E,第一单相绕组或第三单相绕组的绕组数为1/2 + EE倍。 定子励磁绕组也缠绕在定子铁芯上,定子铁心通过控制整流器连接到初级发电绕组的中心抽头。 多个励磁绕组缠绕在转子铁芯上。 场绕组被布置在它们与在主发生绕组中流动的电流产生的电枢反应磁场的奇数阶空间高次谐波分量和由在定子励磁绕组中流动的电流产生的静磁场磁耦合的位置处 。 由于T连接初级绕组,发电机不仅可以同时产生三相输出,而且可以同时产生单相三线输出。

    COMPOSITION FOR FORMING POLISHING LAYER OF CHEMICAL MECHANICAL POLISHING PAD, CHEMICAL MECHANICAL POLISHING PAD AND CHEMICAL MECHANICAL POLISHING METHOD
    38.
    发明申请
    COMPOSITION FOR FORMING POLISHING LAYER OF CHEMICAL MECHANICAL POLISHING PAD, CHEMICAL MECHANICAL POLISHING PAD AND CHEMICAL MECHANICAL POLISHING METHOD 有权
    用于形成化学机械抛光垫,化学机械抛光垫和化学机械抛光方法的抛光层组合物

    公开(公告)号:US20090191795A1

    公开(公告)日:2009-07-30

    申请号:US12357706

    申请日:2009-01-22

    摘要: Provided is a composition for forming a polishing layer of a chemical mechanical polishing pad having polishing characteristics such as a high polishing rate, an excellent planarity of the polished object and less scratches of the polished object.The above composition for forming a polishing layer of a chemical mechanical polishing pad comprises (A) a polyurethane having a carbon-carbon double bond on a side chain and (B) a cross-linking agent. The polyurethane (A) is preferably a thermoplastic polyurethane (A′) obtained by mixing at least the following components (a11) to (a13) and component (a2) in a proportion satisfying the following conditions (1) and (2) and reacting them: (a11) an oligomer which has one or more hydroxyl groups and one or more carbon-carbon double bonds and which has a number average molecular weight of 500 to 2500, (a12) an oligomer which has two or more hydroxyl groups and either one or both of an ether bond and an ester bond and which has a number average molecular weight of 500 to 2500 and is different from the component (a11), (a13) a monomer having two hydroxyl groups and (a2) a monomer having two isocyanate groups; and (1) a value of M-1/M-OH is 0.85 to 1.10, and (2) a value of M-2/M-OH is 0.45 to 0.80, wherein M-1 is the number of isocyanate groups contained in the component (a2), M-2 is the number of hydroxyl groups contained in the component (a13) and M-OH is the total number of hydroxyl groups contained in the components (a11), (a12) and (a13).

    摘要翻译: 提供一种用于形成化学机械抛光垫的抛光层的组合物,其具有抛光特性如抛光速度高,抛光对象的优良平面度和抛光对象的划痕少。 用于形成化学机械抛光垫的抛光层的上述组合物包括(A)侧链上具有碳 - 碳双键的聚氨酯和(B)交联剂。 聚氨酯(A)优选为通过以满足以下条件(1)和(2)的比例混合至少以下成分(a11)〜(a13)和成分(a2)而得到的热塑性聚氨酯(A'), 它们:(a11)具有一个或多个羟基和一个或多个碳 - 碳双键且数均分子量为500至2500的低聚物,(a12)具有两个或更多个羟基的低聚物和 醚键和酯键中的一种或两种,并且其数均分子量为500至2500,并且不同于组分(a11),(a13)具有两个羟基的单体和(a2)具有两个羟基的单体 异氰酸酯基; 和(1)M-1 / M-OH的值为0.85〜1.10,(2)M-2 / M-OH的值为0.45〜0.80,M-1为 组分(a2),M-2是组分(a13)中包含的羟基数,M-OH是组分(a11),(a12)和(a13)中所含羟基的总数。

    CHEMICAL MECHANICAL POLISHING PAD AND METHOD FOR MANUFACTURING SAME
    39.
    发明申请
    CHEMICAL MECHANICAL POLISHING PAD AND METHOD FOR MANUFACTURING SAME 审中-公开
    化学机械抛光垫及其制造方法

    公开(公告)号:US20090053983A1

    公开(公告)日:2009-02-26

    申请号:US12162184

    申请日:2007-01-22

    IPC分类号: B24D11/00

    摘要: There is provided a chemical mechanical polishing pad which has a circular polishing surface and a non-polishing surface that is the back side of the polishing surface and incorporates an information recording medium that is readable or readable/writable by an electromagnetic wave in a noncontact manner and in which the position of the center of gravity of the information recording medium in the radial direction of the polishing surface is preferably within a range of 0 to 10% or 80 to 100% of the radius of the polishing surface in the direction from the center on the radius of the polishing surface toward the periphery of the polishing surface.

    摘要翻译: 提供了一种化学机械抛光垫,其具有圆形抛光表面和作为抛光表面的背面的非抛光表面,并且包括以非接触方式由电磁波读取或读取/写入的信息记录介质 其中信息记录介质在抛光表面的径向方向上的重心位置优选地在抛光表面的方向上的研磨表面的半径的0至10%或80至100%的范围内 以研磨面的半径为中心朝向研磨面的周边。

    Thermoplastic resin composition having excellent long-term heat-aging properties
    40.
    发明授权
    Thermoplastic resin composition having excellent long-term heat-aging properties 有权
    热塑性树脂组合物具有优异的长期热老化性能

    公开(公告)号:US06337371B2

    公开(公告)日:2002-01-08

    申请号:US09775655

    申请日:2001-02-05

    IPC分类号: C08G6348

    CPC分类号: C08L69/00 C08L2666/02

    摘要: The present invention relates to a thermoplastic resin composition with excellent long-term heat-aging properties, comprising: (I) 10 to 45% by weight of a rubber-modified thermoplastic resin obtained by graft polymerizing at least one monomer selected from the group consisting of aromatic vinyl compounds, vinyl cyanide compounds and other vinyl monomers copolymerizable therewith in the presence of a rubber-like polymer; (II) 5 to 30% by weight of a thermoplastic resin obtained by copolymerizing the monomers comprising an aromatic vinyl compound, a vinyl cyanide compound and optionally other vinyl monomer copolymerizable therewith; and (III) 50 to 70% by weight of a polycarbonate resin, the content of the vinyl cyanide compound in the whole produced composition being 3 to 12% by weight.

    摘要翻译: 本发明涉及具有优异的长期热老化性能的热塑性树脂组合物,其包含:(I)10至45重量%的橡胶改性热塑性树脂,其通过将至少一种选自以下的单体接枝聚合而获得: 的芳族乙烯基化合物,乙烯基氰化合物和其它可与橡胶状聚合物共聚的乙烯基单体;(II)5-30重量%的热塑性树脂,其通过将包含芳族乙烯基化合物,乙烯基 氰化物化合物和可与其共聚的任意其它乙烯基单体; 和(III)50〜70重量%的聚碳酸酯树脂,全部生成组合物中的乙烯基氰化合物的含量为3〜12重量%。