Immunoassay method, reagent kit for detecting alkaline phosphatase, and reagent kit for immunoassay
    32.
    发明授权
    Immunoassay method, reagent kit for detecting alkaline phosphatase, and reagent kit for immunoassay 有权
    免疫测定法,碱性磷酸酶检测试剂盒和免疫测定试剂盒

    公开(公告)号:US09046516B2

    公开(公告)日:2015-06-02

    申请号:US12062170

    申请日:2008-04-03

    摘要: An immunoassay method comprising: forming, on a solid phase, a complex comprising a measurement substance in a sample, an alkaline phosphatase (ALP) labeling substance capable of binding to the measurement substance, and a first binding substance which is capable of binding to the measurement substance by antigen-antibody reaction and is capable of binding to the solid phase; reacting ALP in the ALP-labeling substance bound to the measurement substance in the complex, with a substrate for ALP contained in a substrate solution, in the presence of an auxiliary reagent solution comprising an inhibitor for inhibiting an endogenous ALP; and detecting a reaction product produced by the reaction between ALP and the substrate.

    摘要翻译: 一种免疫测定方法,包括:在固相上形成包含样品中的测量物质的复合物,能够结合所述测量物质的碱性磷酸酶(ALP)标记物质,以及能够与所述测定物质结合的第一结合物质 测量物质通过抗原 - 抗体反应并能够结合固相; 在包含用于抑制内源性ALP的抑制剂的辅助试剂溶液的存在下,将与所述复合物中的测量物质结合的ALP标记物质与含有底物溶液中的ALP的底物反应; 并检测通过ALP和基板之间的反应产生的反应产物。

    Liquid crystal display apparatus
    33.
    发明授权
    Liquid crystal display apparatus 有权
    液晶显示装置

    公开(公告)号:US09001296B2

    公开(公告)日:2015-04-07

    申请号:US14001150

    申请日:2012-02-20

    摘要: A liquid crystal display apparatus includes an electrode and a slit formation region provided in the electrode and extending in a direction of extension of a boundary line, a first alignment region and a third alignment region are formed such that liquid crystal molecules are aligned toward a first director orientation, a second alignment region and a fourth alignment region are formed such that liquid crystal molecules are aligned toward a second director orientation greater in an angle of orientation than the first director orientation, an angle of orientation of a first slit orientation is not greater than an angle of orientation of the first director orientation, and an angle of orientation of a second slit orientation is not smaller than an angle of orientation of the second director orientation.

    摘要翻译: 液晶显示装置包括电极和设置在电极中并沿着边界线的延伸方向延伸的狭缝形成区域,第一取向区域和第三取向区域形成为使得液晶分子朝向第一 形成导向器取向,第二取向区域和第四取向区域,使得液晶分子朝向比取向角度大于第一导向器取向的第二导向器取向取向,第一狭缝取向的取向角不大 并且第二狭缝取向的取向角度不小于第二导向器取向的取向角度。

    Liquid crystal display device
    34.
    发明授权
    Liquid crystal display device 有权
    液晶显示装置

    公开(公告)号:US08847863B2

    公开(公告)日:2014-09-30

    申请号:US13577987

    申请日:2010-12-20

    摘要: Disclosed is a liquid crystal display device of active matrix type. Each pixel electrode (1) includes either a single regional electrode (2) or two or more regional electrodes (2) which are electrically connected to each other. The or each regional electrode is provided with: a first electrode (cross-shaped electrode) (3) which has a pattern dividing a first region into a plurality of second regions (R1, R2, R3, and R4); and a plurality of stripe electrodes (4) which are provided in each of the second regions so as to extend from the first electrode and so as to be separated from each other by a distance. A storage capacitor line (CSL) is provided facing one of pixel electrodes (1) in a film thickness direction to form a storage capacitor. The storage capacitor line (CSL) is provided so as not to extend facing an edge (2e, 2e′) of a first region in the film thickness direction parallelly to the edge (2e, 2e′). The invention eliminates irregular orientation of liquid crystal molecules in polymer sustained alignment.

    摘要翻译: 公开了一种有源矩阵型液晶显示装置。 每个像素电极(1)包括彼此电连接的单个区域电极(2)或两个或更多个区域电极(2)。 该区域电极或每个区域电极设置有:第一电极(十字形电极)(3),其具有将第一区域划分成多个第二区域(R1,R2,R3和R4)的图案; 以及多个条状电极(4),其设置在每个第二区域中以便从第一电极延伸并且彼此分开一定距离。 在膜厚方向上设置有一个像素电极(1)的存储电容线(CSL),以形成存储电容器。 保持电容配线(CSL)被设置为不与面向边缘(2e,2e')的膜厚度方向上的第一区域的边缘(2e,2e')相对延伸。 本发明消除了聚合物持续排列中液晶分子的不规则取向。

    Thin-Film Piezoelectric Resonator and Thin-Film Piezoelectric Filter Using the Same
    35.
    发明申请
    Thin-Film Piezoelectric Resonator and Thin-Film Piezoelectric Filter Using the Same 有权
    薄膜压电谐振器和使用其的薄膜压电滤波器

    公开(公告)号:US20110298564A1

    公开(公告)日:2011-12-08

    申请号:US13202442

    申请日:2010-02-17

    摘要: A thin-film piezoelectric resonator including a substrate (6); a piezoelectric layer (2), a piezoelectric resonator stack (12) with a top electrode (10) and bottom electrode (8), and a cavity (4). The piezoelectric resonator stack (12) has a vibration region (40) where the top electrode and bottom electrode overlap in the thickness direction, and the vibration region comprises a first vibration region, second vibration region, and third vibration region. When seen from the thickness direction, the first vibration region is present at the outermost side, the third vibration region is present at the innermost side and does not contact the first vibration region, and the second vibration region is interposed between the first vibration region and third vibration region. The resonance frequency of the primary thickness-longitudinal vibration of the vibration region (40) is f1 at the first vibration region, is f2 at the third vibration region, wherein f1 and f2 satisfy a relationship of f1

    摘要翻译: 1.一种薄膜压电谐振器,包括基板(6); 压电层(2),具有顶部电极(10)和底部电极(8)的压电谐振器叠层(12)和空腔(4)。 压电谐振器叠层(12)具有顶部电极和底部电极在厚度方向上重叠的振动区域(40),振动区域包括第一振动区域,第二振动区域和第三振动区域。 当从厚度方向观察时,第一振动区域存在于最外侧,第三振动区域存在于最内侧并且不与第一振动区域接触,并且第二振动区域介于第一振动区域和第二振动区域之间, 第三振动区域。 振动区域(40)的初始厚度 - 纵向振动的共振频率在第一振动区域为f1,在第三振动区域为f2,其中f1和f2满足f1

    Plasma processing apparatus and control method thereof
    36.
    发明授权
    Plasma processing apparatus and control method thereof 有权
    等离子体处理装置及其控制方法

    公开(公告)号:US07682982B2

    公开(公告)日:2010-03-23

    申请号:US11060547

    申请日:2005-02-18

    IPC分类号: H01L21/302

    CPC分类号: H01J37/32082 H01J37/32935

    摘要: There is provided a plasma processing apparatus includes a lower electrode in a processing chamber on which a object to be processed is mounted; an upper electrode confronting the lower electrode; a first and a second high-frequency power supply for applying high-frequency powers respectively to the upper and the lower electrode; and an output controller for raising each of outputs from the high-frequency power supplies at least three times in a stepwise manner up to each of set levels for processing the object to be processed. The output controller adjusts each of rising times of the outputs from the high-frequency power supplies so that an output of the second high-frequency power supply is raised earlier than an output of the first high-frequency power supply while the outputs from the high-frequency power supplies are raised up to the set levels in a stepwise manner.

    摘要翻译: 提供了一种等离子体处理装置,其包括处理室中的下电极,其上安装有被处理物体; 面向下电极的上电极; 第一和第二高频电源,用于分别向上电极和下电极施加高频电源; 以及输出控制器,用于将高频电源的每个输出至少三次逐步地升高到用于处理待处理对象的每个设定电平。 输出控制器调整来自高频电源的输出的上升时间,使得第二高频电源的输出比第一高频电源的输出早,而高电平的输出 频率电源以逐步方式提升到设定电平。

    ANNULAR ASSEMBLY FOR PLASMA PROCESSING, PLASMA PROCESSING APPARATUS, AND OUTER ANNULAR MEMBER
    37.
    发明申请
    ANNULAR ASSEMBLY FOR PLASMA PROCESSING, PLASMA PROCESSING APPARATUS, AND OUTER ANNULAR MEMBER 审中-公开
    等离子体处理装置,等离子体处理装置和外部会员

    公开(公告)号:US20090229759A1

    公开(公告)日:2009-09-17

    申请号:US12399375

    申请日:2009-03-06

    IPC分类号: H01L21/306

    摘要: An annular assembly for plasma processing which can prevent poor attraction of a substrate. The annular assembly is comprised of a focus ring that is mounted on a mounting stage and disposed such as to surround an outer periphery of a substrate subjected to the plasma processing, and an outer annular member that is disposed such as to surround an outer periphery of the focus ring. The outer annular member has an exposed surface that is exposed into a processing space in which plasma is produced, and the exposed surface is covered with yttria.

    摘要翻译: 用于等离子体处理的环形组件,其可以防止衬底的不良吸引。 环形组件由聚焦环构成,该聚焦环安装在安装台上并且被布置成围绕经受等离子体处理的基板的外周,以及外环形构件,其设置成围绕外部环绕 焦点环。 外环形构件具有暴露于其中产生等离子体的处理空间中的暴露表面,并且暴露的表面被氧化钇覆盖。

    Plasma processing apparatus and plasma processing method
    38.
    发明授权
    Plasma processing apparatus and plasma processing method 有权
    等离子体处理装置和等离子体处理方法

    公开(公告)号:US07504040B2

    公开(公告)日:2009-03-17

    申请号:US11711769

    申请日:2007-02-28

    IPC分类号: B05D1/04

    摘要: An RF power (Bottom RF) from a radio-frequency power source 12 is turned off (t5) and the supply of a He gas 14 to a back face of a wafer W is stopped (t5) when an end point detector 17 (EPD) detects an end point (t5), and a high-voltage DC power source 13 (HV) is turned off (t6) under the condition in which an RF power (Top RF) from a radio-frequency power source 11 is controlled to fall within a range in which etching does not progress and plasma discharge can be maintained (t5). This process enables the inhibition of the adhesion of particles while an etching amount is accurately controlled.

    摘要翻译: 来自射频电源12的RF功率(底部RF)被关闭(t5),并且当端点检测器17(EPD)时,停止向晶片W的背面提供He气体14(t5) )检测终点(t5),并且在将来自射频电源11的RF功率(顶部RF)控制到的条件下,高压DC电源13(HV)被关闭(t6) 落在不进行蚀刻的范围内,能够维持等离子体放电(t5)。 该方法能够在蚀刻量被精确控制的同时抑制颗粒的粘附。

    Immunoassay and immunoassay apparatus
    39.
    发明授权
    Immunoassay and immunoassay apparatus 失效
    免疫测定和免疫测定仪

    公开(公告)号:US07390677B2

    公开(公告)日:2008-06-24

    申请号:US10019949

    申请日:2001-06-11

    IPC分类号: G01N33/546

    摘要: An immunoassay comprises the steps of: (a) mixing a whole blood sample with sensitized insoluble carrier particles smaller than erythrocytes to cause an immune agglutination reaction; (b) introducing the resulting immune agglutination reaction mixture including agglutinated particles and unagglutinated particles to a flow cell, irradiating the particles passing through the flow cell with laser light, and detecting scattered lights generated thereby; (c) setting a threshold value for distinguishing unagglutinated particles from agglutinated particles and a threshold value for distinguishing the agglutinated particles from blood cells with regard to intensity of the scattered light; and (d) distinguishing and counting the unagglutinated particles, the agglutinated particles and the blood cells from the scattered lights detected in the step (b), in reference to the threshold values set in the step (c).

    摘要翻译: 免疫测定法包括以下步骤:(a)将全血样品与小于红细胞的致敏不溶性载体颗粒混合以引起免疫凝集反应; (b)将所得到的包含凝集颗粒和未凝集颗粒的免疫凝集反应混合物引入流动池,用激光照射通过流动池的颗粒,并检测由此产生的散射光; (c)设定用于将未凝集的颗粒与凝集的颗粒区分开的阈值和用于区分凝集的颗粒与血细胞相关的散射光的强度的阈值; 和(d)参照步骤(c)中设定的阈值,从步骤(b)中检测到的散射光中区分和计数未凝集的颗粒,凝集粒子和血细胞。

    Plasma processing apparatus and plasma processing method
    40.
    发明申请
    Plasma processing apparatus and plasma processing method 有权
    等离子体处理装置和等离子体处理方法

    公开(公告)号:US20070148364A1

    公开(公告)日:2007-06-28

    申请号:US11711769

    申请日:2007-02-28

    IPC分类号: B05D1/04

    摘要: An RF power (Bottom RF) from a radio-frequency power source 12 is turned off (t5) and the supply of a He gas 14 to a back face of a wafer W is stopped (t5) when an end point detector 17 (EPD) detects an end point (t5), and a high-voltage DC power source 13 (HV) is turned off (t6) under the condition in which an RF power (Top RF) from a radio-frequency power source 11 is controlled to fall within a range in which etching does not progress and plasma discharge can be maintained (t5). This process enables the inhibition of the adhesion of particles while an etching amount is accurately controlled.

    摘要翻译: 关闭来自射频电源12的RF功率(底部RF)(t 5),并且当端点检测器17(t 5)停止向晶片W的背面提供He气体14时(t 5) (EPD)检测终点(t 5),并且在来自射频电源的RF功率(Top RF)的条件下,高压DC电源13(HV)截止(t 6) 11被控制在不进行蚀刻的范围内,能够维持等离子体放电(t 5)。 该方法能够在蚀刻量被精确控制的同时抑制颗粒的粘附。