公开(公告)号：US5032556A

公开(公告)日：1991-07-16

申请号：US481335

申请日：1990-02-20

申请人： Toshiyuki Mori ,  Yoshitaka Kubota ,  Takashi Mitamura ,  Hidehiko Kobayashi

发明人： Toshiyuki Mori ,  Yoshitaka Kubota ,  Takashi Mitamura ,  Hidehiko Kobayashi

IPC分类号： C01B33/20 ,  C04B35/48

CPC分类号： C01B33/20 ,  C04B35/481

摘要： A preparation method for zircon powder, which comprises heating a feed powder mixture comprising:(1) silica and zirconia obtained by subjecting a liquid having a pH of not higher than 8 and containing silica and zirconia in a SiO.sub.2 /ZrO.sub.2 molar ratio of substantially 1/1, to liquid-removing treatment, and(2) zircon in an amount of at least 0.1% by weight based on the total amount of said silica and zirconia,at a heating rate of not higher than 5.degree. C./min from 1,200.degree. C. to a calcination temperature, and maintaining it at a calcination temperature of from 1,300.degree. to 1,700.degree. C. for from 1.0 to 24 hours.

公开(公告)号：US09105338B2

公开(公告)日：2015-08-11

申请号：US13584899

申请日：2012-08-14

申请人： Kenichi Hidaka ,  Yoshitaka Kubota

发明人： Kenichi Hidaka ,  Yoshitaka Kubota

IPC分类号： G11C7/00 ,  G11C17/16 ,  G11C17/18 ,  H01L27/112 ,  H01L49/02

CPC分类号： H01L27/11206 ,  G11C17/16 ,  G11C17/18 ,  H01L28/40

摘要： The present invention provides an OTP memory having higher confidentiality. A memory cell has a memory transistor forming a current path between first and second nodes, a selection transistor forming a current path between third and fourth nodes, the third node being coupled to the gate of the memory transistor via a line, and a capacitor coupled to the first node. By applying high voltage which does not break but deteriorates a gate oxide film and increases gate leak current to a memory transistor, data is written. Data can be read by the presence/absence of leak of charges accumulated in the capacitor. Since the position of deterioration in the gate oxide film cannot be discriminated by a physical analysis, confidentiality is high.

摘要翻译： 本发明提供了具有较高保密性的OTP存储器。 存储单元具有形成第一和第二节点之间的电流路径的存储晶体管，形成第三和第四节点之间的电流路径的选择晶体管，第三节点通过线耦合到存储晶体管的栅极，以及电容器耦合 到第一个节点。 通过施加不破坏但会使栅极氧化膜劣化并且将栅极漏电流增加到存储晶体管的高电压，写入数据。 可以通过存在/不存在在电容器中累积的电荷的泄漏来读取数据。 由于不能通过物理分析区分栅极氧化膜的劣化位置，因此机密性高。

公开(公告)号：US09070925B2

公开(公告)日：2015-06-30

申请号：US13393530

申请日：2009-09-15

申请人： Masanori Nakamura ,  Ryo Sato ,  Hiroshi Iwakami ,  Atsuro Takeno ,  Yoshitaka Kubota

发明人： Masanori Nakamura ,  Ryo Sato ,  Hiroshi Iwakami ,  Atsuro Takeno ,  Yoshitaka Kubota

IPC分类号： H01M10/46 ,  H01M2/10 ,  B62J11/00 ,  B62K11/10 ,  B62K19/30

CPC分类号： H01M2/1072 ,  B62J11/00 ,  B62K11/10 ,  B62K19/30 ,  B62K2202/00 ,  B62K2204/00 ,  B62K2208/00 ,  H01M10/46

摘要： Provided are a battery charger, which is a different body from a vehicle and the durability, performance, etc., of which are maintained, and a battery charger attaching structure. The battery charger attaching structure comprises: a battery; a battery charger being a different body from a vehicle and charging the battery; an electric motor for generating driving force on the basis of the power supplied from the battery; vehicle covers for covering the vehicle; and an attachment portion provided on the vehicle covers and used for attaching the battery charger on the side of the vehicle. The attachment portion is provided at an upper part on a leg shield.

摘要翻译： 提供了一种电池充电器，其是与车辆不同的主体以及其保持的耐久性，性能等，以及电池充电器附接结构。 电池充电器附接结构包括：电池; 电池充电器是与车辆不同的身体并对电池充电; 电动马达，用于根据从电池提供的电力产生驱动力; 用于覆盖车辆的车辆盖; 并且设置在车辆上的安装部分覆盖并用于将电池充电器安装在车辆侧面。 附接部设置在腿部护罩的上部。

公开(公告)号：USD472003S1

公开(公告)日：2003-03-18

申请号：US29163085

申请日：2002-06-28

申请人： Takuji Kawano ,  Kazuhiro Sakamoto ,  Yoshitaka Kubota ,  Takashi Takizawa

设计人： Takuji Kawano ,  Kazuhiro Sakamoto ,  Yoshitaka Kubota ,  Takashi Takizawa

公开(公告)号：US06375543B1

公开(公告)日：2002-04-23

申请号：US09474007

申请日：1999-12-28

申请人： Hideto Kuramochi ,  Yoshitaka Kubota

发明人： Hideto Kuramochi ,  Yoshitaka Kubota

IPC分类号： B24B100

CPC分类号： C04B35/016 ,  B24D3/18 ,  B24D3/342 ,  B24D7/04

摘要： An abrasive molding predominantly comprised of manganese oxide is described, which has a bulk density of 0.4 to 4.0 g/cm3, a BET specific surface area of 0.2 to 250 m2/g and an average particle diameter of 0.005 to 10 &mgr;m. The abrasive molding has a multiplicity of minute pores, preferably with a pore diameter distribution such that the integrated pore volume of minute pores having a pore diameter of at least 1 &mgr;m is at least 20%, the integrated pore volume of minute pores having a pore diameter of 10 to 100 &mgr;m is at least 15%, and the integrated pore volume of minute pores having a pore diameter exceeding 100 &mgr;m is not larger than 5%, based on the total integrated pore volume of the minute pores of the abrasive molding. The porosity is preferably in the range of 30 to 95% by volume based on the apparent volume of the abrasive molding. The minute pores are preferably interconnecting minute pores which are open to the exterior, wherein a solid is contained which is soluble in a polishing liquid. An abrasive disc having the abrasive molding fixed to a supporting auxiliary is used for polishing a material to be polished.

摘要翻译： 描述了主要由氧化锰组成的研磨成型体，其堆积密度为0.4〜4.0g / cm 3，BET比表面积为0.2〜250m 2 / g，平均粒径为0.005〜10um。 磨料成型体具有多个微孔，优选具有孔径分布，使得孔径至少为1μm的微孔的整体孔体积为至少20％，具有孔的微孔的整体孔体积 10〜100μm的直径为15％以上，孔径超过100μm的细孔的一体孔体积相对于研磨成型体的微细孔的总整体积为5％以下。 基于研磨成型体的表观体积，孔隙率优选在30至95体积％的范围内。 细小孔优选是相互连接的向外部开口的微孔，其中容纳可溶于抛光液体的固体。 将具有固定到支撑辅助件的磨料模制件的研磨盘用于抛光待抛光材料。

公开(公告)号：US06143437A

公开(公告)日：2000-11-07

申请号：US236334

申请日：1999-01-25

申请人： Satoshi Kondou ,  Yoshitaka Kubota

发明人： Satoshi Kondou ,  Yoshitaka Kubota

IPC分类号： C04B35/48 ,  C04B35/486 ,  C04B35/622 ,  C23C14/08 ,  C23C14/24 ,  B32B7/00

CPC分类号： C23C14/083 ,  C04B35/486 ,  C04B35/62222 ,  Y02T50/67

摘要： A vapor deposition material which is a molded body composed of powdery zirconia and a stabilizer, the molded body having a fine structure constituted of a mixture of granules of zirconia particles and non-granulated particles; granules of particle diameter ranging from 20 to 300 .mu.m constitute 20 to 90% of the molded body; the granules of the zirconia particles containing substantially no stabilizer, and being constituted of crystals of a monoclinic phase and a cubic phase with a ratio of the monoclinic phase of 70% or higher; and the particles constituting the granules having an average particle diameter from 0.5 to 15 .mu.m. A process for vapor deposition which employs the above vapor deposition material, and further a member is provided of a base article coated directly, or with interposition of a third film, with a thin zirconia film. The vapor deposition coating material has improved thermal shock resistance on EB irradiation, not causing abrupt boiling of molten matter formed by EB irradiation, being capable of forming stable melt pool, and having a stable evaporation rate.

摘要翻译： 作为由粉末状氧化锆和稳定剂构成的成型体的蒸镀材料，该成型体具有由氧化锆粒子和非造粒粒子的混合物构成的微细结构， 颗粒直径20〜300μm的颗粒构成成型体的20〜90％ 所述氧化锆颗粒的颗粒基本上不含稳定剂，并且由单斜相和立方相的晶体构成，所述单斜相的比率为70％以上; 构成颗粒的颗粒的平均粒径为0.5〜15μm。 一种采用上述蒸镀材料的蒸镀方法，其特征在于，由直接涂布或搭载有第三薄膜的基材制成薄型氧化锆薄膜。 蒸镀层材料在EB照射下具有改善的耐热冲击性，不会导致由EB照射形成的熔融物质的突然沸腾，能够形成稳定的熔池，并且具有稳定的蒸发速率。

公开(公告)号：US6077581A

公开(公告)日：2000-06-20

申请号：US903993

申请日：1997-07-31

申请人： Hideto Kuramochi ,  Yoshitaka Kubota

发明人： Hideto Kuramochi ,  Yoshitaka Kubota

IPC分类号： B24B37/11 ,  B24B37/24 ,  B24B37/26 ,  B24D3/00 ,  B24D11/00 ,  C09K3/14 ,  B32B3/00

CPC分类号： B24B37/24 ,  B24B37/11 ,  B24B37/26 ,  B24D11/00 ,  B24D3/004 ,  C09K3/1409 ,  Y10T428/21 ,  Y10T428/213 ,  Y10T428/216 ,  Y10T428/25 ,  Y10T428/254 ,  Y10T428/2993

摘要： An abrasive shaped article composed of at least 90% by weight, based on the weight of the abrasive shaped article, of silica and having a bulk density of 0.2 g/cm.sup.3 to 1.5 g/cm.sup.3, a BET specific surface area of 10 m.sup.2 /g to 400 m.sup.2 /g and an average particle diameter of 0.001 .mu.m to 0.5 .mu.m. An abrasive disc having fitted thereto at least one of the abrasive shaped article is advantageously used for polishing a material such as substrate. Preferably at least two kinds of abrasive shaped articles are fitted to the supporting auxiliary, at least one kind of which has a bulk density of 0.7 g/cm.sup.3 to 1.5 g/cm.sup.3 and at least one kind of which has a bulk density of at least 0.2 g/cm.sup.3 but smaller than 0.7 g/cm.sup.3.

摘要翻译： 一种研磨成型制品，其由基于磨料成型制品的重量的至少90重量％的二氧化硅组成，其堆积密度为0.2g / cm 3至1.5g / cm 3，BET比表面积为10m 2 / g至400m 2 / g，平均粒径为0.001μm至0.5μm。 研磨成型体的至少一个上配有研磨盘有利地用于研磨诸如基材的材料。 优选地，至少两种研磨成型制品装配到支撑辅助件上，至少一种类型的堆积密度为0.7g / cm 3至1.5g / cm 3，并且其至少一种的堆积密度至少为 0.2g / cm 3，但小于0.7g / cm 3。

公开(公告)号：US5002912A

公开(公告)日：1991-03-26

申请号：US507290

申请日：1990-04-10

申请人： Hiroyoshi Takagi ,  Masanobu Awano ,  Yoshitaka Kubota ,  Yuzi Hoshi

发明人： Hiroyoshi Takagi ,  Masanobu Awano ,  Yoshitaka Kubota ,  Yuzi Hoshi

IPC分类号： C04B35/46 ,  H01C7/04

CPC分类号： C04B35/46 ,  H01C7/043

摘要： An oxide sintered product represented by the formula(TiO.sub.2).sub.1-x (SbO.sub.5/2)x(0.1.gtoreq.x.gtoreq.0.005)and having a bulk density of not less than 4.1 g/cm.sup.3.

公开(公告)号：US4268452A

公开(公告)日：1981-05-19

申请号：US128604

申请日：1980-03-10

申请人： Katsutoshi Mine ,  Yoshitaka Kubota ,  Tsuneo Maruyama

发明人： Katsutoshi Mine ,  Yoshitaka Kubota ,  Tsuneo Maruyama

IPC分类号： C08L83/04

CPC分类号： C08K5/54 ,  C08K3/0033 ,  C08G77/16

摘要： A noncurable sealing material from a hydroxyl end-blocked polydiorganosiloxane, a filler and a silane or siloxane with two hydrolyzable groups having silicon-nitrogen bonds or silicon-oxygen-nitrogen bonds. The material when mixed and stored under substantially anhydrous conditions remains fluid but when exposed to the moisture in air increases in viscosity to form a sealing material which is uncured.

摘要翻译： 来自羟基封端的聚二有机硅氧烷，填料和硅烷或硅氧烷的不可固化的密封材料具有两个具有硅 - 氮键或硅 - 氧 - 氮键的可水解基团。 当在基本上无水的条件下混合并储存时的材料保持流体，但当暴露于空气中的水分时，粘度增加，形成未固化的密封材料。

公开(公告)号：USD678129S1

公开(公告)日：2013-03-19

申请号：US29425428

申请日：2012-06-22

申请人： Yoshitaka Kubota ,  Maurizio Carbonara

设计人： Yoshitaka Kubota ,  Maurizio Carbonara