公开(公告)号：US5965444A

公开(公告)日：1999-10-12

申请号：US880745

申请日：1997-06-23

申请人： Toshihiko Ashikari ,  Hiroto Kondo ,  Keiko Sakakibara ,  Hiroyuki Araki ,  Yasuji Oshima

发明人： Toshihiko Ashikari ,  Hiroto Kondo ,  Keiko Sakakibara ,  Hiroyuki Araki ,  Yasuji Oshima

IPC分类号： C12N9/34 ,  C12N15/65 ,  C12N15/81 ,  C12N15/90 ,  C12Q1/68 ,  C07H21/04

CPC分类号： C12N9/2428 ,  C12N15/65 ,  C12N15/81 ,  C12N15/905

摘要： A DNA construct wherein a DNA fragment which is recombinable in yeast chromosomal DNA is directly or indirectly linked at both ends of a DNA fragment which comprises a pair of R sensitive sequences oriented in the same direction and flaking both an R gene placed under the control of an inducible promoter and an expressible selective marker gene, which is a DNA construct designed with the R sensitive sequences non-symmetrically shortened, so that no functionable R sensitive sequence remains after the R sensitive sequence recombination has occurred by expression of the R gene and the selective marker has been removed. Since no functionable R sensitive sequence remains after removal of the selective marker, recombination does not occur again, and thus the same selective marker may be used for multiple insertions of foreign genes.

摘要翻译： 一种DNA构建体，其中在酵母染色体DNA中可重组的DNA片段在DNA片段的两端直接或间接连接，所述DNA片段包含一对沿相同方向取向的R敏感序列， 可诱导的启动子和可表达的选择性标记基因，其是用R敏感序列非对称缩短设计的DNA构建体，使得在通过R基因的表达发生R敏感序列重组后，不存在可操作的R敏感序列 选择性标记已被删除。 由于在去除选择性标记物之后不存在可操作的R敏感序列，因此重新不再次发生，因此相同的选择性标记可用于多次插入外源基因。

公开(公告)号：US5275184A

公开(公告)日：1994-01-04

申请号：US779481

申请日：1991-10-18

申请人： Hisao Nishizawa ,  Yoshio Nomura ,  Hiroyuki Araki

发明人： Hisao Nishizawa ,  Yoshio Nomura ,  Hiroyuki Araki

IPC分类号： B08B3/10 ,  H01L21/00

CPC分类号： H01L21/67023 ,  B08B3/10 ,  Y10S134/902

摘要： A dipping type wafer treatment apparatus includes a treatment solution bath capable of forming a uniform rising flow of a treatment solution inside from an inlet to an outlet, a treatment solution supplying unit for supplying a treatment solution at a constant velocity to the inlet of the treatment solution bath to form a uniform rising flow of the treatment solution inside the treatment solution bath and a device for dipping and retrieving the wafer into and out of the uniform flow of the treatment solution. The treatment solution is supplied from the inlet in the treatment solution bath and drown off through an outlet of the treatment solution bath. Accordingly, the treatment solution can be rapidly substituted, and the wafers to no experience contact with air during replacement of the treatment solutions.

摘要翻译： 浸渍型晶片处理设备包括能够从入口到出口形成处理溶液的均匀上升流的处理溶液浴，将处理溶液以恒定速度供给到处理入口的处理溶液供给单元 溶液浴以在处理溶液浴中形成均匀的处理溶液的上升流，以及用于将晶片浸入和取出进入和流出处理溶液的均匀流动的装置。 处理溶液从处理溶液浴中的入口提供，并通过处理溶液浴的出口淹没。 因此，可以快速地替代处理溶液，并且在更换处理溶液期间晶片不经历与空气的接触。

公开(公告)号：US08765002B2

公开(公告)日：2014-07-01

申请号：US13409879

申请日：2012-03-01

申请人： Tomoyuki Azuma ,  Kenji Yamada ,  Hiroyuki Araki ,  Koji Ando

发明人： Tomoyuki Azuma ,  Kenji Yamada ,  Hiroyuki Araki ,  Koji Ando

IPC分类号： C03C15/00

CPC分类号： H01L21/67075 ,  H01L21/67028 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/67167 ,  H01L21/67253

摘要： A substrate processing apparatus includes a first processing chamber and a second processing chamber, a first substrate holding unit that holds a substrate in the first processing chamber, a chemical solution supply unit that supplies a chemical solution containing an etching component and a thickening agent to the substrate held by the first substrate holding unit, a substrate transfer unit that transfers the substrate from the first processing chamber to the second processing chamber in a state in which the chemical solution is held on the substrate, and a second substrate holding unit that holds a plurality of substrates on each of which the chemical solution is held in the second processing chamber.

摘要翻译： 基板处理装置包括第一处理室和第二处理室，第一处理室中保持基板的第一基板保持单元，向所述第一处理室供给含有蚀刻成分和增稠剂的化学溶液的化学溶液供给单元， 由第一基板保持单元保持的基板，在将化学溶液保持在基板上的状态下将基板从第一处理室转移到第二处理室的基板转印单元， 多个基板，每个基板上的化学溶液保持在第二处理室中。

公开(公告)号：US20130167227A1

公开(公告)日：2013-06-27

申请号：US13820676

申请日：2012-07-25

申请人： Keisuke Miura ,  Susumu Umemoto ,  Hiroyuki Araki ,  Yasuhisa Uoya

发明人： Keisuke Miura ,  Susumu Umemoto ,  Hiroyuki Araki ,  Yasuhisa Uoya

IPC分类号： G06F21/31 ,  G05B15/02

CPC分类号： H04W12/06 ,  A01B76/00 ,  A01B79/005 ,  B60K35/00 ,  E02F9/2054 ,  E02F9/24 ,  E02F9/26 ,  G05B15/02 ,  G06F21/31 ,  G06F21/35 ,  H04M3/5166 ,  H04W4/20

摘要： A working machine is provided with a control device that can make wireless communication with a mobile terminal storing a mobile-use ID code and stores a working machine-use ID code, wherein the control device is provided with: ID code checking means adapted to check the mobile-use ID code obtained by ID code obtaining means and the working machine-use ID code with each other; data communication means adapted, in the case where as a result of the checking by the checking means, matching between the ID codes is established, to allow data communication between the mobile terminal and the control device, and in the case where the matching is not established, not to allow the data communication; and ID code registration means adapted to register the working machine-use ID code in the mobile terminal as the mobile-use ID code.

摘要翻译： 一种工作机器具有控制装置，该控制装置能够与存储有移动用ID码的移动终端进行无线通信，并存储工作机器使用ID码，其中，所述控制装置设置有：ID码检查装置， 由ID码获取装置获取的移动用ID码和工作机器用ID码; 数据通信装置，在通过检查装置的检查结果确定了ID码之间的匹配被建立的情况下，允许移动终端和控制装置之间的数据通信，并且在不匹配的情况下 建立，不允许数据通信; 以及适用于将移动终端中的工作机器使用ID码注册为移动用ID码的ID码注册单元。

公开(公告)号：US20100236579A1

公开(公告)日：2010-09-23

申请号：US12161263

申请日：2006-01-17

申请人： Hiroyuki Araki ,  Kentaro Tokuri

发明人： Hiroyuki Araki ,  Kentaro Tokuri

IPC分类号： B08B3/00

CPC分类号： B08B3/10 ,  H01L21/67028 ,  H01L21/67051

摘要： A substrate processing apparatus and a substrate processing method are capable of restraining or preventing the generation of streaky particles on a substrate surface by excellent removal of a rinsing liquid therefrom. The substrate processing apparatus has a substrate inclining mechanism for inclining a substrate held by a substrate holding mechanism. After a rinsing liquid has been supplied onto a substrate to form a liquid mass, the substrate is inclined at a small angle by the substrate inclining mechanism. Then, the liquid mass is downwardly moved without being fragmented and then falls down without leaving minute droplets on the substrate top. Thereafter, the substrate is returned to a horizontal posture and then dried.

摘要翻译： 基板处理装置和基板处理方法能够通过从其中除去漂洗液而抑制或防止在基板表面上产生条纹颗粒。 基板处理装置具有用于使由基板保持机构保持的基板倾斜的基板倾斜机构。 在冲洗液已经被供给到基板上以形成液体块之后，基板通过基板倾斜机构以小角度倾斜。 然后，液体物质向下移动而不被分散，然后落下而不在基板顶部上留下微小的液滴。 此后，将基板返回到水平姿势，然后干燥。

公开(公告)号：US20100030573A1

公开(公告)日：2010-02-04

申请号：US12533878

申请日：2009-07-31

申请人： Hiroyuki Araki ,  Tatsuya Shiobara ,  Chieko Watanabe ,  Nobuaki Matsubara ,  Kazuhiro Akiyama ,  Hidenori Tsuruma ,  Tasuku Ogawa

发明人： Hiroyuki Araki ,  Tatsuya Shiobara ,  Chieko Watanabe ,  Nobuaki Matsubara ,  Kazuhiro Akiyama ,  Hidenori Tsuruma ,  Tasuku Ogawa

IPC分类号： G06Q10/00 ,  G06Q50/00

CPC分类号： G06Q50/22 ,  G06F19/00 ,  G06Q10/087 ,  G06Q10/1093 ,  G16H40/20

摘要： The examination schedule memory unit stores an examination schedule including the starting time and the ending time of each examination. A cleaning capacity memory unit stores cleaning-capacity information that specifies the cleaning capacity of cleaning apparatuses that clean a scope used for the examination. A cleaning schedule generation unit generates a cleaning schedule for cleaning a used scope produced at the end of each examination with cleaning apparatuses having a cleaning capacity required by the cleaning-capacity information stored in the cleaning capacity memory unit. The scope shortage determination unit determines whether or not there will be a shortage of scopes to be used for each examination in accordance with both the examination starting time specified by the above examination schedule and the cleaning ending time specified by the cleaning schedule.

摘要翻译： 检查时间表存储单元存储包括每次检查的开始时间和结束时间的检查时间表。 清洁能力存储单元存储清洁用于检查的清洁范围的清洁装置的清洁能力的清洁能力信息。 清洁进度生成单元生成用于清洁每次检查结束时产生的使用范围的清洁进度，其具有清洁能力存储单元中存储的清洁能力信息所需的清洁能力的清洁装置。 范围不足判定单元根据上述检查时间表规定的检查开始时间和由清洗进度指定的清洁结束时间两者，确定是否将缺少要用于每次检查的范围。

公开(公告)号：US07297527B2

公开(公告)日：2007-11-20

申请号：US10798278

申请日：2004-03-12

申请人： Hiroyuki Araki ,  Keiji Endo ,  Hiroshi Hagihara ,  Kazuaki Igarashi ,  Yasuhiro Hayashi ,  Katsuya Ozaki

发明人： Hiroyuki Araki ,  Keiji Endo ,  Hiroshi Hagihara ,  Kazuaki Igarashi ,  Yasuhiro Hayashi ,  Katsuya Ozaki

IPC分类号： C12N9/00 ,  C12N9/28 ,  C11D3/00 ,  C11D7/42

CPC分类号： C12N9/2417 ,  C11D3/386

摘要： The invention relates to mutant α-amylases that may be produced at high yield from recombinant microorganisms.

摘要翻译： 本发明涉及可以从重组微生物以高产率产生的突变型α-淀粉酶。

公开(公告)号：US20060021639A1

公开(公告)日：2006-02-02

申请号：US11190620

申请日：2005-07-27

申请人： Hiroshi Masuda ,  Hiroyuki Araki

发明人： Hiroshi Masuda ,  Hiroyuki Araki

IPC分类号： B08B3/00

CPC分类号： H01L21/67057 ,  Y10S134/902

摘要： A substrate processing apparatus includes a photosensor for detecting the presence/absence of a substrate in each place within a carrier cassette, a pair of processing tanks for performing the same process at the same time, and a supply mechanism for supplying a processing solution to the processing tanks independently. The number of substrates is detected in accordance with the result of the detection of the photosensor. If the number of substrates detected is not greater than an allowable number for one of the processing tanks, the processing solution is supplied to only the one processing tank to perform the process. This reduces the consumption of the processing solution in a batch process.

公开(公告)号：US20050115671A1

公开(公告)日：2005-06-02

申请号：US10998843

申请日：2004-11-29

申请人： Hiroyuki Araki

发明人： Hiroyuki Araki

IPC分类号： B08B1/00 ,  B05C11/08 ,  B05C11/10 ,  B08B3/02 ,  B08B7/04 ,  H01L21/00 ,  H01L21/02 ,  H01L21/027 ,  H01L21/304 ,  H01L21/306 ,  H01L21/311 ,  H01L21/3213

CPC分类号： H01L21/02071 ,  B08B7/04 ,  H01L21/02049 ,  H01L21/02052 ,  H01L21/31116 ,  H01L21/67046 ,  H01L21/67051 ,  H01L21/67167 ,  H01L21/67236

摘要： A substrate treating apparatus includes at least two types of treatment units, and a substrate carrying mechanism for carrying a substrate into/out of at least the two types of treatment units. At least the two types of treatment units are selected out of a chemical liquid treatment unit for supplying a chemical liquid to the substrate, a scrubbing unit for scrubbing a surface of the substrate, a polymer removal unit for supplying a polymer removal liquid to the substrate, a peripheral end surface treatment unit for supplying a treatment liquid to an area including the whole of one surface and a peripheral end surface of the substrate, and a gas phase treatment unit for supplying a vapor to the substrate.

摘要翻译： 基板处理装置包括至少两种类型的处理单元，以及用于将基板输送到至少两种类型的处理单元中的基板承载机构。 从用于向基板供给化学液体的化学液体处理单元中选择至少两种类型的处理单元，用于洗涤基板表面的洗涤单元，用于向基板供应聚合物去除液体的聚合物去除单元 外周端面处理单元，用于将处理液供给到包括基板整体的一个表面和外周端面的区域;以及气相处理单元，用于向基板供给蒸气。

公开(公告)号：US06743616B2

公开(公告)日：2004-06-01

申请号：US09971611

申请日：2001-10-09

申请人： Hiroyuki Araki ,  Keiji Endo ,  Hiroshi Hagihara ,  Kazuaki Igarashi ,  Yasuhiro Hayashi ,  Katsuya Ozaki

发明人： Hiroyuki Araki ,  Keiji Endo ,  Hiroshi Hagihara ,  Kazuaki Igarashi ,  Yasuhiro Hayashi ,  Katsuya Ozaki

IPC分类号： C12N900

CPC分类号： C12N9/2417 ,  C11D3/386

摘要： The invention relates to mutant &agr;-amylases that may be produced at high yield from recombinant microorganisms.

摘要翻译： 本发明涉及可以从重组微生物以高产率产生的突变型α-淀粉酶。