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103 条记录 (耗时 0.029 秒)

    Device for directing radiation to a layer, apparatus with such device and method using such apparatus
    32.
    发明授权
    Device for directing radiation to a layer, apparatus with such device and method using such apparatus 失效
    用于将辐射引导到层的装置，具有这种装置的装置和使用这种装置的方法

    公开(公告)号：US07605979B2

    公开(公告)日：2009-10-20

    申请号：US11911559

    申请日：2006-04-13

    申请人： Jacobus Hermanus Maria Neijzen ,  Helmar Van Santen

    发明人： Jacobus Hermanus Maria Neijzen ,  Helmar Van Santen

    IPC分类号： G02B27/10 ,  G02B27/14

    CPC分类号： G11B7/261 ,  G03F7/70383 ,  G03F7/70583

    摘要： A device for directing radiation to a layer (1) is described. The device includes a first optical element (L1) for focusing a first radiation beam (B1) originating from a first radiation source (S1) onto said layer, a second optical element (L2) for focusing a second radiation beam (B2) originating from a second radiation source (S2) onto said layer. The wavelengths of the radiation from said first and said second radiation source are different from each other. The first and second optical element are jointly movable with respect to said radiation sources, wherein the focal points of the two radiation beams at least substantially coincide with various movements of the first optical element and the second optical element with respect to the radiation sources. The second optical element (L2) has an aperture (A2) which allows optically undisturbed passage of the first radiation beam (B1). In this way a compact and light configuration of L1 and L2 is achieved as well as an improved radiation beam quality. Further an apparatus comprising such a device and a method using such an apparatus are disclosed.

    摘要翻译： 描述了用于将辐射引导到层（1）的装置。 该装置包括用于将源自第一辐射源（S1）的第一辐射束（B1）聚焦到所述层上的第一光学元件（L1），用于聚焦源自第二辐射源 第二辐射源（S2）到所述层上。 来自所述第一和第二辐射源的辐射的波长彼此不同。 第一和第二光学元件可相对于所述辐射源共同移动，其中两个辐射束的焦点至少基本上与第一光学元件和第二光学元件相对于辐射源的各种运动重合。 第二光学元件（L2）具有孔（A2），其允许第一辐射束（B1）的光学上不受干扰地通过。 以这种方式实现L1和L2的紧凑且轻的配置以及改进的辐射束质量。 此外，公开了一种包括这种装置的装置和使用这种装置的方法。

    Imprint lithography method and apparatus
    33.
    发明授权
    Imprint lithography method and apparatus 有权
    压印光刻方法和装置

    公开(公告)号：US07523701B2

    公开(公告)日：2009-04-28

    申请号：US11072686

    申请日：2005-03-07

    申请人： Erik Roelof Loopstra ,  Aleksey Yurievich Kolesnychenko ,  Helmar Van Santen

    发明人： Erik Roelof Loopstra ,  Aleksey Yurievich Kolesnychenko ,  Helmar Van Santen

    IPC分类号： B81C5/00 ,  B29C59/02

    CPC分类号： G03F7/0002 ,  B41M3/003 ,  B82Y10/00 ,  B82Y40/00

    摘要： An imprinting method is disclosed that involves, in an embodiment, redistributing a volume of imprintable medium in a flowable state over a target portion of a surface of a substrate into regions of differing volume corresponding to regions of differing pattern density of an imprint pattern of a template, contacting the medium while in the flowable state with the template to form the imprint pattern in the medium, subjecting the medium to conditions to change the medium into a substantially non-flowable state, and separating the template from the medium while in the substantially non-flowable state.

    摘要翻译： 公开了一种压印方法，其包括在一个实施例中，将可流动状态的可压印介质的体积重新分布在衬底的表面的目标部分上的不同体积的区域对应于不同图案密度的区域 模板，在可流动状态下与模板接触以在介质中形成压印图案，使介质经受条件以将介质改变为基本上不可流动的状态，并将模板与介质分离，同时基本上 不可流动状态。

    liquid removal in a method an device for irradiating spots on a layer
    38.
    发明申请
    liquid removal in a method an device for irradiating spots on a layer 有权
    在用于在层上照射斑点的装置的方法中的液体去除

    公开(公告)号：US20060261288A1

    公开(公告)日：2006-11-23

    申请号：US10538115

    申请日：2003-11-14

    申请人： Helmar Van Santen

    发明人： Helmar Van Santen

    IPC分类号： G21G5/00

    CPC分类号： G11B7/1374 ,  G03F7/70341 ,  G11B7/122 ,  G11B7/261

    摘要： For irradiating a layer (3) a radiation beam (7) is directed and focused to a spot (11) on the layer (3), relative movement of the layer (3) relative to the optical element (59) is caused so that, successively, different portions of the layer (3) are irradiated and an interspace (53) between a surface of the optical element (59) nearest to the layer (3) is maintained. Furthermore, at least a portion of the interspace (53) through which the radiation irradiates the spot (11) on the layer (3) is maintained filled with a liquid (91). By directing a gas flow (71-73) to a surface zone (74) of the layer (3), liquid (91) is reliably prevented from passing that surface zone (74), without causing damage to the layer (3). The liquid (91) is drawn away from the layer (3) in the vicinity of the surface zone (74).

    摘要翻译： 为了照射层（3），辐射束（7）被引导并聚焦到层（3）上的斑点（11），引起层（3）相对于光学元件（59）的相对运动，使得 照射层（3）的不同部分，并且维持最靠近层（3）的光学元件（59）的表面之间的间隙（53）。 此外，辐射照射层（3）上的斑点（11）的间隙（53）的至少一部分保持充满液体（91）。 通过将气流（71-73）引导到层（3）的表面区域（74），可靠地防止液体（91）通过该表面区域（74），而不会损坏层（3）。 液体（91）在表面区域（74）附近从层（3）被拉出。