Abstract:
Provided is an array substrate, an LCD device having the same, and a manufacturing method thereof using IPP. The method includes forming a gate line and a gate electrode on a substrate using a first mold, forming a gate insulating layer over the substrate and the gate line, forming a first plane layer on first portions of the gate insulating layer, forming a semiconductor layer on second portions of the gate insulating layer using a second mold, forming a second plane layer over the first plane layer, forming a data line on the second plane layer and a source electrode and a drain electrode on the semiconductor layer using a third mold, forming a passivation layer having a contact hole using a fourth mold, and forming a pixel electrode on the passivation layer using a fifth mold, the pixel electrode electrically connected to the drain electrode via the contact hole.
Abstract:
A resist solution is discussed. The resist solution includes: a base polymer, a tackifier, a carrier solvent, a printing solvent. The resist solution further includes a methoxy-based silane coupling agent which has a weak affinity for a carrier solvent containing ethanol.
Abstract:
A fabricating method of a flat panel display device according to the present invention includes providing a thin film on a substrate; providing a soft mold having a groove and a projection on the thin film; contacting the projection of the soft mold and the thin film; and spreading a hydrophilic polymer resin on the thin film to pattern the thin film.
Abstract:
A method of fabricating a thin film pattern improve the life of a blanket and reduce the cost and improve reliability in forming the thin film pattern. The method includes injecting an etch resist solution into a blanket on a printing roller, wherein the etch resist solution includes a printing solvent that satisfies the condition 6>δsolvent or δsolvent>11, where δsolvent is the solubility parameter of the solvent, or satisfies the condition 6
Abstract:
A method for fabricating an LCD device is disclosed, in which a reliable thin film pattern is formed as process deviation is minimized. The method includes forming a thin film on a substrate; forming an etch resist solution on the thin film; applying a soft mold having a concave portion and a convex portion to the etch resist solution, wherein the convex portion includes a first width and a second width different than the first width; forming an etch resist pattern having a predetermined linewidth controlled by the pressure applied by the soft mold; hardening the etch resist pattern; separating the soft mold from the substrate; and patterning the thin film using the etch resist pattern as a mask.
Abstract:
Disclosed is a method and apparatus for fabricating a patterned thin film layer within a flat panel display that employs a soft mold and heat treatment in place of a photolithographic process. The disclosed method may reduce process time as well as substantially minimize pattern deformities. A method of fabricating a thin film, a method and apparatus of fabricating a flat panel display according to an embodiment of the present invention includes the steps of forming a thin film on a substrate; coating an etch-resist solution including solvent over a substrate where the thin film has been formed; aligning a soft mold on the substrate provided with the etch-resist solution; forming a patterned etch-resist layer on the thin film by forming the etch-resist solution through a first heat treatment below the vaporization temperature of the solvent while pressure is applied to the soft mold on the etch-resist solvent; separating the soft mold from the patterned etch-resist layer; solidifying the patterned etch-resist layer through a second heat treatment; and etching the thin film by using the patterned etch-resist layer as a mask.
Abstract:
A blanket for a printing roll is disclosed that includes an Si-based resin layer and an acrylate film formed on one surface of the Si-based resin layer, wherein the acrylate film prevents a volatile solvent from permeating into the blanket, to thereby prevent the blanket from being deformed.
Abstract:
A fabricating method and apparatus of a thin film pattern improves the reliability of forming the thin film pattern by a resist printing method. The apparatus includes a print roller device of a roll shape around which a blanket is wound; a spray device located around the print roller device for spraying an etch resist solution to the blanket; and a print plate of an engraved shape where a groove of a desired thin film shape and a projected part except the groove are formed, and the etch resist solution has a surfactant inclusive of an ethylene oxide fluorinated polymer material.
Abstract:
Disclosed herein are a liquid crystal display panel and a method for fabricating the same wherein color reproducibility and superior image quality are achieved. The liquid crystal display panel comprises a color filter array substrate including a black matrix and a plurality of color filters arranged on a substrate, wherein each of the color filter includes a first color filter, a second color filter and a third color filter, each of them yielding a different color; and at least one selected from a fourth color filter yielding a mixed color of the first and second color filters, a fifth color filter yielding a mixed color of the second and third color filters, and a sixth color filter yielding a mixed color of the first and third color filters.
Abstract:
A method and apparatus for fabricating a flat panel display device is disclosed. A thin film is patterned in a patterning process using a soft mold without using a photo process. A thin film layer and a resist are sequentially formed on a substrate. A designated resist pattern is formed by applying pressure to the resist using a soft mold. The resist has a dipole moment μ value equal to or higher than 2 (D), or has a solubility parameter value lower than 6 (cal/cm3)1/2 or higher than 11 (cal/cm3)1/2.
Abstract translation:公开了一种用于制造平板显示装置的方法和装置。 使用软模具在图案化工艺中对薄膜进行图案化,而不使用照相工艺。 在基板上依次形成薄膜层和抗蚀剂。 通过使用软模具对抗蚀剂施加压力来形成指定的抗蚀剂图案。 抗蚀剂的偶极矩μ值等于或高于2(D),或者具有低于6(cal / cm 3)1/2或高于11(cal / cm 3)1/2的溶解度参数值。