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    Apparatus for tilting a carrier for optical elements
    33.
    发明授权
    Apparatus for tilting a carrier for optical elements 有权

    公开(公告)号：US07014328B2

    公开(公告)日：2006-03-21

    申请号：US10119182

    申请日：2002-04-08

    申请人： Ulrich Weber ,  Hubert Holderer ,  Alexander Kohl

    发明人： Ulrich Weber ,  Hubert Holderer ,  Alexander Kohl

    IPC分类号： G02B7/18 ,  G02B7/182

    CPC分类号： G02B7/182

    摘要： The invention relates to an apparatus for tilting a carrier for optical elements with two optical faces which are arranged together on a carrier and are fixed at a fixed angle to one another, the carrier being fastened on a base plate via articulated connections. The carrier can be pivoted about three tilting axes, a first tilting axis preferably being located in the plane of the first optical face and extending normal to the plane of the second optical face, the second tilting axis preferably being located in the plane of the second optical face and extending normal to the plane of the first optical face, and the third tilting axis being located parallel to the line of intersection between the two planes of the optical element.

    Method for correcting oscillation-induced imaging errors in an objective
    35.
    发明授权
    Method for correcting oscillation-induced imaging errors in an objective 失效
    用于校正物镜中振荡引起的成像误差的方法

    公开(公告)号：US06943965B2

    公开(公告)日：2005-09-13

    申请号：US10351901

    申请日：2003-01-27

    申请人： Alexander Kohl ,  Hubert Holderer

    发明人： Alexander Kohl ,  Hubert Holderer

    IPC分类号： G02B7/02 ,  G02B17/08 ,  G02B27/00 ,  G02B27/64 ,  H01L21/027 ,  G02B17/00

    CPC分类号： G03F7/70225 ,  G02B27/0068 ,  G02B27/646 ,  G03F7/709

    摘要： In a method for correcting oscillation-induced imaging errors in an objective, in particular a projection objective in microlithography for fabricating semiconductor elements, an at least first objective part and a second objective part are provided. In this case, the first objective part has a first optical axis and the second objective part has an optical axis which deviates from the first optical axis. Beam deflection takes place between the two objective parts via at least one optical beam deflection element. The oscillations occurring in the second objective part are measured and evaluated by means of a sensor system. The results are used as input data for a device, which adjusts the beam direction in the objective, in such a way that imaging errors occurring as a result of the oscillations of the second objective part are compensated for.

    摘要翻译： 在用于校正目标中的振荡引起的成像误差的方法中，特别是用于制造半导体元件的微光刻中的投影物镜，提供至少第一物镜部分和第二物镜部分。 在这种情况下，第一物镜部分具有第一光轴，第二物镜部分具有偏离第一光轴的光轴。 光束偏转通过至少一个光束偏转元件在两个物镜部分之间发生。 通过传感器系统测量和评估在第二目标部分中发生的振荡。 结果被用作用于调整物镜中的光束方向的装置的输入数据，以便补偿作为第二物镜部分的振荡的结果而产生的成像误差。