Objective, in particular a projection objective in microlithography
    6.
    发明申请
    Objective, in particular a projection objective in microlithography 审中-公开
    目的,特别是微光刻中的投影物镜

    公开(公告)号:US20060012893A1

    公开(公告)日:2006-01-19

    申请号:US10530689

    申请日:2003-08-13

    IPC分类号: G02B7/02

    摘要: An objective, in particular a projection objective in microlithography for producing semiconductor components, is assembled from a number of individual housing structures (4, 5), optical elements being arranged in each housing structure (4, 5), and a number of optical axes (15, 16, 18, 35) being formed by the housing structures (4, 5). At least one first housing structure (4) is provided with seats (22, 23, 24, 25) on which one or more further housing structures (5) and/or optical subassemblies (6, 8, 11, 14) are adjusted and are connected to the first housing structure (4).

    摘要翻译: 特别是用于制造半导体部件的微光刻中的投影物镜的目的是从多个单独的外壳结构(4,5)组装,设置在每个外壳结构(4,5)中的光学元件,以及多个光轴 (15,16,18,35)由所述壳体结构(4,5)形成。 至少一个第一壳体结构(4)设置有座(22,23,24,25),其上调整了一个或多个另外的壳体结构(5)和/或光学子组件(6,8,11,14),并且 连接到第一壳体结构(4)。