公开(公告)号：US07426011B2

公开(公告)日：2008-09-16

申请号：US11223209

申请日：2005-09-12

申请人： Koen Jacobus Johannes Maria Zaal ,  Antonius Johannes De Kort ,  Frederik Eduard De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Hermen Folken Pen

发明人： Koen Jacobus Johannes Maria Zaal ,  Antonius Johannes De Kort ,  Frederik Eduard De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Hermen Folken Pen

IPC分类号： G03B27/42

CPC分类号： G03F7/70341

摘要： In calibration of overlay performance of an immersion lithographic apparatus, two sets of overlay data are obtained from exposures carried out using normal and reversed meanders. The two data sets can then be used to eliminate effects due to wafer cooling.

摘要翻译： 在浸没光刻设备的叠加性能的校准中，从使用正反转的蜿蜒的曝光获得两组覆盖数据。 然后可以使用两个数据集来消除由于晶片冷却引起的影响。

公开(公告)号：US08947636B2

公开(公告)日：2015-02-03

申请号：US13050667

申请日：2011-03-17

申请人： Theodorus Petrus Maria Cadee ,  Jan Jaap Kuit ,  Johannes Catharinus Hubertus Mulkens ,  Koen Jacobus Johannes Maria Zaal

发明人： Theodorus Petrus Maria Cadee ,  Jan Jaap Kuit ,  Johannes Catharinus Hubertus Mulkens ,  Koen Jacobus Johannes Maria Zaal

IPC分类号： G03B27/58 ,  G03B21/58 ,  G03F7/20

CPC分类号： G03B21/58 ,  G03F7/70733

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; at least three substrate tables that are each constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the substrate tables are moveable in a common moving area extending substantially in a plane perpendicular to the patterned radiation beam, the moving area comprising at least three working locations of which at least one working location is arranged for exposure of the substrate to the patterned radiation beam and at least one working location is arranged for non-exposure purposes.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 至少三个衬底台，其被构造成保持衬底; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上，其中所述基板台可在基本上在垂直于所述图案化的辐射束的平面中延伸的公共移动区域中移动，所述移动区域包括至少三个工作 布置其至少一个工作位置的位置用于将衬底暴露于图案化的辐射束，并且至少一个工作位置被布置用于非曝光目的。

公开(公告)号：US08553201B2

公开(公告)日：2013-10-08

申请号：US12243291

申请日：2008-10-01

申请人： Bob Streefkerk ,  Henrikus Herman Marie Cox ,  Christiaan Alexander Hoogendam ,  Jeroen Johannes Sophia Maria Mertens ,  Koen Jacobus Johannes Maria Zaal ,  Minne Cuperus

发明人： Bob Streefkerk ,  Henrikus Herman Marie Cox ,  Christiaan Alexander Hoogendam ,  Jeroen Johannes Sophia Maria Mertens ,  Koen Jacobus Johannes Maria Zaal ,  Minne Cuperus

IPC分类号： G03B27/52 ,  G03B27/54 ,  G03B27/58 ,  G03B27/42 ,  G03B27/32

CPC分类号： G03F7/70341 ,  G03F7/70641 ,  G03F7/70783

摘要： An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.

公开(公告)号：US07903866B2

公开(公告)日：2011-03-08

申请号：US11730190

申请日：2007-03-29

申请人： Marc Wilhelmus Maria Van Der Wijst ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Koen Jacobus Johannes Maria Zaal

发明人： Marc Wilhelmus Maria Van Der Wijst ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Koen Jacobus Johannes Maria Zaal

IPC分类号： G06K9/00

CPC分类号： G03F7/7085 ,  G03F7/70425 ,  G03F7/70775 ,  G03F7/70783

摘要： An encoder-type measurement system is configured to measure a position dependent signal of a movable object, the measurement system including at least one sensor mountable on the movable object a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame. The measurement system further includes a compensation device configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensation device may include a passive or an active damping device and/or a feedback position control system. In an alternative embodiment, the compensation device includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.

摘要翻译： 编码器型测量系统被配置为测量可移动物体的位置相关信号，所述测量系统包括可安装在可移动物体上的至少一个传感器，可安装在基本上固定的框架上的传感器目标物体，以及安装装置， 传感器目标物体在基本上固定的框架上。 测量系统还包括补偿装置，其被配置为补偿传感器目标物体相对于基本上静止的框架的运动和/或变形。 补偿装置可以包括无源或主动阻尼装置和/或反馈位置控制系统。 在替代实施例中，补偿装置包括夹持装置，其在可移动物体的高精度运动期间固定传感器目标物体的位置。

公开(公告)号：US07649611B2

公开(公告)日：2010-01-19

申请号：US11321461

申请日：2005-12-30

申请人： Koen Jacobus Johannes Maria Zaal ,  Jeroen Joost Ottens

发明人： Koen Jacobus Johannes Maria Zaal ,  Jeroen Joost Ottens

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/58

CPC分类号： G03F7/70716 ,  G03F7/70341 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70783 ,  G03F7/7085 ,  G03F7/70858 ,  G03F7/70875

摘要： A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.

摘要翻译： 公开了一种具有与衬底台分开形成的盖板的光刻设备，以及通过控制盖板的温度来稳定衬底台的温度的装置。 公开了一种具有绝热性的光刻设备，其设置在盖板和基板台之间，使得盖板用作基板台的热屏蔽。 公开了一种光刻设备，其包括参考衬底台变形来确定衬底台变形并改善衬底的位置控制的装置。

公开(公告)号：US07492440B2

公开(公告)日：2009-02-17

申请号：US10936712

申请日：2004-09-09

申请人： Koen Jacobus Johannes Maria Zaal ,  Edwin Johan Buis ,  Henrikus Herman Marie Cox ,  Noud Jan Gilissen ,  Harmen Klaas Van Der Schoot

发明人： Koen Jacobus Johannes Maria Zaal ,  Edwin Johan Buis ,  Henrikus Herman Marie Cox ,  Noud Jan Gilissen ,  Harmen Klaas Van Der Schoot

IPC分类号： G02B27/52 ,  G02B27/42 ,  H02K41/00

CPC分类号： G03F7/70716 ,  G03F7/709

摘要： A substrate or a patterning device used in a lithographic apparatus and a lithographic device manufacturing method are presented. The substrate and patterning device are aligned with respect to a patterning beam and are movably supported by a support. Resonances in said support, however, may render the manufactured device unusable and/ or may render the control system complex. Therefore an actuator assembly frame with flexible coupling devices coupled to the support is provided with a number of actuators configured to move the support in a number of degrees of freedom. Thus, the resonances are damped by the flexible coupling devices resulting in a larger bandwidth for the control system and thus enabling a better position accuracy of the support.

摘要翻译： 在光刻设备中使用的基板或图案形成装置以及光刻装置的制造方法。 衬底和图案形成装置相对于图案化束对准并且由支撑件可移动地支撑。 然而，所述支撑件中的共振可能使制造的装置不可用和/或可能使控制系统复杂化。 因此，具有耦合到支撑件的柔性耦合装置的致动器组件框架设置有多个致动器，其构造成以多个自由度移动支撑件。 因此，谐振被柔性耦合装置阻尼，导致用于控制系统的较大带宽，从而使得支撑件具有更好的位置精度。

公开(公告)号：US07486381B2

公开(公告)日：2009-02-03

申请号：US10850451

申请日：2004-05-21

申请人： Bob Streefkerk ,  Henrikus Herman Marie Cox ,  Christiaan Alexander Hoogendam ,  Jeroen Johannes Sophia Maria Mertens ,  Koen Jacobus Johannes Maria Zaal ,  Minne Cuperus

发明人： Bob Streefkerk ,  Henrikus Herman Marie Cox ,  Christiaan Alexander Hoogendam ,  Jeroen Johannes Sophia Maria Mertens ,  Koen Jacobus Johannes Maria Zaal ,  Minne Cuperus

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/58 ,  G03B27/32

CPC分类号： G03F7/70341 ,  G03F7/70641 ,  G03F7/70783

摘要： An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.

摘要翻译： 浸没式光刻设备包括液体供应系统构件，其构造成在光刻设备的投影系统和基板之间的空间中容纳液体，液体供应系统构件补偿器被布置成补偿液体供应系统构件和衬底台之间的相互作用 。

公开(公告)号：US08457385B2

公开(公告)日：2013-06-04

申请号：US13019587

申请日：2011-02-02

申请人： Marc Wilhelmus Maria Van Der Wijst ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Koen Jacobus Johannes Maria Zaal

发明人： Marc Wilhelmus Maria Van Der Wijst ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Koen Jacobus Johannes Maria Zaal

IPC分类号： G06K9/00

CPC分类号： G03F7/7085 ,  G03F7/70425 ,  G03F7/70775 ,  G03F7/70783

摘要： An encoder-type measurement system is configured to measure a position dependent signal of a movable object, the measurement system including at least one sensor mountable on the movable object a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame. The measurement system further includes a compensation device configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensation device may include a passive or an active damping device and/or a feedback position control system. In an alternative embodiment, the compensation device includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.

摘要翻译： 编码器型测量系统被配置为测量可移动物体的位置相关信号，所述测量系统包括可安装在可移动物体上的至少一个传感器，可安装在基本上固定的框架上的传感器目标物体，以及安装装置， 传感器目标物体在基本上固定的框架上。 测量系统还包括补偿装置，其被配置为补偿传感器目标物体相对于基本上静止的框架的运动和/或变形。 补偿装置可以包括无源或主动阻尼装置和/或反馈位置控制系统。 在替代实施例中，补偿装置包括夹持装置，其在可移动物体的高精度运动期间固定传感器目标物体的位置。

公开(公告)号：US07830493B2

公开(公告)日：2010-11-09

申请号：US11257399

申请日：2005-10-25

申请人： Patricius Aloysius Jacobus Tinnemans ,  Willem Jurrianus Venema ,  Koen Jacobus Johannes Maria Zaal

发明人： Patricius Aloysius Jacobus Tinnemans ,  Willem Jurrianus Venema ,  Koen Jacobus Johannes Maria Zaal

IPC分类号： G03B27/52

CPC分类号： G03F7/70891 ,  G03F7/70725 ,  G03F7/70875

摘要： A system and method are used to compensate for thermal effect on a lithographic apparatus. The system comprises a patterning device, a projection system, a substrate position controller, and a substrate-position-based expansion-compensator. The patterning device modulates a radiation beam. The projection system projects the modulated radiation beam onto a target portion of a substrate. The substrate position controller moves the substrate relative to the projection system sequentially through a plurality of exposure positions. The substrate-position-based expansion-compensator interacts with the substrate position controller to modify the exposure positions in order at least partially to compensate for thermally-induced geometrical changes of at least one of the substrate and projection system.

摘要翻译： 系统和方法用于补偿光刻设备的热效应。 该系统包括图案形成装置，投影系统，基板位置控制器和基于基板位置的膨胀补偿器。 图案形成装置调制辐射束。 投影系统将调制的辐射束投影到基板的目标部分上。 基板位置控制器相对于投影系统顺序移动基板通过多个曝光位置。 基于衬底位置的膨胀补偿器与衬底位置控制器相互作用以至少部分地修改曝光位置以补偿至少一个衬底和投影系统的热诱导几何变化。

公开(公告)号：US07327437B2

公开(公告)日：2008-02-05

申请号：US11005480

申请日：2004-12-07

申请人： Henrikus Herman Marie Cox ,  Koen Jacobus Johannes Maria Zaal

发明人： Henrikus Herman Marie Cox ,  Koen Jacobus Johannes Maria Zaal

IPC分类号： G03B27/42 ,  G03B27/58

CPC分类号： G03F7/70725 ,  G05B2219/45028

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate support constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An actuator assembly is configured to move one of the supports with six degrees of freedom comprising x, y, z, rx, ry and rz directions. A controller controls the actuator assembly, and includes at least one compensator which is designed to dynamically decouple a dynamics of the actuator assembly in the degrees of freedom.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统，构造成支撑图案形成装置的图案形成装置支撑件，其能够在其横截面中赋予辐射束图案以形成图案化的辐射束，构造的衬底支架 以保持基板和配置成将图案化的辐射束投影到基板的目标部分上的投影系统。 致动器组件被配置为使包括x，y，z，rx，ry和rz方向的六个自由度中的一个支撑件移动。 控制器控制致动器组件，并且包括至少一个补偿器，其被设计成以自由度动态地解耦致动器组件的动力学。