公开(公告)号：US20110242518A1

公开(公告)日：2011-10-06

申请号：US13050667

申请日：2011-03-17

申请人： Theodorus Petrus Maria Cadee ,  Jan Jaap Kuit ,  Johannes Catharinus Hubertus Mulkens ,  Koen Jacobus Johannes Maria Zaal

发明人： Theodorus Petrus Maria Cadee ,  Jan Jaap Kuit ,  Johannes Catharinus Hubertus Mulkens ,  Koen Jacobus Johannes Maria Zaal

IPC分类号： G03B27/58

CPC分类号： G03B21/58 ,  G03F7/70733

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; at least three substrate tables that are each constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the substrate tables are moveable in a common moving area extending substantially in a plane perpendicular to the patterned radiation beam, the moving area comprising at least three working locations of which at least one working location is arranged for exposure of the substrate to the patterned radiation beam and at least one working location is arranged for non-exposure purposes.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 至少三个衬底台，其被构造成保持衬底; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上，其中所述基板台可在基本上在垂直于所述图案化的辐射束的平面中延伸的公共移动区域中移动，所述移动区域包括至少三个工作 布置其至少一个工作位置的位置用于将衬底暴露于图案化的辐射束，并且至少一个工作位置被布置用于非曝光目的。

公开(公告)号：US08947636B2

公开(公告)日：2015-02-03

申请号：US13050667

申请日：2011-03-17

申请人： Theodorus Petrus Maria Cadee ,  Jan Jaap Kuit ,  Johannes Catharinus Hubertus Mulkens ,  Koen Jacobus Johannes Maria Zaal

发明人： Theodorus Petrus Maria Cadee ,  Jan Jaap Kuit ,  Johannes Catharinus Hubertus Mulkens ,  Koen Jacobus Johannes Maria Zaal

IPC分类号： G03B27/58 ,  G03B21/58 ,  G03F7/20

CPC分类号： G03B21/58 ,  G03F7/70733

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; at least three substrate tables that are each constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the substrate tables are moveable in a common moving area extending substantially in a plane perpendicular to the patterned radiation beam, the moving area comprising at least three working locations of which at least one working location is arranged for exposure of the substrate to the patterned radiation beam and at least one working location is arranged for non-exposure purposes.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 至少三个衬底台，其被构造成保持衬底; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上，其中所述基板台可在基本上在垂直于所述图案化的辐射束的平面中延伸的公共移动区域中移动，所述移动区域包括至少三个工作 布置其至少一个工作位置的位置用于将衬底暴露于图案化的辐射束，并且至少一个工作位置被布置用于非曝光目的。

公开(公告)号：US07349067B2

公开(公告)日：2008-03-25

申请号：US10892394

申请日：2004-07-16

申请人： Jan Jaap Kuit ,  Petrus Rutgerus Bartray ,  Dirk Jan Bijvoet ,  Jan Frederik Hoogkamp

发明人： Jan Jaap Kuit ,  Petrus Rutgerus Bartray ,  Dirk Jan Bijvoet ,  Jan Frederik Hoogkamp

IPC分类号： G03B27/42 ,  G03B27/58

CPC分类号： G03F7/7075 ,  Y10S414/14

摘要： A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit that performs a lithographic process involving exchangeable objects in which the processing unit includes an illumination system that provides a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a substrate holder configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot. The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station.

摘要翻译： 提出了一种具有改进的转印单元的光刻设备。 光刻设备包括处理单元，该处理单元执行涉及可更换物体的光刻处理，其中处理单元包括提供辐射束的照明系统，支撑结构，其被配置为支撑图案形成装置，所述图案形成装置将期望的图案赋予辐射束 ，被配置为保持衬底的衬底保持器，以及配置成将所述图案化的光束投影到所述衬底的目标部分上的投影系统。 光刻设备还包括包括单个机器人的传送单元。 单个机器人被配置为将第一可交换对象从加载站传送到处理单元，并将第二可更换对象从处理单元传送到放电站。

公开(公告)号：US07151590B2

公开(公告)日：2006-12-19

申请号：US10784893

申请日：2004-02-24

申请人： Jan Jaap Kuit

发明人： Jan Jaap Kuit

IPC分类号： G03B27/42 ,  G03B27/72

CPC分类号： G03F7/7075 ,  G03F7/70991 ,  Y10S414/135

摘要： A lithographic apparatus and a device manufacturing method is disclosed. In particular, a transport system configured to transport substrates between the lithographic apparatus and a track is disclosed, the track comprising one or more processing devices. The transport system may also transport substrates between the processing devices within the track. In an embodiment, the transport system comprises a transporter pathway along which one or more tracks and lithographic apparatuses are spaced. The substrates can be transported along the transporter pathway by a transporting device adapted to hold a substrate.

摘要翻译： 公开了一种光刻设备和设备制造方法。 具体地，公开了一种配置成在光刻设备和轨道之间传送基板的传送系统，该轨道包括一个或多个处理设备。 传送系统还可以在轨道内的处理装置之间传送衬底。 在一个实施例中，传送系统包括传送器通道，一个或多个轨道和光刻设备沿着该传送器通道间隔开。 衬底可以通过适于保持衬底的传送装置沿着运送器路径传送。

公开(公告)号：US07408615B2

公开(公告)日：2008-08-05

申请号：US10871528

申请日：2004-06-21

申请人： Jan Jaap Kuit ,  Petrus Rutgerus Bartray ,  Dirk Jan Bijvoet ,  Jan Frederik Hoogkamp

发明人： Jan Jaap Kuit ,  Petrus Rutgerus Bartray ,  Dirk Jan Bijvoet ,  Jan Frederik Hoogkamp

IPC分类号： G03B27/42

CPC分类号： G03F7/70733 ,  G03F7/7075 ,  H01L21/67742 ,  Y10S414/14

摘要： A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit that performs a lithographic process involving exchangeable objects in which the processing unit includes an illumination system that provides a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a substrate holder configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot. The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station.

公开(公告)号：US20070070324A1

公开(公告)日：2007-03-29

申请号：US11238157

申请日：2005-09-29

申请人： Jan Jaap Kuit ,  Peter Schaap

发明人： Jan Jaap Kuit ,  Peter Schaap

IPC分类号： G03B27/58

CPC分类号： G03F7/70741 ,  G03F7/7075 ,  G03F7/70875

摘要： A lithographic apparatus arranged to transfer a pattern from a patterning structure onto a substrate is disclosed that includes a substrate holder configured to hold a substrate and a substrate temperature conditioner configured to condition a temperature of the substrate prior to, during, or both, a transfer of the substrate to the substrate holder to substantially match a temperature of the substrate holder.

摘要翻译： 公开了一种布置成将图案从图案形成结构转印到基板上的光刻设备，其包括被配置为保持基板的基板保持器和被配置为在转印之前，期间或两者期间调节基板的温度的基板温度调节器 的衬底到衬底保持器以基本上匹配衬底保持器的温度。

公开(公告)号：US07131999B2

公开(公告)日：2006-11-07

申请号：US10950674

申请日：2004-09-28

申请人： Jan Frederik Hoogkamp ,  Jan Jaap Kuit ,  Raimond Visser

发明人： Jan Frederik Hoogkamp ,  Jan Jaap Kuit ,  Raimond Visser

IPC分类号： G03B27/58

CPC分类号： G03F7/70741 ,  H01L21/68707

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table configured to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a robot configured to transfer an exchangeable object to and from a support region, the robot including an arm and an end effector, the end effector including a first and second carrier configured to carry respective exchangeable objects, and the end effector being rotatably connected to the arm of the robot around a rotation axis which extends substantially parallel to the support region.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 支撑构造成支撑图案形成装置，图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 以及机器人，其构造成将可交换物体传送到支撑区域和从支撑区域传递，所述机器人包括臂和端部执行器，所述末端执行器包括构造成承载相应可更换物体的第一和第二托架，并且所述末端执行器可旋转地连接到 机器人的臂围绕基本上平行于支撑区域延伸的旋转轴线。

公开(公告)号：US07130019B2

公开(公告)日：2006-10-31

申请号：US10986182

申请日：2004-11-12

申请人： Petrus Rutgerus Bartray ,  Wilhelmus Josephus Box ,  Carlo Cornelis Maria Luijten ,  Bernardus Antonius Johannes Luttikhuis ,  Michael Ten Bhomer ,  Ferdy Migchelbrink ,  Jan Jaap Kuit

发明人： Petrus Rutgerus Bartray ,  Wilhelmus Josephus Box ,  Carlo Cornelis Maria Luijten ,  Bernardus Antonius Johannes Luttikhuis ,  Michael Ten Bhomer ,  Ferdy Migchelbrink ,  Jan Jaap Kuit

IPC分类号： G03B27/42 ,  G03B27/58 ,  G03B27/62

CPC分类号： G03F7/7095 ,  G02B7/028 ,  G03F7/70833 ,  G03F7/70858 ,  G03F7/709

摘要： A lithographic apparatus is provided that includes an illumination system for conditioning a beam of radiation, and a support for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an isolated reference frame for providing a reference surface, and a measuring system for measuring the substrate with respect to the reference surface. The reference frame includes a material having a coefficient of thermal expansion of greater than about 2.9×10−6/K.

摘要翻译： 提供了一种光刻设备，其包括用于调节辐射束的照明系统和用于支撑图案形成装置的支撑件。 图案形成装置用于使辐射束在其横截面上具有图案。 该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统，用于提供参考表面的隔离参考框架，以及用于测量基板相对于基板的测量系统 参考面。 参考框架包括具有大于约2.9×10 -6 / K的热膨胀系数的材料。

公开(公告)号：US06406834B1

公开(公告)日：2002-06-18

申请号：US09588783

申请日：2000-06-07

申请人： Jan Jaap Kuit ,  Jan A. M. Smits ,  Judocus M. D. Stoeldraijer

发明人： Jan Jaap Kuit ,  Jan A. M. Smits ,  Judocus M. D. Stoeldraijer

IPC分类号： G03F720

CPC分类号： G03F7/70466 ,  G03F7/7075

摘要： A method of projecting an image onto a plurality of target areas on a substrate whereby use is made of a lithographic projection apparatus comprising: a radiation system for supplying a projection beam of radiation; a mask table provided with a mask holder for holding a mask; a substrate table provided with a substrate holder for holding a substrate; a projection system for imaging an irradiated portion of the mask onto a target area of the substrate, whereby the substrate is to be irradiated with images from at least two different masks, characterized by the following steps: (a) providing a batch of substrates, each at least partially coated with a layer of radiation-sensitive material; (b) providing storage means for temporary storage of the batch; (c) providing a first mask on the mask table; (d) irradiating a first set of target areas of a first substrate with an image from the first mask, and then placing that substrate in the storage means; (e) repeating step (d) for each of the other substrates in the batch; (f) replacing the first mask by a second mask; (g) providing a primary substrate from the storage means on the substrate table and irradiating a second set of target areas of that substrate with an image from the second mask; (h) repeating step (g) for each of the other substrates stored in the storage means.

摘要翻译： 一种将图像投影到基板上的多个目标区域上的方法，由此使用由光刻投影装置构成的光刻投影装置，该光刻投影装置包括：放射线系统，用于提供投影射线束;掩模台，设置有用于保持掩模的掩模支架; 设置有用于保持基板的基板保持器的基板台;用于将所述掩模的照射部分成像到所述基板的目标区域上的投影系统，由此所述基板将被照射来自至少两个不同掩模的图像，其特征在于， 以下步骤：（a）提供一批至少部分地涂覆有辐射敏感材料层的基材;（b）提供用于临时储存批料的储存装置;（c）在掩模上提供第一掩模 （d）用来自第一掩模的图像照射第一衬底的第一组目标区域，然后将该衬底放置在存储装置中;（e）对于每个另外的子层重复步骤（d） （f）通过第二掩模替换第一掩模;（g）从衬底台上的存储装置提供初级衬底并用来自第二掩模的图像照射该衬底的第二组目标区域 ;（h）对存储在存储装置中的每个其他基板重复步骤（g）。

公开(公告)号：US07423722B2

公开(公告)日：2008-09-09

申请号：US10766526

申请日：2004-01-29

申请人： Albert Johannes Maria Jansen ,  Jan Jaap Kuit ,  Erik Roelof Loopstra ,  Raymond Laurentius Johannes Schrijver

发明人： Albert Johannes Maria Jansen ,  Jan Jaap Kuit ,  Erik Roelof Loopstra ,  Raymond Laurentius Johannes Schrijver

IPC分类号： G03B27/32 ,  G03B27/42

CPC分类号： G03F7/70066 ,  G03F7/70425 ,  G03F7/70475 ,  G03F7/707

摘要： A lithographic apparatus has a mask table adapted to accommodate a mask in at least two positions so that a mask with a pattern area larger than the exposure field can be imaged by first performing an exposure with the mask in the first position and then performing a second exposure with the mask in the second position.

摘要翻译： 光刻设备具有适于在至少两个位置容纳掩模的掩模台，使得具有大于曝光场的图案区域的掩模可以通过首先在掩模的第一位置进行曝光，然后执行第二 第二位置的面罩曝光。