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    LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND SUBSTRATE EXCHANGING METHOD
    1.
    发明申请
    LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND SUBSTRATE EXCHANGING METHOD 有权
    光刻设备，器件制造方法和基板交换方法

    公开(公告)号：US20110242518A1

    公开(公告)日：2011-10-06

    申请号：US13050667

    申请日：2011-03-17

    申请人： Theodorus Petrus Maria Cadee ,  Jan Jaap Kuit ,  Johannes Catharinus Hubertus Mulkens ,  Koen Jacobus Johannes Maria Zaal

    发明人： Theodorus Petrus Maria Cadee ,  Jan Jaap Kuit ,  Johannes Catharinus Hubertus Mulkens ,  Koen Jacobus Johannes Maria Zaal

    IPC分类号： G03B27/58

    CPC分类号： G03B21/58 ,  G03F7/70733

    摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; at least three substrate tables that are each constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the substrate tables are moveable in a common moving area extending substantially in a plane perpendicular to the patterned radiation beam, the moving area comprising at least three working locations of which at least one working location is arranged for exposure of the substrate to the patterned radiation beam and at least one working location is arranged for non-exposure purposes.

    摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 至少三个衬底台，其被构造成保持衬底; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上，其中所述基板台可在基本上在垂直于所述图案化的辐射束的平面中延伸的公共移动区域中移动，所述移动区域包括至少三个工作 布置其至少一个工作位置的位置用于将衬底暴露于图案化的辐射束，并且至少一个工作位置被布置用于非曝光目的。

    Lithographic apparatus, device manufacturing method, and substrate exchanging method
    2.
    发明授权
    Lithographic apparatus, device manufacturing method, and substrate exchanging method 有权
    平版印刷设备，器件制造方法和衬底交换方法

    公开(公告)号：US08947636B2

    公开(公告)日：2015-02-03

    申请号：US13050667

    申请日：2011-03-17

    申请人： Theodorus Petrus Maria Cadee ,  Jan Jaap Kuit ,  Johannes Catharinus Hubertus Mulkens ,  Koen Jacobus Johannes Maria Zaal

    发明人： Theodorus Petrus Maria Cadee ,  Jan Jaap Kuit ,  Johannes Catharinus Hubertus Mulkens ,  Koen Jacobus Johannes Maria Zaal

    IPC分类号： G03B27/58 ,  G03B21/58 ,  G03F7/20

    CPC分类号： G03B21/58 ,  G03F7/70733

    摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; at least three substrate tables that are each constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the substrate tables are moveable in a common moving area extending substantially in a plane perpendicular to the patterned radiation beam, the moving area comprising at least three working locations of which at least one working location is arranged for exposure of the substrate to the patterned radiation beam and at least one working location is arranged for non-exposure purposes.

    摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 至少三个衬底台，其被构造成保持衬底; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上，其中所述基板台可在基本上在垂直于所述图案化的辐射束的平面中延伸的公共移动区域中移动，所述移动区域包括至少三个工作 布置其至少一个工作位置的位置用于将衬底暴露于图案化的辐射束，并且至少一个工作位置被布置用于非曝光目的。

    Apparatus and method for contactless handling of an object
    3.
    发明授权
    Apparatus and method for contactless handling of an object 有权
    用于非接触式处理物体的装置和方法

    公开(公告)号：US08616598B2

    公开(公告)日：2013-12-31

    申请号：US13081919

    申请日：2011-04-07

    申请人： Theodorus Petrus Maria Cadee ,  Koen Jacobus Johannes Maria Zaal ,  Timo Hol ,  Michael Wilhelmus Theodorus Koot

    发明人： Theodorus Petrus Maria Cadee ,  Koen Jacobus Johannes Maria Zaal ,  Timo Hol ,  Michael Wilhelmus Theodorus Koot

    IPC分类号： B25J15/06

    CPC分类号： H01L21/68785 ,  G03F7/7075 ,  H01L21/6838

    摘要： An apparatus configured to handle an object in a contactless manner, the apparatus includes a carrying body having a carrying surface which is configured to be directed towards the object, the carrying surface being provided with a plurality of traction members and a plurality of overpressure members, each overpressure member being provided with at least one exhaust opening, each traction member being provided with an indentation and at least two suction openings that are arranged in the indentation, the at least two suction openings of each traction member being configured to generate a pressure gradient between them so as to create a traction fluid flow in the indentation in a direction substantially parallel to the carrying surface; and a pressure controller configured to control the pressure gradient between the at least two suction openings of each traction member.

    摘要翻译： 一种被配置为以非接触方式处理物体的装置，该装置包括：承载体，其具有构造成朝向物体的承载表面，承载表面设置有多个牵引构件和多个超压构件， 每个超压构件设置有至少一个排气口，每个牵引构件设置有凹陷和布置在凹陷中的至少两个抽吸开口，每个牵引构件的至少两个抽吸孔构造成产生压力梯度 在它们之间以在基本上平行于承载表面的方向上在压痕中产生牵引流体流动; 以及压力控制器，被配置为控制每个牵引构件的至少两个吸入口之间的压力梯度。

    Lithographic apparatus and device manufacturing method
    6.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US08932042B2

    公开(公告)日：2015-01-13

    申请号：US13296571

    申请日：2011-11-15

    申请人： Johannes Petrus Martinus Bernardus Vermeulen ,  Antonius Franciscus Johannes De Groot ,  Theodorus Petrus Maria Cadee ,  Jeroen De Boeij

    发明人： Johannes Petrus Martinus Bernardus Vermeulen ,  Antonius Franciscus Johannes De Groot ,  Theodorus Petrus Maria Cadee ,  Jeroen De Boeij

    IPC分类号： B29C67/00 ,  B23K26/36 ,  G03F7/20

    CPC分类号： G03F7/70758 ,  G03F7/70691

    摘要： A lithography apparatus comprises a projection system arranged to transfer a pattern from a patterning device onto a substrate, a carrier, and a drive system for moving the carrier relative to the projection system in a plane defined by reference to orthogonal axes X and Y. The drive system comprises a shuttle moving parallel to the Y-axis, a shuttle connector connecting the shuttle to the carrier, the shuttle connector allowing movement of the carrier in a direction parallel to the X-axis relative to the shuttle, and a shuttle driver driving movement of the shuttle parallel to the Y-axis. The shuttle is located to one side of the carrier in a direction parallel to the X-axis and it is desirable if only one of the shuttle is connected to the carrier.

    摘要翻译： 光刻设备包括投影系统，其被布置成将图案从图案形成装置传送到基板，载体和驱动系统，用于在参考正交轴线X和Y限定的平面中相对于投影系统移动载体。 驱动系统包括平行于Y轴移动的梭子，将梭子连接到托架的穿梭连接器，穿梭连接器允许托架沿平行于X轴的方向相对于梭子运动，梭梭驱动器 梭子平行于Y轴的运动。 梭子在平行于X轴的方向上位于载体的一侧，并且希望只有梭子之一连接到载体上。

    Fluid handling structure, a lithographic apparatus and a device manufacturing method
    7.
    发明授权
    Fluid handling structure, a lithographic apparatus and a device manufacturing method 有权
    流体处理结构，光刻设备和装置制造方法

    公开(公告)号：US08830441B2

    公开(公告)日：2014-09-09

    申请号：US13404746

    申请日：2012-02-24

    申请人： Theodorus Petrus Maria Cadee ,  Raymond Wilhelmus Louis Lafarre

    发明人： Theodorus Petrus Maria Cadee ,  Raymond Wilhelmus Louis Lafarre

    IPC分类号： G03B27/52 ,  G03B27/42 ,  G03F7/20

    CPC分类号： G03F7/70341 ,  Y10T29/494 ,  Y10T137/8593

    摘要： A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure, wherein the fluid handling structure has a main body with an undersurface, a moveable member moveable relative to the main body, and a self-regulating mechanism to maintain a gap of a certain size between a bottom surface of the moveable member and the facing surface independent of the size of a gap between the undersurface and the facing surface.

    摘要翻译： 一种流体处理结构，其构造成将浸没液体供应到在投影系统和面向流体处理结构的相对表面之间限定的空间中，其中流体处理结构具有带有下表面的主体，可相对于主体移动的可移动构件， 以及自动调节机构，以在所述可移动部件的底表面和所述相对表面之间保持一定尺寸的间隙，而与所述下表面和所述相对表面之间的间隙的尺寸无关。