公开(公告)号：US20100134772A1

公开(公告)日：2010-06-03

申请号：US12656456

申请日：2010-01-29

申请人： Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Soichi Owa ,  Shigeru Hirukawa

发明人： Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Soichi Owa ,  Shigeru Hirukawa

IPC分类号： G03B27/52

CPC分类号： G03F7/70916 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70925

摘要： An exposure apparatus forms an immersion area of a liquid on the side of the image plane of a projection optical system and performs exposure of a substrate via the projection optical system and the liquid of the immersion region. The exposure apparatus has an optical cleaning unit which irradiates a predetermined irradiation light, having an optical cleaning effect, onto, for example, the upper surface of the substrate stage which makes contact with the liquid for forming the immersion area. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region.

摘要翻译： 曝光装置在投影光学系统的像面一侧形成液体的浸没区域，并通过投影光学系统和浸没区域的液体进行基板的曝光。 曝光装置具有光学清洁单元，其将具有光学清洁效果的预定照射光照射到例如与用于形成浸没区域的液体接触的基底台的上表面。 因此，可以防止由于与浸没区域中的液体接触的构件的污染导致的曝光精度和测量精度的劣化。

公开(公告)号：US20090225286A1

公开(公告)日：2009-09-10

申请号：US11630110

申请日：2005-06-21

申请人： Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Soichi Owa ,  Shigeru Hirukawa

发明人： Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Soichi Owa ,  Shigeru Hirukawa

IPC分类号： G03B27/52

CPC分类号： G03F7/70916 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70925

摘要： An exposure apparatus forms an immersion area of a liquid on the side of the image plane of a projection optical system and performs exposure of a substrate via the projection optical system and the liquid of the immersion region. The exposure apparatus has an optical cleaning unit which irradiates a predetermined irradiation light, having an optical cleaning effect, onto, for example, the upper surface of the substrate stage which makes contact with the liquid for forming the immersion area. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region.

摘要翻译： 曝光装置在投影光学系统的像面一侧形成液体的浸没区域，并通过投影光学系统和浸没区域的液体进行基板的曝光。 曝光装置具有光学清洁单元，其将具有光学清洁效果的预定照射光照射到例如与用于形成浸没区域的液体接触的基底台的上表面。 因此，可以防止由于与浸没区域中的液体接触的构件的污染导致的曝光精度和测量精度的劣化。

公开(公告)号：US20090153813A1

公开(公告)日：2009-06-18

申请号：US11883319

申请日：2007-01-27

申请人： Kenichi Shiraishi

发明人： Kenichi Shiraishi

IPC分类号： G03B27/52

CPC分类号： G03F7/70858 ,  G03F7/70341 ,  G03F7/70425

摘要： An exposure condition is determined in accordance with a moving condition of a substrate (P) relative to a projection optical system so that a pattern image is projected on the substrate (P) in a desired projection state, and the substrate (P) is exposed in the determined exposure condition.

摘要翻译： 根据基板（P）相对于投影光学系统的移动状态确定曝光条件，使得图案图像以期望的投影状态投影在基板（P）上，并且基板（P）暴露 在确定的暴露条件下。

公开(公告)号：US20080252865A1

公开(公告)日：2008-10-16

申请号：US12155742

申请日：2008-06-09

申请人： Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Soichi Owa ,  Shigeru Hirukawa

发明人： Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Soichi Owa ,  Shigeru Hirukawa

IPC分类号： G03B27/52

CPC分类号： G03F7/70916 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70925

摘要： An exposure apparatus forms an immersion area of a liquid on the side of the image plane of a projection optical system and performs exposure of a substrate via the projection optical system and the liquid of the immersion region. The exposure apparatus has an optical cleaning unit which irradiates a predetermined irradiation light, having an optical cleaning effect, onto, for example, the upper surface of the substrate stage which makes contact with the liquid for forming the immersion area. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region.

摘要翻译： 曝光装置在投影光学系统的像面一侧形成液体的浸没区域，并通过投影光学系统和浸没区域的液体进行基板的曝光。 曝光装置具有光学清洁单元，其将具有光学清洁效果的预定照射光照射到例如与用于形成浸渍区域的液体接触的基底台的上表面。 因此，可以防止由于与浸没区域中的液体接触的构件的污染而引起的曝光精度和测量精度的劣化。

公开(公告)号：US20080231825A1

公开(公告)日：2008-09-25

申请号：US12153234

申请日：2008-05-15

申请人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

发明人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

IPC分类号： G03B27/52

CPC分类号： G03F7/7085 ,  G03B27/52 ,  G03F7/00 ,  G03F7/2041 ,  G03F7/70316 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70958 ,  G03F9/7015 ,  G03F9/7088 ,  G03F9/7096

摘要： An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a flow passage in which exposure liquid flows, the flow passage being in fluidic communication with the space. The apparatus also includes a cleaning system which cleans the member.

摘要翻译： 曝光装置包括光学元件，通过该光学元件，图案化的光束通过填充在光学元件和基板之间的空间中的曝光液体投影到基板上。 该装置还包括具有流动通道的构件，曝气液体在该流动通道中，流动通道与该空间流体连通。 该装置还包括清洁构件的清洁系统。

公开(公告)号：US20060227312A1

公开(公告)日：2006-10-12

申请号：US11448927

申请日：2006-06-08

申请人： Soichi Owa ,  Nobutaka Magome ,  Shigeru Hirukawa ,  Yoshihiko Kudo ,  Jiro Inoue ,  Hirotaka Kohno ,  Masahiro Nei ,  Motokatsu Imai ,  Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Yasufumi Nishii ,  Hiroaki Takaiwa

发明人： Soichi Owa ,  Nobutaka Magome ,  Shigeru Hirukawa ,  Yoshihiko Kudo ,  Jiro Inoue ,  Hirotaka Kohno ,  Masahiro Nei ,  Motokatsu Imai ,  Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Yasufumi Nishii ,  Hiroaki Takaiwa

IPC分类号： G03B27/58

CPC分类号： G03F7/70341 ,  G03B27/58 ,  G03F7/2041 ,  G03F7/707 ,  G03F7/70716

摘要： In exposing substrate by projecting an image of a pattern onto substrate via projection optical system and liquid, side surface and underside surface of substrate are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided.

公开(公告)号：US20060077367A1

公开(公告)日：2006-04-13

申请号：US11284187

申请日：2005-11-22

申请人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

发明人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

IPC分类号： G03B27/42

CPC分类号： G03F7/7085 ,  G03B27/52 ,  G03F7/00 ,  G03F7/2041 ,  G03F7/70316 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70958 ,  G03F9/7015 ,  G03F9/7088 ,  G03F9/7096

摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.

公开(公告)号：US06556314B1

公开(公告)日：2003-04-29

申请号：US09325752

申请日：1999-06-04

申请人： Kenichi Shiraishi ,  Hiroshi Kawamoto ,  Hiroaki Takeshima ,  Mamoru Fujii ,  Akihiko Kumagai

发明人： Kenichi Shiraishi ,  Hiroshi Kawamoto ,  Hiroaki Takeshima ,  Mamoru Fujii ,  Akihiko Kumagai

IPC分类号： H04N140

CPC分类号： H04N1/00541 ,  H04N1/00538

摘要： A facsimile provided with a easily detachable scanner disclosed. When a button 7 provided in a panel 6 of a facsimile body F is pushed, lower a right end 10R of a release lever 10 is depressed, and the release lever 10 is turned on a pivot 10C to raise its left end 10L, thereby boosting a bottom 11 of the scanner S. In consequence thereof, the scanner S is ached from the facsimile body F.

摘要翻译： 具有公开的容易拆卸的扫描仪的传真机。 当设置在传真机身F的面板6中的按钮7被按下时，释放杆10的右端10R被下压，释放杆10转动到枢轴10C上以使其左端10L升高，从而提升 扫描仪S的底部11.因此，扫描器S从传真体F中消失。

公开(公告)号：US6097877A

公开(公告)日：2000-08-01

申请号：US444731

申请日：1995-05-19

申请人： Hironobu Katayama ,  Hiroaki Nogami ,  Kenichi Shiraishi

发明人： Hironobu Katayama ,  Hiroaki Nogami ,  Kenichi Shiraishi

IPC分类号： H04N5/783 ,  G11B5/008 ,  H04N5/92 ,  H04N7/52 ,  H04N9/804 ,  H04N19/00 ,  H04N19/423 ,  H04N19/46 ,  H04N19/503 ,  H04N19/577 ,  H04N19/587 ,  H04N19/59 ,  H04N19/61 ,  H04N19/625 ,  H04N19/65 ,  H04N19/66 ,  H04N19/70 ,  H04N19/85 ,  H04N19/89 ,  H04N19/895 ,  H04N19/91 ,  H04N5/91 ,  H04N5/917 ,  H04N7/26

CPC分类号： H04N21/236 ,  H04N21/434 ,  H04N9/8047 ,  G11B5/0086 ,  G11B5/00878 ,  H04N5/783

摘要： A digitally recording and reproducing apparatus simultaneously records two kinds of digital signals of an identical video program, generated by high-efficiency coding, or a relatively high bit-rate signal and a relatively low bit-rate signal, onto the approximately the same positions on the tape. The apparatus is constructed so that the low bit-rate signal is commonly used for normal playback and search-playback. Further, the recording time can be lengthened by reducing the recording bit-rate.

摘要翻译： 数字记录和再现装置同时将通过高效编码产生的相同视频节目的两种数字信号或相对较高的比特率信号和相对低的比特率信号记录在大致相同的位置上 磁带。 该装置被构造成使得低比特率信号通常用于正常播放和搜索重放。 此外，可以通过降低记录比特率来延长记录时间。

公开(公告)号：US5970046A

公开(公告)日：1999-10-19

申请号：US889575

申请日：1997-07-08

申请人： Toshiyuki Takegahara ,  Shoichi Suzuki ,  Kenichi Shiraishi ,  Hiroyuki Nagasaka ,  Atsushi Shinoda

发明人： Toshiyuki Takegahara ,  Shoichi Suzuki ,  Kenichi Shiraishi ,  Hiroyuki Nagasaka ,  Atsushi Shinoda

IPC分类号： H04B1/04 ,  H04B1/30 ,  H04J11/00

CPC分类号： H04B1/04 ,  H04B1/30

摘要： An apparatus for demodulating an AM data multiplexed modulated wave signal in which an analog modulated signal and digital modulated signals are multiplexed, in order to derive therefrom a baseband digital signal. The demodulation apparatus aims to derive the digital baseband signal from the AM data multiplexed modulated wave signal in which the analog modulated signal obtained by amplitude modulating a carrier having a frequency fc with an analog signal and the digital modulated signals at frequency position of (fc+f.alpha.) and (fc-f.alpha.) line-symmetrical with respect to a frequency axis of the frequency fc are multiplexed. A demodulation apparatus includes an AM type modulated wave signal eliminating circuit for removing an AM modulated wave signal from an input AM data multiplexed modulated wave signal, and a data demodulation circuit for receiving an output of the AM type modulated wave signal eliminating circuit and for deriving therefrom a baseband digital signal.

摘要翻译： 一种用于解调其中模拟调制信号和数字调制信号被多路复用的AM数据复用调制波信号的装置，以便从中得到基带数字信号。 解调装置旨在从AM数据复用调制波信号导出数字基带信号，其中通过对具有模拟信号的频率fc的载波进行幅度调制而获得的模拟调制信号和频率位置处的（fc + fα）和（fc-fα）相对于频率fc的频率轴线对称的多路复用。 解调装置包括：AM型调制波信号消除电路，用于从输入的AM数据复用调制波信号中去除AM调制波信号;以及数据解调电路，用于接收AM型调制波信号消除电路的输出， 从而提供基带数字信号。