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136 条记录 (耗时 0.036 秒)

    Data processing apparatus with software protecting functions
    31.
    发明授权
    Data processing apparatus with software protecting functions 失效
    具有软件保护功能的数据处理装置

    公开(公告)号：US5915025A

    公开(公告)日：1999-06-22

    申请号：US779643

    申请日：1997-01-15

    申请人： Masahiro Taguchi ,  Kenji Kawano ,  Kazuo Saito

    发明人： Masahiro Taguchi ,  Kenji Kawano ,  Kazuo Saito

    IPC分类号： G06F1/00 ,  G06F12/14 ,  G06F21/00 ,  G06F21/22 ,  G06F21/24 ,  G09C1/00 ,  H04L9/08 ,  H04L9/14 ,  H04L9/00

    CPC分类号： G06F12/145 ,  G06F21/14 ,  G06F21/602 ,  G06F21/72 ,  H04L9/088 ,  H04L9/16 ,  G06F2207/7219 ,  G06F2211/007

    摘要： A data processing apparatus with software protecting functions capable of enhancing the level of encryption security independently of the memory management method of the system comprising the apparatus. Upon receiving target data to be encrypted, an encryption key generation unit generates an encryption key in accordance with an attribute of the target data. Using the encryption key, an encryption unit encrypts the target data. The encrypted data is placed into a storage unit. When a request is made to process the encrypted data, a decryption key generation unit generates a decryption key in accordance with the attribute of the encrypted data. A decryption unit decrypts the encrypted data using the decryption key. The decrypted data is processed by a processing unit. A control unit supplies the encryption unit with the data processed by the processing unit as data to be encrypted.

    摘要翻译： 一种具有软件保护功能的数据处理装置，其能够独立于包括该装置的系统的存储器管理方法来增强加密安全级别。 在接收到要加密的目标数据时，加密密钥生成单元根据目标数据的属性生成加密密钥。 使用加密密钥，加密单元加密目标数据。 将加密的数据放入存储单元中。 当提出处理加密数据的请求时，解密密钥生成单元根据加密数据的属性生成解密密钥。 解密单元使用解密密钥解密加密数据。 解密的数据由处理单元处理。 控制单元向加密单元提供由处理单元处理的数据作为要加密的数据。

    Exposure mask and manufacturing method thereof
    32.
    发明授权
    Exposure mask and manufacturing method thereof 失效
    曝光掩模及其制造方法

    公开(公告)号：US5866280A

    公开(公告)日：1999-02-02

    申请号：US710408

    申请日：1996-09-17

    申请人： Shinichi Ito ,  Kenji Kawano ,  Soichi Inoue ,  Satoshi Tanaka

    发明人： Shinichi Ito ,  Kenji Kawano ,  Soichi Inoue ,  Satoshi Tanaka

    IPC分类号： G03F1/28 ,  G03F1/30 ,  G03F1/68 ,  G03F1/80 ,  H01L21/027 ,  G03F9/00

    CPC分类号： G03F1/26 ,  G03F1/30

    摘要： An exposure mask comprises a phase shift section including a plurality of opening patterns formed by making openings in part of a shading film provided on a transmissive substrate and digging part of the substrate, and a non-phase shift section including at least one opening pattern. The opening pattern of the non-phase shift section has a dig whose amount of digging has been adjusted according to the amount of digging in the opening patterns of the phase shift section.

    摘要翻译： 曝光掩模包括相移部分，其包括通过在设置在透射基板上的遮光膜的一部分上形成开口和挖掘基板的一部分而形成的多个开口图案，以及包括至少一个开口图案的非相移部分。 非相移部分的打开模式具有根据相移部分的打开模式中的挖掘量来调整挖掘量的挖掘。

    Method for manufacturing exposure mask and the exposure mask
    33.
    发明授权
    Method for manufacturing exposure mask and the exposure mask 失效
    曝光掩模和曝光掩模的制造方法

    公开(公告)号：US5543252A

    公开(公告)日：1996-08-06

    申请号：US228504

    申请日：1994-04-15

    申请人： Tsuyoshi Shibata ,  Koji Hashimoto ,  Katsuhiko Heida ,  Kenji Kawano ,  Shinichi Ito ,  Keiji Horioka

    发明人： Tsuyoshi Shibata ,  Koji Hashimoto ,  Katsuhiko Heida ,  Kenji Kawano ,  Shinichi Ito ,  Keiji Horioka

    IPC分类号： G03F1/29 ,  G03F1/30 ,  G03F1/34 ,  G03F9/00

    CPC分类号： G03F1/30 ,  G03F1/29 ,  G03F1/34

    摘要： A method for manufacturing an exposure mask provided with a substrate for transmitting an exposure light and with phase shifters arranged at prescribed intervals on the substrate for shifting the phase of the exposure light transmitted through the substrate by a half wavelength as compared with the phase of the exposure light transmitted through both the substrate and an opening between the phase shifters consists of the steps of preparing a solution containing a phase shifter material, arranging resist layers at the prescribed intervals on the substrate, immersing the substrate with the resist layers in the solution, forming the phase shifters on the substrate between the resist layers by a prescribed thickness by depositing the material of the phase shifter from the solution, and removing the resist layers from the substrate to form the openings.

    摘要翻译： 一种制造曝光掩模的方法，该曝光掩模具有用于透射曝光光的基板和在基板上以规定间隔布置的移相器，用于将透过该基板的曝光光的相位与第二波长的相位相比移动一半波长 透过基板和移相器之间的开口的曝光光由以下步骤组成：制备含有移相材料的溶液，在基板上以规定的间隔配置抗蚀剂层，将基板与抗蚀剂层浸入溶液中， 通过从溶液中沉积移相器的材料，在基板上形成位于抗蚀剂层之间的相移规定厚度的移相器，以及从基板去除抗蚀剂层以形成开口。

    Ink jet recording apparatus and detachably mountable ink jet cartridge
    34.
    发明授权
    Ink jet recording apparatus and detachably mountable ink jet cartridge 失效
    喷墨记录装置和可拆卸安装的喷墨盒

    公开(公告)号：US5500664A

    公开(公告)日：1996-03-19

    申请号：US339882

    申请日：1994-11-14

    申请人： Etsurou Suzuki ,  Yoshifumi Hattori ,  Masashi Kitani ,  Hideo Saikawa ,  Masami Kojima ,  Kenji Kawano ,  Koichi Tanno ,  Kenji Aono

    发明人： Etsurou Suzuki ,  Yoshifumi Hattori ,  Masashi Kitani ,  Hideo Saikawa ,  Masami Kojima ,  Kenji Kawano ,  Koichi Tanno ,  Kenji Aono

    IPC分类号： B41J2/175

    CPC分类号： B41J2/17546 ,  B41J2/17513 ,  B41J2/1752

    摘要： An ink jet cartridge has a recording head portion and an ink containing portion which are detachably mountable relative to each other. The recording head portion ejects ink to effect recording with the ink. The cartridge includes a first ink container, provided in the recording head portion, for containing the ink; a second ink container, provided in the ink containing portion, for containing the ink; and an ink communication tube for establishing ink communication between the first ink container and the second ink container, wherein the ink communication tube is not externally exposed. An ink jet recording apparatus includes a recording head for ejecting ink, an ink container detachably mountable to the recording head for containing the ink to be supplied to the recording head, a detecting device for detecting mounting of the ink container to the ink jet recording apparatus and a control device for controlling a recording operation of the ink jet recording apparatus in accordance with an output of the detecting device.

    摘要翻译： 喷墨墨盒具有相对于彼此可拆卸地安装的记录头部分和墨水容纳部分。 记录头部分喷射墨水以用墨水进行记录。 墨盒包括设置在记录头部分中的用于容纳墨水的第一墨盒; 设置在墨水容纳部分中用于容纳墨水的第二墨水容器; 以及用于建立第一墨盒和第二墨盒之间的墨连通的墨通信管，其中墨连接管不外露。 一种喷墨记录装置，包括用于喷射墨的记录头，可拆卸地安装到记录头上用于容纳要供应到记录头的墨的墨盒;检测装置，用于检测墨盒安装到喷墨记录装置 以及控制装置，用于根据检测装置的输出来控制喷墨记录装置的记录操作。

    Vehicle seat
    35.
    发明授权
    Vehicle seat 有权
    车座

    公开(公告)号：US08752901B2

    公开(公告)日：2014-06-17

    申请号：US13490861

    申请日：2012-06-07

    申请人： Kenji Kawano ,  Kousuke Sei ,  Takanori Kinoshita

    发明人： Kenji Kawano ,  Kousuke Sei ,  Takanori Kinoshita

    IPC分类号： A47C7/02

    CPC分类号： B60N2/686 ,  B60N2/68 ,  B60N2/7011

    摘要： In a vehicle seat, a back side, that is a side opposite a seating side, of a cushion is covered by a backing that has less expandability than the cushion. The back side of the cushion is divided by a pair of first supporting members into a center portion arranged between the pair of first supporting members and a pair of side portions arranged on both sides of the center portion. The center portion and the side portions each have a semi-cylindrical outer shape that protrudes out from the back side of the cushion. First arranging portions that are recessed toward the seating side are formed between the center portion and each of the side portions. The first supporting members are arranged sinking into the cushion at the first arranging portions.

    摘要翻译： 在车辆座椅中，靠垫的相对侧的背面被衬垫覆盖，该背衬具有比衬垫更小的可膨胀性的背衬。 衬垫的背面由一对第一支撑构件分成一对第一支撑构件和布置在中心部分两侧的一对侧部之间的中心部分。 中心部分和侧部各自具有从衬垫的后侧突出的半圆柱形外形。 在中心部分和每个侧部之间形成有朝向座侧凹入的第一布置部分。 第一支撑构件被布置成在第一排列部分处沉入垫子中。

    Optical modulation device
    38.
    发明授权
    Optical modulation device 失效
    光调制装置

    公开(公告)号：US08311371B2

    公开(公告)日：2012-11-13

    申请号：US11884407

    申请日：2006-02-16

    申请人： Kenji Kawano ,  Masaya Nanami ,  Hiroaki Senda ,  Takeshi Hondo ,  Seiji Uchida ,  Yuji Sato ,  Toru Nakahira

    发明人： Kenji Kawano ,  Masaya Nanami ,  Hiroaki Senda ,  Takeshi Hondo ,  Seiji Uchida ,  Yuji Sato ,  Toru Nakahira

    IPC分类号： G02F1/035 ,  G02B6/42 ,  G02B6/12

    CPC分类号： G02F1/2255 ,  G02F1/0356 ,  G02F2001/212 ,  G02F2202/07 ,  G02F2202/20

    摘要： Herein disclosed is an optical modulation device, comprising: a substrate 1 having a polarization non-reversal region 17a and a polarization reversal region 17b; an optical waveguide 18 including first and second branched optical waveguide portions 18a, 18b; and a traveling waveguide including a center electrode 19a and a ground electrode 19b, 19c to have an electric signal applied thereto, said traveling waveguide and said first and second branched optical waveguide portions collectively forming an interaction portion to have said incident light interacted with said electric signal, said interaction portion being constituted by a first interaction sub-portion 20a and a second interaction sub-portion 20b, said first and second interaction sub-portions being respectively positioned in regions of said substrate having opposite polarization orientations with each other, in which said center electrode is positioned in face to face relationship with one of said first and second branched optical waveguide portions at said first and second interaction sub-portion to ensure that said incident light in said first and second branched optical waveguide portions are phase modulated, and in which said interaction portion includes an optical waveguide shift sub-portion sandwiched between said first and second interaction sub-portions to have positions of said first and second branched optical waveguide portions shifted therein in a transverse direction, ensuring that positions of said first and second optical waveguides relative to said center and ground electrodes are interchanged between said first and second interaction sub-portions.

    摘要翻译： 这里公开了一种光调制装置，包括：具有极化非反转区域17a和极化反转区域17b的基板1; 包括第一和第二分支光波导部分18a，18b的光波导18; 以及具有施加电信号的中心电极19a和接地电极19b，19c的行进波导，所述行波导管和所述第一和第二分支光波导部分共同形成相互作用部分，以使所述入射光与所述电 信号，所述相互作用部分由第一相互作用子部分20a和第二相互作用子部分20b构成，所述第一相互作用子部分和第二相互作用子部分分别位于具有相反极化取向的所述基板的区域中，其中 所述中心电极在所述第一和第二相互作用子部分处于与所述第一和第二分支光波导部分中的一个相对面的关系，以确保所述第一和第二分支光波导部分中的所述入射光被相位调制，以及 其中所述相互作用部分包括光波导s 夹在所述第一相互作用子部分和第二相互作用子部分之间的折叠部分，以使所述第一和第二分支光波导部分在横向上移位的位置，确保所述第一和第二光波导相对于所述中心和接地电极的位置 在所述第一和第二相互作用子部分之间互换。

    Exposure method and method for manufacturing semiconductor device
    39.
    发明授权
    Exposure method and method for manufacturing semiconductor device 有权
    半导体器件制造方法及曝光方法

    公开(公告)号：US07517621B2

    公开(公告)日：2009-04-14

    申请号：US11896871

    申请日：2007-09-06

    申请人： Kazuya Fukuhara ,  Kenji Kawano ,  Kazuyuki Masukawa

    发明人： Kazuya Fukuhara ,  Kenji Kawano ,  Kazuyuki Masukawa

    IPC分类号： G03C5/00

    CPC分类号： G03F7/213 ,  G03F7/70125 ,  G03F7/70433

    摘要： An exposure method includes preparing a photomask having first and second main openings by which corresponding patterns are to be formed in a photo resist and first and second assist openings by which no corresponding patterns are to be formed in the photo resist, preparing an illumination having first and second light emitting areas, and irradiating the photo resist with illumination light from the illumination via the photomask, the first light emitting area and the second light emitting area being symmetric with respect to a center of the illumination, the first light emitting area and the second light emitting area containing a first point and a second point, respectively, the first point and the second point being symmetric with respect to the center of the illumination, the first point and the second point being symmetric with respect to a straight line extending through the center of the illumination.

    摘要翻译： 曝光方法包括制备具有第一和第二主开口的光掩模，通过该光掩模在光致抗蚀剂中形成相应的图案，并且在光致抗蚀剂中不形成相应图案的第一和第二辅助开口，准备具有第一 和第二发光区域，并且通过光掩模照射来自照射的照明光，第一发光区域和第二发光区域相对于照明的中心对称，第一发光区域和 第二发光区域分别包含第一点和第二点，第一点和第二点相对于照明中心对称，第一点和第二点相对于延伸穿过的直线对称 照明的中心。