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公开(公告)号：US20120108007A1
公开(公告)日：2012-05-03
申请号：US13346963
申请日：2012-01-10
IPC分类号： H01L21/336
CPC分类号： H01L29/66969 , H01L21/46 , H01L27/1225 , H01L29/7869
摘要： It is an object to provide a semiconductor device including a thin film transistor with favorable electric properties and high reliability, and a method for manufacturing the semiconductor device with high productivity. In an inverted staggered (bottom gate) thin film transistor, an oxide semiconductor film containing In, Ga, and Zn is used as a semiconductor layer, and a buffer layer formed using a metal oxide layer is provided between the semiconductor layer and a source and drain electrode layers. The metal oxide layer is intentionally provided as the buffer layer between the semiconductor layer and the source and drain electrode layers, whereby ohmic contact is obtained.
摘要翻译： 本发明的目的是提供一种包括具有良好的电性能和高可靠性的薄膜晶体管的半导体器件，以及一种以高生产率制造半导体器件的方法。 在倒置交错（底栅极）薄膜晶体管中，使用含有In，Ga和Zn的氧化物半导体膜作为半导体层，并且在半导体层和源之间设置使用金属氧化物层形成的缓冲层， 漏电极层。 有意地提供金属氧化物层作为半导体层与源极和漏极电极层之间的缓冲层，从而获得欧姆接触。
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公开(公告)号：US20110284856A1
公开(公告)日：2011-11-24
申请号：US13196926
申请日：2011-08-03
IPC分类号： H01L29/786 , H01L33/16 , H01L33/08
CPC分类号： H01L27/1288 , H01L21/67017 , H01L21/67207 , H01L27/1214 , H01L27/124 , H01L27/1244 , H01L29/04 , H01L29/41733 , H01L29/4908 , H01L29/66742 , H01L29/66765 , H01L29/78678 , H01L29/78687 , H01L29/78696
摘要： An object is to reduce off-current of a thin film transistor. Another object is to improve electric characteristics of a thin film transistor. Further, it is still another object to improve image quality of a display device using the thin film transistor. An aspect of the present invention is a thin film transistor including a semiconductor film formed over a gate electrode and in an inner region of the gate electrode which does not reach an end portion of the gate electrode, with a gate insulating film interposed therebetween, a film covering at least a side surface of the semiconductor film, and a pair of wirings over the film covering the side surface of the semiconductor film; in which an impurity element serving as a donor is added to the semiconductor film.
摘要翻译： 目的是减少薄膜晶体管的截止电流。 另一个目的是改善薄膜晶体管的电特性。 此外，还有另一个目的是提高使用薄膜晶体管的显示装置的图像质量。 本发明的一个方面是一种薄膜晶体管，它包括半导体膜，该半导体膜形成在栅电极之上，并且在栅电极的内部区域中，其不到达栅电极的端部，栅极绝缘膜介于它们之间， 至少覆盖半导体膜的侧面的膜，以及覆盖半导体膜的侧面的膜上的一对配线; 其中作为供体的杂质元素被添加到半导体膜。
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公开(公告)号：US20110115763A1
公开(公告)日：2011-05-19
申请号：US13013054
申请日：2011-01-25
IPC分类号： G06F3/038 , H01L29/786
CPC分类号： H01L29/66969 , H01L21/46 , H01L27/1225 , H01L29/7869
摘要： It is an object to provide a semiconductor device including a thin film transistor with favorable electric properties and high reliability, and a method for manufacturing the semiconductor device with high productivity. In an inverted staggered (bottom gate) thin film transistor, an oxide semiconductor film containing In, Ga, and Zn is used as a semiconductor layer, and a buffer layer formed using a metal oxide layer is provided between the semiconductor layer and a source and drain electrode layers. The metal oxide layer is intentionally provided as the buffer layer between the semiconductor layer and the source and drain electrode layers, whereby ohmic contact is obtained.
摘要翻译： 本发明的目的是提供一种包括具有良好的电性能和高可靠性的薄膜晶体管的半导体器件，以及一种以高生产率制造半导体器件的方法。 在倒置交错（底栅极）薄膜晶体管中，使用含有In，Ga和Zn的氧化物半导体膜作为半导体层，并且在半导体层和源之间设置使用金属氧化物层形成的缓冲层， 漏电极层。 有意地提供金属氧化物层作为半导体层与源极和漏极电极层之间的缓冲层，从而获得欧姆接触。
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公开(公告)号：US20100032666A1
公开(公告)日：2010-02-11
申请号：US12535712
申请日：2009-08-05
CPC分类号： H01L29/7869 , H01L27/1225
摘要： A semiconductor device including thin film transistors having high electrical properties and reliability is proposed. Further, a method for manufacturing the semiconductor devices with mass productivity is proposed. The semiconductor device includes a thin film transistor which includes a gate electrode layer, a gate insulating layer over the gate electrode layer, a source electrode layer and a drain electrode layer over the gate insulating layer, a buffer layer over the source electrode layer and the drain electrode layer, and a semiconductor layer over the buffer layer. A part of the semiconductor layer overlapping with the gate electrode layer is over and in contact with the gate insulating layer and is provided between the source electrode layer and the drain electrode layer. The semiconductor layer is an oxide semiconductor layer containing indium, gallium, and zinc. The buffer layer contains a metal oxide having n-type conductivity. The semiconductor layer and the source and drain electrode layers are electrically connected to each other through the buffer layer.
摘要翻译： 提出了包括具有高电特性和可靠性的薄膜晶体管的半导体器件。 此外，提出了一种以大规模生产率制造半导体器件的方法。 该半导体器件包括薄膜晶体管，该薄膜晶体管包括栅极电极层，栅极电极层上的栅极绝缘层，栅极绝缘层上的源极电极层和漏极电极层，源电极层上的缓冲层和 漏极电极层和缓冲层上的半导体层。 与栅极电极层重叠的半导体层的一部分与栅极绝缘层接触并且设置在源极电极层和漏极电极层之间。 半导体层是含有铟，镓和锌的氧化物半导体层。 缓冲层含有具有n型导电性的金属氧化物。 半导体层和源极和漏极电极层通过缓冲层彼此电连接。
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公开(公告)号：US20120228607A1
公开(公告)日：2012-09-13
申请号：US13478490
申请日：2012-05-23
CPC分类号： H01L27/1225 , G02F1/1362 , H01L27/124 , H01L27/1251 , H01L27/1255 , H01L27/3262 , H01L29/42384 , H01L29/4908 , H01L29/78606 , H01L29/78645 , H01L29/78648 , H01L29/7869
摘要： As a display device has higher definition, the number of pixels is increased and thus, the number of gate lines and signal lines is increased. When the number of gate lines and signal lines is increased, it is difficult to mount IC chips including driver circuits for driving the gate lines and the signal lines by bonding or the like, whereby manufacturing cost is increased. A pixel portion and a driver circuit for driving the pixel portion are provided on the same substrate, and at least part of the driver circuit comprises a thin film transistor including an oxide semiconductor sandwiched between gate electrodes. A channel protective layer is provided between the oxide semiconductor and a gate electrode provided over the oxide semiconductor. The pixel portion and the driver circuit are provided on the same substrate, which leads to reduction of manufacturing cost.
摘要翻译： 由于显示装置具有更高的清晰度，因此像素数量增加，因此栅极线和信号线的数量增加。 当栅极线和信号线的数量增加时，难以通过结合等安装包括用于驱动栅极线和信号线的驱动电路的IC芯片，由此增加制造成本。 用于驱动像素部分的像素部分和驱动电路设置在同一基板上，并且驱动电路的至少一部分包括薄膜晶体管，该薄膜晶体管包括夹在栅电极之间的氧化物半导体。 在氧化物半导体和设置在氧化物半导体上的栅电极之间设置沟道保护层。 像素部分和驱动电路设置在相同的基板上，这导致制造成本的降低。
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公开(公告)号：US20100117079A1
公开(公告)日：2010-05-13
申请号：US12615615
申请日：2009-11-10
CPC分类号： H01L29/7869 , H01L27/1225 , H01L29/78648
摘要： As a display device has a higher definition, the number of pixels, gate lines, and signal lines are increased. When the number of the gate lines and the signal lines are increased, there occurs a problem that it is difficult to mount an IC chip including a driver circuit for driving the gate and signal lines by bonding or the like, whereby manufacturing cost is increased. A pixel portion and a driver circuit for driving the pixel portion are provided over the same substrate, and at least part of the driver circuit includes a thin film transistor using an oxide semiconductor interposed between gate electrodes provided above and below the oxide semiconductor. Therefore, when the pixel portion and the driver circuit are provided over the same substrate, manufacturing cost can be reduced.
摘要翻译： 作为显示装置具有更高的清晰度，像素数，栅极线和信号线的数量增加。 当栅极线和信号线的数量增加时，存在难以安装包括用于通过接合等驱动栅极和信号线的驱动电路的IC芯片，由此增加制造成本的问题。 用于驱动像素部分的像素部分和驱动电路设置在相同的基板上，驱动电路的至少一部分包括薄膜晶体管，该薄膜晶体管使用介于氧化物半导体上方和下方的栅电极之间的氧化物半导体。 因此，当像素部分和驱动电路设置在相同的基板上时，可以降低制造成本。
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公开(公告)号：US20120273779A1
公开(公告)日：2012-11-01
申请号：US13546345
申请日：2012-07-11
IPC分类号： H01L29/786
CPC分类号： H01L29/7869 , H01L21/02554 , H01L21/02565 , H01L21/02631 , H01L27/016 , H01L27/1218 , H01L27/1225 , H01L27/124 , H01L27/1248 , H01L27/1255 , H01L27/15 , H01L27/3225 , H01L27/3241 , H01L27/3248 , H01L27/3258 , H01L29/45 , H01L29/4908 , H01L29/513 , H01L29/518 , H01L29/66742 , H01L29/786 , H01L29/78618
摘要： In an active matrix display device, electric characteristics of thin film transistors included in a circuit are important, and performance of the display device depends on the electric characteristics. Thus, by using an oxide semiconductor film including In, Ga, and Zn for an inverted staggered thin film transistor, variation in electric characteristics of the thin film transistor can be reduced. Three layers of a gate insulating film, an oxide semiconductor layer and a channel protective layer are successively formed by a sputtering method without being exposed to air. Further, in the oxide semiconductor layer, the thickness of a region overlapping with the channel protective film is larger than that of a region in contact with a conductive film.
摘要翻译： 在有源矩阵显示装置中，包括在电路中的薄膜晶体管的电特性是重要的，显示装置的性能取决于电特性。 因此，通过使用包括In，Ga和Zn的氧化物半导体膜用于反向交错薄膜晶体管，可以减小薄膜晶体管的电特性的变化。 通过溅射法连续地形成三层栅极绝缘膜，氧化物半导体层和沟道保护层，而不暴露于空气。 此外，在氧化物半导体层中，与沟道保护膜重叠的区域的厚度大于与导电膜接触的区域的厚度。
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公开(公告)号：US20120108006A1
公开(公告)日：2012-05-03
申请号：US13346118
申请日：2012-01-09
IPC分类号： H01L21/36
CPC分类号： H01L29/66969 , H01L21/46 , H01L27/1225 , H01L29/7869
摘要： It is an object to provide a semiconductor device including a thin film transistor with favorable electric properties and high reliability, and a method for manufacturing the semiconductor device with high productivity. In an inverted staggered (bottom gate) thin film transistor, an oxide semiconductor film containing In, Ga, and Zn is used as a semiconductor layer, and a buffer layer formed using a metal oxide layer is provided between the semiconductor layer and a source and drain electrode layers. The metal oxide layer is intentionally provided as the buffer layer between the semiconductor layer and the source and drain electrode layers, whereby ohmic contact is obtained.
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公开(公告)号：US20120058599A1
公开(公告)日：2012-03-08
申请号：US13227585
申请日：2011-09-08
CPC分类号： H01L29/7869 , H01L27/1225
摘要： The semiconductor device includes a thin film transistor which includes a gate electrode layer, a gate insulating layer over the gate electrode layer, a source electrode layer and a drain electrode layer over the gate insulating layer, a buffer layer over the source electrode layer and the drain electrode layer, and a semiconductor layer over the buffer layer. A part of the semiconductor layer overlapping with the gate electrode layer is over and in contact with the gate insulating layer and is provided between the source electrode layer and the drain electrode layer. The semiconductor layer is an oxide semiconductor layer containing indium, gallium, and zinc. The buffer layer contains a metal oxide having n-type conductivity. The semiconductor layer and the source and drain electrode layers are electrically connected to each other through the buffer layer.
摘要翻译： 该半导体器件包括薄膜晶体管，该薄膜晶体管包括栅极电极层，栅极电极层上的栅极绝缘层，栅极绝缘层上的源极电极层和漏极电极层，源电极层上的缓冲层和 漏极电极层和缓冲层上的半导体层。 与栅电极层重叠的半导体层的一部分与栅极绝缘层相接触并且设置在源极电极层和漏极电极层之间。 半导体层是含有铟，镓和锌的氧化物半导体层。 缓冲层含有具有n型导电性的金属氧化物。 半导体层和源极和漏极电极层通过缓冲层彼此电连接。
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公开(公告)号：US20100102314A1
公开(公告)日：2010-04-29
申请号：US12581919
申请日：2009-10-20
IPC分类号： H01L33/00 , H01L29/786 , H01L21/34
CPC分类号： H01L29/78648 , H01L27/1225 , H01L27/124 , H01L29/42384 , H01L29/78645 , H01L29/7869 , H01L29/78696
摘要： As a display device has a higher definition, the number of pixels, gate lines, and signal lines are increased. When the number of the gate lines and the signal lines are increased, there occurs a problem that it is difficult to mount an IC chip including a driver circuit for driving the gate and signal lines by bonding or the like, whereby manufacturing cost is increased. A pixel portion and a driver circuit for driving the pixel portion are provided over the same substrate, and at least part of the driver circuit includes a thin film transistor using an oxide semiconductor interposed between gate electrodes provided above and below the oxide semiconductor. The pixel portion and the driver portion are provided over the same substrate, whereby manufacturing cost can be reduced.
摘要翻译： 作为显示装置具有更高的清晰度，像素数，栅极线和信号线的数量增加。 当栅极线和信号线的数量增加时，存在难以安装包括用于通过接合等驱动栅极和信号线的驱动电路的IC芯片，由此增加制造成本的问题。 用于驱动像素部分的像素部分和驱动电路设置在相同的基板上，驱动电路的至少一部分包括薄膜晶体管，该薄膜晶体管使用介于设置在氧化物半导体之上和之下的栅电极之间的氧化物半导体。 像素部分和驱动器部分设置在相同的基板上，由此可以降低制造成本。
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