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公开(公告)号：US08810771B2
公开(公告)日：2014-08-19
申请号：US13323404
申请日：2011-12-12
申请人： Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Bob Streefkerk , Bernhard Gellrich , Andreas Wurmbrand
发明人： Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Bob Streefkerk , Bernhard Gellrich , Andreas Wurmbrand
CPC分类号： G03F7/70341
摘要： Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.
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公开(公告)号：US08749754B2
公开(公告)日：2014-06-10
申请号：US12647876
申请日：2009-12-28
申请人： Bob Streefkerk , Henrikus Herman Marie Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes Maria Zaal , Minne Cuperus
发明人： Bob Streefkerk , Henrikus Herman Marie Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes Maria Zaal , Minne Cuperus
CPC分类号： G03F7/70341 , G03F7/70641 , G03F7/70783
摘要： An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.
摘要翻译： 浸没式光刻设备包括液体供应系统构件，其构造成在光刻设备的投影系统和基板之间的空间中容纳液体，液体供应系统构件补偿器被布置成补偿液体供应系统构件和衬底台之间的相互作用 。
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公开(公告)号：US08717535B2
公开(公告)日：2014-05-06
申请号：US12341081
申请日：2008-12-22
申请人： Huibert Visser , Martinus Hendricus Hendricus Hoeks , Borgert Kruizinga , Bob Streefkerk , Patricius Aloysius Jacobus Tinnemans , Erwin John Van Zwet , Roeland Nicolaas Maria Vanneer , Marcus Gerhardus Hendrikus Meijerink , Nicolaas Cornelis Johannes Van Der Valk , Har Van Himbergen
发明人： Huibert Visser , Martinus Hendricus Hendricus Hoeks , Borgert Kruizinga , Bob Streefkerk , Patricius Aloysius Jacobus Tinnemans , Erwin John Van Zwet , Roeland Nicolaas Maria Vanneer , Marcus Gerhardus Hendrikus Meijerink , Nicolaas Cornelis Johannes Van Der Valk , Har Van Himbergen
IPC分类号： G03B27/42
CPC分类号： G03F7/70291 , G03F7/70516
摘要： Apparatus and methods are used to calibrate an array of individually controllable elements within a lithographic apparatus. A calibration unit can switch between a first state in which the modulated beam of radiation passes into a projection system for projecting the modulated beam of radiation onto a substrate and a second state in which a portion of the modulated beam of radiation is inspected by the calibration unit. The calibration unit generates calibration data, or alternatively, updates calibration data, based on the inspection of the modulated beam of radiation. An array controller uses the calibration data to provide control signals to elements of an array of individually controllable elements, which are subsequently configured in response to the control signals.
摘要翻译： 设备和方法用于校准光刻设备内的独立可控元件阵列。 校准单元可以在其中调制的辐射束通过投影系统的第一状态之间切换，以将经调制的辐射束投射到衬底上，以及第二状态，其中调制的辐射束的一部分通过校准 单元。 校准单元产生校准数据，或者替代地，基于调制的辐射束的检查更新校准数据。 阵列控制器使用校准数据向独立可控元件阵列的元件提供控制信号，其随后响应于控制信号被配置。
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公开(公告)号：US20130301017A1
公开(公告)日：2013-11-14
申请号：US13722830
申请日：2012-12-20
申请人： Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Yurievich Kolesnychenko , Joeri Lof , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Alexander Straaijer , Bob Streefkerk , Joannes Theodoor De Smit , Helmar Van Santen
发明人： Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Yurievich Kolesnychenko , Joeri Lof , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Alexander Straaijer , Bob Streefkerk , Joannes Theodoor De Smit , Helmar Van Santen
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7088
摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
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公开(公告)号：US08547519B2
公开(公告)日：2013-10-01
申请号：US12411952
申请日：2009-03-26
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
摘要： An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
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公开(公告)号：US08542343B2
公开(公告)日：2013-09-24
申请号：US12850487
申请日：2010-08-04
申请人： Christiaan Alexander Hoogendam , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
发明人： Christiaan Alexander Hoogendam , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/70808
摘要： Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
摘要翻译： 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中，溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方，因此液体可以不断刷新，并且液体中的压力可能保持基本恒定。
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公开(公告)号：US20130235358A1
公开(公告)日：2013-09-12
申请号：US13866879
申请日：2013-04-19
申请人： Christiaan Alexander HOOGENDAM , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
发明人： Christiaan Alexander HOOGENDAM , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要： A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
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公开(公告)号：US08416385B2
公开(公告)日：2013-04-09
申请号：US12872683
申请日：2010-08-31
申请人： Bob Streefkerk , Marcel Mathijs Theodore Marie Dierichs , Wendy Fransisca Johanna Gehoel-Van Ansem
发明人： Bob Streefkerk , Marcel Mathijs Theodore Marie Dierichs , Wendy Fransisca Johanna Gehoel-Van Ansem
CPC分类号： G03F7/70341 , G03F7/70866 , G03F7/70958
摘要： A lithographic apparatus and device manufacturing method is provided in which exposure is carried out by projecting through a liquid having a pH of less than 7, the liquid being in contact with a substrate to be exposed. The liquid advantageously comprises an anti-reflective topcoat.
摘要翻译： 提供了一种光刻设备和设备的制造方法，其中通过突发通过pH小于7的液体进行曝光，液体与要暴露的基板接触。 液体有利地包括抗反射面漆。
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公开(公告)号：US08354209B2
公开(公告)日：2013-01-15
申请号：US13331865
申请日：2011-12-20
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Christiaan Alexander Hoogendam
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Christiaan Alexander Hoogendam
IPC分类号： G03F9/00
CPC分类号： G03F9/7023 , G03F7/70341 , G03F7/70883
摘要： A lithographic apparatus, includes a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate table; a sensor configured to measure an exposure parameter using a measuring beam projected through the liquid; and a correction system configured to determine an offset based on a change of a physical property impacting a measurement made using the measuring beam to at least partly correct the measured exposure parameter.
摘要翻译： 光刻设备包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置成在其横截面中赋予图案的辐射束; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统，被配置为向所述投影系统和所述基板台之间的空间提供液体; 传感器，被配置为使用通过所述液体投影的测量光束来测量曝光参数; 以及校正系统，其被配置为基于影响使用所述测量光束进行的测量的物理属性的变化来确定偏移，以至少部分地校正所测量的曝光参数。
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公开(公告)号：US08330936B2
公开(公告)日：2012-12-11
申请号：US11523743
申请日：2006-09-20
申请人： Bob Streefkerk , Youri Johannes Laurentius Maria Van Dommelen , Richard Moerman , Cédric Désiré Grouwstra
发明人： Bob Streefkerk , Youri Johannes Laurentius Maria Van Dommelen , Richard Moerman , Cédric Désiré Grouwstra
CPC分类号： G03F7/70341 , G03F7/70425
摘要： A path which a substrate should take under the projection system during immersion lithography imaging of a plurality of dies on the top surface of the substrate is disclosed.
摘要翻译： 公开了一种在衬底的顶表面上的多个管芯的浸没光刻成像期间衬底应该在投影系统下面的路径。
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