公开(公告)号：US07079644B1

公开(公告)日：2006-07-18

申请号：US09228562

申请日：1999-01-12

申请人： Tetsuo Taniguchi ,  Naoki Mizoguchi

发明人： Tetsuo Taniguchi ,  Naoki Mizoguchi

IPC分类号： H04M1/00

CPC分类号： H03H7/42 ,  H01F2017/0026 ,  H03H2001/0085

摘要： An input-output balanced filter has a greatly reduced size and excellent stable electric characteristics. The input-output balanced filter includes two LC bandpass filter circuit units. A first LC bandpass filter circuit unit has a circuit structure in which a first LC parallel resonant circuit including an inductor and a capacitor is connected to a second LC parallel resonant circuit including an inductor and a capacitor via a connecting capacitor, while the second LC bandpass filter circuit unit has a circuit structure in which a third LC parallel resonant circuit including an inductor and a capacitor is connected to a fourth LC parallel resonant circuit including an inductor and a capacitor via the other connecting capacitor; and, the common side lines of the two LC bandpass filter circuit units are connected to each other via a connecting inductor which functions as a common line.

摘要翻译： 输入输出平衡滤波器具有大大减小的尺寸和优异的稳定电特性。 输入输出平衡滤波器包括两个LC带通滤波器电路单元。 第一LC带通滤波器电路单元具有电路结构，其中包括电感器和电容器的第一LC并联谐振电路经由连接电容器连接到包括电感器和电容器的第二LC并联谐振电路，而第二LC带通 滤波器电路单元具有电路结构，其中包括电感器和电容器的第三LC并联谐振电路经由另一连接电容器连接到包括电感器和电容器的第四LC并联谐振电路; 并且两个LC带通滤波器电路单元的公共侧线经由用作公共线的连接电感器彼此连接。

公开(公告)号：US07061575B2

公开(公告)日：2006-06-13

申请号：US11008166

申请日：2004-12-10

申请人： Tetsuo Taniguchi ,  Masayuki Murayama

发明人： Tetsuo Taniguchi ,  Masayuki Murayama

IPC分类号： G03B27/52 ,  G03B27/42 ,  G01N21/00

CPC分类号： G03F7/70916 ,  G03F7/2002 ,  G03F7/70241 ,  G03F7/70866 ,  G03F7/70925

摘要： Pattern transfer can be performed with improved exposure accuracy, by reducing the contamination caused by the attachment of a photosensitive agent or the like on an optical member of a projection optical member or the like. The pattern transfer onto a substrate W is performed after cleaning the objective member OB disposed at a given position by a cleaning device 8 at the time when pattern transfer is not performed, or while making flow a gas in a space between the substrate W and the optical member OB by a contamination protection device 98. Alternatively, the optical member OB disposed at a given position is inspected for contamination by a contamination inspection device 84 at the time when pattern transfer is not performed, and the pattern transfer or the cleaning or replacement of the optical member is performed based on the result.

摘要翻译： 可以通过降低由于将光敏剂等附着在投影光学元件等的光学构件上引起的污染而以更好的曝光精度进行图案转印。 在不进行图案转印时，通过清洁装置8清洁设置在给定位置的目标构件OB之后，或者在将衬底W和衬底W之间的空间中的气体流动的同时， 光学构件OB由污染保护装置98。 或者，设置在给定位置的光学构件OB在不执行图案转印时被污染检查装置84检查，并且基于结果执行图案转印或光学构件的清洁或更换 。

公开(公告)号：US20050053226A1

公开(公告)日：2005-03-10

申请号：US10966433

申请日：2004-10-15

申请人： Tetsuo Taniguchi ,  Naoki Mizoguchi

发明人： Tetsuo Taniguchi ,  Naoki Mizoguchi

IPC分类号： H01F27/00 ,  H01F17/00 ,  H01G4/40 ,  H03H7/01 ,  H03H7/075 ,  H03H7/42 ,  H04M1/00 ,  H04M9/00

CPC分类号： H03H7/42 ,  H01F2017/0026 ,  H03H2001/0085

摘要： An input-output balanced filter has a greatly reduced size and excellent stable electric characteristics. The input-output balanced filter includes two LC bandpass filter circuit units. A first LC bandpass filter circuit unit has a circuit structure in which a first LC parallel resonant circuit including an inductor and a capacitor is connected to a second LC parallel resonant circuit including an inductor and a capacitor via a connecting capacitor, while the second LC bandpass filter circuit unit has a circuit structure in which a third LC parallel resonant circuit including an inductor and a capacitor is connected to a fourth LC parallel resonant circuit including an inductor and a capacitor via the other connecting capacitor; and, the common side lines of the two LC bandpass filter circuit units are connected to each other via a connecting inductor which functions as a common line.

摘要翻译： 输入输出平衡滤波器具有大大减小的尺寸和优异的稳定电特性。 输入输出平衡滤波器包括两个LC带通滤波器电路单元。 第一LC带通滤波器电路单元具有电路结构，其中包括电感器和电容器的第一LC并联谐振电路经由连接电容器连接到包括电感器和电容器的第二LC并联谐振电路，而第二LC带通 滤波器电路单元具有电路结构，其中包括电感器和电容器的第三LC并联谐振电路经由另一连接电容器连接到包括电感器和电容器的第四LC并联谐振电路; 并且两个LC带通滤波器电路单元的公共侧线经由用作公共线的连接电感器彼此连接。

公开(公告)号：US06724463B2

公开(公告)日：2004-04-20

申请号：US09911619

申请日：2001-07-25

申请人： Tetsuo Taniguchi

发明人： Tetsuo Taniguchi

IPC分类号： G03B2742

CPC分类号： G03F7/70358 ,  B60R16/027 ,  B60R21/017 ,  G03F7/70241 ,  G03F7/70258 ,  G03F7/70891

摘要： A scanning exposure apparatus and method in which an interferometer, operatively connected to a stage holding a mask or a substrate, outputs a measurement value corresponding to positional information of the stage in the scanning direction. Start and stop timing of the output of trigger signals for the emission of pulses of an exposure beam emitted at predetermined time intervals is controlled based on the measurement value from the interferometer.

摘要翻译： 一种扫描曝光装置和方法，其中可操作地连接到保持掩模或基板的台的干涉仪输出与扫描方向上的台的位置信息相对应的测量值。 基于来自干涉仪的测量值来控制用于以预定时间间隔发射的曝光光束的脉冲的发射的触发信号的输出的启动和停止定时。

公开(公告)号：US06710848B2

公开(公告)日：2004-03-23

申请号：US09941668

申请日：2001-08-30

申请人： Tetsuo Taniguchi

发明人： Tetsuo Taniguchi

IPC分类号： G03B2742

CPC分类号： G03F9/7003 ,  G03F7/70258 ,  G03F7/70825 ,  G03F7/70883

摘要： An imagery characteristic is corrected by changing the position and/or orientation of a reticle or lens elements of a projection lens system. Correction of the imagery characteristic, however, causes displacement of the projected pattern image of the reticle. The relation between the driving amount of the lens elements and reticle and the lateral displacement of the center of the pattern image of the reticle is stored as a table in advance. When the lens elements and/or the reticle are driven, lateral displacement of the pattern image can be obtained by accessing the table. Alternatively, the lateral displacement can be determined using a base-line amount corresponding to a distance between a detection center of a substrate position detector and a center of the projected image. Once the pattern image displacement is determined, the substrate can be accurately positioned. In another arrangement, a mask alignment method prevents positional shift of a projected image of a mask pattern even if the projection magnification of the projection optical system is changed.

摘要翻译： 通过改变投影透镜系统的掩模版或透镜元件的位置和/或取向来校正图像特性。 然而，图像特征的校正导致标线的投影图案图像的位移。 透镜元件和掩模版的驱动量与标线图案的图案图像的中心的横向位移之间的关系作为表预先存储。 当透镜元件和/或光罩被驱动时，可以通过访问桌子来获得图案图像的横向位移。 或者，可以使用对应于基板位置检测器的检测中心与投影图像的中心之间的距离的基线量来确定横向位移。 一旦确定了图案图像位移，就可以准确地定位基板。 在另一种布置中，即使投影光学系统的投影倍率改变，掩模对准方法也可以防止掩模图案的投影图像的位置偏移。

公开(公告)号：US06496257B1

公开(公告)日：2002-12-17

申请号：US09577020

申请日：2000-05-22

申请人： Tetsuo Taniguchi ,  Masayuki Murayama

发明人： Tetsuo Taniguchi ,  Masayuki Murayama

IPC分类号： G01N2188

CPC分类号： G03F7/70916 ,  G03F7/2002 ,  G03F7/70241 ,  G03F7/70866 ,  G03F7/70925

摘要： Pattern transfer can be performed with improved exposure accuracy, by reducing the contamination caused by the attachment of a photosensitive agent or the like on an optical member of a projection optical member or the like. The pattern transfer onto a substrate W is performed after cleaning the objective member OB disposed at a given position by a cleaning device 8 at the time when pattern transfer is not performed, or while making flow a gas in a space between the substrate W and the optical member OB by a contamination protection device 98. Alternatively, the optical member OB disposed at a given position is inspected for contamination by a contamination inspection device 84 at the time when pattern transfer is not performed, and the pattern transfer or the cleaning or replacement of the optical member is performed based on the result.

摘要翻译： 可以通过降低由于将光敏剂等附着在投影光学元件等的光学构件上引起的污染而以更好的曝光精度进行图案转印。 在不进行图案转印时，通过清洁装置8清洁设置在给定位置的目标构件OB之后，或者在将衬底W和衬底W之间的空间中的气体流动的同时， 通过污染保护装置98进行光学构件OB.或者，在不执行图案转印时，检查布置在给定位置处的光学构件OB被污染检查装置84污染，并且图案转印或清洁或更换 基于该结果来执行光学部件。

公开(公告)号：US06333776B1

公开(公告)日：2001-12-25

申请号：US09184877

申请日：1998-11-03

申请人： Tetsuo Taniguchi

发明人： Tetsuo Taniguchi

IPC分类号： G03B2768

CPC分类号： G03F7/70858 ,  G03F7/70091 ,  G03F7/70241 ,  G03F7/70258 ,  G03F7/70308 ,  G03F7/70333 ,  G03F7/70358

摘要： A transparent correcting plate is disposed between a reticle and a projection optical system. The correcting plate can be selectively inserted and withdrawn by a changing device. The correcting plate can be changed for another correcting plate stored in a storage unit according to need. The correcting plate has been polished so as to be capable of correcting random distortion, and thus it corrects random distortion produced by a projection exposure apparatus in which it is used. Further, a correcting plate is selected according to image distortion characteristics of a projection exposure apparatus used in the preceding exposure process or a projection exposure apparatus to be used in the subsequent process, thereby correcting the distortion of a projected image, and thus improving the overlay accuracy between two layers.

摘要翻译： 透明校正板设置在光罩和投影光学系统之间。 校正板可以通过改变装置选择性地插入和取出。 根据需要可以对存储在存储单元中的另一个校正板进行修正。 校正板已经被抛光，以便能够校正随机变形，从而校正由其使用的投影曝光设备产生的随机变形。 此外，根据在以前的曝光处理中使用的投影曝光装置的图像失真特性或将在随后的处理中使用的投影曝光装置来选择校正板，从而校正投影图像的失真，从而改善叠加 两层之间的精度。

公开(公告)号：US06169602A

公开(公告)日：2001-01-02

申请号：US09253711

申请日：1999-02-22

申请人： Tetsuo Taniguchi ,  Toshihiko Tsuji

发明人： Tetsuo Taniguchi ,  Toshihiko Tsuji

IPC分类号： G01B1100

CPC分类号： G03F7/70358 ,  G03F7/706 ,  G03F7/70691

摘要： The present invention relates to a method of detecting an image formation characteristic of a projection optical system for projecting a reference pattern on a reticle on a substrate. According to the detection method, a reticle stage is moved so that a reference mark on the reticle comes to a first reference position and a second reference position, and a wafer stage is moved so that a light transmission portion on the wafer stage crosses an image forming position of a projected image of the reference mark obtained through the projection optical system. The positions of the reticle stage and the wafer stage at the first and second reference positions are measured as moved distances of the stages, respectively. From the distances of movement of the reticle and wafer stages measured, the image formation characteristic of the projection optical system is calculated.

摘要翻译： 本发明涉及一种检测投影光学系统的图像形成特性的方法，用于将基准图案投影在基板上的掩模版上。 根据检测方法，移动标线片台，使得标线上的基准标记进入第一基准位置和第二基准位置，并移动晶片台，使得晶片台上的光透射部分跨越图像 形成通过投影光学系统获得的参考标记的投影图像的位置。 在第一和第二参考位置处的标线片台和晶片台的位置分别被测量为阶段的移动距离。 从测量的标线片和晶片台的移动距离来计算投影光学系统的图像形成特性。

公开(公告)号：US5945239A

公开(公告)日：1999-08-31

申请号：US811465

申请日：1997-03-03

申请人： Tetsuo Taniguchi

发明人： Tetsuo Taniguchi

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F7/706 ,  G03F7/70258 ,  G03F7/70641 ,  G03F7/70691

摘要： Methods and apparatus are disclosed for correcting distortion of a projection image obtained with a projection-exposure apparatus (such as a stepper) having a projection-optical system. Distortion is corrected even when the distortion of the projection image is not linear relative to depth in the optical-axis direction of the projection-optical system. Any distortion of the projection image is detected at a measurement surface and while the projection image is defocused in a direction along the optical axis relative to an image surface of the projection-optical system. Based on the detection results, the projection-optical system is adjusted to change the distortion relative to the converging surface of the projection-optical system.

摘要翻译： 公开了用于校正由具有投影光学系统的投影曝光装置（例如步进器）获得的投影图像的变形的方法和装置。 即使当投影图像的失真相对于投影光学系统的光轴方向上的深度不是线性时，失真也被校正。 在测量表面上检测到投影图像的任何失真，并且在投影图像相对于投影光学系统的图像表面沿着光轴的方向散焦。 基于检测结果，调整投影光学系统以相对于投影光学系统的会聚表面改变变形。

公开(公告)号：US5798838A

公开(公告)日：1998-08-25

申请号：US713719

申请日：1996-09-13

申请人： Tetsuo Taniguchi ,  Toshihiko Tsuji ,  Tadashi Nagayama

发明人： Tetsuo Taniguchi ,  Toshihiko Tsuji ,  Tadashi Nagayama

IPC分类号： G03F7/20 ,  H01L21/30 ,  G01B11/00

CPC分类号： G03F7/70591 ,  G03F7/70133 ,  G03F7/70241 ,  G03F7/70258 ,  G03F7/70358

摘要： The invention relates to a projection exposure apparatus for detecting a light-intensity distribution of a spatial image of a mask pattern formed through a projection optical system. The projection exposure apparatus has a knife-edge member which is disposed on the main surface of a wafer stage such that a plane including an exposure surface of a photosensitive substrate is leveled with a light incidence surface of the knife-edge member. The knife-edge member has a transmission area for transmitting the exposure light passing through the projection optical system, a light shielding area for preventing transmission of the exposure light, and a knife-edge defined as a boundary line between the transmission area and the light shielding area. The projection exposure apparatus detects the light-intensity distribution of light from the spatial image while moving the spatial image of the mask pattern and the knife-edge of the knife-edge member relatively to each other. The information related to the light-intensity distribution is used in optically adjusting a projection optical system, or the like.

摘要翻译： 本发明涉及一种用于检测通过投影光学系统形成的掩模图案的空间图像的光强度分布的投影曝光装置。 投影曝光装置具有刀片部件，其设置在晶片台的主表面上，使得包括感光基板的曝光表面的平面与刀刃部件的光入射面平齐。 刀刃部件具有用于透射通过投影光学系统的曝光光的透射区域，用于防止曝光光的透射的遮光区域和被定义为透射区域与光线之间的边界线的刀刃 屏蔽区域。 投影曝光装置在将掩模图案的空间图像和刀刃部件的刀刃相对于彼此移动的同时，检测来自空间图像的光的光强度分布。 与光强分布有关的信息用于光学调整投影光学系统等。