公开(公告)号：US20120128230A1

公开(公告)日：2012-05-24

申请号：US13362151

申请日：2012-01-31

申请人： Shunji Maeda ,  Kenji Oka ,  Yukihiro Shibata ,  Minoru Yoshida ,  Chie Shishido ,  Yuji Takagi ,  Atsushi Yoshida ,  Kazuo Yamaguchi

发明人： Shunji Maeda ,  Kenji Oka ,  Yukihiro Shibata ,  Minoru Yoshida ,  Chie Shishido ,  Yuji Takagi ,  Atsushi Yoshida ,  Kazuo Yamaguchi

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G01N21/9501 ,  G01N21/95607 ,  G06T7/0004 ,  G06T2207/30148

摘要： An inspection method, including: illuminating a light on a wafer on which plural chips having identical patterns are formed; imaging corresponding areas of two chips formed on the wafer to obtain inspection images and reference images with an image sensor; and processing the obtained inspection image and the reference image to produce a difference image which indicates a difference between the inspection image and the reference image and detect a defect by comparing the difference image with a threshold, wherein a threshold applied to a difference image which is produced by comparing the inspection image and the reference image obtained by imaging peripheral portion of the wafer is different from a threshold applied to a difference image which is produced by comparing the inspection image and the reference image obtained by imaging central portion of the wafer.

摘要翻译： 一种检查方法，包括：在其上形成有多个具有相同图案的芯片的晶片上照射光; 对形成在晶片上的两个芯片的对应区域进行成像，以获得具有图像传感器的检查图像和参考图像; 并且处理所获得的检查图像和参考图像以产生指示检查图像和参考图像之间的差异的差异图像，并且通过将差异图像与阈值进行比较来检测缺陷，其中应用于差分图像的阈值是 通过比较检查图像和通过对晶片的周边部分进行成像获得的参考图像而产生的参考图像与通过比较检查图像和通过对晶片的中心部分进行成像而获得的参考图像而产生的差分图像的阈值不同。

公开(公告)号：US08086422B2

公开(公告)日：2011-12-27

申请号：US12341657

申请日：2008-12-22

申请人： Hisae Shibuya ,  Yuji Takagi

发明人： Hisae Shibuya ,  Yuji Takagi

IPC分类号： G06F11/00

CPC分类号： G01N21/956 ,  G06T7/0006 ,  G06T7/001 ,  G06T2207/30148

摘要： The distribution states of defects are analyzed on the basis of the coordinates of defects detected by an inspection apparatus to classify them into a distribution feature category, or any one of repetitive defect, congestion defect, linear distribution defect, ring/lump distribution defect and random defect. In the manufacturing process for semiconductor substrates, defect distribution states are analyzed on the basis of defect data detected by an inspection apparatus, thereby specifying the cause of defect in apparatus or process.

摘要翻译： 基于由检查装置检测到的缺陷坐标来分析缺陷的分布状态，将其分类为分布特征类别，或重复缺陷，拥塞缺陷，线性分布缺陷，环/块分布缺陷和随机 缺陷。 在半导体基板的制造工序中，基于由检查装置检测出的缺陷数据来分析缺陷分布状态，从而指定装置或处理中的缺陷的原因。

公开(公告)号：US20110164809A1

公开(公告)日：2011-07-07

申请号：US13049943

申请日：2011-03-17

申请人： Hisae Shibuya ,  Akira Hamamatsu ,  Yuji Takagi

发明人： Hisae Shibuya ,  Akira Hamamatsu ,  Yuji Takagi

IPC分类号： G06K9/00

CPC分类号： G06K9/6221 ,  G01N21/9501 ,  G01N21/95607 ,  G01N2021/8854 ,  G01N2021/95676

摘要： With the objective of achieving defect kind training in a short period of time to teach classification conditions of defects detected as a result of inspecting a thin film device, according to one aspect of the present invention, there is provided a visual inspection method, and an apparatus therefor, comprising the steps of: detecting defects based on inspection images acquired by optical or electronic defect detection means, and at the same time calculating features of the defects; and classifying the defects according to classification conditions set beforehand, wherein said classification condition setting step further includes the steps of: collecting defect features over a large number of defects acquired beforehand from the defect detection step; sampling defects based on the distribution of the collected defect features over the large number of defects; and setting defect classification conditions based on the result of reviewing the sampled defects.

摘要翻译： 为了在短时间内实现缺陷种类训练，目的在于教导检查薄膜装置的检测缺陷的分类条件，根据本发明的一个方面，提供一种目视检查方法， 其装置包括以下步骤：基于由光学或电子缺陷检测装置获取的检查图像检测缺陷，同时计算缺陷的特征; 并根据预先设定的分类条件对缺陷进行分类，其中所述分类条件设置步骤还包括以下步骤：从缺陷检测步骤预先获取的大量缺陷中收集缺陷特征; 基于收集的缺陷特征分布在大量缺陷上的采样缺陷; 并根据检查采样缺陷的结果设置缺陷分类条件。

公开(公告)号：US20080245434A1

公开(公告)日：2008-10-09

申请号：US11868728

申请日：2007-10-08

申请人： Motoshige Hibino ,  Yuji Takagi ,  Minoru Hiramatsu ,  Koji Uchino

发明人： Motoshige Hibino ,  Yuji Takagi ,  Minoru Hiramatsu ,  Koji Uchino

IPC分类号： F16L11/15 ,  F16L11/20 ,  B21D26/02

CPC分类号： F16L11/112 ,  F16L11/15 ,  Y10T29/49435 ,  Y10T29/49805

摘要： A composite hose is constructed to have an outer peripheral portion and an inner peripheral portion. The outer peripheral portion includes an elastic layer and a reinforcing layer provided on an outer periphery of the elastic layer. The inner peripheral portion includes a corrugated metal tube which is provided with a corrugated portion formed with corrugation his and corrugation valleys. A distance between the reinforcing layer and tops of the corrugation hills of the corrugated metal tube is designed 0.27 mm or less.

摘要翻译： 复合软管被构造成具有外周部分和内周部分。 外周部包括弹性层和设置在弹性层的外周上的增强层。 内周部分包括波纹状金属管，该波纹金属管设置有形成有波纹状波纹状波谷的波纹状部分。 波纹状金属管的波纹状山体的加强层与顶部之间的距离为0.27mm以下。

公开(公告)号：US20070277896A1

公开(公告)日：2007-12-06

申请号：US11806474

申请日：2007-05-31

申请人： Yuji Takagi ,  Ayumu Ikemoto

发明人： Yuji Takagi ,  Ayumu Ikemoto

IPC分类号： F16L11/00

CPC分类号： F16L11/04 ,  F16L11/081 ,  F16L11/085 ,  F16L2011/047 ,  Y10T428/1393

摘要： A refrigerant transportation hose having excellent flexibility and high resistance to permeation of refrigerant. The refrigerant transportation hose includes an innermost layer formed by using polyamide resin, a low-permeation layer formed on an outer peripheral surface of the innermost layer and rubber layers (of an inner rubber layer and an outer rubber layer) formed on an outer peripheral surface of the low-permeation layer, wherein the low-permeation layer is a resin film in thickness of 5 to 10 μm made of polyvinyl alcohol having a degree of saponification of not less than 90%.

摘要翻译： 一种制冷剂输送软管，具有优良的柔性和高耐制冷剂的渗透性。 制冷剂输送软管包括通过使用聚酰胺树脂形成的最内层，形成在最内层的外周表面上的低渗透层和形成在外周表面上的橡胶层（内橡胶层和外橡胶层） 的低渗透层，其中低渗透层是由皂化度不小于90％的聚乙烯醇制成的厚度为5至10μm的树脂膜。

公开(公告)号：US07274813B2

公开(公告)日：2007-09-25

申请号：US11204181

申请日：2005-08-16

申请人： Shunji Maeda ,  Kenji Oka ,  Yukihiro Shibata ,  Minoru Yoshida ,  Chie Shishido ,  Yuji Takagi ,  Atsushi Yoshida ,  Kazuo Yamaguchi

发明人： Shunji Maeda ,  Kenji Oka ,  Yukihiro Shibata ,  Minoru Yoshida ,  Chie Shishido ,  Yuji Takagi ,  Atsushi Yoshida ,  Kazuo Yamaguchi

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G01N21/9501 ,  G01N21/95607 ,  G06T7/0004 ,  G06T2207/30148

摘要： A method of inspecting defects of a plurality of patterns that are formed on a substrate to have naturally the same shape. According to this method, in order to detect very small defects of the patterns with high sensitivity without being affected by irregular brightness due to the thickness difference between the patterns formed on a semiconductor wafer, a first pattern being inspected is detected to produce a first image of the first pattern, the first image is stored, a second pattern being inspected is detected to produce a second image of said second pattern, the stored first image and the second image are matched in brightness, and the brightness-matched first and second images are compared with each other so that the patterns can be inspected.

摘要翻译： 检查在基板上形成的具有自然相同形状的多个图案的缺陷的方法。 根据该方法，为了以高灵敏度检测图案的非常小的缺陷，不受由于在半导体晶片上形成的图案之间的厚度差而引起的不规则亮度的影响，检测出被检查的第一图案以产生第一图像 第一图案被存储，检测出被检查的第二图案以产生所述第二图案的第二图像，所存储的第一图像和第二图像的亮度相匹配，并且亮度匹配的第一和第二图像 彼此进行比较，从而可以检查图案。

公开(公告)号：US07231079B2

公开(公告)日：2007-06-12

申请号：US10050519

申请日：2002-01-18

申请人： Hirohito Okuda ,  Yuji Takagi ,  Masahiro Watanabe ,  Shunji Maeda ,  Minori Noguchi ,  Yoshimasa Ooshima ,  Makoto Ono

发明人： Hirohito Okuda ,  Yuji Takagi ,  Masahiro Watanabe ,  Shunji Maeda ,  Minori Noguchi ,  Yoshimasa Ooshima ,  Makoto Ono

IPC分类号： G06K9/00

CPC分类号： G01N21/956 ,  G01N21/9501 ,  G01N2021/8854 ,  G01N2021/8861

摘要： For the purpose of reducing a false report and shortening inspection time, an area to be inspected is locally inspected under optimum inspection conditions. In order to avoid the number of detected defects from increasing explosively, and thereby to facilitate control of a critical defect, general-purpose layout data, which is used for producing a mask of a semiconductor wafer, is accumulated in a design information server 2. With reference to the layout data, an area to be inspected, which is inspected by a pattern inspecting apparatus 1, is divided into partial inspection areas including a cell portion and a non-cell portion. Inspection parameters are set for each of the partial inspection areas. In addition, the defect reviewing apparatus 8 obtains an inspection result of the pattern inspecting apparatus 1. When obtaining a defect image, the defect reviewing apparatus 8 identifies a position, where the defect occurred, from among a cell portion, a non-cell portion, a pattern dense portion, and the like according to layout data. Moreover, the defect reviewing apparatus 8 sets inspection parameters, such as pickup magnification of this defect, in response to a result of the identification to set a control criterion of criticality.

摘要翻译： 为了减少虚假报告和缩短检查时间，在最佳检查条件下对被检查区域进行局部检查。 为了避免检测到的缺陷数量爆炸性增加，从而有利于控制关键缺陷，用于制造半导体晶片的掩模的通用布局数据被累积在设计信息服务器2中。 参照布局数据，由图案检查装置1检查的被检查区域被划分为包括单元部分和非单元部分的局部检查区域。 为每个部分检查区域设置检查参数。 另外，缺陷检查装置8获得图案检查装置1的检查结果。 当获得缺陷图像时，缺陷检查装置8根据布局数据从单元部分，非单元部分，图案密集部分等中识别发生缺陷的位置。 此外，缺陷检查装置8响应于识别的结果设置检查参数，例如该缺陷的拾取倍率，以设置关键性的控制标准。

公开(公告)号：US20060239536A1

公开(公告)日：2006-10-26

申请号：US11472399

申请日：2006-06-22

申请人： Hisae Shibuya ,  Yuji Takagi

发明人： Hisae Shibuya ,  Yuji Takagi

IPC分类号： H04N7/18 ,  G06K9/00 ,  G01N21/00

CPC分类号： G01N21/956 ,  G01N21/9501 ,  G06T7/0006 ,  G06T7/001 ,  G06T2207/30148

摘要： The distribution states of defects are analyzed on the basis of the coordinates of defects detected by an inspection apparatus to classify them into a distribution feature category, or any one of repetitive defect, congestion defect, linear distribution defect, ring/lump distribution defect and random defect. In the manufacturing process for semiconductor substrates, defect distribution states are analyzed on the basis of defect data detected by an inspection apparatus, thereby specifying the cause of defect in apparatus or process.

公开(公告)号：US07068834B1

公开(公告)日：2006-06-27

申请号：US09452149

申请日：1999-12-01

申请人： Yoko Ikeda ,  Junko Konishi ,  Hisafumi Iwata ,  Yuji Takagi ,  Kenji Obara ,  Ryo Nakagaki ,  Seiji Isogai ,  Yasuhiko Ozawa

发明人： Yoko Ikeda ,  Junko Konishi ,  Hisafumi Iwata ,  Yuji Takagi ,  Kenji Obara ,  Ryo Nakagaki ,  Seiji Isogai ,  Yasuhiko Ozawa

IPC分类号： G06K9/00

CPC分类号： G06F3/0486 ,  G06F2203/04803 ,  G06T7/0004 ,  G06T2200/24 ,  G06T2207/30148

摘要： The present invention has an analyzing unit including an image detection device for producing a plurality of images of a workpiece, a storage for storing detected images produced by the image detection device, and a display having a screen with a first area for displaying a plurality of detected images stored in the storage and a plurality of second areas for classifying the detected images according to features of the detected images, whereby the plurality of detected images are moved on the screen from the first area to selected second areas to classify the plurality of detected images in the second areas.

摘要翻译： 本发明具有一种分析单元，包括用于产生工件的多个图像的图像检测装置，用于存储由图像检测装置产生的检测图像的存储器以及具有用于显示多个图像的第一区域的屏幕的显示器 检测存储在存储器中的图像和多个第二区域，用于根据检测到的图像的特征对检测到的图像进行分类，由此多个检测图像在屏幕上从第一区域移动到选定的第二区域，以对多个检测到的图像进行分类 图像在第二个区域。

公开(公告)号：US20050211323A1

公开(公告)日：2005-09-29

申请号：US11070588

申请日：2005-03-02

申请人： Yuji Takagi ,  Minoru Hiramatsu ,  Motoshige Hibino

发明人： Yuji Takagi ,  Minoru Hiramatsu ,  Motoshige Hibino

IPC分类号： F16L11/11 ,  F16L11/00 ,  F16L11/115 ,  F16L11/12 ,  F16L11/15

CPC分类号： F16L11/15 ,  F16L2011/047

摘要： A composite hose is provided with a corrugated metal tube as a barrier layer against permeation of conveyed fluid, and an elastic filler layer which is filled in valley gaps between corrugation hills on an outer peripheral side of the corrugated metal tube. The elastic filler layer is filled completely in the valley gaps to tops of the corrugation hills. A radial thickness of the elastic filler layer measured radially outwardly from a radial position of the tops of the corrugation hills is designed 0.3 mm or less.

摘要翻译： 复合软管设置有波纹金属管作为阻挡输送流体渗透的阻挡层，以及填充在波纹状金属管的外周侧的波纹丘陵之间的谷间隙中的弹性填充层。 弹性填充层完全填充在波纹山丘顶部的谷间隙中。 从波纹山丘的顶部的径向位置径向向外测量的弹性填充层的径向厚度设计为0.3mm或更小。