Method of manufacturing optical glass element
    31.
    发明申请
    Method of manufacturing optical glass element 审中-公开
    制造光学玻璃元件的方法

    公开(公告)号:US20070204655A1

    公开(公告)日:2007-09-06

    申请号:US11712134

    申请日:2007-02-28

    申请人: Kinya Kato

    发明人: Kinya Kato

    IPC分类号: C03B23/00 C03B23/04 C03B29/00

    CPC分类号: C03B11/08 C03B2215/80

    摘要: A pair of upper die and lower die having forming surfaces corresponding to optical glass elements are prepared. A locating member having a plurality of locating holes for locating preforms is arranged on the lower die. A plurality of preforms are supplied to the locating holes, respectively, and the preforms are hot-press-molded between the paired upper die and lower die. According to this method, since a plurality of optical glass elements can be formed simultaneously, the high-precision optical glass elements can be manufactured at low cost.

    摘要翻译: 准备具有对应于光学玻璃元件的成形表面的一对上模和下模。 具有用于定位预成型件的多个定位孔的定位构件设置在下模上。 将多个预成型件分别供应到定位孔,并且将预成型件热压成型在成对的上模和下模之间。 根据该方法,由于可以同时形成多个光学玻璃元件,所以可以以低成本制造高精度光学玻璃元件。

    Polluted soil remediation apparatus and pollutant degrading apparatus

    公开(公告)号:US07108837B2

    公开(公告)日:2006-09-19

    申请号:US10290357

    申请日:2002-11-08

    IPC分类号: B01J19/08

    摘要: A polluted soil remediation apparatus comprising a treatment tank in which pollutants degradable with light irradiation in the presence of chlorine is extracted as a gas containing the pollutants from polluted soil and a mixture of the gas containing the pollutants and chlorine-containing air is irradiated with light to degrade the pollutants, wherein the apparatus comprises a unit for aspirating the gas containing the pollutants from the polluted soil, a chlorine-containing air generation unit for generating the chlorine-containing gas, a mixing unit for mixing the gas containing the pollutants extracted by the aspiration unit and the chorine-containing air generated by the chlorine-containing gas generation unit to form a mixed gas, the treatment tank comprising a treatment region where the mixed gas is introduced and a light irradiation unit for irradiating the treatment region with light to degrade the pollutants contained in the mixed gas, and an exhaust unit for exhausting the degradation-treated gas from the treatment region of the treatment tank.

    Charged-particle-beam mapping projection-optical systems and methods for adjusting same
    33.
    发明授权
    Charged-particle-beam mapping projection-optical systems and methods for adjusting same 有权
    带电粒子束映射投影光学系统及其调整方法

    公开(公告)号:US06765217B1

    公开(公告)日:2004-07-20

    申请号:US09302075

    申请日:1999-04-28

    IPC分类号: G01N2100

    摘要: Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation optical system, and enters a Wien filter (“E×B”). Upon passing through the E×B, the irradiation beam passes through an objective optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective optical system and the E×B in a different direction to a detector via an imaging optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the E×B. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g., in the plane of the object surface) can be used that are optimized for the CPB optical system and the off-axis optical system. Desirably, the image formed on the detector when electrical voltage and current are not applied to the E×B is in the same position as the image formed on the detector when electrical voltage and current are applied to the E×B. Also provided are “evaluation charts” for use in such alignments that do not require adjustment of the optical axis of the irradiation optical system, and from which the kinetic-energy distribution of the emitted adjustment beam is stable.

    摘要翻译: 公开了可以快速且准确地执行这种系统的带电粒子束(CPB)映射投影光学系统和调整方法。 在典型的系统中,照射光束从光源发射,通过照射光学系统,并进入维恩滤光片(“ExB”)。 当通过ExB时,照射光束通过物镜光学系统并入射到物体表面上。 这种冲击产生观察光束,该观察光束经由成像光学系统通过物镜光学系统和ExB以不同的方向返回到检测器。 调整光束源发射用于调整和对准例如物体表面的位置和/或ExB的维恩状态的调节光束。 调节光束可以相对于物镜光学系统偏轴。 对于这种调整和对准,可以使用为CPB光学系统和离轴光学系统优化的基准标记(例如位于物体表面的平面中)。 理想地,当电压和电流未施加到ExB时,在检测器上形成的图像与当将电压和电流施加到ExB时形成在检测器上的图像位于相同的位置。 还提供了用于这种对准的“评估图”,其不需要调整照射光学系统的光轴,并且发射的调节光束的动能分布从该距离稳定。

    Defect inspection apparatus
    35.
    发明授权
    Defect inspection apparatus 有权
    缺陷检查装置

    公开(公告)号:US06512579B2

    公开(公告)日:2003-01-28

    申请号:US09781957

    申请日:2001-02-14

    IPC分类号: G01N2100

    CPC分类号: G01N21/956 G01N21/8806

    摘要: An illumination optical system for illuminating a substrate and a light receiving optical system that receives diffracted light from the wafer are provided in a defect inspection apparatus that inspects for a defect present at the wafer based upon an image of the wafer obtained at the light-receiving optical system, with a numerical aperture at the illumination optical system set different from a numerical aperture at the light-receiving optical system and the absolute value of the difference between the numerical apertures at the illumination optical system and the light-receiving optical system set at a value equal to or larger than the quantity of the angular offset manifesting between the direction along which the diffracted light advances and the direction along which an optical axis of the light-receiving optical system extends. As a result, highly reliable inspection results by preventing the contrast of an image of a substrate formed by diffracted light from becoming lowered either in its entirety or in part is achieved even when there is an angular offset between the direction in which the diffracted light from the substrate advances and the direction of the optical axis of a light-receiving system.

    摘要翻译: 用于照射基板的照明光学系统和从晶片接收衍射光的光接收光学系统设置在缺陷检查装置中,该缺陷检查装置基于在光接收时获得的晶片的图像来检查存在于晶片的缺陷 光学系统,其在照明光学系统处的数值孔径与光接收光学系统的数值孔径不同,并且照明光学系统和设置在光接收光学系统的光接收光学系统的数值孔径之间的差的绝对值 在衍射光的前进方向与受光光学系统的光轴延伸的方向之间的角度偏移量的数量以上的值等于或大于该值。 因此,通过防止由衍射光形成的基板的图像的对比度全部或部分地降低而实现的高度可靠的检查结果即使当在衍射光的衍射光的方向之间存在角度偏移时, 基板前进并且光接收系统的光轴的方向。

    Method and apparatus for decomposing gaseous aliphatic hydrocarbon halide compound
    36.
    发明授权
    Method and apparatus for decomposing gaseous aliphatic hydrocarbon halide compound 失效
    用于分解气态脂族烃卤化物的方法和装置

    公开(公告)号:US06497795B1

    公开(公告)日:2002-12-24

    申请号:US09458685

    申请日:1999-12-10

    申请人: Kinya Kato

    发明人: Kinya Kato

    IPC分类号: B01D5300

    摘要: A method for decomposing a gaseous aliphatic hydrocarbon halide compound more simply is provided. The method includes the steps of mixing the gaseous aliphatic hydrocarbon halide compound and a chlorine gas-containing gas and emitting light to a mixture gas of the gaseous aliphatic hydrocarbon halide compound and the chlorine gas.

    摘要翻译: 提供了一种更简单地分解气态脂族烃卤化物的方法。 该方法包括以下步骤:将气态脂族烃卤化物和含氯气的气体混合并将其发射到气态脂族烃卤化物和氯气的混合气体中。

    Method for decomposing halogenated aliphatic hydrocarbon compounds having adsorption process and apparatus for decomposition having adsorption means
    37.
    发明授权
    Method for decomposing halogenated aliphatic hydrocarbon compounds having adsorption process and apparatus for decomposition having adsorption means 有权
    具有吸附方法的分解卤化脂族烃化合物的方法和具有吸附装置的分解装置

    公开(公告)号:US06462250B1

    公开(公告)日:2002-10-08

    申请号:US09595439

    申请日:2000-06-16

    IPC分类号: C02F1461

    摘要: Process and apparatus for decomposing halogenated aliphatic hydrocarbon compounds in the presence of functional water under light irradiation, where the target substance for decomposition contained at a low concentration in the exhaust or discharge from the decomposition unit is adsorbed by an adsorption unit, and at regular intervals, the adsorbed target substance is released from the adsorption unit and returned to the decomposition unit. The concentration of the target substance in the waste or discharge can be easily and efficiently reduced below the environmental standard.

    摘要翻译: 在光照射下在官能水存在下分解卤代脂族烃化合物的方法和装置,其中排放中的低浓度所含的分解对象物质或分解单元的排出物被吸附单元吸附,并且以规则的间隔 吸附的目标物质从吸附单元释放并返回分解单元。 目标物质在废物或排放物中的浓度可以容易而有效地降低到低于环境标准。

    Foreign substance inspecting apparatus and method thereof
    39.
    发明授权
    Foreign substance inspecting apparatus and method thereof 失效
    异物检查装置及其方法

    公开(公告)号:US5856868A

    公开(公告)日:1999-01-05

    申请号:US889558

    申请日:1997-07-08

    IPC分类号: G01N21/94 G01N21/88

    CPC分类号: G01N21/94

    摘要: A foreign substance inspecting apparatus and method for detecting a foreign substance on a surface, includes a light source for providing light; a plurality of condensing optical systems for collecting the light from the light source and for forming a plurality of light spots on the surface; a scanning system for scanning the surface using the light spots formed by the condensing optical systems; a detecting optical system for detecting light scattered from at least one of the light spots by the foreign substance on the surface; and a surface shape measuring system for measuring a shape of the surface, wherein a focus of each one of the condensing optical systems is individually adjusted according to the surface shape measured by the surface shape measuring system.

    摘要翻译: 用于检测表面上的异物的异物检查装置和方法包括:用于提供光的光源; 多个聚光系统,用于收集来自光源的光并在表面上形成多个光斑; 使用由聚光光学系统形成的光斑扫描表面的扫描系统; 检测光学系统,用于检测由表面上的异物从至少一个光斑散射的光; 以及用于测量表面形状的表面形状测量系统,其中根据由表面形状测量系统测量的表面形状单独地调整每个聚光光学系统的焦点。

    Interferometer, adjusting method therefor, stage apparatus having the
interferometer, and exposure apparatus having the stage apparatus
    40.
    发明授权
    Interferometer, adjusting method therefor, stage apparatus having the interferometer, and exposure apparatus having the stage apparatus 失效
    干涉仪,其调节方法,具有干涉仪的舞台装置,以及具有舞台装置的曝光装置

    公开(公告)号:US5764361A

    公开(公告)日:1998-06-09

    申请号:US734078

    申请日:1996-10-21

    IPC分类号: G01B9/02 G03F7/20

    摘要: This invention relates an interferometer having a structure for suppressing measurement errors arising from leakage light by minimizing nonlinear errors due to the leakage light in a polarization beam splitter for splitting incident light into a first polarized light component and a second polarized light component, and apparatuses to which the interferometer is applied. The interferometer includes an adjustment mechanism for adjusting the angle of light incidence on the beam splitting surface of the polarization beam splitter such that the extinction ratio of the polarization beam splitter is minimized by using the dependence of the polarization beam splitter on the incident angle.

    摘要翻译: 本发明涉及一种干涉仪,其具有通过使入射光分离为第一偏振光分量和第二偏振光分量的偏振分束器中的漏光引起的非线性误差最小化,抑制由漏光引起的测量误差的结构, 应用干涉仪。 该干涉仪包括调节机构,用于调节偏振分束器的分束表面上的光入射角,使得偏振分束器的消光比通过使用偏振分束器对入射角的依赖性来最小化。