VIA ARRAY DESIGN FOR MULTI-LAYER REDISTRIBUTION CIRCUIT STRUCTURE

    公开(公告)号:US20210351124A1

    公开(公告)日:2021-11-11

    申请号:US17179357

    申请日:2021-02-18

    Applicant: MEDIATEK INC.

    Abstract: An interconnect structure for a redistribution layer includes an intermediate via land pad; a cluster of upper conductive vias abutting the intermediate via land pad and electrically coupling the intermediate via land pad to an upper via land pad; and an array of lower conductive vias electrically coupling the intermediate via land pad with a lower circuit pad. The array of lower conductive vias is arranged within a horseshoe-shaped via array region extending along a perimeter of the intermediate via land pad. The array of lower conductive vias arranged within the horseshoe-shaped via array region does not overlap with the cluster of upper conductive vias.

    SEMICONDUCTOR PACKAGE WITH REDUCED NOISE
    32.
    发明申请

    公开(公告)号:US20200058633A1

    公开(公告)日:2020-02-20

    申请号:US16535019

    申请日:2019-08-07

    Applicant: MEDIATEK INC.

    Abstract: The present disclosure provides a semiconductor package including a bottom package having a substrate, a radio-frequency (RF) die and a system-on-a-chip (SoC) die arranged on the substrate in a side-by-side manner, a molding compound covering the RF die and the SoC die, and an interposer over the molding compound. Connection elements and a column of signal interference shielding elements are disposed on the substrate. The connection elements surround the SoC die. The column of signal interference shielding elements is interposed between the RF die and the SoC die. A top package is mounted on the interposer.

    METHOD FOR FABRICATING MICROELECTRONIC PACKAGE WITH SURFACE MOUNTED PASSIVE ELEMENT

    公开(公告)号:US20180294255A1

    公开(公告)日:2018-10-11

    申请号:US15886813

    申请日:2018-02-01

    Applicant: MEDIATEK INC.

    Inventor: Hsing-Chih Liu

    Abstract: A method for fabricating a microelectronic package is disclosed. A packaged substrate having a chip surrounded by a molding compound is prepared. An RDL structure is formed on the chip. Bump pads and SMD pads are disposed in a topmost level of metal interconnect of the RDL structure. A passivation layer covers the RDL structure. The passivation layer is subjected to a lithographic process to form bump pad openings and an SMD opening in the passivation layer. The bump pads are exposed, respectively, through the bump pad openings. The SMD pads are exposed through the SMD opening. Bumps are formed on the bump pads through the bump pad openings, respectively. A passive element is mounted on the SMD pads.

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