公开(公告)号：US5518859A

公开(公告)日：1996-05-21

申请号：US405293

申请日：1995-03-16

申请人： Naozumi Iwasawa ,  Junichi Higashi

发明人： Naozumi Iwasawa ,  Junichi Higashi

IPC分类号： G03F7/023 ,  C09D5/44 ,  G03F7/16

CPC分类号： G03F7/023 ,  G03F7/164

摘要： A positive-type photosensitive electrodeposition coating composition comprising a water-soluble or water-dispersible resin having an ionic group and containing at least one modified quinonediazidesulfone unit represented by the following formula (I) or (II) ##STR1## wherein R.sub.1 represents ##STR2## R.sub.2 represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkyl ether group, andR.sub.3 represents an alkylene group, a cycloalkylene group, an alkylene ether group, a phenylene group which may optionally be substituted with an alkyl group having 1 to 20 carbon atoms, or an alkylene, cycloalkylene or alkylene ether group containing in its chain a phenylene group which may optionally be substituted with an alkyl group having 1 to 20 carbon atoms, in the molecule.

摘要翻译： 一种正型光敏电沉积涂料组合物，其包含具有离子性基团的水溶性或水分散性树脂，并含有由下式（I）或（II）表示的至少一种改性的醌二叠氮化物单元。 >（II）其中R 1表示R 2表示氢原子，烷基，环烷基或烷基醚基，R 3表示亚烷基，亚环烷基，亚烷基醚基，亚苯基， 或者可以被分子内被碳原子数为1〜20的烷基取代的亚烷基，亚环烷基或亚烷基醚基在其链中含有可以被碳原子数1〜20的烷基取代的亚苯基。

公开(公告)号：US5439774A

公开(公告)日：1995-08-08

申请号：US314438

申请日：1994-09-28

申请人： Naozumi Iwasawa ,  Junichi Higashi

发明人： Naozumi Iwasawa ,  Junichi Higashi

IPC分类号： G03F7/023 ,  C09D5/44 ,  G03F7/16

CPC分类号： G03F7/023 ,  G03F7/164

摘要： A positive-type photosensitive electrodeposition coating composition comprising a water-soluble or water-dispersible resin having an ionic group and containing at least one modified quinonediazidesulfone unit represented by the following formula (I) or (II) ##STR1## wherein R.sub.1 represents ##STR2## R.sub.2 represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkyl ether group, andR.sub.3 represents an alkylene group, a cycloalkylene group, an alkylene ether group,a phenylene group which may optionally be substituted with an alkyl group having 1 to 20 carbon atoms, or an alkylene, cycloalkylene or alkylene ether group containing in its chain a phenylene group which may optionally be substituted with an alkyl group having 1 to 20 carbon atoms, in the molecule.

摘要翻译： 一种正型光敏电沉积涂料组合物，其包含具有离子性基团的水溶性或水分散性树脂，并含有由下式（I）或（II）表示的至少一种改性的醌二叠氮化物单元。 >（II）其中R 1表示R 2表示氢原子，烷基，环烷基或烷基醚基，R 3表示亚烷基，亚环烷基，亚烷基醚基，亚苯基， 或者可以被分子内被碳原子数为1〜20的烷基取代的亚烷基，亚环烷基或亚烷基醚基在其链中含有可以被碳原子数1〜20的烷基取代的亚苯基。

公开(公告)号：US5096936A

公开(公告)日：1992-03-17

申请号：US476923

申请日：1990-02-08

申请人： Kenji Seko ,  Satoshi Watanabe ,  Naozumi Iwasawa

发明人： Kenji Seko ,  Satoshi Watanabe ,  Naozumi Iwasawa

IPC分类号： C08G59/20 ,  C07D303/16 ,  C08F4/12 ,  C08F20/32 ,  C08G59/00 ,  C08G59/32 ,  C08G59/68 ,  G03F7/029 ,  G03F7/038

CPC分类号： C08G59/68 ,  C08G59/3209 ,  G03F7/029 ,  G03F7/038

摘要： The invention provides a photo-crosslinkable resin composition consisting essentially of an acrylic resin having alicyclic epoxy groups and a photo cationic polymerization initiator.

摘要翻译： 本发明提供一种基本上由具有脂环族环氧基的丙烯酸树脂和光阳离子聚合引发剂组成的光交联性树脂组合物。

公开(公告)号：US4975351A

公开(公告)日：1990-12-04

申请号：US268547

申请日：1988-11-07

申请人： Yuu Akaki ,  Kenji Seko ,  Toshio Kondo ,  Naozumi Iwasawa

发明人： Yuu Akaki ,  Kenji Seko ,  Toshio Kondo ,  Naozumi Iwasawa

IPC分类号： C09D5/44 ,  C09D201/02 ,  G03C1/72 ,  G03C1/74 ,  G03F7/022 ,  G03F7/023 ,  G03F7/16 ,  H05K3/06

CPC分类号： G03F7/023 ,  G03F7/164

摘要： A positive-type photosensitive electrodeposition coating composition comprising as a main component a water-soluble or water-dispersible resin containing modified quinonediazidesulfone units represented by the following formula (I) ##STR1## wherein R.sub.1 represents ##STR2## or ##STR3## R.sub.2 represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkyl ether group, andR.sub.3 represents an alkylene group, a cycloalkylene group or an alkylene ether group, in the molecule.

公开(公告)号：US4069274A

公开(公告)日：1978-01-17

申请号：US598946

申请日：1975-07-25

申请人： Minoru Shibata ,  Naozumi Iwasawa ,  Tadashi Watanabe ,  Ichiro Yoshihara

发明人： Minoru Shibata ,  Naozumi Iwasawa ,  Tadashi Watanabe ,  Ichiro Yoshihara

IPC分类号： C09D5/03 ,  C08G81/00 ,  C08G81/02 ,  C08J3/20 ,  C09D5/46 ,  C08L63/00

CPC分类号： C08G81/027

摘要： A thermosetting powder coating composition comprising:A. a functional glycidyl group-containing graft copolymer ofI. 10 to 40 percent of a linear polyester having a number average molecular weight of 600 to 3,000 and containing one terminal carboxyl group andIi. 60 to 90 percent of acrylic copolymer of ii-a) 6.5 to 60 percent of at least one of glycidyl esters having the formula ##STR1## wherein R.sub.1 is hydrogen or methyl, ii-b) 10 to 93.5 percent of at least one of acrylic monomers having the formula CH.sub.2 .dbd.C(R.sub.2)COOR.sub.3 wherein R.sub.2 is hydrogen or methyl and R.sub.3 is alkyl having 1 to 14 carbon atoms, cyclohexyl or hydroxyalkyl having 1 to 4 carbon atoms, and ii-c) 0 to 65 percent of additional monomers selected from the group consisting of acrylonitrile, methacrylonitrile and styrenes having the formula ##STR2## wherein R.sub.4 is hydrogen or alkyl having 1 to 4 carbon atoms, said graft copolymer having a softening point of 70.degree. to 110.degree. C and a number average molecular weight of 2,000 to 30,000 and containing glycidyl group in an amount of 0.35 to 2.35 moles per kilogram of the graft copolymer; andB. at least one of polycarboxylic acids and anhydrides thereof in an amount of 0.6 to 1.2 moles in terms of carboxyl group per mole of the glycidyl group contained in the graft copolymer.

摘要翻译： 一种热固性粉末涂料组合物，其包含：

公开(公告)号：US4038225A

公开(公告)日：1977-07-26

申请号：US582700

申请日：1975-06-02

申请人： Yasuo Takaya ,  Tadashi Watanabe ,  Naozumi Iwasawa

发明人： Yasuo Takaya ,  Tadashi Watanabe ,  Naozumi Iwasawa

IPC分类号： C08L67/00 ,  C08G63/00 ,  C08G63/46 ,  C08L67/08 ,  C09D5/46 ,  C09D167/00 ,  C09D167/08 ,  C09D3/52

CPC分类号： C09D167/08 ,  Y10T428/31522

摘要： A thermosetting high solid coating composition which is characterized in that said composition consumes less solvents in production, evolves less solvent vapor in use, and consists of: (a) 80 to 60 parts by weight of alkyd resin having a fatty acid content of 10 to 20% by weight, a phenyl group content of 10 to 25% by weight and a dibasic acid ratio and a hydroxyl group equivalent within certain ranges, (b) 20 to 40 parts by weight of melamine resin mainly comprising hexakisalkoxymethylmelamine, (c) if desired, alcohol modified melamine resin replacing not more than one half of said melamine resin (b), (d) 0.05 to 1.00 part by weight of aliphatic or aromatic sulfonic acid or their amine salts, and (e) 70 to 20 parts by weight of solvents at the time of spray coating.

公开(公告)号：US5576148A

公开(公告)日：1996-11-19

申请号：US382155

申请日：1995-02-01

申请人： Genji Imai ,  Yukari Takeda ,  Hideo Kogure ,  Naozumi Iwasawa

发明人： Genji Imai ,  Yukari Takeda ,  Hideo Kogure ,  Naozumi Iwasawa

IPC分类号： H05K3/42 ,  H05K3/00 ,  H05K3/06 ,  H05K3/46 ,  G03F7/00

CPC分类号： H05K3/0094 ,  H05K2201/09581 ,  H05K2203/0582 ,  H05K2203/107 ,  H05K2203/135 ,  H05K3/0082 ,  H05K3/064

摘要： The present invention provides a process for producing a high-density printed wiring board with plated throughholes, at high productivity and reliability by a direct drawing method. The process comprises making throughholes in a substrate having an electro-conductive layer on each side; conducting plating on at least the walls of the substrate throughholes; forming a photosensitive resist film on each side of the substrate; applying an actinic radiation onto the resist film by a direct drawing method in the shape of a pattern to be obtained when the resist film is a negative type, or in the shape of a pattern reverse to a pattern to be obtained when the resist film is a positive type; forming, on the uncoated portion inside the throughholes by electrodeposition, an electrodeposition film which is insoluble in a developing solution used later and an etching solution used later but is removable with a peeling solution used later; conducting development with an appropriate developing solution to remove the resist film; removing the exposed plating layer portion and the electro-conductive layer portion present therebeneath, by etching; and then peeling the remaining resist film and the electrodeposition film inside the throughholes, with an appropriate peeling solution.

摘要翻译： 本发明提供一种通过直接拉伸法以高生产率和可靠性制造具有电镀通孔的高密度印刷线路板的方法。 该方法包括在每个侧面上具有导电层的基板中形成通孔; 至少在基板通孔的壁上进行电镀; 在基板的每一侧上形成光敏抗蚀剂膜; 通过直接拉伸法将光化辐射施加到抗蚀剂膜为负型时获得的图案的形状，或者与抗蚀剂膜为 积极的类型 通过电沉积在通孔内的未涂覆部分上形成不溶于稍后使用的显影液的电沉积膜和稍后使用的可用随后使用的剥离溶液除去的蚀刻溶液; 用合适的显影液进行显影以除去抗蚀剂膜; 通过蚀刻去除暴露的镀层部分和存在于其中的导电层部分; 然后用适当的剥离溶液将剩余的抗蚀剂膜和电沉积膜剥离到通孔内。

公开(公告)号：US5496678A

公开(公告)日：1996-03-05

申请号：US227346

申请日：1994-04-14

申请人： Genji Imai ,  Naozumi Iwasawa ,  Tsuguo Yamaoka

发明人： Genji Imai ,  Naozumi Iwasawa ,  Tsuguo Yamaoka

IPC分类号： G03F7/004 ,  G03F7/027 ,  G03F7/021 ,  G03F7/029 ,  G03F7/032

CPC分类号： G03F7/0045 ,  G03F7/027

摘要： A photosensitive composition which comprises, as essential components:(A) a polymer having carboxyl group(s) and hydroxyphenyl group(s), or (A') a polymer having carboxyl group(s) and (A") a polymer having hydroxyphenyl group(s),(B) a compound having at least two vinyl ether groups in the molecule, and(C) a compound which generates an acid when irradiated with an actinic ray, and which is useful as a positive type photoresist having high resolution and excellent formability of fine image pattern, a material for printing, etc.; and a process for pattern formation using said composition.

摘要翻译： 作为必要成分的感光性组合物：（A）具有羧基和羟基苯基的聚合物，或（A'）具有羧基的聚合物和（A“）具有 羟基苯基，（B）分子中具有至少两个乙烯基醚基的化合物，（C）当用光化射线照射时产生酸的化合物，其可用作具有高分子量的正型光致抗蚀剂 精细图像图案的分辨率和优异的成形性，印刷材料等; 以及使用所述组合物的图案形成方法。

公开(公告)号：US5455117A

公开(公告)日：1995-10-03

申请号：US140564

申请日：1993-10-25

申请人： Toshiaki Nagano ,  Hideo Kogure ,  Naozumi Iwasawa ,  Tetsu Maki

发明人： Toshiaki Nagano ,  Hideo Kogure ,  Naozumi Iwasawa ,  Tetsu Maki

IPC分类号： G21F1/12 ,  H05K9/00 ,  B32B9/00

CPC分类号： G21F1/125 ,  H05K9/0088 ,  G21Y2002/301 ,  G21Y2004/10 ,  G21Y2004/30 ,  Y10T428/12007 ,  Y10T428/12014 ,  Y10T428/12035

摘要： An electromagnetic wave reflection-preventing material having a structure formed by successively laminating (A) an electromagnetic have reflecting metallic material layer, if needed, (B) a substrate layer, (C) a resin layer containing a powder of at least one selected from ferrite, carbon, metal powder and an electrically conductive metallic oxide, and, if needed, a good dielectric material, if needed, (D) a supporting film layer, and (E) a pattern coating layer prepared in the form of a geometrical pattern, containing a metal powder and having a volume resistivity of 10.sup.-3 to 10.sup.10 .OMEGA..multidot.cm, preferably further laminating (F) a clear or colored coating layer; and an electromagnetic wave reflection-preventing material which is obtained by substituting (G) a molded sheet layer formed by coating a coating composition prepared by dispersing the above powder into a binder onto a substrate having void, and molding under pressure for (C) a resin layer; and an electromagnetic wave reflection-preventing method which comprises applying the electromagnetic wave reflection-preventing material onto a structure, or which comprises applying a laminate obtained by removing the electromagnetic wave reflecting metallic material layer (A) from the electromagnetic wave reflection-preventing material onto an electromagnetic wave reflecting structure having a metallic surface.

摘要翻译： 具有通过依次层叠（A）电磁体形成的结构的电磁波反射防止材料具有反射金属材料层，如果需要，（B）基底层，（C）含有选自以下的至少一种的粉末的树脂层 铁素体，碳，金属粉末和导电金属氧化物，如果需要，如果需要，可以使用良好的介电材料（D）支撑膜层，和（E）以几何图案形式制备的图案涂层 ，含有金属粉末，体积电阻率为10-3至1010欧米加×厘米，优选进一步层压（F）透明或有色涂层; 和（G）通过将（G）通过将通过将上述粉末分散在粘合剂中而制备的涂料组合物形成的模塑片层而获得的模塑片层而获得，并且在压力下成型（C） 树脂层; 以及电磁波反射防止方法，其包括将电磁波反射防止材料施加到结构上，或者包括将从电磁波反射防止材料除去电磁波反射金属材料层（A）获得的层压体施加到 具有金属表面的电磁波反射结构。

公开(公告)号：US5453328A

公开(公告)日：1995-09-26

申请号：US183763

申请日：1994-01-21

申请人： Toshiaki Nagano ,  Hideo Kogure ,  Naozumi Iwasawa ,  Tetsu Maki

发明人： Toshiaki Nagano ,  Hideo Kogure ,  Naozumi Iwasawa ,  Tetsu Maki

IPC分类号： H05K9/00 ,  B32B9/00

CPC分类号： H05K9/0086 ,  Y10T428/12007 ,  Y10T428/12014 ,  Y10T428/12035

摘要： An electromagnetic wave reflection-preventing material having a structure formed by a process which comprises successively laminating (A) a pattern layer formed in the form of a geometrical pattern having a volume resistivity of 10.sup.3 .OMEGA. . cm or less, if needed, (B) a supporting layer, (C) a resin layer, and, if needed, (D) a supporting layer, to form a laminate unit, laminating a pluralitry of the laminate unit so that the layer (A) may face on the layer (C) or (D) to form a multiple laminate unit structure, and laminating the multiple laminate unit structure onto (E) an electromagnetic wave reflecting material layer so that the layer (C) or (D) of the multiple laminate unit structure may face on the layer (E), preferably further laminating a clear or colored coating layer onto the uppermost metallic pattern layer of the electromagnetic wave, reflection-preventing material; and an electromagnetic wave reflection-preventing method which comprises applying the electromagnetic wave reflection-preventing material onto a structure, or which comprises applying the multiple laminate unit structure obtained by removing the electromagnetic wave reflecting material layer (E) from the electromagnetic wave reflection-preventing material onto an electromagnetic wave reflecting structure having a metallic surface.

摘要翻译： 一种电磁波反射防止材料，其具有通过以下工序形成的结构形成的工艺：连续地层叠（A）形成为体积电阻率为103欧姆时的几何图案形式的图案层。 cm以下，如果需要，（B）支撑层，（C）树脂层，如果需要，（D）支撑层，形成层叠单元，层叠多层叠单元，使层 （A）可以在层（C）或（D）上面对以形成多层压单元结构，并将多层压单元结构层压到（E）电磁波反射材料层上，使得层（C）或（D 多层压单元结构可以在层（E）上面对，优选将透明或着色的涂层进一步层叠到电磁波的最上层的金属图案层上，防反射材料; 以及电磁波反射防止方法，其包括将电磁波反射防止材料施加到结构上，或者包括施加通过从电磁波反射防止中除去电磁波反射材料层（E）而获得的多层叠单元结构 材料到具有金属表面的电磁波反射结构。